Coupling substances therefor

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CPC
G03C1/58

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GPHYSICS G03Photography G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHOTOGRAPHIC PROCESSES G03C1/00Photosensitive materials

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G03C1/58Coupling substances therefor

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Patents Grantslast 30 patents

Information Patent Grant
Azolinyl acetic acid derivative and azolinyl acetic acid derivative...
- Patent number 7,300,738
- Issue date Nov 27, 2007
- FUJIFILM Corporation
- Naoki Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 6,927,007
- Issue date Aug 9, 2005
- Fuji Photo Film Co., Ltd.
- Yohsuke Takeuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 6,743,750
- Issue date Jun 1, 2004
- Fuji Photo Film Co., Ltd.
- Hisato Nagase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
PHENYLURETHANE COMPOUNDS AND METHODS FOR PRODUCING SAME, ASYMMETRIC...
- Patent number 6,720,421
- Issue date Apr 13, 2004
- Fuji Photo Film Co., Ltd.
- Akinori Fujita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pyrrolopyrimidineone compound and heat-sensitive recording material...
- Patent number 6,346,359
- Issue date Feb 12, 2002
- Fuji Photo Film Co., Ltd.
- Hisao Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pyrrolo[1,2-a]pyrimidine compound and heat-sensitiv...
- Patent number 6,329,116
- Issue date Dec 11, 2001
- Fuji Photo Film Co., Ltd.
- Hiroshi Sato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Heat-sensitive recording material comprising a uracil coupling comp...
- Patent number 6,268,104
- Issue date Jul 31, 2001
- Fuji Photo Film Co., Ltd.
- Masatoshi Yumoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Heat-sensitive recording material
- Patent number 6,197,725
- Issue date Mar 6, 2001
- Fuji Photo Film Co., Ltd.
- Atsuhiro Ohkawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo-containing photosensitive material
- Patent number 6,190,823
- Issue date Feb 20, 2001
- Somar Corporation
- Yoko Suzukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 6,017,672
- Issue date Jan 25, 2000
- Fuji Photo Film Co., Ltd.
- Yoshimitsu Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet dosimeter film
- Patent number 6,015,621
- Issue date Jan 18, 2000
- Syntec Gesellschaft fur Chemie und Technologie der Informationsaufzeichnu ng mbH
- Regina Lischewski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 5,925,489
- Issue date Jul 20, 1999
- Fuji Photo Film Co., Ltd.
- Tatsuo Kawabuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 5,866,293
- Issue date Feb 2, 1999
- Fuji Photo Film Co., Ltd.
- Kimiatsu Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 5,773,186
- Issue date Jun 30, 1998
- Fuji Photo Film Co., Ltd.
- Masanobu Takashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo heat-sensitive recording material comprising hydroxy coumarin...
- Patent number 5,683,850
- Issue date Nov 4, 1997
- Fuji Photo Film Co., Ltd.
- Tetunori Matushita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(...
- Patent number 5,407,777
- Issue date Apr 18, 1995
- Fuji Photo Film Co., Ltd.
- Hirokazu Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo heat-sensitive recording material
- Patent number 5,296,329
- Issue date Mar 22, 1994
- Fuji Photo Film Co., Ltd.
- Takekatsu Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pyrrole derivatives useful as diazo and coupling components
- Patent number 5,003,081
- Issue date Mar 26, 1991
- BASF Aktiengesellschaft
- Juergen Pfister
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Light-sensitive material
- Patent number 4,902,599
- Issue date Feb 20, 1990
- Fuji Photo Film Co., Ltd.
- Soichiro Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Black color heat-sensitive diazo microcapsule recording material wi...
- Patent number 4,842,979
- Issue date Jun 27, 1989
- Fuji Photo Film Co., Ltd.
- Sadao Ishige
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Heat-sensitive diazo recording material with diphenyl alkene coupler
- Patent number 4,770,973
- Issue date Sep 13, 1988
- Kanzaki Paper Manufacturing Limited
- Nobuo Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazotype composition with a non-migrating yellow coupler of contro...
- Patent number 4,743,524
- Issue date May 10, 1988
- Andrews Paper & Chemical Co., Inc.
- Peter Muller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo-type thermosensitive recording material with hydrazone couple...
- Patent number 4,659,644
- Issue date Apr 21, 1987
- Ricoh Company, Ltd.
- Takayuki Hoshina
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast coupling lemon-yellow phenolic couplers
- Patent number 4,642,383
- Issue date Feb 10, 1987
- James River Graphics, Inc.
- Robert C. Desjarlais
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Diazotype materials with 2-hydroxy-naphthalene having sulfonamide s...
- Patent number 4,492,749
- Issue date Jan 8, 1985
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Thermo-developable type diazo copying material with 2-naphthol coup...
- Patent number 4,486,527
- Issue date Dec 4, 1984
- Ricoh Company, Ltd.
- Norio Kurisu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromogenic compositions containing stabilized phenolic coupler com...
- Patent number 4,439,512
- Issue date Mar 27, 1984
- La Cellophane
- Claude Ceintrey
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photosensitive material and process for developing the same
- Patent number 4,374,193
- Issue date Feb 15, 1983
- Kimoto & Co., Ltd.
- Takeo Moriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid...
- Patent number 4,334,004
- Issue date Jun 8, 1982
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
2-Hydroxy-3-naphthoic acid amides
- Patent number 4,321,373
- Issue date Mar 23, 1982
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Recording material
- Publication number 20040220054
- Publication date Nov 4, 2004
- Fuji Photo Film Co., Ltd.
- Akinori Fujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Azolinyl acetic acid derivative and azolinyl acetic acid derivative...
- Publication number 20040157157
- Publication date Aug 12, 2004
- Fuji Photo Film Co., Ltd.
- Naoki Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heat-sensitive recording material
- Publication number 20040086798
- Publication date May 6, 2004
- Fuji Photo Film Co., Ltd.
- Yohsuke Takeuchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Heat-sensitive recording material
- Publication number 20040048185
- Publication date Mar 11, 2004
- Fuji Photo Film Co., Ltd.
- Hisao Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phenylurethane compounds and methods for producing same, asymmetric...
- Publication number 20030166961
- Publication date Sep 4, 2003
- Fuji Photo Film Co., Ltd.
- Akinori Fujita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Phenylurethane compounds and methods for producing same, asymmetric...
- Publication number 20020161225
- Publication date Oct 31, 2002
- Fuji Photo Film Co., Ltd.
- Akinori Fujita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Heat-sensitive recording material
- Publication number 20020086797
- Publication date Jul 4, 2002
- Fuji Photo Film Co., Ltd.
- Hisato Nagase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Coupling substances therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Azolinyl acetic acid derivative and azolinyl acetic acid derivative...

Heat-sensitive recording material

Heat-sensitive recording material

PHENYLURETHANE COMPOUNDS AND METHODS FOR PRODUCING SAME, ASYMMETRIC...

Pyrrolopyrimidineone compound and heat-sensitive recording material...

Pyrrolo&#x0005B;1,2-a&#x0005D;pyrimidine compound and heat-sensitiv...

Heat-sensitive recording material comprising a uracil coupling comp...

Heat-sensitive recording material

Diazo-containing photosensitive material

Heat-sensitive recording material

Ultraviolet dosimeter film

Heat-sensitive recording material

Heat-sensitive recording material

Heat-sensitive recording material

Diazo heat-sensitive recording material comprising hydroxy coumarin...

Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(...

Diazo heat-sensitive recording material

Pyrrole derivatives useful as diazo and coupling components

Light-sensitive material

Black color heat-sensitive diazo microcapsule recording material wi...

Heat-sensitive diazo recording material with diphenyl alkene coupler

Diazotype composition with a non-migrating yellow coupler of contro...

Diazo-type thermosensitive recording material with hydrazone couple...

Fast coupling lemon-yellow phenolic couplers

Diazotype materials with 2-hydroxy-naphthalene having sulfonamide s...

Thermo-developable type diazo copying material with 2-naphthol coup...

Chromogenic compositions containing stabilized phenolic coupler com...

Photosensitive material and process for developing the same

Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid...

2-Hydroxy-3-naphthoic acid amides

Patents Applicationslast 30 patents

Recording material

Azolinyl acetic acid derivative and azolinyl acetic acid derivative...

Heat-sensitive recording material

Heat-sensitive recording material

Phenylurethane compounds and methods for producing same, asymmetric...

Phenylurethane compounds and methods for producing same, asymmetric...

Heat-sensitive recording material

Pyrrolo[1,2-a]pyrimidine compound and heat-sensitiv...