Non-aqueous liquid suspensions

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CPC
C09K3/1472

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CCHEMISTRY METALLURGY C09Paints, dyes C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE C09K3/00Materials not provided for elsewhere

Current Industry

C09K3/1472Non-aqueous liquid suspensions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Azeotropic or azeotropic-like composition comprising hydrogen fluor...
- Patent number 11,826,596
- Issue date Nov 28, 2023
- Daikin Industries, Ltd.
- Kazuhiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceria-based composite fine particle dispersion, production method t...
- Patent number 11,267,715
- Issue date Mar 8, 2022
- JGC Catalysts and Chemicals Ltd.
- Michio Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liquid suspension of cerium oxide particles
- Patent number 11,028,288
- Issue date Jun 8, 2021
- Rhodia Operations
- Eisaku Suda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Chemical-mechanical processing slurry and methods for processing a...
- Patent number 10,968,377
- Issue date Apr 6, 2021
- CMC Materials, Inc.
- Tong Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical-mechanical processing slurry and methods for processing a...
- Patent number 10,792,785
- Issue date Oct 6, 2020
- Cabot Microelectronics Corporation
- Ke Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, abrasive set, and method for polishing substrate
- Patent number 10,759,968
- Issue date Sep 1, 2020
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic film CMP slurry composition and polishing method using same
- Patent number 10,723,916
- Issue date Jul 28, 2020
- Samsung SDI Co., Ltd.
- Jung Min Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lubricated mechanical polishing
- Patent number 10,442,055
- Issue date Oct 15, 2019
- Iowa State University Research Foundation, Inc.
- Ludovico Cademartiri
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Abrasive particle-dispersion layer composite and polishing slurry c...
- Patent number 10,421,883
- Issue date Sep 24, 2019
- KCTECH CO., LTD.
- Jang Kuk Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing abrasive particle, production method therefore, polishing...
- Patent number 10,414,021
- Issue date Sep 17, 2019
- ASAHI KASEI KOGYO CO., LTD.
- Shunichi Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid suspension of cerium oxide particles
- Patent number 10,344,183
- Issue date Jul 9, 2019
- Rhodia Operations
- Eisaku Suda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composition containing 2,3,3,3-tetrafluoropropene and 1,2-difluoroe...
- Patent number 10,131,829
- Issue date Nov 20, 2018
- Arkema France
- Dominique Deur-Bert
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for metal and polishing method
- Patent number 10,037,894
- Issue date Jul 31, 2018
- Hitachi Chemical Company, Ltd.
- Yasuhiro Ichige
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, abrasive set, and method for polishing substrate
- Patent number 10,030,172
- Issue date Jul 24, 2018
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- B24 - GRINDING POLISHING
Information Patent Grant
Liquid suspensions and powders of cerium oxide particles and prepar...
- Patent number 9,909,033
- Issue date Mar 6, 2018
- Rhodia Operations
- Guillaume Criniere
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Polishing composition and method for polishing magnetic disk substrate
- Patent number 9,856,401
- Issue date Jan 2, 2018
- YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Toru Iwata
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry for chemical-mechanical polishing of metals and use thereof
- Patent number 9,708,508
- Issue date Jul 18, 2017
- GLOBALFOUNDRIES Inc.
- Graham M. Bates
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Lapping slurry having a cationic surfactant
- Patent number 9,388,328
- Issue date Jul 12, 2016
- Diamond Innovations, Inc.
- Shuang Ji
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive agent manufacturing method
- Patent number 9,388,331
- Issue date Jul 12, 2016
- Konica Minolta, Inc.
- Hazuki Nakae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing liquid and polishing method
- Patent number 9,318,346
- Issue date Apr 19, 2016
- Hitachi Chemical Company, Ltd.
- Mamiko Kanamaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing method
- Patent number 9,299,573
- Issue date Mar 29, 2016
- Hitachi Chemical Company, Ltd.
- Kouji Mishima
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Slurry and method for producing slurry
- Patent number 9,260,643
- Issue date Feb 16, 2016
- Shin-Etsu Handotai Co., Ltd.
- Koji Kitagawa
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Slurry for chemical-mechanical polishing of metals and use thereof
- Patent number 9,057,004
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Graham M. Bates
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
CMP polishing liquid and polishing method
- Patent number 8,883,031
- Issue date Nov 11, 2014
- Hitachi Chemical Company, Ltd.
- Mamiko Kanamaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liquid suspensions and powders of cerium oxide particles and prepar...
- Patent number 8,876,926
- Issue date Nov 4, 2014
- Rhodia Operations
- Guillaume Criniere
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for preparing fluorinated nanodiamond liquid dispersion
- Patent number 8,790,541
- Issue date Jul 29, 2014
- Central Glass Co., Ltd.
- Akifumi Yao
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,779,011
- Issue date Jul 15, 2014
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slurry for chemical-mechanical polishing of copper and use thereof
- Patent number 8,734,665
- Issue date May 27, 2014
- International Business Machines Corporation
- Graham M. Bates
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Surface treatment composition, surface treatment method, and method...
- Patent number 8,257,504
- Issue date Sep 4, 2012
- JSR Corporation
- Yasumasa Mori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,211,193
- Issue date Jul 3, 2012
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING METHOD AND SYSTEM OF SUSPENSION ABRASIVE JETS
- Publication number 20240123572
- Publication date Apr 18, 2024
- Industrial Technology Research Institute
- Pin-Tsung CHENG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AZEOTROPIC OR AZEOTROPIC-LIKE COMPOSITION COMPRISING HYDROGEN FLUOR...
- Publication number 20240050792
- Publication date Feb 15, 2024
- DAIKIN INDUSTRIES, LTD.
- Kazuhiro TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Foam Abrasive and Method for Producing Same
- Publication number 20220403130
- Publication date Dec 22, 2022
- ROBERT BOSCH GmbH
- Ruben Drost
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SURFACE MODIFIED SILANIZED COLLOIDAL SILICA PARTICLES
- Publication number 20220356065
- Publication date Nov 10, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Changzai Chi
- C01 - INORGANIC CHEMISTRY
Information Patent Application
NANODIAMOND DISPERSION COMPOSITION
- Publication number 20220259048
- Publication date Aug 18, 2022
- DAICEL CORPORATION
- Norihiro KIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AZEOTROPIC OR AZEOTROPIC-LIKE COMPOSITION COMPRISING HYDROGEN FLUOR...
- Publication number 20220023693
- Publication date Jan 27, 2022
- DAIKIN INDUSTRIES, LTD.
- Kazuhiro TAKAHASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Ceria-Based Composite Fine Particle Dispersion, Production Method T...
- Publication number 20200087554
- Publication date Mar 19, 2020
- JGC CATALYSTS AND CHEMICALS LTD.
- Michio Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID SUSPENSION OF CERIUM OXIDE PARTICLES
- Publication number 20200087539
- Publication date Mar 19, 2020
- RHODIA OPERATIONS
- Eisaku SUDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Organic Film CMP Slurry Composition and Polishing Method Using Same
- Publication number 20180362807
- Publication date Dec 20, 2018
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE
- Publication number 20180320024
- Publication date Nov 8, 2018
- Hitachi Chemical Company, Ltd.
- Hisataka MINAMI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL PROCESSING SLURRY AND METHODS FOR PROCESSING A...
- Publication number 20180298257
- Publication date Oct 18, 2018
- Cabot Miroelectronics Corporation
- Tong Li
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL PROCESSING SLURRY AND METHODS FOR PROCESSING A...
- Publication number 20170348820
- Publication date Dec 7, 2017
- Cabot Microelectronics Corporation
- Ke ZHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION CONTAINING 2,3,3,3-TETRAFLUOROPROPENE AND 1,2-DIFLUOROE...
- Publication number 20170218241
- Publication date Aug 3, 2017
- Arkema France
- Dominique DEUR-BERT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY
- Publication number 20160068730
- Publication date Mar 10, 2016
- REC SOLAR PTE. LTD.
- Mohan Menon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Abrasive Agent Manufacturing Method
- Publication number 20150135602
- Publication date May 21, 2015
- Konica Minolta, Inc.
- Hazuki Nakae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STABILIZED, WATER-JET SLURRY APPARATUS AND METHOD
- Publication number 20150017607
- Publication date Jan 15, 2015
- H2O Tech, Inc.
- Timothy D. Nelson
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY AND METHOD FOR PRODUCING SLURRY
- Publication number 20150000208
- Publication date Jan 1, 2015
- Shin-Etsu Handotai Co., Ltd.
- Koji Kitagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR METAL AND POLISHING METHOD
- Publication number 20140370707
- Publication date Dec 18, 2014
- Yasuhiro Ichige
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING LIQUID AND POLISHING METHOD
- Publication number 20140363973
- Publication date Dec 11, 2014
- HITACHI CHEMICAL COMPANY., LTD.
- Mamiko Kanamaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY
- Publication number 20130228160
- Publication date Sep 5, 2013
- REC WAFER PTE. LTD.
- Mohan Menon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Slurry Composition For Polishing And Method Of Manufacturing Phase...
- Publication number 20130112914
- Publication date May 9, 2013
- Samsung Electronics Co., Ltd.
- Choong-Ho HAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF COPPER AND USE THEREOF
- Publication number 20130092651
- Publication date Apr 18, 2013
- International Business Machines Corporation
- Graham M. Bates
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF METALS AND USE THEREOF
- Publication number 20130078811
- Publication date Mar 28, 2013
- International Business Machines Corporation
- Graham M. Bates
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...
- Publication number 20130059439
- Publication date Mar 7, 2013
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...
- Publication number 20120299158
- Publication date Nov 29, 2012
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS AND METHODS FOR REMOVING SCRATCHES FROM PLASTIC SURFACES
- Publication number 20120164924
- Publication date Jun 28, 2012
- Plastek LLC
- Lynette Dee Lobmeyer
- B24 - GRINDING POLISHING
Information Patent Application
ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...
- Publication number 20120145950
- Publication date Jun 14, 2012
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP POLISHING LIQUID AND POLISHING METHOD
- Publication number 20120094491
- Publication date Apr 19, 2012
- Hitachi Chemical Company, Ltd.
- Mamiko Kanamaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LIQUID SUSPENSIONS AND POWDERS OF CERIUM OXIDE PARTICLES AND PREPAR...
- Publication number 20110225897
- Publication date Sep 22, 2011
- RHODIA OPERATIONS
- Guillaume Criniere
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated Nano Diamond and Dispersion Thereof, and Process for Pr...
- Publication number 20110124541
- Publication date May 26, 2011
- Central Glass Company, Limited
- Akifumi YAO
- C01 - INORGANIC CHEMISTRY

Non-aqueous liquid suspensions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Azeotropic or azeotropic-like composition comprising hydrogen fluor...

Ceria-based composite fine particle dispersion, production method t...

Liquid suspension of cerium oxide particles

Chemical-mechanical processing slurry and methods for processing a...

Chemical-mechanical processing slurry and methods for processing a...

Abrasive, abrasive set, and method for polishing substrate

Organic film CMP slurry composition and polishing method using same

Lubricated mechanical polishing

Abrasive particle-dispersion layer composite and polishing slurry c...

Polishing abrasive particle, production method therefore, polishing...

Liquid suspension of cerium oxide particles

Composition containing 2,3,3,3-tetrafluoropropene and 1,2-difluoroe...

Polishing liquid for metal and polishing method

Abrasive, abrasive set, and method for polishing substrate

Liquid suspensions and powders of cerium oxide particles and prepar...

Polishing composition and method for polishing magnetic disk substrate

Slurry for chemical-mechanical polishing of metals and use thereof

Lapping slurry having a cationic surfactant

Abrasive agent manufacturing method

CMP polishing liquid and polishing method

Polishing method

Slurry and method for producing slurry

Slurry for chemical-mechanical polishing of metals and use thereof

CMP polishing liquid and polishing method

Liquid suspensions and powders of cerium oxide particles and prepar...

Method for preparing fluorinated nanodiamond liquid dispersion

Ultrapure colloidal silica for use in chemical mechanical polishing...

Slurry for chemical-mechanical polishing of copper and use thereof

Surface treatment composition, surface treatment method, and method...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Patents Applicationslast 30 patents

PROCESSING METHOD AND SYSTEM OF SUSPENSION ABRASIVE JETS

AZEOTROPIC OR AZEOTROPIC-LIKE COMPOSITION COMPRISING HYDROGEN FLUOR...

Foam Abrasive and Method for Producing Same

SURFACE MODIFIED SILANIZED COLLOIDAL SILICA PARTICLES

NANODIAMOND DISPERSION COMPOSITION

AZEOTROPIC OR AZEOTROPIC-LIKE COMPOSITION COMPRISING HYDROGEN FLUOR...

Ceria-Based Composite Fine Particle Dispersion, Production Method T...

LIQUID SUSPENSION OF CERIUM OXIDE PARTICLES

Organic Film CMP Slurry Composition and Polishing Method Using Same

ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE

CHEMICAL-MECHANICAL PROCESSING SLURRY AND METHODS FOR PROCESSING A...

CHEMICAL-MECHANICAL PROCESSING SLURRY AND METHODS FOR PROCESSING A...

COMPOSITION CONTAINING 2,3,3,3-TETRAFLUOROPROPENE AND 1,2-DIFLUOROE...

METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY

Abrasive Agent Manufacturing Method

STABILIZED, WATER-JET SLURRY APPARATUS AND METHOD

SLURRY AND METHOD FOR PRODUCING SLURRY

POLISHING LIQUID FOR METAL AND POLISHING METHOD

CMP POLISHING LIQUID AND POLISHING METHOD

METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY

Slurry Composition For Polishing And Method Of Manufacturing Phase...

SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF COPPER AND USE THEREOF

SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF METALS AND USE THEREOF

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...

COMPOSITIONS AND METHODS FOR REMOVING SCRATCHES FROM PLASTIC SURFACES

ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...

CMP POLISHING LIQUID AND POLISHING METHOD

LIQUID SUSPENSIONS AND POWDERS OF CERIUM OXIDE PARTICLES AND PREPAR...

Fluorinated Nano Diamond and Dispersion Thereof, and Process for Pr...