Masks, reticles, shadow masks

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CPC
G01N2021/95676

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Parent Industries

GPHYSICS G01Measuring instruments G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES

Current Industry

G01N2021/95676Masks, reticles, shadow masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mask inspection for semiconductor specimen fabrication
- Patent number 12,361,535
- Issue date Jul 15, 2025
- Applied Materials Israel Ltd.
- Ronen Madmon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integration of an optical height sensor in mask inspection tools
- Patent number 12,360,058
- Issue date Jul 15, 2025
- KLA Corporation
- Zefram Marks
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection apparatus and method for inspecting a mask having f...
- Patent number 12,333,706
- Issue date Jun 17, 2025
- Samsung Display Co., Ltd.
- Dae Won Baek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-performance EUV microscope with free form illumination system
- Patent number 12,332,188
- Issue date Jun 17, 2025
- ESOL, Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus and inspection method
- Patent number 12,326,407
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Nitish Kumar
- G01 - MEASURING TESTING
Information Patent Grant
Monolithic particle inspection device
- Patent number 12,298,257
- Issue date May 13, 2025
- ASML Netherlands B.V.
- Ilse Van Weperen
- G01 - MEASURING TESTING
Information Patent Grant
Photoresist inspection apparatus, photoresist inspection method usi...
- Patent number 12,276,907
- Issue date Apr 15, 2025
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to detect a defect on a lithographic sample and metrology sy...
- Patent number 12,271,115
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring an effect of a wavelength-dependent measuring...
- Patent number 12,174,546
- Issue date Dec 24, 2024
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask inspection method and mask inspection apparatus
- Patent number 12,050,184
- Issue date Jul 30, 2024
- Lasertec Corporation
- Keita Saito
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection apparatus and mask inspection method using the same
- Patent number 12,045,975
- Issue date Jul 23, 2024
- Samsung Display Co., Ltd.
- Ilha Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement tool and method for lithography masks
- Patent number 12,032,298
- Issue date Jul 9, 2024
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
EUV mask defect tool apparatus
- Patent number 11,960,202
- Issue date Apr 16, 2024
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection apparatus, method for inspecting defect, and meth...
- Patent number 11,940,391
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Ryusei Terashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for characterizing a microlithographic mask
- Patent number 11,914,303
- Issue date Feb 27, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask inspection device using multilayer reflection zone plate
- Patent number 11,898,970
- Issue date Feb 13, 2024
- ESOL Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Build material handling unit for a powder module for an apparatus f...
- Patent number 11,878,463
- Issue date Jan 23, 2024
- CONCEPT LASER GMBH
- Dominik Eideloth
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection device and defect inspection method
- Patent number 11,788,973
- Issue date Oct 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor manufacturing method and apparatus thereof
- Patent number 11,756,789
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G01 - MEASURING TESTING
Information Patent Grant
Pulsed light generation device, pulsed light generation method, exp...
- Patent number 11,757,247
- Issue date Sep 12, 2023
- Nikon Corporation
- Akira Tokuhisa
- G01 - MEASURING TESTING
Information Patent Grant
Multidimensional printer
- Patent number 11,738,312
- Issue date Aug 29, 2023
- GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY O...
- Andrei A. Kolmakov
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
EUV in-situ linearity calibration for TDI image sensors using test...
- Patent number 11,733,605
- Issue date Aug 22, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Method for inspecting a reticle, a method for manufacturing a retic...
- Patent number 11,726,398
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Seulgi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and inspection method
- Patent number 11,692,948
- Issue date Jul 4, 2023
- ASML Netherlands B.V.
- Nitish Kumar
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,635,371
- Issue date Apr 25, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Surface topography measurement apparatus and method
- Patent number 11,604,151
- Issue date Mar 14, 2023
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUSES AND METHODS FOR ASSESSING DEEP ULTRAVIOLET REFLECTIVITY...
- Publication number 20250231474
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kelvin Elphick
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Inspecting Mask
- Publication number 20250216773
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Hsun CHEN
- G01 - MEASURING TESTING
Information Patent Application
MANUFACTURING METHOD FOR CONDUCTIVE FILM, MANUFACTURING METHOD FOR...
- Publication number 20250208500
- Publication date Jun 26, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Shunsuke KANAME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION SYSTEM AND METHOD FOR OPERATING THEREOF
- Publication number 20250199398
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Ting CHEN
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM TO FOR RAPID INSPECTION OF PHOTOLITHOGRAPHY RETICLE
- Publication number 20250123555
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Lin SYU
- G01 - MEASURING TESTING
Information Patent Application
EUV Microscope
- Publication number 20250116615
- Publication date Apr 10, 2025
- EUV TECH, INC.
- CHAMI N. PERERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE APPARATUS, INSPECTION APPARATUS, EXPOSURE APPARATUS, L...
- Publication number 20250102445
- Publication date Mar 27, 2025
- Lasertec Corporation
- Ko GONDAIRA
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR A MASK INSPECTION SYSTEM
- Publication number 20250093770
- Publication date Mar 20, 2025
- Carl Zeiss SMT GMBH
- Sören Schmidt
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20250060677
- Publication date Feb 20, 2025
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION
- Publication number 20250044679
- Publication date Feb 6, 2025
- KLA Corporation
- Alexander Pokrovskiy
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS
- Publication number 20240377335
- Publication date Nov 14, 2024
- NuFlare Technology, Inc.
- Masaya TAKEDA
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION S...
- Publication number 20240353318
- Publication date Oct 24, 2024
- KLA Corporation
- Yun Xie
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20240152057
- Publication date May 9, 2024
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
PROBE AND INSPECTION APPARATUS INCLUDING THE SAME
- Publication number 20240019362
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- Junbum Park
- G01 - MEASURING TESTING
Information Patent Application
HIGH-PERFORMANCE EUV MICROSCOPE WITH FREE FORM ILLUMINATION SYSTEM
- Publication number 20240011922
- Publication date Jan 11, 2024
- ESOL, Inc.
- Dong Gun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM
- Publication number 20240003827
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chien-Lin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20230341760
- Publication date Oct 26, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS AND INSPECTION METHOD
- Publication number 20230296533
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Nitish KUMAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC PARTICLE INSPECTION DEVICE
- Publication number 20230266255
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Ilse VAN WEPEREN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...
- Publication number 20230236124
- Publication date Jul 27, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Application
APPARATUSES AND METHODS FOR DIFFRACTION BASE OVERLAY MEASUREMENTS
- Publication number 20230175835
- Publication date Jun 8, 2023
- Micron Technology, Inc.
- Masazumi Matsunobu
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM INCLUDING SIDE ILLUMINATION UNIT AND INSPECTION M...
- Publication number 20230175974
- Publication date Jun 8, 2023
- Samsung Electronics Co., Ltd.
- Junghoon CHOI
- G01 - MEASURING TESTING
Information Patent Application
TUNABLE SHRINKAGE AND TRIM PROCESS FOR FABRICATING GRATINGS
- Publication number 20230160820
- Publication date May 25, 2023
- Meta Platforms Technologies, LLC
- Austin LANE
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION
- Publication number 20230131950
- Publication date Apr 27, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Ronen MADMON
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV MICROSCOPE
- Publication number 20230121350
- Publication date Apr 20, 2023
- EUV TECH, INC.
- CHAMI N. PERERA
- G01 - MEASURING TESTING
Information Patent Application
EUV MASK INSPECTION DEVICE USING MULTILAYER REFLECTION ZONE PLATE
- Publication number 20230121748
- Publication date Apr 20, 2023
- ESOL Inc.
- Dong Gun LEE
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION
- Publication number 20230080151
- Publication date Mar 16, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Ariel SHKALIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...
- Publication number 20230042743
- Publication date Feb 9, 2023
- Katholieke Universiteit Leuven
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INSPECTING A RETICLE, A METHOD FOR MANUFACTURING A RETIC...
- Publication number 20220365415
- Publication date Nov 17, 2022
- Samsung Electronics Co., Ltd.
- Seulgi KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20220350258
- Publication date Nov 3, 2022
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING

Masks, reticles, shadow masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask inspection for semiconductor specimen fabrication

Integration of an optical height sensor in mask inspection tools

Mask inspection apparatus and method for inspecting a mask having f...

High-performance EUV microscope with free form illumination system

Inspection apparatus and inspection method

Monolithic particle inspection device

Photoresist inspection apparatus, photoresist inspection method usi...

Method to detect a defect on a lithographic sample and metrology sy...

Process window qualification modulation layouts

EUV microscope

Method for measuring an effect of a wavelength-dependent measuring...

Mask inspection method and mask inspection apparatus

Mask inspection apparatus and mask inspection method using the same

Measurement tool and method for lithography masks

EUV mask defect tool apparatus

Defect inspection apparatus, method for inspecting defect, and meth...

Apparatus and method for characterizing a microlithographic mask

EUV mask inspection device using multilayer reflection zone plate

Build material handling unit for a powder module for an apparatus f...

Inspection device for masks for semiconductor lithography and method

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Defect inspection device and defect inspection method

Semiconductor manufacturing method and apparatus thereof

Pulsed light generation device, pulsed light generation method, exp...

Multidimensional printer

EUV in-situ linearity calibration for TDI image sensors using test...

Method for inspecting a reticle, a method for manufacturing a retic...

Inspection apparatus and inspection method

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Surface topography measurement apparatus and method

Patents Applicationslast 30 patents

APPARATUSES AND METHODS FOR ASSESSING DEEP ULTRAVIOLET REFLECTIVITY...

System and Method for Inspecting Mask

MANUFACTURING METHOD FOR CONDUCTIVE FILM, MANUFACTURING METHOD FOR...

INSPECTION SYSTEM AND METHOD FOR OPERATING THEREOF

METHOD AND SYSTEM TO FOR RAPID INSPECTION OF PHOTOLITHOGRAPHY RETICLE

EUV Microscope

LIGHT SOURCE APPARATUS, INSPECTION APPARATUS, EXPOSURE APPARATUS, L...

ILLUMINATION OPTICAL UNIT FOR A MASK INSPECTION SYSTEM

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION

PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS

METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION S...

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

PROBE AND INSPECTION APPARATUS INCLUDING THE SAME

HIGH-PERFORMANCE EUV MICROSCOPE WITH FREE FORM ILLUMINATION SYSTEM

SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

INSPECTION APPARATUS AND INSPECTION METHOD

MONOLITHIC PARTICLE INSPECTION DEVICE

APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...

APPARATUSES AND METHODS FOR DIFFRACTION BASE OVERLAY MEASUREMENTS

INSPECTION SYSTEM INCLUDING SIDE ILLUMINATION UNIT AND INSPECTION M...

TUNABLE SHRINKAGE AND TRIM PROCESS FOR FABRICATING GRATINGS

MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION

EUV MICROSCOPE

EUV MASK INSPECTION DEVICE USING MULTILAYER REFLECTION ZONE PLATE

MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION

PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...

METHOD FOR INSPECTING A RETICLE, A METHOD FOR MANUFACTURING A RETIC...

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...