Radiation imagery chemistry: process, composition, or product thereof

Industry

US Classification
430

US Patent Classification (USPC) is no longer used by USPTO since June 2015. Please refer to similar CPC classifications / industries.

Current Industry

430Radiation imagery chemistry

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Toner
- Patent number 9,040,216
- Issue date May 26, 2015
- Canon Kabushiki Kaisha
- Kosuke Fukudome
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, patterning process and polymer
- Patent number 9,040,223
- Issue date May 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of improving print performance in flexographic printing plates
- Patent number 9,040,226
- Issue date May 26, 2015
- Chouaib Boukaftane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microstructure manufacturing method
- Patent number 9,040,227
- Issue date May 26, 2015
- Canon Kabushiki Kaisha
- Takayuki Teshima
- G02 - OPTICS
Information Patent Grant
Resist ink and method of forming pattern using the same
- Patent number 9,040,230
- Issue date May 26, 2015
- LG Display Co., Ltd.
- Sung-Hee Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for pattern formation, method and composition for resist und...
- Patent number 9,040,232
- Issue date May 26, 2015
- JSR Corporation
- Shin-ya Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mask and method of manufacturing a substrate using the mask
- Patent number 9,040,211
- Issue date May 26, 2015
- Samsung Display Co., Ltd.
- Chang-Soon Jang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Endpoint detection for photolithography mask repair
- Patent number 9,040,212
- Issue date May 26, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Carrier, two-component developer using the same, and image-forming...
- Patent number 9,040,217
- Issue date May 26, 2015
- Sharp Kabushiki Kaisha
- Kazuki Takatsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, multi-layered resist pattern, multi-layered...
- Patent number 9,040,231
- Issue date May 26, 2015
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,041,909
- Issue date May 26, 2015
- Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Minghung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, photosensitive resin fil...
- Patent number 9,040,213
- Issue date May 26, 2015
- Cheil Industries Inc.
- Hyun-Yong Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amine compound, electrophotographic photoconductor, image forming m...
- Patent number 9,040,215
- Issue date May 26, 2015
- Ricoh Company, Ltd.
- Tomoyuki Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Maskless process for pre-tilting liquid crystal molecules
- Patent number 9,040,229
- Issue date May 26, 2015
- Kent State University
- Hiroshi Yokoyama
- G02 - OPTICS
Information Patent Grant
Manufacturing method of organic light emitting display device
- Patent number 9,040,320
- Issue date May 26, 2015
- LG Display Co., Ltd.
- Jae Hyun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution of gallium phthalocyanine method for preparing the same me...
- Patent number 9,040,218
- Issue date May 26, 2015
- Canon Kabushiki Kaisha
- Tsutomu Nishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,040,221
- Issue date May 26, 2015
- JSR Corporation
- Hitoshi Osaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 9,040,225
- Issue date May 26, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming patterns of semiconductor device by using mixed...
- Patent number 9,040,228
- Issue date May 26, 2015
- SK hynix Inc.
- Jeon Kyu Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrophotographic photosensitive member, process cartridge and el...
- Patent number 9,040,214
- Issue date May 26, 2015
- Canon Kabushiki Kaisha
- Atsushi Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image forming material, planographic printing plate precursor, and...
- Patent number 9,040,219
- Issue date May 26, 2015
- FUJIFILM Corporation
- Yoshinori Taguchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Polymerizable tertiary ester compound, polymer, resist composition,...
- Patent number 9,040,222
- Issue date May 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,040,224
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Electrophotography toner
- Patent number 9,034,547
- Issue date May 19, 2015
- Samsung Electronics Co., Ltd.
- Hae-ree Joo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carrier core particles for electrophotographic developer, carrier f...
- Patent number 9,034,552
- Issue date May 19, 2015
- Dowa Electronics Materials Co., Ltd.
- Tomohide Iida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,034,558
- Issue date May 19, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,034,559
- Issue date May 19, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition and cured film forming me...
- Patent number 9,034,440
- Issue date May 19, 2015
- FUJIFILM Corporation
- Satoshi Takita
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method for producing cleaning blade
- Patent number 9,037,069
- Issue date May 19, 2015
- Canon Kabushiki Kaisha
- Masahiro Watabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION
- Publication number 20150147685
- Publication date May 28, 2015
- Wasatch Photonics, Inc.
- Gerald L. Heidt
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER
- Publication number 20150147693
- Publication date May 28, 2015
- Canon Kabushiki Kaisha
- Keiko Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150147688
- Publication date May 28, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20150147698
- Publication date May 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150147699
- Publication date May 28, 2015
- FUJIFILM CORPORATION
- Sou KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING NANOANTENNA ARRAY, NANOANTENNA ARRAY CHIP AN...
- Publication number 20150146180
- Publication date May 28, 2015
- Korea Institute of Science and Technology
- Kyeong Seok LEE
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION
- Publication number 20150147684
- Publication date May 28, 2015
- Wasatch Photonics, Inc.
- Gerald L. Heidt
- B82 - NANO-TECHNOLOGY
Information Patent Application
Extreme Ultraviolet Lithography Process and Mask with Reduced Shado...
- Publication number 20150147687
- Publication date May 28, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYCARBONATE COPOLYMER, COATING LIQUID USING SAME, AND ELECTROPHOT...
- Publication number 20150147689
- Publication date May 28, 2015
- Idemitsu Kosan Co., Ltd.
- Kengo Hirata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20150147701
- Publication date May 28, 2015
- Hyun-woo KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20150147702
- Publication date May 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Lithography Process And Mask
- Publication number 20150147686
- Publication date May 28, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD FOR MANUFACTURING...
- Publication number 20150147691
- Publication date May 28, 2015
- Canon Kabushiki Kaisha
- Tsutomu Nishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive Photosensitive Resin Composition, Photosensitive Resin Fil...
- Publication number 20150147694
- Publication date May 28, 2015
- Samsung SDI Co., Ltd.
- Ji-Yun KWON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIS...
- Publication number 20150147695
- Publication date May 28, 2015
- Sumitomo Chemical Company, Limited
- Mitsuyoshi OCHIAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTOR...
- Publication number 20150147696
- Publication date May 28, 2015
- DAICEL CORPORATION
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20150147697
- Publication date May 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYARYLATECARBONATE CONTAINING PHOTOCONDUCTORS
- Publication number 20150147690
- Publication date May 28, 2015
- Xerox Corporation
- Jin Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LIQUID DEVELOPER, PARTICLES FOR LIQUID DEVELOPER, AND LIQUID DEVELO...
- Publication number 20150147692
- Publication date May 28, 2015
- FUJI XEROX CO., LTD
- Takako KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Black Photosensitive Resin Composition and Light Blocking Layer Usi...
- Publication number 20150147700
- Publication date May 28, 2015
- CHEIL INDUSTRIES INC.
- Hyun-Moo CHOI
- G02 - OPTICS
Information Patent Application
FORMING CONDUCTIVE METAL PATTERN USING REACTIVE POLYMERS
- Publication number 20150140285
- Publication date May 21, 2015
- MARK EDWARD IRVING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Transparent conductive electrodes comprising merged metal nanowires...
- Publication number 20150140287
- Publication date May 21, 2015
- Hakfei Poon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PREPARATION METHOD
- Publication number 20150140267
- Publication date May 21, 2015
- Arkema France
- Christophe Navarro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20150140480
- Publication date May 21, 2015
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER AND METHOD FOR PRODUCIN...
- Publication number 20150140488
- Publication date May 21, 2015
- KYOCERA DOCUMENT SOLUTIONS INC.
- Kohei TERASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20150140497
- Publication date May 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FORMING PATTERNS USING CROSSLINKABLE REACTIVE POLYMERS
- Publication number 20150140481
- Publication date May 21, 2015
- Allan Wexler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROLESS PLATING METHOD
- Publication number 20150140483
- Publication date May 21, 2015
- MARK EDWARD IRVING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE HAVING ANTISTATIC FI...
- Publication number 20150140492
- Publication date May 21, 2015
- Shin-Etsu Polymer Co., Ltd.
- Toshiya Sawai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV MASK FOR USE DURING EUV PHOTOLITHOGRAPHY PROCESSES
- Publication number 20150140477
- Publication date May 21, 2015
- GLOBAL FOUNDRIES Inc.
- Mandeep Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Radiation imagery chemistry: process, composition, or product thereof

Industry

Current Industry

Patents Grantslast 30 patents

Toner

Resist composition, patterning process and polymer

Method of improving print performance in flexographic printing plates

Microstructure manufacturing method

Resist ink and method of forming pattern using the same

Method for pattern formation, method and composition for resist und...

Mask and method of manufacturing a substrate using the mask

Endpoint detection for photolithography mask repair

Carrier, two-component developer using the same, and image-forming...

Compound and method of producing the same, acid generator, resist c...

Pattern forming method, multi-layered resist pattern, multi-layered...

Exposure apparatus and exposure method

Positive photosensitive resin composition, photosensitive resin fil...

Amine compound, electrophotographic photoconductor, image forming m...

Maskless process for pre-tilting liquid crystal molecules

Manufacturing method of organic light emitting display device

Solution of gallium phthalocyanine method for preparing the same me...

Radiation-sensitive resin composition, method for forming resist pa...

Developable bottom antireflective coating composition and pattern f...

Method for forming patterns of semiconductor device by using mixed...

Electrophotographic photosensitive member, process cartridge and el...

Image forming material, planographic printing plate precursor, and...

Polymerizable tertiary ester compound, polymer, resist composition,...

Resist composition, method of forming resist pattern and compound

Electrophotography toner

Carrier core particles for electrophotographic developer, carrier f...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Pattern-forming method, and radiation-sensitive composition

Positive photosensitive resin composition and cured film forming me...

Method for producing cleaning blade

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION

METHOD OF PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD FOR FABRICATING NANOANTENNA ARRAY, NANOANTENNA ARRAY CHIP AN...

SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION

Extreme Ultraviolet Lithography Process and Mask with Reduced Shado...

POLYCARBONATE COPOLYMER, COATING LIQUID USING SAME, AND ELECTROPHOT...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Extreme Ultraviolet Lithography Process And Mask

ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD FOR MANUFACTURING...

Positive Photosensitive Resin Composition, Photosensitive Resin Fil...

RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIS...

METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTOR...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POLYARYLATECARBONATE CONTAINING PHOTOCONDUCTORS

LIQUID DEVELOPER, PARTICLES FOR LIQUID DEVELOPER, AND LIQUID DEVELO...

Black Photosensitive Resin Composition and Light Blocking Layer Usi...

FORMING CONDUCTIVE METAL PATTERN USING REACTIVE POLYMERS

Transparent conductive electrodes comprising merged metal nanowires...

SURFACE PREPARATION METHOD

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER AND METHOD FOR PRODUCIN...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

FORMING PATTERNS USING CROSSLINKABLE REACTIVE POLYMERS

ELECTROLESS PLATING METHOD

CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE HAVING ANTISTATIC FI...

EUV MASK FOR USE DURING EUV PHOTOLITHOGRAPHY PROCESSES