Polyalkylene oxides

Industry

CPC
G03C1/895

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Parent Industries

GPHYSICS G03Photography G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHOTOGRAPHIC PROCESSES G03C1/00Photosensitive materials

Current Industry

G03C1/895Polyalkylene oxides

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Polyoxyalkylene ammonium salts and their use as antistatic agents
- Patent number 7,893,144
- Issue date Feb 22, 2011
- 3M Innovative Properties Company
- Patricia M. Savu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polyoxyalkylene ammonium salts and their use as antistatic agents
- Patent number 7,678,941
- Issue date Mar 16, 2010
- 3M Innovative Properties Company
- Patricia M. Savu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing water-soluble nonionic surface-active compounds...
- Patent number 7,351,748
- Issue date Apr 1, 2008
- Daikin Industries, Ltd.
- Kouji Nagashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antistatic conductive grid pattern with integral logo
- Patent number 7,255,912
- Issue date Aug 14, 2007
- Eastman Kodak Company
- Peter T. Aylward
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Transparent invisible conductive grid
- Patent number 7,153,620
- Issue date Dec 26, 2006
- Eastman Kodak Company
- Peter T. Aylward
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silver halide photographic light-sensitive material
- Patent number 6,897,013
- Issue date May 24, 2005
- Fuji Photo Film Co., Ltd.
- Terukazu Yanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive and roughening layer
- Patent number 6,838,165
- Issue date Jan 4, 2005
- Eastman Kodak Company
- Debasis Majumdar
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silver halide photographic photosensitive material
- Patent number 6,686,139
- Issue date Feb 3, 2004
- Fuji Photo Film Co. Ltd.
- Katsuhiko Kanazawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bis-poly(ethylene oxide) surfactants and their use as antistats in...
- Patent number 6,482,975
- Issue date Nov 19, 2002
- Eastman Kodak Company
- Alan R. Pitt
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of adjusting conductivity after processing of photographs
- Patent number 6,465,140
- Issue date Oct 15, 2002
- Eastman Kodak Company
- Debasis Majumdar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive and roughening layer
- Patent number 6,436,619
- Issue date Aug 20, 2002
- Eastman Kodak Company
- Debasis Majumdar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Primer layer for photographic element
- Patent number 6,120,979
- Issue date Sep 19, 2000
- Eastman Kodak Company
- Debasis Majumdar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antistatic layer with smectite clay and an interpolymer containing...
- Patent number 5,869,227
- Issue date Feb 9, 1999
- Eastman Kodak Company
- Debasis Majumdar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for photographic paper
- Patent number 5,723,276
- Issue date Mar 3, 1998
- Eastman Kodak Company
- Lori Jeanne Shaw-Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Poly(ethylene oxide) and alkali metal salt antistatic backing layer...
- Patent number 5,683,862
- Issue date Nov 4, 1997
- Eastman Kodak Company
- Debasis Majumdar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic material having improved antistatic prop...
- Patent number 5,571,665
- Issue date Nov 5, 1996
- Imation Corp.
- Dario Ballerini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic material
- Patent number 5,565,311
- Issue date Oct 15, 1996
- Fuji Photo Film Co., Ltd.
- Fumio Kawamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic light-sensitive material
- Patent number 5,286,619
- Issue date Feb 15, 1994
- Konica Corporation
- Nobuaki Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ternary surfactant system to reduce static in photographic silver h...
- Patent number 5,258,276
- Issue date Nov 2, 1993
- E. I. Du Pont de Nemours and Company
- Allan R. Schoenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic materials and method for manufacture the...
- Patent number 5,153,115
- Issue date Oct 6, 1992
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic element
- Patent number 5,135,843
- Issue date Aug 4, 1992
- Konica Corporation
- Yasuhiko Takamuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antistatic layer containing hydrophobic polymer particles and condu...
- Patent number 5,098,822
- Issue date Mar 24, 1992
- Konica Corporation
- Noriki Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silver halide photographic material containing antistatic agents
- Patent number 4,943,520
- Issue date Jul 24, 1990
- Fuji Photo Film Co., Ltd.
- Masakazu Yoneyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic materials
- Patent number 4,917,993
- Issue date Apr 17, 1990
- Fuji Photo Film Co., Ltd.
- Yasuo Mukunoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic material comprising a protective layer c...
- Patent number 4,859,576
- Issue date Aug 22, 1989
- Fuji Photo Film Co., Ltd.
- Nobuaki Miyasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic light-sensitive materials
- Patent number 4,847,186
- Issue date Jul 11, 1989
- Fuji Photo Film Co., Ltd.
- Yasuo Mukunoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sheet or web carrying an antistatic layer
- Patent number 4,828,927
- Issue date May 9, 1989
- Agfa-Gevaert, N.V.
- Daniel M. Timmerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antistatic polymeric article
- Patent number 4,786,560
- Issue date Nov 22, 1988
- Imperial Chemical Industries PLC
- Christopher Crocker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process of making a photographic elements comprising protective lay...
- Patent number 4,670,376
- Issue date Jun 2, 1987
- Agfa-Gavaert, N.V.
- Hubert Vandenabeele
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic light-sensitive material having improved antistaticity
- Patent number 4,622,288
- Issue date Nov 11, 1986
- Fuji Photo Film Co., Ltd.
- Shigeki Yokoyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POLYOXYALKYLENE AMMONIUM SALTS AND THEIR USE AS ANTISTATIC AGENTS
- Publication number 20080039654
- Publication date Feb 14, 2008
- 3M Innovative Properties Company
- Patricia M. Savu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYOXYALKYLENE AMMONIUM SALTS AND THEIR USE AS ANTISTATIC AGENTS
- Publication number 20080033078
- Publication date Feb 7, 2008
- 3M Innovative Properties Company
- Patricia M. Savu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Fluorine-containing water-soluble nonionic surface-active compounds...
- Publication number 20050170989
- Publication date Aug 4, 2005
- DAIKIN INDUSTRIES, LTD.
- Kouji Nagashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antistatic conductive grid pattern with integral logo
- Publication number 20050069683
- Publication date Mar 31, 2005
- Eastman Kodak Company
- Peter T. Aylward
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Transparent invisible conductive grid
- Publication number 20050064154
- Publication date Mar 24, 2005
- Eastman Kodak Company
- Peter T. Aylward
- G02 - OPTICS
Information Patent Application
Conductive and roughening layer
- Publication number 20040170934
- Publication date Sep 2, 2004
- Debasis Majumdar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silver halide photographic light-sensitive material
- Publication number 20040002024
- Publication date Jan 1, 2004
- Terukazu Yanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILVER HALIDE PHOTOGRAPHIC PHOTOSENSITIVE MATERIAL
- Publication number 20030235793
- Publication date Dec 25, 2003
- Katsuhiko Kanazawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Conductive and roughening layer
- Publication number 20030059602
- Publication date Mar 27, 2003
- Debasis Majumdar
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polyoxyalkylene ammonium salts and their use as antistatic agents
- Publication number 20030054172
- Publication date Mar 20, 2003
- 3M Innovative Properties Company
- Patricia M. Savu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Polyalkylene oxides

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polyoxyalkylene ammonium salts and their use as antistatic agents

Polyoxyalkylene ammonium salts and their use as antistatic agents

Fluorine-containing water-soluble nonionic surface-active compounds...

Antistatic conductive grid pattern with integral logo

Transparent invisible conductive grid

Silver halide photographic light-sensitive material

Conductive and roughening layer

Silver halide photographic photosensitive material

Bis-poly(ethylene oxide) surfactants and their use as antistats in...

Method of adjusting conductivity after processing of photographs

Conductive and roughening layer

Primer layer for photographic element

Antistatic layer with smectite clay and an interpolymer containing...

Coating compositions for photographic paper

Poly(ethylene oxide) and alkali metal salt antistatic backing layer...

Silver halide photographic material having improved antistatic prop...

Silver halide photographic material

Silver halide photographic light-sensitive material

Ternary surfactant system to reduce static in photographic silver h...

Silver halide photographic materials and method for manufacture the...

Silver halide photographic element

Antistatic layer containing hydrophobic polymer particles and condu...

Silver halide photographic material containing antistatic agents

Silver halide photographic materials

Silver halide photographic material comprising a protective layer c...

Silver halide photographic light-sensitive materials

Sheet or web carrying an antistatic layer

Antistatic polymeric article

Process of making a photographic elements comprising protective lay...

Photographic light-sensitive material having improved antistaticity

Patents Applicationslast 30 patents

POLYOXYALKYLENE AMMONIUM SALTS AND THEIR USE AS ANTISTATIC AGENTS

POLYOXYALKYLENE AMMONIUM SALTS AND THEIR USE AS ANTISTATIC AGENTS

Fluorine-containing water-soluble nonionic surface-active compounds...

Antistatic conductive grid pattern with integral logo

Transparent invisible conductive grid

Conductive and roughening layer

Silver halide photographic light-sensitive material

SILVER HALIDE PHOTOGRAPHIC PHOTOSENSITIVE MATERIAL

Conductive and roughening layer

Polyoxyalkylene ammonium salts and their use as antistatic agents