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Christopher Michael Young
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Fatih Uysal
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Henrik Strid
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Justin M. Seal
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Ulrich Kölbl
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Ashok Adrian Singh
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Kyung Sup Han
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PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Akira Isomi
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Scott A. Leonard
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CYLZER S.A.
Javier Hernan Blanco
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Annamaria Vilinska
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Yukio Miyairi
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Jason Ryon
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Yung T. Bui
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Brian C. Domrese
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Chris Chapman
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Edward Kinnaird
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Stein Følkner
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Lan-fen Chiang
B08 - CLEANING
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David Yu Zhang Chang
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Infuze, L.L.C.
Daniel Noall
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Ecolab USA Inc.
Daniel Davis Anderson
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FloWorks International, LLC
Charles Jeffrey Witemyre
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Andreas Doering
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Daniel J. Zurn
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HIGHLIGHT TECH CORP.
ZHI-HAO CHEN
B08 - CLEANING
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Wen-Tsu SU
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Brett Heher
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Transportation IP Holdings, LLC
Brett Heher
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Kenneth W. HUNGERFORD
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Bernd Nennemann
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Eduardo Alano
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Sung Hun HONG
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PURITECH Co., Ltd.
Sung Hun HONG
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Gideon Vandegrift
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Ahmed Khurshid
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Daniel Joseph Styles
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Scott Paul EDWARDS
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Sang Kyu LEE
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Mohamed Ahmed Soliman
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Jong Min LIM
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John T. MacDonald
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Meng-Huang LU
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Huei Tarng Liou
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Faurecia Emissions Control Technologies, USA, LLC
Randall Cvelbar
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Ninad JOSHI
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Liquid O3, LLC
Evan D. Marlow
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Scott QUENSTEDT
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XIAMEN FORBETTER SANITARY WARE CO., LTD.
Xingui Zhang
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Trevor Percival Castor
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RheoVest, LLC
Eric Appleton
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EBARA CORPORATION
Suguru OZAWA
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TRUSVAL TECHNOLOGY CO., LTD.
SHIH-PAO CHIEN
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
