off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Industry

CPC
G02B17/0844

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G02Optics G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS G02B17/00Systems with reflecting surfaces, with or without refracting elements

Current Industry

G02B17/0844off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Industries

Patents Grantslast 30 patents

Information Patent Grant
Reflective microscope objective lens for all colors
- Patent number 12,066,616
- Issue date Aug 20, 2024
- The Regents of the University of California
- Adam Hanninen
- G02 - OPTICS
Information Patent Grant
Compact annular field imager and method for imaging electromagnetic...
- Patent number 11,698,294
- Issue date Jul 11, 2023
- WAVEFRONT RESEARCH, INC.
- Thomas A. Mitchell
- G01 - MEASURING TESTING
Information Patent Grant
Optical system for three-dimensional stereoscopic image display
- Patent number 11,435,598
- Issue date Sep 6, 2022
- Yunam Optics Inc.
- Young Ju Kim
- G02 - OPTICS
Information Patent Grant
Compact annular field imager and method for imaging electromagnetic...
- Patent number 10,914,625
- Issue date Feb 9, 2021
- Wavefront Research, Inc.
- Thomas A. Mitchell
- G01 - MEASURING TESTING
Information Patent Grant
Projection optical system, exposure apparatus, and article manufact...
- Patent number 10,578,846
- Issue date Mar 3, 2020
- Canon Kabushiki Kaisha
- Michio Kono
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 10,156,792
- Issue date Dec 18, 2018
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,933,705
- Issue date Apr 3, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,904,174
- Issue date Feb 27, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,846,366
- Issue date Dec 19, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction projection optical system, exposure apparatus, and exposu...
- Patent number 9,791,781
- Issue date Oct 17, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective with parallel, offset optical axes
- Patent number 9,772,478
- Issue date Sep 26, 2017
- Carl Zeiss SMT GmbH
- David Shafer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing immersion projection optical system
- Patent number 9,606,443
- Issue date Mar 28, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing immersion projection optical system
- Patent number 9,568,834
- Issue date Feb 14, 2017
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,500,943
- Issue date Nov 22, 2016
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,470,968
- Issue date Oct 18, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,442,360
- Issue date Sep 13, 2016
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,086,635
- Issue date Jul 21, 2015
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Catadioptric projection optical system, exposure apparatus, and exp...
- Patent number 9,081,295
- Issue date Jul 14, 2015
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective including an aspherized plate
- Patent number 8,804,234
- Issue date Aug 12, 2014
- Carl Zeiss SMT GmbH
- David Shafer
- G02 - OPTICS
Information Patent Grant
Objective
- Patent number 8,526,126
- Issue date Sep 3, 2013
- Fraunhofer-Gesellschaft zur Foedrderung der angewandten Forschung e.V.
- Kristof Seidl
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective with mirror group
- Patent number 8,363,315
- Issue date Jan 29, 2013
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 8,339,701
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- David Shafer
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 8,289,619
- Issue date Oct 16, 2012
- Carl Zeiss SMT GmbH
- David Shafer
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus and device fabricatin...
- Patent number 8,102,510
- Issue date Jan 24, 2012
- Canon Kabushiki Kaisha
- Takahiro Sasaki
- G02 - OPTICS
Information Patent Grant
Projection objective for lithography
- Patent number 8,068,276
- Issue date Nov 29, 2011
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 7,869,122
- Issue date Jan 11, 2011
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Grant
Microlithographic reduction projection catadioptric objective
- Patent number 7,859,748
- Issue date Dec 28, 2010
- Carl Zeiss SMT GmbH
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Projection objective for lithography
- Patent number 7,835,073
- Issue date Nov 16, 2010
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Imaging system with mirror group
- Patent number 7,712,905
- Issue date May 11, 2010
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 7,679,821
- Issue date Mar 16, 2010
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Techniques for High-Speed Volumetric Sampling
- Publication number 20230152561
- Publication date May 18, 2023
- THE ROCKEFELLER UNIVERSITY
- Alipasha VAZIRI
- G02 - OPTICS
Information Patent Application
REFLECTIVE MICROSCOPE OBJECTIVE LENS FOR ALL COLORS
- Publication number 20210255446
- Publication date Aug 19, 2021
- The Regents of the University of California
- Adam Hanninen
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR THREE-DIMENSIONAL STEREOSCOPIC IMAGE DISPLAY
- Publication number 20210072557
- Publication date Mar 11, 2021
- Yunam Optics Inc.
- Young Ju KIM
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20180299785
- Publication date Oct 18, 2018
- Nikon Corporation
- Yasuhiro OMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES
- Publication number 20180031815
- Publication date Feb 1, 2018
- Carl Zeiss SMT GMBH
- David Shafer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH TWO INTERMEDIATE IMAGES AND...
- Publication number 20140376086
- Publication date Dec 25, 2014
- David Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20140211180
- Publication date Jul 31, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20140211182
- Publication date Jul 31, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20140211183
- Publication date Jul 31, 2014
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20130314679
- Publication date Nov 28, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP
- Publication number 20130120728
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Alexander Epple
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20120274918
- Publication date Nov 1, 2012
- Carl Zeiss SMT GMBH
- David Shafer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20120274919
- Publication date Nov 1, 2012
- Carl Zeiss SMT GMBH
- David Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20120092760
- Publication date Apr 19, 2012
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
OBJECTIVE
- Publication number 20120050891
- Publication date Mar 1, 2012
- FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG e.V.
- Kristof SEIDL
- G02 - OPTICS
Information Patent Application
Catadioptric Projection Objective With Mirror Group
- Publication number 20110261444
- Publication date Oct 27, 2011
- Alexander Epple
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20110235167
- Publication date Sep 29, 2011
- Carl Zeiss SMT GMBH
- David Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR LITHOGRAPHY
- Publication number 20110026110
- Publication date Feb 3, 2011
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20110002032
- Publication date Jan 6, 2011
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20100253999
- Publication date Oct 7, 2010
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE FABRICATIN...
- Publication number 20090185152
- Publication date Jul 23, 2009
- Canon Kabushiki Kaisha
- Takahiro SASAKI
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure apparatus, and exposure method
- Publication number 20090168189
- Publication date Jul 2, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20080310014
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20080297889
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20080285121
- Publication date Nov 20, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
Imaging System With Mirror Group
- Publication number 20080213703
- Publication date Sep 4, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20080212170
- Publication date Sep 4, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20080186567
- Publication date Aug 7, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR LITHOGRAPHY
- Publication number 20080174858
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20080151364
- Publication date Jun 26, 2008
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS

off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reflective microscope objective lens for all colors

Compact annular field imager and method for imaging electromagnetic...

Optical system for three-dimensional stereoscopic image display

Compact annular field imager and method for imaging electromagnetic...

Projection optical system, exposure apparatus, and article manufact...

Projection optical system, exposure apparatus, and exposure method

Reduction projection optical system, exposure apparatus, and exposu...

Reduction projection optical system, exposure apparatus, and exposu...

Projection optical system, exposure apparatus, and exposure method

Reduction projection optical system, exposure apparatus, and exposu...

Catadioptric projection objective with parallel, offset optical axes

Reducing immersion projection optical system

Reducing immersion projection optical system

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system, exposure apparatus, and exposure method

Catadioptric projection optical system, exposure apparatus, and exp...

Catadioptric projection objective including an aspherized plate

Objective

Catadioptric projection objective with mirror group

Catadioptric projection objective

Catadioptric projection objective

Projection optical system, exposure apparatus and device fabricatin...

Projection objective for lithography

Catadioptric projection objective

Microlithographic reduction projection catadioptric objective

Projection objective for lithography

Imaging system with mirror group

Catadioptric projection objective

Patents Applicationslast 30 patents

Techniques for High-Speed Volumetric Sampling

REFLECTIVE MICROSCOPE OBJECTIVE LENS FOR ALL COLORS

OPTICAL SYSTEM FOR THREE-DIMENSIONAL STEREOSCOPIC IMAGE DISPLAY

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES

CATADIOPTRIC PROJECTION OBJECTIVE WITH TWO INTERMEDIATE IMAGES AND...

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP

CATADIOPTRIC PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

OBJECTIVE

Catadioptric Projection Objective With Mirror Group

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OBJECTIVE FOR LITHOGRAPHY

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE FABRICATIN...

Projection optical system, exposure apparatus, and exposure method

CATADIOPTRIC PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

Imaging System With Mirror Group

CATADIOPTRIC PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OBJECTIVE FOR LITHOGRAPHY

CATADIOPTRIC PROJECTION OBJECTIVE