Introducing or correcting distorsion

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CPC
G03B27/68

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GPHYSICS G03Photography G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES ACCESSORIES THEREFOR G03B27/00Photographic printing apparatus

Current Industry

G03B27/68Introducing or correcting distorsion

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 9,535,335
- Issue date Jan 3, 2017
- Canon Kabushiki Kaisha
- Osamu Morimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projector and display control method for projector with orientation...
- Patent number 9,389,493
- Issue date Jul 12, 2016
- Seiko Epson Corporation
- Tetsu Nakayama
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Non-uniform correction illumination pattern
- Patent number 9,148,573
- Issue date Sep 29, 2015
- Hewlett-Packard Development Company, L.P.
- David B Short
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Lithographic apparatus, distortion determining method, and patterni...
- Patent number 8,988,653
- Issue date Mar 24, 2015
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image display apparatus and portable information processing apparat...
- Patent number 8,840,252
- Issue date Sep 23, 2014
- Panasonic Corporation
- Takahisa Shiramizu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method and apparatus for composing 3D photographs
- Patent number 8,818,185
- Issue date Aug 26, 2014
- 3DV Co., Ltd.
- Kwok Wah Allen Lo
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus and device manufactur...
- Patent number 8,760,618
- Issue date Jun 24, 2014
- Canon Kabushiki Kaisha
- Yuhei Sumiyoshi
- G02 - OPTICS
Information Patent Grant
Method and apparatus for analyzing and/or repairing of an EUV mask...
- Patent number 8,674,329
- Issue date Mar 18, 2014
- Carl Zeiss SMS GmbH
- Michael Budach
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 8,558,986
- Issue date Oct 15, 2013
- Canon Kabushiki Kaisha
- Keiji Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically compensated unidirectional reticle bender
- Patent number 8,553,207
- Issue date Oct 8, 2013
- ASML Holdings N.V.
- Santiago E. Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,482,718
- Issue date Jul 9, 2013
- ASML Netherlands B.V.
- Wilhelmus Maria Corbeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining exposure settings, lithographic exposure app...
- Patent number 8,208,118
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- David Warren Burry
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and correction apparatus
- Patent number 8,149,380
- Issue date Apr 3, 2012
- Canon Kabushiki Kaisha
- Hiromi Suda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated determination of height and tilt of a substrate surface w...
- Patent number 8,111,379
- Issue date Feb 7, 2012
- The Research Foundation of State University of New York
- Junru Ruan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Altering pattern data based on measured optical element characteris...
- Patent number 7,936,445
- Issue date May 3, 2011
- ASML Netherlands B.V.
- Jason D. Hintersteiner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for determination of focus and telecentricity,...
- Patent number 7,846,624
- Issue date Dec 7, 2010
- Litel Instruments
- Adlai H. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method of manufacturing device
- Patent number 7,804,581
- Issue date Sep 28, 2010
- Canon Kabushiki Kaisha
- Yoshinori Uchida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for correcting multiple axis displacement distortion
- Patent number 7,352,913
- Issue date Apr 1, 2008
- Silicon Optix Inc.
- Bonaventure Karuta
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure equipment and related control method
- Patent number 7,339,651
- Issue date Mar 4, 2008
- Samsung Electronics Co., Ltd.
- Soo-Han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system in exposure apparatus, and device manufacturing method
- Patent number 7,221,460
- Issue date May 22, 2007
- Canon Kabushiki Kaisha
- Masaru Ohtsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and preventing focal plane anomalies in the focal plane o...
- Patent number 7,068,349
- Issue date Jun 27, 2006
- ASML Netherlands B.V.
- Ingrid Minnaert-Janssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for amelioration of scanning synchronization error
- Patent number 7,053,979
- Issue date May 30, 2006
- Litel Instruments
- Adlai H. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for self-referenced dynamic step and scan intr...
- Patent number 6,975,382
- Issue date Dec 13, 2005
- Litel Instruments
- Adlai Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method of correcting exposure defects in photolithography
- Patent number 6,967,707
- Issue date Nov 22, 2005
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, semiconductor device manufacturing method, main...
- Patent number 6,934,004
- Issue date Aug 23, 2005
- Canon Kabushiki Kaisha
- Keiji Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for translating a spatial light modulator to p...
- Patent number 6,917,462
- Issue date Jul 12, 2005
- Eastman Kodak Company
- Timothy A. Peter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for self-referenced dynamic step and scan intr...
- Patent number 6,906,780
- Issue date Jun 14, 2005
- Litel Instruments
- Adlai Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus having aberration measurement device
- Patent number 6,859,264
- Issue date Feb 22, 2005
- Canon Kabushiki Kaisha
- Akihiro Nakauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method of correcting exposure defects in photolithography
- Patent number 6,812,999
- Issue date Nov 2, 2004
- Micron Technology, Inc.
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180307135
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140307241
- Publication date Oct 16, 2014
- Osamu Morimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-UNIFORM CORRECTION ILLUMINATION PATTERN
- Publication number 20140267866
- Publication date Sep 18, 2014
- Hewlett-Packard Development Company, L.P.
- David B. SHORT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTOR AND DISPLAY CONTROL METHOD FOR PROJECTOR
- Publication number 20140160443
- Publication date Jun 12, 2014
- SEIKO EPSON CORPORATION
- Tetsu Nakayama
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
METHOD AND APPARATUS FOR COMPOSING 3D PHOTOGRAPHS
- Publication number 20140079383
- Publication date Mar 20, 2014
- 3DV CO. LTD.
- Kwok Wah Allen Lo
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK...
- Publication number 20130156939
- Publication date Jun 20, 2013
- Michael Budach
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMAGE DISPLAY APPARATUS AND PORTABLE INFORMATION PROCESSING APPARAT...
- Publication number 20120229779
- Publication date Sep 13, 2012
- PANASONIC CORPORATION
- Takahisa SHIRAMIZU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC APPARATUS, DISTORTION DETERMINING METHOD, AND PATTERNI...
- Publication number 20110043775
- Publication date Feb 24, 2011
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110043780
- Publication date Feb 24, 2011
- ASML NETHERLANDS B.V.
- Wilhelmus Maria Corbeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND EXPOSURE SYSTEM
- Publication number 20100195069
- Publication date Aug 5, 2010
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTUR...
- Publication number 20100182577
- Publication date Jul 22, 2010
- Canon Kabushiki Kaisha
- Yuhei Sumiyoshi
- G02 - OPTICS
Information Patent Application
Optically Compensated Unidirectional Reticle Bender
- Publication number 20100167189
- Publication date Jul 1, 2010
- ASML Holding N.V.
- Santiago E. DEL PUERTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100141913
- Publication date Jun 10, 2010
- Canon Kabushiki Kaisha
- Osamu Morimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100123884
- Publication date May 20, 2010
- Canon Kabushiki Kaisha
- Keiji Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING...
- Publication number 20100110403
- Publication date May 6, 2010
- Canon Kabushiki Kaisha
- Makiko Ogasawara
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATED DETERMINATION OF HEIGHT AND TILT OF A SUBSTRATE SURFACE W...
- Publication number 20090296057
- Publication date Dec 3, 2009
- THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK
- Junru RUAN
- G01 - MEASURING TESTING
Information Patent Application
Method for Determining Exposure Settings, Lithographic Exposure App...
- Publication number 20090201473
- Publication date Aug 13, 2009
- ASML NETHERLANDS B.V.
- David Warren BURRY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR LEVELING TOPOGRAPHY OF SEMICONDUCTOR CHIP SUR...
- Publication number 20090190108
- Publication date Jul 30, 2009
- Toshiba America Electronic Components, Inc
- Tatsuhiko Ema
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND CORRECTION APPARATUS
- Publication number 20090097005
- Publication date Apr 16, 2009
- Canon Kabushiki Kaisha
- Hiromi Suda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE RECORDING APPARATUS, IMAGE CORRECTING APPARATUS, AND IMAGE SE...
- Publication number 20090086174
- Publication date Apr 2, 2009
- Sanyo Electric Co., Ltd.
- Shimpei FUKUMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- Publication number 20090075210
- Publication date Mar 19, 2009
- Canon Kabushiki Kaisha
- Atsushi Takagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REFERENTIAL POSITION MEASUREMENT AND PATTE...
- Publication number 20080273184
- Publication date Nov 6, 2008
- FUJIFILM CORPORATION
- Yasuhiko MORIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REDUCING DEFECTS
- Publication number 20080160457
- Publication date Jul 3, 2008
- Sean Michael Collins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTOR
- Publication number 20080123062
- Publication date May 29, 2008
- SEIKO EPSON CORPORATION
- Eiji Morikuni
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- Publication number 20080062391
- Publication date Mar 13, 2008
- Canon Kabushiki Kaisha
- Yoshinori Uchida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Altering pattern data based on measured optical element characteris...
- Publication number 20070291240
- Publication date Dec 20, 2007
- ASML Holding N.V.
- Jason D. Hintersteiner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems And Methods For Determination of Focus And Telecentricity,...
- Publication number 20070206168
- Publication date Sep 6, 2007
- Adlai H. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure equipment and related control method
- Publication number 20060072086
- Publication date Apr 6, 2006
- Soo-Han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for amelioration of scanning synchronization error
- Publication number 20050254027
- Publication date Nov 17, 2005
- Adlai H. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method of correcting exposure defects in photolithography
- Publication number 20050068513
- Publication date Mar 31, 2005
- Craig A. Hickman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Introducing or correcting distorsion

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus to correct for patterning process error

Exposure apparatus and device manufacturing method

Projector and display control method for projector with orientation...

Non-uniform correction illumination pattern

Lithographic apparatus, distortion determining method, and patterni...

Image display apparatus and portable information processing apparat...

Method and apparatus for composing 3D photographs

Projection optical system, exposure apparatus and device manufactur...

Method and apparatus for analyzing and/or repairing of an EUV mask...

Exposure apparatus and device manufacturing method

Optically compensated unidirectional reticle bender

Lithographic apparatus and device manufacturing method

Method for determining exposure settings, lithographic exposure app...

Exposure apparatus and correction apparatus

Automated determination of height and tilt of a substrate surface w...

Altering pattern data based on measured optical element characteris...

Systems and methods for determination of focus and telecentricity,...

Exposure apparatus and method of manufacturing device

System and method for correcting multiple axis displacement distortion

Exposure equipment and related control method

Optical system in exposure apparatus, and device manufacturing method

Method of and preventing focal plane anomalies in the focal plane o...

Process for amelioration of scanning synchronization error

Method and apparatus for self-referenced dynamic step and scan intr...

Device and method of correcting exposure defects in photolithography

Exposure apparatus, semiconductor device manufacturing method, main...

Method and apparatus for translating a spatial light modulator to p...

Method and apparatus for self-referenced dynamic step and scan intr...

Projection exposure apparatus having aberration measurement device

Device and method of correcting exposure defects in photolithography

Patents Applicationslast 30 patents

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

NON-UNIFORM CORRECTION ILLUMINATION PATTERN

PROJECTOR AND DISPLAY CONTROL METHOD FOR PROJECTOR

METHOD AND APPARATUS FOR COMPOSING 3D PHOTOGRAPHS

METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK...

IMAGE DISPLAY APPARATUS AND PORTABLE INFORMATION PROCESSING APPARAT...

LITHOGRAPHIC APPARATUS, DISTORTION DETERMINING METHOD, AND PATTERNI...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE METHOD AND EXPOSURE SYSTEM

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTUR...

Optically Compensated Unidirectional Reticle Bender

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING...

AUTOMATED DETERMINATION OF HEIGHT AND TILT OF A SUBSTRATE SURFACE W...

Method for Determining Exposure Settings, Lithographic Exposure App...

METHOD AND SYSTEM FOR LEVELING TOPOGRAPHY OF SEMICONDUCTOR CHIP SUR...

EXPOSURE APPARATUS AND CORRECTION APPARATUS

IMAGE RECORDING APPARATUS, IMAGE CORRECTING APPARATUS, AND IMAGE SE...

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE

APPARATUS AND METHOD FOR REFERENTIAL POSITION MEASUREMENT AND PATTE...

APPARATUS AND METHOD FOR REDUCING DEFECTS

PROJECTOR

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE

Altering pattern data based on measured optical element characteris...

Systems And Methods For Determination of Focus And Telecentricity,...

Exposure equipment and related control method

Process for amelioration of scanning synchronization error

Device and method of correcting exposure defects in photolithography