Heavy metals

Industry

CPC
C23F3/04

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Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 C23F3/00Brightening metals by chemical means

Current Industry

C23F3/04Heavy metals

Industries

Patents Grantslast 30 patents

Information Patent Grant
Fluid composition and method for conducting a material removing ope...
- Patent number 11,518,913
- Issue date Dec 6, 2022
- Saint-Gobain Ceramics & Plastics, Inc.
- Lin Fu
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Copper plasma etching method and manufacturing method of display panel
- Patent number 10,910,232
- Issue date Feb 2, 2021
- Samsung Display Co., Ltd.
- Sang Gab Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-corrosion polishing composition
- Patent number 10,858,543
- Issue date Dec 8, 2020
- FUJIMI INCORPORATED
- Hooi-Sung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing (CMP) of cobalt-containing substrate
- Patent number 10,745,589
- Issue date Aug 18, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing compositions
- Patent number 10,711,159
- Issue date Jul 14, 2020
- Fujifilm Electronic Materials U.S.A., Inc.
- James McDonough
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laminate for see-through electrodes, see-through electrode material...
- Patent number 10,691,276
- Issue date Jun 23, 2020
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shin Kuwabara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective electroless electrochemical atomic layer deposition in an...
- Patent number 10,640,874
- Issue date May 5, 2020
- Lam Research Corporation
- Aniruddha Joi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Buffered slurry formulation for cobalt CMP
- Patent number 10,570,315
- Issue date Feb 25, 2020
- Fujimi Incorporated
- Hooi-Sung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP polishing agent, manufacturing method thereof, and method for p...
- Patent number 10,297,461
- Issue date May 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Mitsuhito Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP slurry composition for polishing copper and polishing method us...
- Patent number 10,150,890
- Issue date Dec 11, 2018
- Samsung SDI Co., Ltd.
- Jeong Hwan Jeong
- B24 - GRINDING POLISHING
Information Patent Grant
Corrosion inhibitors and related compositions and methods
- Patent number 10,124,464
- Issue date Nov 13, 2018
- Cabot Microelectronics Corporation
- Mary Cavanaugh
- B24 - GRINDING POLISHING
Information Patent Grant
CMP slurry composition for metal wiring and polishing method using...
- Patent number 10,100,225
- Issue date Oct 16, 2018
- Samsung SDI Co., Ltd.
- So Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry for chemical mechanical polishing of cobalt
- Patent number 9,944,828
- Issue date Apr 17, 2018
- Cabot Microelectronics Corporation
- Elise Sikma
- B24 - GRINDING POLISHING
Information Patent Grant
Cobalt polishing accelerators
- Patent number 9,850,403
- Issue date Dec 26, 2017
- Cabot Microelectronics Corporation
- Steven Kraft
- B24 - GRINDING POLISHING
Information Patent Grant
Metal foil and electronic device
- Patent number 9,786,404
- Issue date Oct 10, 2017
- Mitsui Mining & Smelting Co., Ltd.
- Yoshinori Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten-processing slurry with cationic surfactant and cyclodextrin
- Patent number 9,771,496
- Issue date Sep 26, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,698,050
- Issue date Jul 4, 2017
- Hitachi Kokusai Electric Inc.
- Hiroshi Ashihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten-processing slurry with cationic surfactant
- Patent number 9,631,122
- Issue date Apr 25, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition
- Patent number 9,631,121
- Issue date Apr 25, 2017
- Fujimi Incorporated
- Yukinobu Yoshizaki
- B24 - GRINDING POLISHING
Information Patent Grant
Cobalt inhibitor combination for improved dishing
- Patent number 9,528,030
- Issue date Dec 27, 2016
- Cabot Microelectronics Corporation
- Steven Kraft
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of surface-treating metal component
- Patent number 9,489,978
- Issue date Nov 8, 2016
- NHK Spring Co., Ltd.
- Tatsuji Tamura
- C21 - METALLURGY OF IRON
Information Patent Grant
Wet etching methods for copper removal and planarization in semicon...
- Patent number 9,447,505
- Issue date Sep 20, 2016
- Novellus Systems, Inc.
- Steven T. Mayer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet etching methods for copper removal and planarization in semicon...
- Patent number 9,074,286
- Issue date Jul 7, 2015
- Novellus Systems, Inc.
- Steven T. Mayer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing slurry composition
- Patent number 9,039,925
- Issue date May 26, 2015
- Uwiz Technology Co., Ltd.
- Wei-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Materials for polishing liquid for metal, polishing liquid for meta...
- Patent number 8,900,477
- Issue date Dec 2, 2014
- Hitachi, Ltd.
- Takeshi Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,779,011
- Issue date Jul 15, 2014
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidation-stabilized CMP compositions and methods
- Patent number 8,497,209
- Issue date Jul 30, 2013
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing composition
- Patent number 8,425,276
- Issue date Apr 23, 2013
- Showa Denko K.K.
- Takashi Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet etching methods for copper removal and planarization in semicon...
- Patent number 8,372,757
- Issue date Feb 12, 2013
- Novellus Systems, Inc.
- Steven T. Mayer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sarcosine compound used as corrosion inhibitor
- Patent number 8,337,716
- Issue date Dec 25, 2012
- UWiZ Technology Co., Ltd.
- Song-Yuan Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING SUPERHYDROPHILIC OXIDE FILM ON PURE TITANIUM SUR...
- Publication number 20240360582
- Publication date Oct 31, 2024
- Dong-eui University Industry-academic Corporation Foundation
- Chanyoung JEONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Coating a Motor Vehicle Bodyshell Part, and Motor Vehicl...
- Publication number 20210292915
- Publication date Sep 23, 2021
- Bayerische Motoren Werke Aktiengesellschaft
- Clemens BERGMANN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUID COMPOSITION AND METHOD FOR CONDUCTING A MATERIAL REMOVING OPE...
- Publication number 20210062045
- Publication date Mar 4, 2021
- Saint-Gobain Ceramics & Plastics, Inc.
- Lin FU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COPPER PLASMA ETCHING METHOD AND MANUFACTURING METHOD OF DISPLAY PANEL
- Publication number 20190103287
- Publication date Apr 4, 2019
- SAMSUNG DISPLAY CO., LTD.
- Sang Gab KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ELECTROLESS ELECTROCHEMICAL ATOMIC LAYER DEPOSITION IN AN...
- Publication number 20190048472
- Publication date Feb 14, 2019
- LAM RESEARCH CORPORATION
- Aniruddha Joi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING COMPOSITIONS
- Publication number 20180187047
- Publication date Jul 5, 2018
- Fujifilm Planar Solutions, LLC
- James McDonough
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrate
- Publication number 20170362466
- Publication date Dec 21, 2017
- Versum Materials US, LLC
- Xiaobo Shi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP SLURRY COMPOSITION FOR POLISHING COPPER AND POLISHING METHOD US...
- Publication number 20170335139
- Publication date Nov 23, 2017
- SAMSUNG SDI CO., LTD.
- Jeong Hwan JEONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP POLISHING AGENT, MANUFACTURING METHOD THEREOF, AND METHOD FOR P...
- Publication number 20170278718
- Publication date Sep 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Mitsuhito TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COBALT POLISHING ACCELERATORS
- Publication number 20170260421
- Publication date Sep 14, 2017
- Cabot Microelectronics Corporation
- Steven Kraft
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SLURRY FOR CHEMICA...
- Publication number 20170133238
- Publication date May 11, 2017
- Kabushiki Kaisha Toshiba
- Takahiko KAWASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN
- Publication number 20170121560
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT
- Publication number 20170121561
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20150259575
- Publication date Sep 17, 2015
- NITTA HAAS INCORPORATED
- Rika TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SURFACE-TREATING METAL COMPONENT
- Publication number 20140150931
- Publication date Jun 5, 2014
- NHK Spring Co., Ltd.
- Tatsuji Tamura
- C21 - METALLURGY OF IRON
Information Patent Application
Stent With Reduced Weld Profiles and a Closed-End Wire Configuration
- Publication number 20140074220
- Publication date Mar 13, 2014
- Boston Scientific Scimed, Inc.
- Claude O. Clerc
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20140065825
- Publication date Mar 6, 2014
- HITACHI CHEMICAL CO., Ltd.
- Takashi Shinoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RU...
- Publication number 20140054266
- Publication date Feb 27, 2014
- Wiechang JIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME
- Publication number 20140017893
- Publication date Jan 16, 2014
- Hitachi Chemical Company, Ltd.
- Hisataka MINAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING SLURRY COMPOSITION
- Publication number 20130264515
- Publication date Oct 10, 2013
- UWiZ Technology Co., Ltd.
- Wei-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WET ETCHING METHODS FOR COPPER REMOVAL AND PLANARIZATION IN SEMICON...
- Publication number 20130207030
- Publication date Aug 15, 2013
- Steven T. MAYER
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF PREVENTING OXIDATION OF MULTILAYER WIRINGS IN ULTRA LARGE...
- Publication number 20120321780
- Publication date Dec 20, 2012
- Yuling LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...
- Publication number 20120145950
- Publication date Jun 14, 2012
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Stent With Reduced Weld Profiles and a Closed-End Wire Configuration
- Publication number 20110295359
- Publication date Dec 1, 2011
- Boston Scientific Scimed, Inc.
- Claude O. Clerc
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
POLISHING LIQUID FOR METALS
- Publication number 20100330809
- Publication date Dec 30, 2010
- FUJIFILM CORPORATION
- Tadashi Inaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20100267315
- Publication date Oct 21, 2010
- SHOWA DENKO K.K
- Takashi Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME
- Publication number 20100216309
- Publication date Aug 26, 2010
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS
- Publication number 20100200802
- Publication date Aug 12, 2010
- Cabot Microelectronics Corporation
- Steven K. GRUMBINE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20100163787
- Publication date Jul 1, 2010
- Rika Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20100155655
- Publication date Jun 24, 2010
- Yoshiyuki Matsumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Heavy metals

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Fluid composition and method for conducting a material removing ope...

Copper plasma etching method and manufacturing method of display panel

Anti-corrosion polishing composition

Chemical mechanical polishing (CMP) of cobalt-containing substrate

Polishing compositions

Laminate for see-through electrodes, see-through electrode material...

Selective electroless electrochemical atomic layer deposition in an...

Buffered slurry formulation for cobalt CMP

CMP polishing agent, manufacturing method thereof, and method for p...

CMP slurry composition for polishing copper and polishing method us...

Corrosion inhibitors and related compositions and methods

CMP slurry composition for metal wiring and polishing method using...

Slurry for chemical mechanical polishing of cobalt

Cobalt polishing accelerators

Metal foil and electronic device

Tungsten-processing slurry with cationic surfactant and cyclodextrin

Method of manufacturing semiconductor device

Tungsten-processing slurry with cationic surfactant

Polishing composition

Cobalt inhibitor combination for improved dishing

Method of surface-treating metal component

Wet etching methods for copper removal and planarization in semicon...

Wet etching methods for copper removal and planarization in semicon...

Polishing slurry composition

Materials for polishing liquid for metal, polishing liquid for meta...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Oxidation-stabilized CMP compositions and methods

Polishing composition

Wet etching methods for copper removal and planarization in semicon...

Sarcosine compound used as corrosion inhibitor

Patents Applicationslast 30 patents

METHOD FOR FORMING SUPERHYDROPHILIC OXIDE FILM ON PURE TITANIUM SUR...

Method for Coating a Motor Vehicle Bodyshell Part, and Motor Vehicl...

FLUID COMPOSITION AND METHOD FOR CONDUCTING A MATERIAL REMOVING OPE...

COPPER PLASMA ETCHING METHOD AND MANUFACTURING METHOD OF DISPLAY PANEL

SELECTIVE ELECTROLESS ELECTROCHEMICAL ATOMIC LAYER DEPOSITION IN AN...

POLISHING COMPOSITIONS

Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrate

CMP SLURRY COMPOSITION FOR POLISHING COPPER AND POLISHING METHOD US...

CMP POLISHING AGENT, MANUFACTURING METHOD THEREOF, AND METHOD FOR P...

COBALT POLISHING ACCELERATORS

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SLURRY FOR CHEMICA...

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT

POLISHING COMPOSITION

METHOD OF SURFACE-TREATING METAL COMPONENT

Stent With Reduced Weld Profiles and a Closed-End Wire Configuration

POLISHING SLURRY FOR CMP AND POLISHING METHOD

COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RU...

CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME

POLISHING SLURRY COMPOSITION

WET ETCHING METHODS FOR COPPER REMOVAL AND PLANARIZATION IN SEMICON...

METHOD OF PREVENTING OXIDATION OF MULTILAYER WIRINGS IN ULTRA LARGE...

ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...

Stent With Reduced Weld Profiles and a Closed-End Wire Configuration

POLISHING LIQUID FOR METALS

POLISHING COMPOSITION

CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME

OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS

POLISHING COMPOSITION

POLISHING COMPOSITION