Differential etching apparatus having a barrel reactor

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CPC
Y10S156/917

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S156/00Adhesive bonding and miscellaneous chemical manufacture

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Y10S156/917Differential etching apparatus having a barrel reactor

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Patents Grantslast 30 patents

Information Patent Grant
Method for improving uniformity in batch processing of semiconducto...
- Patent number 6,607,987
- Issue date Aug 19, 2003
- Micron Technology, Inc.
- Kevin G. Donohoe
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Information Patent Grant
Apparatus and method for improving uniformity in batch processing o...
- Patent number 6,315,859
- Issue date Nov 13, 2001
- Micron Technology, Inc.
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for improving uniformity in batch processing o...
- Patent number 6,030,902
- Issue date Feb 29, 2000
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faraday cage for barrel-style plasma etchers
- Patent number 5,362,353
- Issue date Nov 8, 1994
- LSI Logic Corporation
- Thomas G. Mallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase epitaxial growth apparatus having exhaust unit for remo...
- Patent number 5,154,773
- Issue date Oct 13, 1992
- Kabushiki Kaisha Toshiba
- Takayuki Furusawa
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Film forming method and film forming device
- Patent number 5,015,330
- Issue date May 14, 1991
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
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Gas treatment apparatus and method
- Patent number 4,969,416
- Issue date Nov 13, 1990
- Emcore, Inc.
- Norman E. Schumaker
- C30 - CRYSTAL GROWTH
Information Patent Grant
Fixture for cleaning a plasma etcher
- Patent number 4,786,392
- Issue date Nov 22, 1988
- Unisys Corporation
- James N. Kruchowski
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Information Patent Grant
Vacuum plasma treatment apparatus
- Patent number 4,633,812
- Issue date Jan 6, 1987
- Canon Kabushiki Kaisha
- Yasutomo Fujiyama
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Automatically loadable multifaceted electrode with load lock mechanism
- Patent number 4,526,670
- Issue date Jul 2, 1985
- LFE Corporation
- John G. Hajj
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Information Patent Grant
Wafer holding apparatus and method
- Patent number 4,473,455
- Issue date Sep 25, 1984
- AT&T Bell Laboratories
- Robert E. Dean
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Information Patent Grant
Method for etching and controlled chemical vapor deposition
- Patent number 4,468,283
- Issue date Aug 28, 1984
- Irfan Ahmed
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus and method for plasma-assisted etching of wafers
- Patent number 4,427,516
- Issue date Jan 24, 1984
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma-assisted etching of wafers
- Patent number 4,419,201
- Issue date Dec 6, 1983
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma-assisted etching of wafers
- Patent number 4,397,724
- Issue date Aug 9, 1983
- Bell Telephone Laboratories, Incorporated
- Joseph M. Moran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and method for improving uniformity in batch processing o...
- Publication number 20010022215
- Publication date Sep 20, 2001
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Differential etching apparatus having a barrel reactor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for improving uniformity in batch processing of semiconducto...

Apparatus and method for improving uniformity in batch processing o...

Apparatus and method for improving uniformity in batch processing o...

Faraday cage for barrel-style plasma etchers

Vapor phase epitaxial growth apparatus having exhaust unit for remo...

Film forming method and film forming device

Gas treatment apparatus and method

Fixture for cleaning a plasma etcher

Vacuum plasma treatment apparatus

Automatically loadable multifaceted electrode with load lock mechanism

Wafer holding apparatus and method

Method for etching and controlled chemical vapor deposition

Apparatus and method for plasma-assisted etching of wafers

Apparatus and method for plasma-assisted etching of wafers

Apparatus and method for plasma-assisted etching of wafers

Patents Applicationslast 30 patents

Apparatus and method for improving uniformity in batch processing o...