Other polishing compositions

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CPC
C09G1/06

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CCHEMISTRY METALLURGY C09Paints, dyes C09GPOLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES C09G1/00Polishing compositions

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C09G1/06Other polishing compositions

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Patents Grantslast 30 patents

Information Patent Grant
MXene with excellent mechanical strength and fast and high-yield an...
- Patent number 12,173,215
- Issue date Dec 24, 2024
- Korea Institute of Science and Technology
- Chong Min Koo
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Composition and method for polysilicon CMP
- Patent number 12,157,834
- Issue date Dec 3, 2024
- CMC MATERIALS LLC
- Sarah Brosnan
- B24 - GRINDING POLISHING
Information Patent Grant
CMP slurry composition for polishing tungsten pattern wafer and met...
- Patent number 12,077,681
- Issue date Sep 3, 2024
- Samsung SDI Co., Ltd.
- Ji Ho Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 12,037,517
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry composition and method of poli...
- Patent number 12,024,651
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Grant
Methods of temporarily enhancing the luster and brilliance of jewel...
- Patent number 12,023,707
- Issue date Jul 2, 2024
- Paul Ashley
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,862,472
- Issue date Jan 2, 2024
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 11,820,919
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,806,836
- Issue date Nov 7, 2023
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,767,448
- Issue date Sep 26, 2023
- Resonac Corporation
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,732,157
- Issue date Aug 22, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization composition for polishing oxide m...
- Patent number 11,718,767
- Issue date Aug 8, 2023
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing agent, polishing method, and liquid additive for polishing
- Patent number 11,713,404
- Issue date Aug 1, 2023
- AGC Inc.
- Toshihiko Otsuki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of using same
- Patent number 11,680,186
- Issue date Jun 20, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing slurry, method for polishing glass, and method for manufa...
- Patent number 11,518,912
- Issue date Dec 6, 2022
- AGC Inc.
- Tomohiro Shibuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Barrier ruthenium chemical mechanical polishing slurry
- Patent number 11,505,718
- Issue date Nov 22, 2022
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Derivatized polyamino acids
- Patent number 11,492,514
- Issue date Nov 8, 2022
- CMC Materials, Inc.
- Na Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,462,415
- Issue date Oct 4, 2022
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry, method for polishing glass, and method for manufa...
- Patent number 11,370,939
- Issue date Jun 28, 2022
- AGC Inc.
- Tomohiro Shibuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Polishing liquid, polishing liquid set and polishing method
- Patent number 11,352,523
- Issue date Jun 7, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing liquid, polishing liquid set and polishing method
- Patent number 11,292,939
- Issue date Apr 5, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomohiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective chemical mechanical polishing cobalt, zirconium...
- Patent number 11,292,938
- Issue date Apr 5, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Murali Ganth Theivanayagam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing composition, chemical mechanical poli...
- Patent number 11,286,403
- Issue date Mar 29, 2022
- Dongjin Semichem Co., Ltd.
- Hyejung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing slurry composition and method of poli...
- Patent number 11,267,987
- Issue date Mar 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Liao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low oxide trench dishing shallow trench isolation chemical mechanic...
- Patent number 11,254,839
- Issue date Feb 22, 2022
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition for silicon nitride layer and method of etching...
- Patent number 11,254,871
- Issue date Feb 22, 2022
- Samsung SDI Co., Ltd.
- Jung Min Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,214,712
- Issue date Jan 4, 2022
- Illumina, Inc.
- Robert Yang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry composition and method of manufacturing integrated circuit d...
- Patent number 11,186,749
- Issue date Nov 30, 2021
- Samsung Electronics Co., Ltd.
- Boyun Kim
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous anionic functional silica slurry and amine carboxylic acid...
- Patent number 11,186,748
- Issue date Nov 30, 2021
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- B24 - GRINDING POLISHING
Information Patent Grant
Etching composition, method for etching insulating film of semicond...
- Patent number 11,186,772
- Issue date Nov 30, 2021
- SK Innovation Co., Ltd.
- Cheol Woo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20240327677
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Application
Ruthenium CMP Chemistry Based On Halogenation
- Publication number 20240043721
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Application
METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWEL...
- Publication number 20230323157
- Publication date Oct 12, 2023
- Paul Ashley
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Polishing Compositions and Methods of Using Same
- Publication number 20230265313
- Publication date Aug 24, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS FOR POLISHING DIELECTRIC LAYER IN FORMING SEMICONDUCTOR DEVICE
- Publication number 20220406612
- Publication date Dec 22, 2022
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20220195246
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CALCIUM CARBONATE SLURRY
- Publication number 20220089910
- Publication date Mar 24, 2022
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING
- Publication number 20210261824
- Publication date Aug 26, 2021
- AGC Inc.
- Toshihiko Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY
- Publication number 20210261822
- Publication date Aug 26, 2021
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PRE...
- Publication number 20200071613
- Publication date Mar 5, 2020
- Samsung Electronics Co., Ltd.
- Bo-yun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Organic Film CMP Slurry Composition and Polishing Method Using Same
- Publication number 20180362807
- Publication date Dec 20, 2018
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION COMPRISING HF AND 3,3,3-TRIFLUORO-2-CHLOROPROPENE
- Publication number 20180126348
- Publication date May 10, 2018
- Arkema France
- Philippe BONNET
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DIAMOND-BASED SLURRIES WITH IMPROVED SAPPHIRE REMOVAL RATE AND SURF...
- Publication number 20180072916
- Publication date Mar 15, 2018
- Cabot Microelectronics Corporation
- Prativa PANDEY
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION FOR MAGNETIC DISC SUBSTRATE
- Publication number 20170321086
- Publication date Nov 9, 2017
- YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Junichiro ANDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION COMPRISING HF AND 3,3,3-TRIFLUORO-2-CHLOROPROPENE
- Publication number 20160023176
- Publication date Jan 28, 2016
- ARKEMA FRANCE
- Philippe BONNET
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RU...
- Publication number 20140054266
- Publication date Feb 27, 2014
- Wiechang JIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of mixing reactive chemicals contained in separate container...
- Publication number 20130095245
- Publication date Apr 18, 2013
- Sefik Tuncer Goren
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Ethylene-tetrafluoroethylene phosphate composition
- Publication number 20090286885
- Publication date Nov 19, 2009
- E.I. du Pont de Nemuours and Company
- Weiming Qiu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUOROALKYL ACID AMIDE SURFACTANTS
- Publication number 20090042997
- Publication date Feb 12, 2009
- THOMAS FOO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Leveling Agent for Floor Polish and Aqueous Floor Polish Composition
- Publication number 20070289481
- Publication date Dec 20, 2007
- Atsushi Nagata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Solubilizing agents for active or functional organic compounds
- Publication number 20050152858
- Publication date Jul 14, 2005
- ISP INVESTMENTS INC.
- Steven H. Bertz
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Other polishing compositions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

MXene with excellent mechanical strength and fast and high-yield an...

Composition and method for polysilicon CMP

CMP slurry composition for polishing tungsten pattern wafer and met...

Ruthenium CMP chemistry based on halogenation

Chemical mechanical polishing slurry composition and method of poli...

Methods of temporarily enhancing the luster and brilliance of jewel...

Methods for polishing dielectric layer in forming semiconductor device

Ruthenium CMP chemistry based on halogenation

Calcium carbonate slurry

Polishing liquid, polishing liquid set, and polishing method

Polishing compositions and methods of use thereof

Chemical mechanical planarization composition for polishing oxide m...

Polishing agent, polishing method, and liquid additive for polishing

Polishing compositions and methods of using same

Polishing slurry, method for polishing glass, and method for manufa...

Barrier ruthenium chemical mechanical polishing slurry

Derivatized polyamino acids

Methods for polishing dielectric layer in forming semiconductor device

Polishing slurry, method for polishing glass, and method for manufa...

Polishing liquid, polishing liquid set and polishing method

Polishing liquid, polishing liquid set and polishing method

Method of selective chemical mechanical polishing cobalt, zirconium...

Chemical mechanical polishing composition, chemical mechanical poli...

Chemical mechanical polishing slurry composition and method of poli...

Low oxide trench dishing shallow trench isolation chemical mechanic...

Etching composition for silicon nitride layer and method of etching...

Calcium carbonate slurry

Slurry composition and method of manufacturing integrated circuit d...

Aqueous anionic functional silica slurry and amine carboxylic acid...

Etching composition, method for etching insulating film of semicond...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

Ruthenium CMP Chemistry Based On Halogenation

METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWEL...

Polishing Compositions and Methods of Using Same

METHODS FOR POLISHING DIELECTRIC LAYER IN FORMING SEMICONDUCTOR DEVICE

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

CALCIUM CARBONATE SLURRY

POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING

BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PRE...

Organic Film CMP Slurry Composition and Polishing Method Using Same

COMPOSITION COMPRISING HF AND 3,3,3-TRIFLUORO-2-CHLOROPROPENE

DIAMOND-BASED SLURRIES WITH IMPROVED SAPPHIRE REMOVAL RATE AND SURF...

POLISHING COMPOSITION FOR MAGNETIC DISC SUBSTRATE

COMPOSITION COMPRISING HF AND 3,3,3-TRIFLUORO-2-CHLOROPROPENE

COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RU...

Method of mixing reactive chemicals contained in separate container...

Ethylene-tetrafluoroethylene phosphate composition

FLUOROALKYL ACID AMIDE SURFACTANTS

Leveling Agent for Floor Polish and Aqueous Floor Polish Composition

Solubilizing agents for active or functional organic compounds