Esters containing halogen

Industry

CPC
C08F222/18

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CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule Salts, anhydrides, esters, amides, imides, or nitriles thereof

Current Industry

C08F222/18Esters containing halogen

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,747,726
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki Fukumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,061,329
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Anti-reflective film and preparation method of the same
- Patent number 11,046,827
- Issue date Jun 29, 2021
- LG Chem., Ltd
- Jin Seok Byun
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluoromonomer and fluorooligomer compounds, photopolymerizable comp...
- Patent number 10,995,215
- Issue date May 4, 2021
- EWHA University-Industry Collaboration Foundation
- Myung Hwa Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, fluorine-cont...
- Patent number 10,838,301
- Issue date Nov 17, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiopaque polymers for medical devices
- Patent number 10,814,042
- Issue date Oct 27, 2020
- Endoshape, Inc.
- Stephen D. Goodrich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition
- Patent number 10,795,258
- Issue date Oct 6, 2020
- Sumitomo Chemical Company, Limited
- Takayuki Miyagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for preparing core-shell copolymer, core-shell copolymer and...
- Patent number 10,787,534
- Issue date Sep 29, 2020
- LG Chem, Ltd.
- Sang Il Nam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Optically clear photo-polymerization resists for additive manufactu...
- Patent number 10,781,315
- Issue date Sep 22, 2020
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable resin composition and method of forming patterns using...
- Patent number 10,752,718
- Issue date Aug 25, 2020
- Chem Optics Inc.
- Hyung-Jong Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition and semiconductor device
- Patent number 10,738,187
- Issue date Aug 11, 2020
- Namics Corporation
- Hiroki Myodo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 10,613,437
- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,613,436
- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,606,172
- Issue date Mar 31, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin precursor composition for optical materials, optical element...
- Patent number 10,577,446
- Issue date Mar 3, 2020
- Nikon Corporation
- Shiho Nishimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Oligomeric aminoketones and their use as photoinitiators
- Patent number 10,563,073
- Issue date Feb 18, 2020
- Sun Chemical Corporation
- Kai-Uwe Gaudl
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiopaque polymers for medical devices
- Patent number 10,434,223
- Issue date Oct 8, 2019
- Endoshape, Inc.
- Stephen D. Goodrich
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Water/oil repellent composition, method for its production, and art...
- Patent number 10,378,146
- Issue date Aug 13, 2019
- AGC Inc.
- Akira Isobe
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,996,002
- Issue date Jun 12, 2018
- Sumitomo Chemical Company, Limited
- Takashi Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oligomeric aminoketones and their use as photoinitiators
- Patent number 9,982,150
- Issue date May 29, 2018
- Sun Chemical Corporation
- Kai-Uwe Gaudl
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,983,478
- Issue date May 29, 2018
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of treatment to improve the quality of alcoholic beverages...
- Patent number 9,920,146
- Issue date Mar 20, 2018
- ISP Investments LLC
- Krishnamurthy Nacharaju
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,869,929
- Issue date Jan 16, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiopaque polymers for medical devices
- Patent number 9,789,231
- Issue date Oct 17, 2017
- Endoshape, Inc.
- Stephen D. Goodrich
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Rubbery polymer with low compression set
- Patent number 9,765,212
- Issue date Sep 19, 2017
- OMNOVA SOLUTIONS
- Sophie Drillieres
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Cross-linkable fluorinated photopolymer
- Patent number 9,541,829
- Issue date Jan 10, 2017
- Orthogonal, Inc.
- Douglas Robert Robello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,519,218
- Issue date Dec 13, 2016
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing sulfonic acid salt, fluorine-containing sulfoni...
- Patent number 9,488,914
- Issue date Nov 8, 2016
- Central Glass Company, Limited
- Kazunori Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated photopolymer with fluorinated sensitizer
- Patent number 9,298,088
- Issue date Mar 29, 2016
- Orthogonal, Inc.
- Douglas Robert Robello
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 9,261,783
- Issue date Feb 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
ARTICLE AND METHOD OF MAKING ARTICLE
- Publication number 20230058958
- Publication date Feb 23, 2023
- Factorial Inc.
- Jia Du
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200409262
- Publication date Dec 31, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki FUKUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OPTICALLY CLEAR PHOTO-POLYMERIZATION RESISTS FOR ADDITIVE MANUFACTU...
- Publication number 20200377736
- Publication date Dec 3, 2020
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Sourabh Kumar Saha
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIOPAQUE POLYMERS FOR MEDICAL DEVICES
- Publication number 20200061252
- Publication date Feb 27, 2020
- EndoShape, Inc.
- Stephen D. GOODRICH
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method For Preparing Core-Shell Copolymer, Core-Shell Copolymer And...
- Publication number 20190185605
- Publication date Jun 20, 2019
- LG CHEM, LTD.
- Sang Il Nam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN PRECURSOR COMPOSITION FOR OPTICAL MATERIALS, OPTICAL ELEMENT...
- Publication number 20190112405
- Publication date Apr 18, 2019
- Nikon Corporation
- Shiho NISHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OLIGOMERIC AMINOKETONES AND THEIR USE AS PHOTOINITIATORS
- Publication number 20180251648
- Publication date Sep 6, 2018
- SUN CHEMICAL CORPORATION
- Kai-Uwe GAUDL
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20180215850
- Publication date Aug 2, 2018
- CHEM OPTICS INC.
- Hyung-Jong LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIOPAQUE POLYMERS FOR MEDICAL DEVICES
- Publication number 20180126045
- Publication date May 10, 2018
- EndoShape, Inc.
- Stephen D. GOODRICH
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
METHODS OF TREATMENT TO IMPROVE THE QUALITY OF ALCOHOLIC BEVERAGES...
- Publication number 20170190813
- Publication date Jul 6, 2017
- ISP INVESTMENTS LLC
- Krishnamurthy Nacharaju
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
RESIN PRECURSOR COMPOSITION FOR OPTICAL MATERIALS, OPTICAL ELEMENT...
- Publication number 20170183438
- Publication date Jun 29, 2017
- Nikon Corporation
- Shiho NISHIMURA
- G02 - OPTICS
Information Patent Application
TRIBOELECTRICALLY NEUTRAL POLYMER
- Publication number 20160355675
- Publication date Dec 8, 2016
- National University of Singapore
- Xuan ZHANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20160244400
- Publication date Aug 25, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20160145186
- Publication date May 26, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIOPAQUE POLYMERS FOR MEDICAL DEVICES
- Publication number 20150374884
- Publication date Dec 31, 2015
- ENDOSHAPE, INC.
- Stephen D. GOODRICH
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
- Publication number 20150030981
- Publication date Jan 29, 2015
- Orthogonal, Inc.
- Douglas Robert Robello
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin,...
- Publication number 20140287359
- Publication date Sep 25, 2014
- Kazunori MORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RUBBERY POLYMER WITH LOW COMPRESSION SET
- Publication number 20140243451
- Publication date Aug 28, 2014
- OMNOVA SOLUTIONS
- Sophie Drillieres
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20140114080
- Publication date Apr 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20140051024
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi KINSHO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Coating Composition for Low Refractive Layer Including Fluorine-Con...
- Publication number 20130302623
- Publication date Nov 14, 2013
- SK INNOVATION CO., LTD.
- Sung Ho Son
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CURABLE COMPOSITION AND PROCESS FOR PRODUCING CURED FILM
- Publication number 20130123382
- Publication date May 16, 2013
- Asahi Glass Company, Limited
- Masahiro ITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin,...
- Publication number 20130065182
- Publication date Mar 14, 2013
- Central Glass Company, Limited
- Kazunori MORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...
- Publication number 20120164581
- Publication date Jun 28, 2012
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20120083580
- Publication date Apr 5, 2012
- Takeshi KINSHO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20110250539
- Publication date Oct 13, 2011
- Masayoshi SAGEHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...
- Publication number 20110151381
- Publication date Jun 23, 2011
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Rubbery Polymer WIth Low Compression Set
- Publication number 20100292391
- Publication date Nov 18, 2010
- ELIOKEM
- Sophie Drillieres
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Negative resist composition, method of forming resist pattern and p...
- Publication number 20100035178
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Sho Abe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL POLYMERIZABLE SURFACE ACTIVE MONOMERS WITH BOTH FLUORINE-CONT...
- Publication number 20090012250
- Publication date Jan 8, 2009
- Yu-Chin Lai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Esters containing halogen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Anti-reflective film and preparation method of the same

Fluoromonomer and fluorooligomer compounds, photopolymerizable comp...

Resist composition, method of forming resist pattern, fluorine-cont...

Radiopaque polymers for medical devices

Resist composition

Method for preparing core-shell copolymer, core-shell copolymer and...

Optically clear photo-polymerization resists for additive manufactu...

Photocurable resin composition and method of forming patterns using...

Resin composition and semiconductor device

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resin precursor composition for optical materials, optical element...

Oligomeric aminoketones and their use as photoinitiators

Radiopaque polymers for medical devices

Water/oil repellent composition, method for its production, and art...

Resin, resist composition and method for producing resist pattern

Oligomeric aminoketones and their use as photoinitiators

Resin, resist composition and method for producing resist pattern

Methods of treatment to improve the quality of alcoholic beverages...

Resin, resist composition and method for producing resist pattern

Radiopaque polymers for medical devices

Rubbery polymer with low compression set

Cross-linkable fluorinated photopolymer

Resin, resist composition and method for producing resist pattern

Fluorine-containing sulfonic acid salt, fluorine-containing sulfoni...

Fluorinated photopolymer with fluorinated sensitizer

Fluorinated ester monomer, making method, fluorinated ester polymer...

Patents Applicationslast 30 patents

ARTICLE AND METHOD OF MAKING ARTICLE

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

OPTICALLY CLEAR PHOTO-POLYMERIZATION RESISTS FOR ADDITIVE MANUFACTU...

RADIOPAQUE POLYMERS FOR MEDICAL DEVICES

Method For Preparing Core-Shell Copolymer, Core-Shell Copolymer And...

RESIN PRECURSOR COMPOSITION FOR OPTICAL MATERIALS, OPTICAL ELEMENT...

OLIGOMERIC AMINOKETONES AND THEIR USE AS PHOTOINITIATORS

PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING...

RADIOPAQUE POLYMERS FOR MEDICAL DEVICES

METHODS OF TREATMENT TO IMPROVE THE QUALITY OF ALCOHOLIC BEVERAGES...

RESIN PRECURSOR COMPOSITION FOR OPTICAL MATERIALS, OPTICAL ELEMENT...

TRIBOELECTRICALLY NEUTRAL POLYMER

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUC...

RADIOPAQUE POLYMERS FOR MEDICAL DEVICES

CROSS-LINKABLE FLUORINATED PHOTOPOLYMER

Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin,...

RUBBERY POLYMER WITH LOW COMPRESSION SET

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

Coating Composition for Low Refractive Layer Including Fluorine-Con...

CURABLE COMPOSITION AND PROCESS FOR PRODUCING CURED FILM

Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin,...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...

Rubbery Polymer WIth Low Compression Set

Negative resist composition, method of forming resist pattern and p...

NOVEL POLYMERIZABLE SURFACE ACTIVE MONOMERS WITH BOTH FLUORINE-CONT...