containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton

Industry

CPC
C07C309/06

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Parent Industries

CCHEMISTRY METALLURGY C07Organic chemistry C07CACYCLIC OR CARBOCYCLIC COMPOUNDS C07C309/00Sulfonic acids Halides, esters, or anhydrides thereof

Current Industry

C07C309/06containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton

Industries

Patents Grantslast 30 patents

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Negative resist composition and pattern forming process
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Salt, acid generator, resist composition and method for producing r...
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- Katsuhiro Komuro
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Sulfonium salt photoinitiator, preparation method therefor, photocu...
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Salt, acid generator, resist composition and method for producing r...
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- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
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- Takuya Ikeda
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Information Patent Grant
Alkoxy compounds for disease treatment
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- Acucela Inc.
- Ian L. Scott
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Metal-containing onium salt compound, photodegradable base, resist...
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- Toyo Gosei Co., Ltd.
- Michiya Naito
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- 3M Innovative Properties Company
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Resist composition, patterning process, and barium salt
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- Jun Hatakeyama
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Metal particle supported catalysts, methods for producing same, and...
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- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
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Weakly coloured sulfonic acid
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- Arkema France
- Jean-Alex Laffitte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
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- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
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Information Patent Grant
Photoacid generator and photoresist composition including the same
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- Issue date May 18, 2021
- Samsung Electronics Co., Ltd.
- Suk-koo Hong
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Information Patent Grant
Non-aqueous electrolyte magnesium secondary battery
- Patent number 10,998,574
- Issue date May 4, 2021
- National Institute of Advanced Industrial Science and Technology
- Keigo Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aryl acetate onium materials
- Patent number 10,844,037
- Issue date Nov 24, 2020
- Rohm and Haas Electronic Materials LLC
- Paul J. Labeaume
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Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,838,300
- Issue date Nov 17, 2020
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing C2-C20 fluorine-containing organic acid, and c...
- Patent number 10,759,731
- Issue date Sep 1, 2020
- Daikin Industries, Ltd.
- Shuuji Itatani
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Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,670,963
- Issue date Jun 2, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
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HALOALKANE SULFONIC ACIDS, COMPOSITIONS THEREOF, AND RELATED METHODS
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- University of Kansas
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20230229082
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- JSR Corporation
- Katsuaki NISHIKORI
- C07 - ORGANIC CHEMISTRY
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ALKOXY COMPOUNDS FOR DISEASE TREATMENT
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- Acucela Inc.
- Ian L. Scott
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
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PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...
- Publication number 20230212112
- Publication date Jul 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION,...
- Publication number 20230185191
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- THE SCHOOL CORPORATION KANSAI UNIVERSITY
- Hiroto KUDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIS...
- Publication number 20230100642
- Publication date Mar 30, 2023
- SAN-APRO LTD.
- Takuto Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR...
- Publication number 20230013430
- Publication date Jan 19, 2023
- TOYO GOSEI CO., LTD.
- Yusuke SUGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOACID GENERATOR
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- International Business Machines Corporation
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20220091507
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- JSR Corporation
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
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- FUJIFILM CORPORATION
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SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL
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- FUJIFILM Wako Pure Chemical Corporation
- Goro MORI
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ELECTROLYTE AND ELECTROCHEMICAL APPARATUS USING SAME
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- NINGDE AMPEREX TECHNOLOGY LIMITED
- Yali XIONG
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MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING SOLUBLE...
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- FUJIFILM CORPORATION
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- DEXERIALS CORPORATION
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containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Salt, acid generator, resist composition and method for producing r...

Negative resist composition and pattern forming process

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Salts and photoresists comprising same

Photoacid generator

Salt, acid generator, resist composition and method for producing r...

Process for producing sulfonic acid group-containing monomer

Mass polymerizable polycycloolefin compositions containing soluble...

Radiation-sensitive resin composition and method for forming resist...

Compound, resist composition and method for producing resist pattern

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Radiation-sensitive resin composition, resist pattern-forming metho...

Sulfonium salt photoinitiator, preparation method therefor, photocu...

Salt, acid generator, resist composition and method for producing r...

Resist composition, method of forming resist pattern, and compound

Alkoxy compounds for disease treatment

Metal-containing onium salt compound, photodegradable base, resist...

Methods of making a polyfluorinated allyl ether and compounds relat...

Resist composition, method of forming resist pattern, compound, and...

Radiation-sensitive composition, pattern-forming method and radiati...

Resist composition, patterning process, and barium salt

Metal particle supported catalysts, methods for producing same, and...

Weakly coloured sulfonic acid

Resist composition, method of forming resist pattern, and compound

Photoacid generator and photoresist composition including the same

Non-aqueous electrolyte magnesium secondary battery

Aryl acetate onium materials

Salt and photoresist composition containing the same

Method for producing C2-C20 fluorine-containing organic acid, and c...

Salt and photoresist composition containing the same

Patents Applicationslast 30 patents

PHOTOACID GENERATOR

NON-AQUEOUS ELECTROLYTIC SOLUTION FOR LITHIUM SECONDARY BATTERY AND...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

HALOALKANE SULFONIC ACIDS, COMPOSITIONS THEREOF, AND RELATED METHODS

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

ALKOXY COMPOUNDS FOR DISEASE TREATMENT

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...

COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION,...

SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIS...

SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR...

PHOTOACID GENERATOR

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL

ELECTROLYTE AND ELECTROCHEMICAL APPARATUS USING SAME

MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING SOLUBLE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHODS OF MAKING A POLYFLUORINATED ALLYL ETHER AND COMPOUNDS RELAT...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

ALKOXY COMPOUNDS FOR DISEASE TREATMENT

PROCESS FOR PRODUCING SULFONIC ACID GROUP-CONTAINING MONOMER

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

Ionic Liquid, Lubricant, and Magnetic Recording Medium

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

METHOD FOR PRODUCING C2-C20 FLUORINE-CONTAINING ORGANIC ACID, AND C...

ALKOXY COMPOUNDS FOR DISEASE TREATMENT

ANTIREFLECTIVE COMPOSITIONS WITH THERMAL ACID GENERATORS

Ionic Liquid, Lubricating Agent, and Magnetic Recording Medium