Esters containing halogen

Industry

CPC
C08F220/22

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Parent Industries

CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof

Current Industry

C08F220/22Esters containing halogen

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Fluorine-containing polymer and surface treatment agent
- Patent number 12,195,619
- Issue date Jan 14, 2025
- Daikin Industries, Ltd.
- Yuuki Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Flame resistant build materials and associated printed 3D articles
- Patent number 12,168,735
- Issue date Dec 17, 2024
- 3D Systems, Inc.
- Khalil Moussa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Antibacterial polymer coating composition and antibacterial polymer...
- Patent number 12,122,939
- Issue date Oct 22, 2024
- LG Chem, Ltd.
- Mingoo Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition comprising polymer havin...
- Patent number 12,025,915
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 12,001,139
- Issue date Jun 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Durable water resistant coatings
- Patent number 11,987,657
- Issue date May 21, 2024
- Massachusetts Institute of Technology
- Kripa K. Varanasi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Polymers and nanoparticles for flooding
- Patent number 11,987,749
- Issue date May 21, 2024
- Saudi Arabian Oil Company
- S. Sherry Zhu
- E21 - EARTH DRILLING MINING
Information Patent Grant
Polymers and nanoparticles for flooding
- Patent number 11,987,748
- Issue date May 21, 2024
- Saudi Arabian Oil Company
- S. Sherry Zhu
- E21 - EARTH DRILLING MINING
Information Patent Grant
Resist composition and resist film
- Patent number 11,960,207
- Issue date Apr 16, 2024
- Zeon Corporation
- Manabu Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer and positive resist composition
- Patent number 11,919,985
- Issue date Mar 5, 2024
- Zeon Corporation
- Manabu Hoshino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graft copolymer and use thereof
- Patent number 11,827,730
- Issue date Nov 28, 2023
- Eternal Materials Co., Ltd.
- Wei-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodized aromatic carboxylic acid type pendant-containing polymer, r...
- Patent number 11,815,814
- Issue date Nov 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Toner compositions and additives
- Patent number 11,815,851
- Issue date Nov 14, 2023
- Xerox Corporation
- Richard Philip Nelson Veregin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acrylic rubber and crosslinkable composition thereof
- Patent number 11,795,251
- Issue date Oct 24, 2023
- Unimatec Co., Ltd.
- Daichi Toge
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Highly fluorinated nanostructured polymer foams for producing super...
- Patent number 11,773,272
- Issue date Oct 3, 2023
- Glassomer GmbH
- Bastian Rapp
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Copolymers of halogenated olefins and halogenated co-monomers
- Patent number 11,725,071
- Issue date Aug 15, 2023
- Arkema Inc.
- Benjamin Bin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods for liquid phase oligonucleotide synthesis
- Patent number 11,725,073
- Issue date Aug 15, 2023
- Hongene Biotech Corporation
- Aldrich N. K. Lau
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Hard coating film and image display device having the same
- Patent number 11,718,722
- Issue date Aug 8, 2023
- Dongwoo Fine-Chem Co., Ltd.
- Min Kyung Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,709,427
- Issue date Jul 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, method for forming pattern,...
- Patent number 11,709,428
- Issue date Jul 25, 2023
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
- Patent number 11,703,760
- Issue date Jul 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 11,675,270
- Issue date Jun 13, 2023
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition, optical film, polarizing plate, display device, and me...
- Patent number 11,613,596
- Issue date Mar 28, 2023
- FUJIFILM Corporation
- Reiko Fukagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers and nanoparticles for flooding
- Patent number 11,566,165
- Issue date Jan 31, 2023
- Saudi Arabian Oil Company
- S. Sherry Zhu
- E21 - EARTH DRILLING MINING
Information Patent Grant
Method of preparing terpolymer-doped polyaniline super-hydrophobic...
- Patent number 11,499,057
- Issue date Nov 15, 2022
- Shaanxi University of Science & Technology
- Haihua Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pulp molded product and method for manufacturing same
- Patent number 11,434,606
- Issue date Sep 6, 2022
- Daiken Industries, Ltd.
- Tetsuya Uehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Zwitterion-containing membranes
- Patent number 11,421,061
- Issue date Aug 23, 2022
- Trustees of Tufts College
- Ayse Asatekin Alexiou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pressure-sensitive adhesive tape, pressure-sensitive adhesive tape...
- Patent number 11,345,835
- Issue date May 31, 2022
- Sekisui Chemical Co., Ltd.
- Noriyuki Uchida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250028243
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER AND FLUORINE-CONTAINING COMPOSITION
- Publication number 20250011510
- Publication date Jan 9, 2025
- DAIKIN INDUSTRIES, LTD.
- Shinichi MINAMI
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD
- Publication number 20250004376
- Publication date Jan 2, 2025
- OJI HOLDINGS CORPORATION
- Kimiko HATTORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers and Nanoparticles for Flooding
- Publication number 20240417618
- Publication date Dec 19, 2024
- Saudi Arabian Oil Company
- S. Sherry Zhu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist Material, Resist Composition, Patterning Process, And Monomer
- Publication number 20240361690
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
- Publication number 20240360069
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...
- Publication number 20240337933
- Publication date Oct 10, 2024
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240337938
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
- Publication number 20240319606
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...
- Publication number 20240319607
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polymers and Nanoparticles for Flooding
- Publication number 20240263064
- Publication date Aug 8, 2024
- Saudi Arabian Oil Company
- S. Sherry Zhu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-BASED POLYMER, FLUORINE-BASED POLYMER COMPOSITION COMPRISI...
- Publication number 20240199780
- Publication date Jun 20, 2024
- Korea Research Institute of Chemical Technology
- Eun-Ho SOHN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240192596
- Publication date Jun 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240192591
- Publication date Jun 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, AND ELECTRON...
- Publication number 20240182617
- Publication date Jun 6, 2024
- TOSOH CORPORATION
- Junghwi LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, ACT...
- Publication number 20240176242
- Publication date May 30, 2024
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240176238
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240168382
- Publication date May 23, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHARMACEUTICAL POLYMER FOR TREATING HYPERKALEMIA AND PREPARATION ME...
- Publication number 20240139234
- Publication date May 2, 2024
- WATERSTONE PHARMACEUTICALS (WUHAN) CO., LTD.
- Min FU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LIQUID-REPELLING AGENT, CURABLE COMPOSITION, CURED PRODUCT, DIVIDIN...
- Publication number 20240132730
- Publication date Apr 25, 2024
- Central Glass Company, Limited
- Yuta SAKAIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240118610
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240111212
- Publication date Apr 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPRISING PENTAFLUOROPHENYL ESTER AND ELECTROCHEMICAL BIOS...
- Publication number 20240101741
- Publication date Mar 28, 2024
- I-SENS, INC.
- Hyunseo SHIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230400767
- Publication date Dec 14, 2023
- JSR Corporation
- Takuya OMIYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20230384677
- Publication date Nov 30, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomomi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Genera...
- Publication number 20230375928
- Publication date Nov 23, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230305398
- Publication date Sep 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takeshi SASAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20230288800
- Publication date Sep 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20230280652
- Publication date Sep 7, 2023
- JSR CORPORATION
- Natsuko KINOSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Esters containing halogen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Fluorine-containing polymer and surface treatment agent

Flame resistant build materials and associated printed 3D articles

Antibacterial polymer coating composition and antibacterial polymer...

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Resist underlayer film-forming composition comprising polymer havin...

Resist composition and patterning process

Durable water resistant coatings

Polymers and nanoparticles for flooding

Polymers and nanoparticles for flooding

Resist composition and resist film

Copolymer and positive resist composition

Graft copolymer and use thereof

Iodized aromatic carboxylic acid type pendant-containing polymer, r...

Toner compositions and additives

Acrylic rubber and crosslinkable composition thereof

Highly fluorinated nanostructured polymer foams for producing super...

Copolymers of halogenated olefins and halogenated co-monomers

Compositions and methods for liquid phase oligonucleotide synthesis

Hard coating film and image display device having the same

Positive resist composition and pattern forming process

Radiation-sensitive resin composition, method for forming pattern,...

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...

Resist underlayer film-forming composition

Composition, optical film, polarizing plate, display device, and me...

Polymers and nanoparticles for flooding

Method of preparing terpolymer-doped polyaniline super-hydrophobic...

Pulp molded product and method for manufacturing same

Zwitterion-containing membranes

Pressure-sensitive adhesive tape, pressure-sensitive adhesive tape...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

FLUORINE-CONTAINING POLYMER AND FLUORINE-CONTAINING COMPOSITION

RESIST MATERIAL AND PATTERN FORMING METHOD

Polymers and Nanoparticles for Flooding

Resist Material, Resist Composition, Patterning Process, And Monomer

Monomer, Resist Material, Resist Composition, And Patterning Process

RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...

Polymers and Nanoparticles for Flooding

FLUORINE-BASED POLYMER, FLUORINE-BASED POLYMER COMPOSITION COMPRISI...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

FLUORINE RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, AND ELECTRON...

PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, ACT...

SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHARMACEUTICAL POLYMER FOR TREATING HYPERKALEMIA AND PREPARATION ME...

LIQUID-REPELLING AGENT, CURABLE COMPOSITION, CURED PRODUCT, DIVIDIN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POLYMER COMPRISING PENTAFLUOROPHENYL ESTER AND ELECTROCHEMICAL BIOS...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Genera...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...