involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development

Industry

CPC
B41M5/368

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B41Printing, stamps B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES COLOUR PRINTING B41M5/00Duplicating or marking methods Sheet materials for use therein

Current Industry

B41M5/368involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Thermally reactive infrared absorption polymers and their use in a...
- Patent number 8,632,947
- Issue date Jan 21, 2014
- Ipagsa Industrial, S.L.
- Peter Jonathan Bentley
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Imaging member
- Patent number 8,323,803
- Issue date Dec 4, 2012
- Xerox Corporation
- Jin Wu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Positive-working radiation-sensitive imageable elements
- Patent number 8,298,750
- Issue date Oct 30, 2012
- Eastman Kodak Company
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Pattern forming materials and pattern formation method using the ma...
- Patent number 8,187,786
- Issue date May 29, 2012
- Samsung Electronics Co., Ltd.
- Joo-Ho Kim
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Bakeable lithographic printing plates with a high resistance to che...
- Patent number 8,137,891
- Issue date Mar 20, 2012
- Eastman Kodak Company
- Mathias Jarek
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photopolymer composition usable for lithographic plates
- Patent number 8,119,331
- Issue date Feb 21, 2012
- Kodak Graphic Communications GmbH
- Harald Baumann
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Radiation-sensitive elements with developability-enhancing compounds
- Patent number 8,088,549
- Issue date Jan 3, 2012
- Eastman Kodak Company
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
On-press developable elements and methods of use
- Patent number 8,084,182
- Issue date Dec 27, 2011
- Eastman Kodak Company
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Positive-working imageable elements with chemical resistance
- Patent number 8,076,052
- Issue date Dec 13, 2011
- Eastman Kodak Company
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithographic printing plate precursor and lithographic printing method
- Patent number 7,998,652
- Issue date Aug 16, 2011
- FUJIFILM Corporation
- Naonori Makino
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photosensitive recording material, planographic printing plate prec...
- Patent number 7,968,271
- Issue date Jun 28, 2011
- FUJIFILM Corporation
- Hisao Yamamoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Radiation-sensitive compositions and elements with solvent resistan...
- Patent number 7,955,779
- Issue date Jun 7, 2011
- Eastman Kodak Company
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photopolymer composition suitable for lithographic printing plates
- Patent number 7,955,776
- Issue date Jun 7, 2011
- Eastman Kodak Company
- Harald Baumann
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Modified polymers and their use in the production of lithographic p...
- Patent number 7,914,966
- Issue date Mar 29, 2011
- Eastman Kodak Company
- Celin Savariar-Hauck
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Pattern forming method, graft pattern material, conductive pattern...
- Patent number 7,879,535
- Issue date Feb 1, 2011
- FUJIFILM Corporation
- Takeyoshi Kano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation-sensitive compositions and elements with solvent resistan...
- Patent number 7,723,012
- Issue date May 25, 2010
- Eastman Kodak Company
- Moshe Levanon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer having polymerizable group, polymerizable composition, plan...
- Patent number 7,618,762
- Issue date Nov 17, 2009
- FUJIFILM Corporation
- Kazuto Kunita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working imageable elements and methods of use
- Patent number 7,604,924
- Issue date Oct 20, 2009
- Eastman Kodak Company
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
On-press developable negative-working imageable elements
- Patent number 7,592,128
- Issue date Sep 22, 2009
- Eastman Kodak Company
- Jianbing Huang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resin composition and thermo/photosensitive composition
- Patent number 7,569,328
- Issue date Aug 4, 2009
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Near infrared ray activation type positive resin composition
- Patent number 7,544,461
- Issue date Jun 9, 2009
- Kansai Paint Co., Ltd.
- Genji Imai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition and elements with basic development...
- Patent number 7,544,462
- Issue date Jun 9, 2009
- Eastman Kodak Company
- Moshe Levanon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working radiation-sensitive compositions and imageable mat...
- Patent number 7,524,614
- Issue date Apr 28, 2009
- Eastman Kodak Company
- Ting Tao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic printing plate precursor and lithographic printing method
- Patent number 7,524,605
- Issue date Apr 28, 2009
- FUJIFILM Corporation
- Ryuki Kakino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thermally reactive near-infrared absorbing acetal copolymers, metho...
- Patent number 7,473,515
- Issue date Jan 6, 2009
- American Dye Source, Inc.
- My T Nguyen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Lithographic printing plate precursor and lithographic printing met...
- Patent number 7,462,440
- Issue date Dec 9, 2008
- Fujifilm Corporation
- Sumiaki Yamasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursor and polymerizable composition
- Patent number 7,455,954
- Issue date Nov 25, 2008
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working radiation-sensitive compositions and imageable mat...
- Patent number 7,452,638
- Issue date Nov 18, 2008
- Eastman Kodak Company
- Jianfei Yu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymerizable composition
- Patent number 7,416,835
- Issue date Aug 26, 2008
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for colored image formation
- Patent number 7,402,374
- Issue date Jul 22, 2008
- FUJIFILM Corporation
- Hidekazu Oohashi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
INFRARED-SENSITIVE COMPOSITION FOR PRINTING PLATE PRECURSORS
- Publication number 20120015295
- Publication date Jan 19, 2012
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
THERMOSENSITIVE IMAGING COMPOSITION AND LITHOGRAPHIC PLATE COMPRISI...
- Publication number 20110271859
- Publication date Nov 10, 2011
- Shiyou Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-WORKING RADIATION-SENSITIVE IMAGEABLE ELEMENTS
- Publication number 20110059399
- Publication date Mar 10, 2011
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSI...
- Publication number 20110003123
- Publication date Jan 6, 2011
- Christopher D. Simpson
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IMAGING MEMBER
- Publication number 20100255413
- Publication date Oct 7, 2010
- Xerox Corporation
- Jin Wu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
IMAGING MEMBER
- Publication number 20100251914
- Publication date Oct 7, 2010
- Xerox Corporation
- Jing Zhou
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
NEGATIVE-WORKING ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS
- Publication number 20100129616
- Publication date May 27, 2010
- Jeffrey J. Collins
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS
- Publication number 20100075258
- Publication date Mar 25, 2010
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS
- Publication number 20100015549
- Publication date Jan 21, 2010
- Jianbing Huang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
POLYMER HAVING POLYMERIZABLE GROUP, POLYMERIZABLE COMPOSITION, PLAN...
- Publication number 20100003618
- Publication date Jan 7, 2010
- Kazuto Kunita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTAN...
- Publication number 20090311626
- Publication date Dec 17, 2009
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHE...
- Publication number 20090269554
- Publication date Oct 29, 2009
- Mathias Jarek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ON-PRESS DEVELOPABLE ELEMENTS AND METHODS OF USE
- Publication number 20090269699
- Publication date Oct 29, 2009
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
IMAGEABLE ELEMENTS WITH COALESCING CORE-SHELL PARTICLES
- Publication number 20090183647
- Publication date Jul 23, 2009
- Mathias Jarek
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
POSITIVE-WORKING IMAGEABLE ELEMENTS WITH CHEMICAL RESISTANCE
- Publication number 20090181326
- Publication date Jul 16, 2009
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
RADIATION-SENSITIVE ELEMENTS WITH DEVELOPABILITY-ENHANCING COMPOUNDS
- Publication number 20090162783
- Publication date Jun 25, 2009
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE
- Publication number 20090111051
- Publication date Apr 30, 2009
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE SUPPORT
- Publication number 20090084683
- Publication date Apr 2, 2009
- AGFA GRAPHICS NV
- Paola Campestrini
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photopolymer Composition Usable for Lithographic Plates
- Publication number 20090011363
- Publication date Jan 8, 2009
- Harald Baumann
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTAN...
- Publication number 20090004599
- Publication date Jan 1, 2009
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Thermally Reactive Infrared Absorption Polymers and Their Use in a...
- Publication number 20080261151
- Publication date Oct 23, 2008
- Peter Jonathan Bentley
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photopolymer Composition Suitable for Lithographic Printing Plates
- Publication number 20080248424
- Publication date Oct 9, 2008
- Harald Baumann
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMEN...
- Publication number 20080206678
- Publication date Aug 28, 2008
- Moshe Levanon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
INFRARED LASER-SENSITIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR
- Publication number 20080206670
- Publication date Aug 28, 2008
- FUJIFILM CORPORATION
- Yuichi Shiraishi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Polymer having polymerizable group, polymerizable composition, plan...
- Publication number 20080182205
- Publication date Jul 31, 2008
- Kazuto Kunita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MAT...
- Publication number 20080070152
- Publication date Mar 20, 2008
- Jianfei Yu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Resin composition and thermo/photosensitive composition
- Publication number 20080044763
- Publication date Feb 21, 2008
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Negative-working radiation-sensitive compositions and imageable ele...
- Publication number 20080008957
- Publication date Jan 10, 2008
- Eastman Kodak Company
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Process for the Production of Double-Layer Heat-Sensitive Imageable...
- Publication number 20070292809
- Publication date Dec 20, 2007
- KODAK POLYCHROME GRAPHICS, GMBH
- Celin Savariar-Hauck
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Negative-working radiation-sensitive compositions and imageable mat...
- Publication number 20070275322
- Publication date Nov 29, 2007
- Eastman Kodak Company
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Thermally reactive infrared absorption polymers and their use in a...

Imaging member

Positive-working radiation-sensitive imageable elements

Pattern forming materials and pattern formation method using the ma...

Bakeable lithographic printing plates with a high resistance to che...

Photopolymer composition usable for lithographic plates

Radiation-sensitive elements with developability-enhancing compounds

On-press developable elements and methods of use

Positive-working imageable elements with chemical resistance

Lithographic printing plate precursor and lithographic printing method

Photosensitive recording material, planographic printing plate prec...

Radiation-sensitive compositions and elements with solvent resistan...

Photopolymer composition suitable for lithographic printing plates

Modified polymers and their use in the production of lithographic p...

Pattern forming method, graft pattern material, conductive pattern...

Radiation-sensitive compositions and elements with solvent resistan...

Polymer having polymerizable group, polymerizable composition, plan...

Negative-working imageable elements and methods of use

On-press developable negative-working imageable elements

Resin composition and thermo/photosensitive composition

Near infrared ray activation type positive resin composition

Radiation-sensitive composition and elements with basic development...

Negative-working radiation-sensitive compositions and imageable mat...

Lithographic printing plate precursor and lithographic printing method

Thermally reactive near-infrared absorbing acetal copolymers, metho...

Lithographic printing plate precursor and lithographic printing met...

Lithographic printing plate precursor and polymerizable composition

Negative-working radiation-sensitive compositions and imageable mat...

Polymerizable composition

Method for colored image formation

Patents Applicationslast 30 patents

INFRARED-SENSITIVE COMPOSITION FOR PRINTING PLATE PRECURSORS

THERMOSENSITIVE IMAGING COMPOSITION AND LITHOGRAPHIC PLATE COMPRISI...

POSITIVE-WORKING RADIATION-SENSITIVE IMAGEABLE ELEMENTS

SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSI...

IMAGING MEMBER

IMAGING MEMBER

NEGATIVE-WORKING ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS

ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS

ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS

POLYMER HAVING POLYMERIZABLE GROUP, POLYMERIZABLE COMPOSITION, PLAN...

RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTAN...

BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHE...

ON-PRESS DEVELOPABLE ELEMENTS AND METHODS OF USE

IMAGEABLE ELEMENTS WITH COALESCING CORE-SHELL PARTICLES

POSITIVE-WORKING IMAGEABLE ELEMENTS WITH CHEMICAL RESISTANCE

RADIATION-SENSITIVE ELEMENTS WITH DEVELOPABILITY-ENHANCING COMPOUNDS

NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE

METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE SUPPORT

Photopolymer Composition Usable for Lithographic Plates

RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTAN...

Thermally Reactive Infrared Absorption Polymers and Their Use in a...

Photopolymer Composition Suitable for Lithographic Printing Plates

RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMEN...

INFRARED LASER-SENSITIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR

Polymer having polymerizable group, polymerizable composition, plan...

NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MAT...

Resin composition and thermo/photosensitive composition

Negative-working radiation-sensitive compositions and imageable ele...

Process for the Production of Double-Layer Heat-Sensitive Imageable...

Negative-working radiation-sensitive compositions and imageable mat...