off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Industry

CPC
G02B17/0828

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Parent Industries

GPHYSICS G02Optics G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS G02B17/00Systems with reflecting surfaces, with or without refracting elements

Current Industry

G02B17/0828off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Projection optical system and projector
- Patent number 10,466,452
- Issue date Nov 5, 2019
- Seiko Epson Corporation
- Nobutaka Minefuji
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,500,943
- Issue date Nov 22, 2016
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,470,968
- Issue date Oct 18, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,442,360
- Issue date Sep 13, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Optical system for direct imaging of light markable material
- Patent number 8,570,356
- Issue date Oct 29, 2013
- John Michael Tamkin
- F21 - LIGHTING
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 7,956,984
- Issue date Jun 7, 2011
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Microlithographic reduction projection catadioptric objective
- Patent number 7,859,748
- Issue date Dec 28, 2010
- Carl Zeiss SMT GmbH
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Catadioptric projection system for 157 nm lithography
- Patent number 7,508,581
- Issue date Mar 24, 2009
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 7,372,543
- Issue date May 13, 2008
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 7,372,544
- Issue date May 13, 2008
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Microlithographic reduction projection catadioptric objective
- Patent number 7,218,445
- Issue date May 15, 2007
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Zoom optical system
- Patent number 7,126,761
- Issue date Oct 24, 2006
- Canon Kabushiki Kaisha
- Manabu Hakko
- G02 - OPTICS
Information Patent Grant
Imaging optical system
- Patent number 7,123,420
- Issue date Oct 17, 2006
- NEC Viewtechnology, Ltd.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 7,088,425
- Issue date Aug 8, 2006
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 7,023,527
- Issue date Apr 4, 2006
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Imaging optical system
- Patent number 6,950,240
- Issue date Sep 27, 2005
- NEC Viewtechnology, Ltd.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Grant
Imaging optical system
- Patent number 6,947,221
- Issue date Sep 20, 2005
- NEC Viewtechnology, Ltd.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Grant
Imaging optical system
- Patent number 6,879,444
- Issue date Apr 12, 2005
- NEC Viewtechnology, Ltd.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Grant
Microlithographic reduction projection catadioptric objective
- Patent number 6,873,476
- Issue date Mar 29, 2005
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 6,795,169
- Issue date Sep 21, 2004
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Image-forming optical system
- Patent number 6,771,427
- Issue date Aug 3, 2004
- NEC Viewtechnology, Ltd.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Grant
Microlithographic reduction projection catadioptric objective
- Patent number 6,636,350
- Issue date Oct 21, 2003
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Exposure/imaging apparatus and method in which imaging characterist...
- Patent number 6,556,278
- Issue date Apr 29, 2003
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Aperture stop having central aperture region defined by a circular...
- Patent number 6,509,954
- Issue date Jan 21, 2003
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus for illuminating a mask, method of m...
- Patent number 6,480,262
- Issue date Nov 12, 2002
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Exposure apparatus and exposure method for transferring pattern ont...
- Patent number 6,351,305
- Issue date Feb 26, 2002
- Nikon Corporation
- Masahi Tanaka
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, optical projection apparatus and a method for a...
- Patent number 5,729,331
- Issue date Mar 17, 1998
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Grant
Catadioptric reduction projection optical system
- Patent number 5,668,673
- Issue date Sep 16, 1997
- Nikon Corporation
- Yutaka Suenaga
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system
- Patent number 5,592,329
- Issue date Jan 7, 1997
- Nikon Corporation
- Toshiro Ishiyama
- G02 - OPTICS
Information Patent Grant
Dual field of view multi wavelength sensor
- Patent number 5,363,235
- Issue date Nov 8, 1994
- Hughes Aircraft Company
- Pul C. Kiunke
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL SYSTEM AND PROJECTOR
- Publication number 20230176465
- Publication date Jun 8, 2023
- SEIKO EPSON CORPORATION
- Eiji Morikuni
- G02 - OPTICS
Information Patent Application
METHOD FOR THREE-DIMENSIONALLY MEASURING A 3D AERIAL IMAGE OF A LIT...
- Publication number 20180357758
- Publication date Dec 13, 2018
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Wafer Defect Inspection and Review Systems
- Publication number 20170219807
- Publication date Aug 3, 2017
- KLA-Tencor Corporation
- Shiyu Zhang
- G02 - OPTICS
Information Patent Application
Optical System for Direct Imaging of Light Markable Material
- Publication number 20140022786
- Publication date Jan 23, 2014
- Sinclair Systems International LLC
- John Tamkin
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20130314679
- Publication date Nov 28, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical System for Direct Imaging of Light Markable Media
- Publication number 20100309279
- Publication date Dec 9, 2010
- John Michael Tamkin
- G02 - OPTICS
Information Patent Application
Exposure apparatus, optical projection apparatus and a method for a...
- Publication number 20080192216
- Publication date Aug 14, 2008
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION SYSTEM FOR 157nm LITHOGRAPHY
- Publication number 20070273965
- Publication date Nov 29, 2007
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Application
Exposure apparatus, optical projection apparatus and a method for a...
- Publication number 20070216885
- Publication date Sep 20, 2007
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC REDUCTION PROJECTION CATADIOPTRIC OBJECTIVE
- Publication number 20070153398
- Publication date Jul 5, 2007
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Exposure apparatus, optical projection apparatus and a method for a...
- Publication number 20060238729
- Publication date Oct 26, 2006
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Application
Imaging optical system
- Publication number 20060077567
- Publication date Apr 13, 2006
- NEC VIEWTECHNOLOGY, LTD.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Application
Zoom optical system
- Publication number 20060050407
- Publication date Mar 9, 2006
- Manabu Hakko
- G02 - OPTICS
Information Patent Application
Exposure apparatus, optical projection apparatus and a method for a...
- Publication number 20050185162
- Publication date Aug 25, 2005
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Application
Exposure apparatus, optical projection apparatus and a method for a...
- Publication number 20050012917
- Publication date Jan 20, 2005
- Nikon Corporation
- Masashi Tanaka
- G02 - OPTICS
Information Patent Application
Imaging optical system
- Publication number 20040196568
- Publication date Oct 7, 2004
- NEC VIEWTECHNOLOGY, LTD.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Application
Imaging optical system
- Publication number 20040114256
- Publication date Jun 17, 2004
- NEC VIEWTECHNOLOGY, LTD.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Application
Imaging optical system
- Publication number 20040114255
- Publication date Jun 17, 2004
- NEC VIEWTECHNOLOGY, LTD.
- Eiki Matsuo
- G02 - OPTICS
Information Patent Application
Microlithographic reduction projection catadioptric objective
- Publication number 20040027653
- Publication date Feb 12, 2004
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Exposure apparatus, optical projection apparatus and a method for a...
- Publication number 20030137644
- Publication date Jul 24, 2003
- NIKON CORPORATION
- Masashi Tanaka
- G02 - OPTICS
Information Patent Application
Microlithographic reduction projection catadioptric objective
- Publication number 20020012100
- Publication date Jan 31, 2002
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Microlithographic reduction projection catadioptric objective
- Publication number 20010043391
- Publication date Nov 22, 2001
- David R. Shafer
- G02 - OPTICS

off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Projection optical system and projector

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Optical system for direct imaging of light markable material

Exposure apparatus, optical projection apparatus and a method for a...

Microlithographic reduction projection catadioptric objective

Catadioptric projection system for 157 nm lithography

Exposure apparatus, optical projection apparatus and a method for a...

Exposure apparatus, optical projection apparatus and a method for a...

Microlithographic reduction projection catadioptric objective

Zoom optical system

Imaging optical system

Exposure apparatus, optical projection apparatus and a method for a...

Exposure apparatus, optical projection apparatus and a method for a...

Imaging optical system

Imaging optical system

Imaging optical system

Microlithographic reduction projection catadioptric objective

Exposure apparatus, optical projection apparatus and a method for a...

Image-forming optical system

Microlithographic reduction projection catadioptric objective

Exposure/imaging apparatus and method in which imaging characterist...

Aperture stop having central aperture region defined by a circular...

Illumination optical apparatus for illuminating a mask, method of m...

Exposure apparatus and exposure method for transferring pattern ont...

Exposure apparatus, optical projection apparatus and a method for a...

Catadioptric reduction projection optical system

Catadioptric optical system

Dual field of view multi wavelength sensor

Patents Applicationslast 30 patents

OPTICAL SYSTEM AND PROJECTOR

METHOD FOR THREE-DIMENSIONALLY MEASURING A 3D AERIAL IMAGE OF A LIT...

Wafer Defect Inspection and Review Systems

Optical System for Direct Imaging of Light Markable Material

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

Optical System for Direct Imaging of Light Markable Media

Exposure apparatus, optical projection apparatus and a method for a...

CATADIOPTRIC PROJECTION SYSTEM FOR 157nm LITHOGRAPHY

Exposure apparatus, optical projection apparatus and a method for a...

MICROLITHOGRAPHIC REDUCTION PROJECTION CATADIOPTRIC OBJECTIVE

Exposure apparatus, optical projection apparatus and a method for a...

Imaging optical system

Zoom optical system

Exposure apparatus, optical projection apparatus and a method for a...

Exposure apparatus, optical projection apparatus and a method for a...

Imaging optical system

Imaging optical system

Imaging optical system

Microlithographic reduction projection catadioptric objective

Exposure apparatus, optical projection apparatus and a method for a...

Microlithographic reduction projection catadioptric objective

Microlithographic reduction projection catadioptric objective