Masks, reticles, shadow masks

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CPC
G01N2021/95676

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Parent Industries

GPHYSICS G01Measuring instruments G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES

Current Industry

G01N2021/95676Masks, reticles, shadow masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring an effect of a wavelength-dependent measuring...
- Patent number 12,174,546
- Issue date Dec 24, 2024
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask inspection method and mask inspection apparatus
- Patent number 12,050,184
- Issue date Jul 30, 2024
- Lasertec Corporation
- Keita Saito
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection apparatus and mask inspection method using the same
- Patent number 12,045,975
- Issue date Jul 23, 2024
- Samsung Display Co., Ltd.
- Ilha Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement tool and method for lithography masks
- Patent number 12,032,298
- Issue date Jul 9, 2024
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
EUV mask defect tool apparatus
- Patent number 11,960,202
- Issue date Apr 16, 2024
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection apparatus, method for inspecting defect, and meth...
- Patent number 11,940,391
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Ryusei Terashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for characterizing a microlithographic mask
- Patent number 11,914,303
- Issue date Feb 27, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask inspection device using multilayer reflection zone plate
- Patent number 11,898,970
- Issue date Feb 13, 2024
- ESOL Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Build material handling unit for a powder module for an apparatus f...
- Patent number 11,878,463
- Issue date Jan 23, 2024
- CONCEPT LASER GMBH
- Dominik Eideloth
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection device and defect inspection method
- Patent number 11,788,973
- Issue date Oct 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor manufacturing method and apparatus thereof
- Patent number 11,756,789
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G01 - MEASURING TESTING
Information Patent Grant
Pulsed light generation device, pulsed light generation method, exp...
- Patent number 11,757,247
- Issue date Sep 12, 2023
- Nikon Corporation
- Akira Tokuhisa
- G01 - MEASURING TESTING
Information Patent Grant
Multidimensional printer
- Patent number 11,738,312
- Issue date Aug 29, 2023
- GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY O...
- Andrei A. Kolmakov
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
EUV in-situ linearity calibration for TDI image sensors using test...
- Patent number 11,733,605
- Issue date Aug 22, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Method for inspecting a reticle, a method for manufacturing a retic...
- Patent number 11,726,398
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Seulgi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and inspection method
- Patent number 11,692,948
- Issue date Jul 4, 2023
- ASML Netherlands B.V.
- Nitish Kumar
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,635,371
- Issue date Apr 25, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Surface topography measurement apparatus and method
- Patent number 11,604,151
- Issue date Mar 14, 2023
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Grant
Foreign substance inspection apparatus and foreign substance inspec...
- Patent number 11,513,082
- Issue date Nov 29, 2022
- Canon Kabushiki Kaisha
- Masayoshi Iino
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining one or more characteristics of light in an optical system
- Patent number 11,499,924
- Issue date Nov 15, 2022
- KLA Corp.
- Larissa Juschkin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Increasing signal-to-noise ratio in optical imaging of defects on u...
- Patent number 11,474,437
- Issue date Oct 18, 2022
- Applied Materials Israel Ltd.
- Yechiel Kapoano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for inspecting a reticle, a method for manufacturing a retic...
- Patent number 11,467,484
- Issue date Oct 11, 2022
- Samsung Electronics Co., Ltd.
- Seulgi Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband light interferometry for focal-map generation in photomas...
- Patent number 11,442,021
- Issue date Sep 13, 2022
- KLA Corporation
- Rui-Fang Shi
- G01 - MEASURING TESTING
Information Patent Grant
Surface topography measurement apparatus and method
- Patent number 11,422,096
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Weimin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulsed light generation device, pulsed light generation method, exp...
- Patent number 11,366,070
- Issue date Jun 21, 2022
- Nikon Corporation
- Akira Tokuhisa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 11,348,222
- Issue date May 31, 2022
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pulsed light generation device, pulsed light generation method, exp...
- Patent number 11,303,091
- Issue date Apr 12, 2022
- Nikon Corporation
- Akira Tokuhisa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS
- Publication number 20240377335
- Publication date Nov 14, 2024
- NuFlare Technology, Inc.
- Masaya TAKEDA
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION S...
- Publication number 20240353318
- Publication date Oct 24, 2024
- KLA Corporation
- Yun Xie
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20240152057
- Publication date May 9, 2024
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
PROBE AND INSPECTION APPARATUS INCLUDING THE SAME
- Publication number 20240019362
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- Junbum Park
- G01 - MEASURING TESTING
Information Patent Application
HIGH-PERFORMANCE EUV MICROSCOPE WITH FREE FORM ILLUMINATION SYSTEM
- Publication number 20240011922
- Publication date Jan 11, 2024
- ESOL, Inc.
- Dong Gun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM
- Publication number 20240003827
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chien-Lin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20230341760
- Publication date Oct 26, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS AND INSPECTION METHOD
- Publication number 20230296533
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Nitish KUMAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC PARTICLE INSPECTION DEVICE
- Publication number 20230266255
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Ilse VAN WEPEREN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...
- Publication number 20230236124
- Publication date Jul 27, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Application
APPARATUSES AND METHODS FOR DIFFRACTION BASE OVERLAY MEASUREMENTS
- Publication number 20230175835
- Publication date Jun 8, 2023
- Micron Technology, Inc.
- Masazumi Matsunobu
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM INCLUDING SIDE ILLUMINATION UNIT AND INSPECTION M...
- Publication number 20230175974
- Publication date Jun 8, 2023
- Samsung Electronics Co., Ltd.
- Junghoon CHOI
- G01 - MEASURING TESTING
Information Patent Application
TUNABLE SHRINKAGE AND TRIM PROCESS FOR FABRICATING GRATINGS
- Publication number 20230160820
- Publication date May 25, 2023
- Meta Platforms Technologies, LLC
- Austin LANE
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION
- Publication number 20230131950
- Publication date Apr 27, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Ronen MADMON
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV MICROSCOPE
- Publication number 20230121350
- Publication date Apr 20, 2023
- EUV TECH, INC.
- CHAMI N. PERERA
- G01 - MEASURING TESTING
Information Patent Application
EUV MASK INSPECTION DEVICE USING MULTILAYER REFLECTION ZONE PLATE
- Publication number 20230121748
- Publication date Apr 20, 2023
- ESOL Inc.
- Dong Gun LEE
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION
- Publication number 20230080151
- Publication date Mar 16, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Ariel SHKALIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...
- Publication number 20230042743
- Publication date Feb 9, 2023
- Katholieke Universiteit Leuven
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INSPECTING A RETICLE, A METHOD FOR MANUFACTURING A RETIC...
- Publication number 20220365415
- Publication date Nov 17, 2022
- Samsung Electronics Co., Ltd.
- Seulgi KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20220350258
- Publication date Nov 3, 2022
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METH...
- Publication number 20220317061
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Ryusei TERASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO DETECT A DEFECT ON A LITHOGRAPHIC SAMPLE AND METROLOGY SY...
- Publication number 20220283513
- Publication date Sep 8, 2022
- Carl Zeiss SMT GMBH
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Surface Topography Measurement Apparatus And Method
- Publication number 20220283100
- Publication date Sep 8, 2022
- Aplied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Application
Integration of an Optical Height Sensor in Mask Inspection Tools
- Publication number 20220196572
- Publication date Jun 23, 2022
- KLA Corporation
- Zefram Marks
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS
- Publication number 20220178847
- Publication date Jun 9, 2022
- Lasertec Corporation
- Keita SAITO
- G01 - MEASURING TESTING
Information Patent Application
Surface Topography Measurement Apparatus And Method
- Publication number 20220170866
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD USING THE SAME
- Publication number 20220114714
- Publication date Apr 14, 2022
- SAMSUNG DISPLAY CO., LTD.
- ILHA SONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASUREMENT TOOL AND METHOD FOR LITHOGRAPHY MASKS
- Publication number 20220011679
- Publication date Jan 13, 2022
- Intel Corporation
- Yoshihiro TEZUKA
- G01 - MEASURING TESTING
Information Patent Application
Defect Inspection Device and Defect Inspection Method
- Publication number 20210381989
- Publication date Dec 9, 2021
- Hitachi High-Tech Corporation
- Takashi HIROI
- G01 - MEASURING TESTING
Information Patent Application
INCREASING SIGNAL-TO-NOISE RATIO IN OPTICAL IMAGING OF DEFECTS ON U...
- Publication number 20210333719
- Publication date Oct 28, 2021
- APPLIED MATERIALS ISRAEL LTD.
- Yechiel Kapoano
- G01 - MEASURING TESTING

Masks, reticles, shadow masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV microscope

Method for measuring an effect of a wavelength-dependent measuring...

Mask inspection method and mask inspection apparatus

Mask inspection apparatus and mask inspection method using the same

Measurement tool and method for lithography masks

EUV mask defect tool apparatus

Defect inspection apparatus, method for inspecting defect, and meth...

Apparatus and method for characterizing a microlithographic mask

EUV mask inspection device using multilayer reflection zone plate

Build material handling unit for a powder module for an apparatus f...

Inspection device for masks for semiconductor lithography and method

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Defect inspection device and defect inspection method

Semiconductor manufacturing method and apparatus thereof

Pulsed light generation device, pulsed light generation method, exp...

Multidimensional printer

EUV in-situ linearity calibration for TDI image sensors using test...

Method for inspecting a reticle, a method for manufacturing a retic...

Inspection apparatus and inspection method

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Surface topography measurement apparatus and method

Foreign substance inspection apparatus and foreign substance inspec...

Determining one or more characteristics of light in an optical system

Increasing signal-to-noise ratio in optical imaging of defects on u...

Method for inspecting a reticle, a method for manufacturing a retic...

Broadband light interferometry for focal-map generation in photomas...

Surface topography measurement apparatus and method

Pulsed light generation device, pulsed light generation method, exp...

Methods and systems for inspection of wafers and reticles using des...

Pulsed light generation device, pulsed light generation method, exp...

Patents Applicationslast 30 patents

PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS

METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION S...

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

PROBE AND INSPECTION APPARATUS INCLUDING THE SAME

HIGH-PERFORMANCE EUV MICROSCOPE WITH FREE FORM ILLUMINATION SYSTEM

SYSTEMS AND METHODS FOR ACTINIC MASK INSPECTION AND REVIEW IN VACUUM

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

INSPECTION APPARATUS AND INSPECTION METHOD

MONOLITHIC PARTICLE INSPECTION DEVICE

APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...

APPARATUSES AND METHODS FOR DIFFRACTION BASE OVERLAY MEASUREMENTS

INSPECTION SYSTEM INCLUDING SIDE ILLUMINATION UNIT AND INSPECTION M...

TUNABLE SHRINKAGE AND TRIM PROCESS FOR FABRICATING GRATINGS

MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION

EUV MICROSCOPE

EUV MASK INSPECTION DEVICE USING MULTILAYER REFLECTION ZONE PLATE

MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION

PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...

METHOD FOR INSPECTING A RETICLE, A METHOD FOR MANUFACTURING A RETIC...

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METH...

METHOD TO DETECT A DEFECT ON A LITHOGRAPHIC SAMPLE AND METROLOGY SY...

Surface Topography Measurement Apparatus And Method

Integration of an Optical Height Sensor in Mask Inspection Tools

MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS

Surface Topography Measurement Apparatus And Method

MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD USING THE SAME

MEASUREMENT TOOL AND METHOD FOR LITHOGRAPHY MASKS

Defect Inspection Device and Defect Inspection Method

INCREASING SIGNAL-TO-NOISE RATIO IN OPTICAL IMAGING OF DEFECTS ON U...