POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES

Industry

CPC
C09G

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of polishing object to be polished containing material havin...
- Patent number 11,939,491
- Issue date Mar 26, 2024
- FUJIMI INCORPORATED
- Kohsuke Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer grinding wheel
- Patent number 11,931,861
- Issue date Mar 19, 2024
- Samsung Electronics Co., Ltd.
- Seong Gi Jeon
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Polishing solution, polishing solution set, polishing method, and d...
- Patent number 11,926,764
- Issue date Mar 12, 2024
- Resonac Corporation
- Masayuki Hanano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluid processing systems including a plurality of material tanks, a...
- Patent number 11,925,912
- Issue date Mar 12, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Shih-Pin Chou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for etching and manufacturing method of semiconductor d...
- Patent number 11,912,902
- Issue date Feb 27, 2024
- Jae-Wan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing semiconductor substrate surface unevenness
- Patent number 11,901,186
- Issue date Feb 13, 2024
- Massachusetts Institute of Technology
- Li Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing solution
- Patent number 11,898,063
- Issue date Feb 13, 2024
- Anji Microelectronics (Shanghai) Co., Ltd.
- Wenting Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for polishing silicon substrate and polishing composition set
- Patent number 11,897,081
- Issue date Feb 13, 2024
- FUJIMI INCORPORATED
- Shinichiro Takami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silica-based particle dispersion and production method therefor
- Patent number 11,891,307
- Issue date Feb 6, 2024
- JGC Catalysts and Chemicals Ltd.
- Michio Komatsu
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Tungsten chemical mechanical planarization (CMP) with low dishing a...
- Patent number 11,884,859
- Issue date Jan 30, 2024
- VERSUM MATERIALS US, LLC
- Matthias Stender
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for post-polishing to be used after primary polishing o...
- Patent number 11,884,844
- Issue date Jan 30, 2024
- NISSAN CHEMICAL CORPORATION
- Hibiki Ishijima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition, polishing method, and method of producing se...
- Patent number 11,884,843
- Issue date Jan 30, 2024
- FUJIMI INCORPORATED
- Ryota Mae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cation-containing polishing composition for eliminating protrusions...
- Patent number 11,873,420
- Issue date Jan 16, 2024
- NISSAN CHEMICAL CORPORATION
- Hayato Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Optical surface polishing
- Patent number 11,865,663
- Issue date Jan 9, 2024
- George Shuai
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,862,472
- Issue date Jan 2, 2024
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Finishing mediums and finishing suspensions
- Patent number 11,859,108
- Issue date Jan 2, 2024
- PostProcess Technologies, Inc.
- Daniel Joshua Hutchinson
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,851,585
- Issue date Dec 26, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternative oxidizing agents for cobalt CMP
- Patent number 11,851,584
- Issue date Dec 26, 2023
- CMC Materials, Inc.
- Steven Kraft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for conducting a material removing operation
- Patent number 11,851,586
- Issue date Dec 26, 2023
- Saint-Gobain Ceramics & Plastics, Inc.
- Lin Fu
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
CMP composition for polishing hard materials
- Patent number 11,840,645
- Issue date Dec 12, 2023
- Entegris, Inc.
- Rajiv K. Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard abrasive particle-free polishing of hard materials
- Patent number 11,820,918
- Issue date Nov 21, 2023
- Entegris, Inc.
- Rajiv K. Singh
- B24 - GRINDING POLISHING
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 11,820,919
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing liquid composition for silicon oxide film
- Patent number 11,814,547
- Issue date Nov 14, 2023
- Kao Corporation
- Haruhiko Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 11,813,713
- Issue date Nov 14, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bryan E. Barton
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,814,548
- Issue date Nov 14, 2023
- Resonac Corporation
- Tomohiro Iwano
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,806,836
- Issue date Nov 7, 2023
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silica-based slurry for selective polishing of carbon-based films
- Patent number 11,802,220
- Issue date Oct 31, 2023
- CMC Materials, Inc.
- Brian Reiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing slurry and method of manufacturing semiconductor device
- Patent number 11,795,347
- Issue date Oct 24, 2023
- Samsung Electronics Co., Ltd.
- Kenji Takai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid composition for silicon oxide film
- Patent number 11,795,346
- Issue date Oct 24, 2023
- Kao Corporation
- Yohei Uchida
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition and polishing method
- Patent number 11,791,164
- Issue date Oct 17, 2023
- NITTA DUPONT INCORPORATED
- Takayuki Matsushita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
- Publication number 20240124744
- Publication date Apr 18, 2024
- Hooi-Sung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING P...
- Publication number 20240123568
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Sivapackia GANAPATHIAPPAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON S...
- Publication number 20240117220
- Publication date Apr 11, 2024
- CMC Materials LLC
- Alex Villani-Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240117219
- Publication date Apr 11, 2024
- Fujimi Incorporated
- Yasuaki ITO
- B24 - GRINDING POLISHING
Information Patent Application
LUBRICIOUS COATINGS FOR SKIS AND SNOWBOARDS AND RELATED SYSTEMS AND...
- Publication number 20240117266
- Publication date Apr 11, 2024
- Drake Holdings, Inc.
- Jeffrey Scott BATES
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
POLISHING METHOD AND POLISHING COMPOSITION
- Publication number 20240117218
- Publication date Apr 11, 2024
- Fujimi Incorporated
- Yuichiro NAKAGAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240110080
- Publication date Apr 4, 2024
- Fujimi Incorporated
- Yuichiro NAKAGAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION, PRODUCTION METHOD OF POLISHING COMPOSITION,...
- Publication number 20240101866
- Publication date Mar 28, 2024
- Fujimi Incorporated
- Ryota MAE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING METHOD AND POLISHING COMPOSITION
- Publication number 20240101867
- Publication date Mar 28, 2024
- Fujimi Incorporated
- Yuichiro NAKAGAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURF...
- Publication number 20240101865
- Publication date Mar 28, 2024
- CMC Materials LLC
- Na ZHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE SLURRY REGENERATION METHOD AND ABRASIVE SLURRY REGENERATIO...
- Publication number 20240091905
- Publication date Mar 21, 2024
- Konica Minolta, Inc.
- Shin NAKAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION AND POLISHING METHOD
- Publication number 20240084170
- Publication date Mar 14, 2024
- Fujimi Incorporated
- Hiroyuki Ishida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC LAYER POLISHING COMPOSITION AND METHOD FOR POLISHING USING...
- Publication number 20240084171
- Publication date Mar 14, 2024
- DONGJIN SEMICHEM CO., LTD.
- Hee Suk KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NOVEL CURABLE COMPOSITION CONTAINING CYCLIC MONOMER
- Publication number 20240084067
- Publication date Mar 14, 2024
- Tokuyama Corporation
- Kazuishi FUKUDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE
- Publication number 20240076522
- Publication date Mar 7, 2024
- Disco Corporation
- Ayumu SAKAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE
- Publication number 20240076521
- Publication date Mar 7, 2024
- Disco Corporation
- Ayumu SAKAI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
- Publication number 20240052203
- Publication date Feb 15, 2024
- Fujimi Incorporated
- Ryo Wakabayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION AND METHOD OF POLISHING SILICON WAFER
- Publication number 20240052202
- Publication date Feb 15, 2024
- NITTA DuPont Incorporated
- Noriaki SUGITA
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND MATERIALS FOR POLISHING OF MATERIALS
- Publication number 20240052201
- Publication date Feb 15, 2024
- Entegris, Inc.
- Rajiv K. Singh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING,METHOD FOR PREPA...
- Publication number 20240043718
- Publication date Feb 8, 2024
- SK enpulse Co., Ltd.
- Han Teo PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING,METHOD FOR PREPA...
- Publication number 20240043719
- Publication date Feb 8, 2024
- Han Teo PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ruthenium CMP Chemistry Based On Halogenation
- Publication number 20240043721
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURI...
- Publication number 20240043720
- Publication date Feb 8, 2024
- Fujimi Incorporated
- Jingzhi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FERRULE POLISHING MATERIAL
- Publication number 20240034908
- Publication date Feb 1, 2024
- ADMATECHS CO., LTD.
- Yusuke TOMIOKA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR CONDUCTING A MATERIAL REMOVING OPERATION
- Publication number 20240038543
- Publication date Feb 1, 2024
- Saint-Gobain Ceramics & Plastics, Inc.
- Renjie ZHOU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION, POLISHING METHOD AND METHOD FOR PRODUCING SE...
- Publication number 20240034907
- Publication date Feb 1, 2024
- Fujimi Incorporated
- Sonosuke ISHIGURO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING POLISHING COMPOS...
- Publication number 20240030041
- Publication date Jan 25, 2024
- SK enpulse Co., Ltd.
- Han Teo PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240018390
- Publication date Jan 18, 2024
- Fujimi Incorporated
- Yukinobu YOSHIZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME
- Publication number 20240016154
- Publication date Jan 18, 2024
- SoClean, Inc.
- Dean MARCARELLI
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Application
Chemical Mechanical Planarization (CMP) For Copper And Through-Sili...
- Publication number 20240006189
- Publication date Jan 4, 2024
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS

POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES

Industry

Parent Industries

Current Industry

Sub Industries

Patents Grantslast 30 patents

Method of polishing object to be polished containing material havin...

Wafer grinding wheel

Polishing solution, polishing solution set, polishing method, and d...

Fluid processing systems including a plurality of material tanks, a...

Composition for etching and manufacturing method of semiconductor d...

Method of reducing semiconductor substrate surface unevenness

Chemical-mechanical polishing solution

Method for polishing silicon substrate and polishing composition set

Silica-based particle dispersion and production method therefor

Tungsten chemical mechanical planarization (CMP) with low dishing a...

Composition for post-polishing to be used after primary polishing o...

Polishing composition, polishing method, and method of producing se...

Cation-containing polishing composition for eliminating protrusions...

Optical surface polishing

Methods for polishing dielectric layer in forming semiconductor device

Finishing mediums and finishing suspensions

Polishing compositions and methods of use thereof

Alternative oxidizing agents for cobalt CMP

Composition and method for conducting a material removing operation

CMP composition for polishing hard materials

Hard abrasive particle-free polishing of hard materials

Ruthenium CMP chemistry based on halogenation

Polishing liquid composition for silicon oxide film

Chemical mechanical polishing pad and polishing method

Polishing liquid, polishing liquid set, and polishing method

Calcium carbonate slurry

Silica-based slurry for selective polishing of carbon-based films

Polishing slurry and method of manufacturing semiconductor device

Polishing liquid composition for silicon oxide film

Polishing composition and polishing method

Patents Applicationslast 30 patents

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING P...

CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON S...

POLISHING COMPOSITION

LUBRICIOUS COATINGS FOR SKIS AND SNOWBOARDS AND RELATED SYSTEMS AND...

POLISHING METHOD AND POLISHING COMPOSITION

POLISHING COMPOSITION

POLISHING COMPOSITION, PRODUCTION METHOD OF POLISHING COMPOSITION,...

POLISHING METHOD AND POLISHING COMPOSITION

TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURF...

ABRASIVE SLURRY REGENERATION METHOD AND ABRASIVE SLURRY REGENERATIO...

POLISHING COMPOSITION AND POLISHING METHOD

ORGANIC LAYER POLISHING COMPOSITION AND METHOD FOR POLISHING USING...

NOVEL CURABLE COMPOSITION CONTAINING CYCLIC MONOMER

POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

POLISHING COMPOSITION AND METHOD OF POLISHING SILICON WAFER

METHODS AND MATERIALS FOR POLISHING OF MATERIALS

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING,METHOD FOR PREPA...

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING,METHOD FOR PREPA...

Ruthenium CMP Chemistry Based On Halogenation

POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURI...

FERRULE POLISHING MATERIAL

COMPOSITION AND METHOD FOR CONDUCTING A MATERIAL REMOVING OPERATION

POLISHING COMPOSITION, POLISHING METHOD AND METHOD FOR PRODUCING SE...

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING POLISHING COMPOS...

POLISHING COMPOSITION

SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME

Chemical Mechanical Planarization (CMP) For Copper And Through-Sili...