substituted on the ring sulfur atom

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CPC
C07D333/46

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CCHEMISTRY METALLURGY C07Organic chemistry C07DHETEROCYCLIC COMPOUNDS C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom

Current Industry

C07D333/46substituted on the ring sulfur atom

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Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
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- FUJIFILM Corporation
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Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
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Radiation-sensitive resin composition, onium salt compound and meth...
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- JSR Corporation
- Katsuaki Nishikori
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Photoacid generator and photoresist composition including the same
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- Issue date May 18, 2021
- Samsung Electronics Co., Ltd.
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- Taejin Choi
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Salt and photoresist composition containing the same
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- Sumitomo Chemical Company, Limited
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Actinic ray-sensitive or radiation-sensitive resin composition, res...
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- FUJIFILM Corporation
- Ryo Nishio
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Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
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- Ryo Nishio
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Sulfonium salt, resist composition, and patterning process
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Sortilin binding compounds, formulations, and uses thereof
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- Issue date Nov 19, 2019
- University of Florida
- Robert Pleasants Sparks
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Compound useful for manufacturing salacinol, method for manufacturi...
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- Issue date Oct 1, 2019
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- Koki Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators and lithographic resists comprising the same
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- Issue date Jun 4, 2019
- Kenneth E Gonsalves
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Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
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- Issue date Mar 19, 2019
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- Takeshi Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition containing the same
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Information Patent Grant
Amino sulfonyl-based compounds, the preparation method therefor and...
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- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sortilin binding compounds, formulations, and uses thereof
- Patent number 10,085,969
- Issue date Oct 2, 2018
- University of South Florida
- Robert Pleasants Sparks
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Compound useful for manufacturing salacinol, method for manufacturi...
- Patent number 10,059,686
- Issue date Aug 28, 2018
- FUJIFILM Corporation
- Koki Nakamura
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,958,775
- Issue date May 1, 2018
- FUJIFILM Corporation
- Takuya Tsuruta
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Compound, active light sensitive or radiation sensitive resin compo...
- Patent number 9,904,167
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- FUJIFILM Corporation
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Compound useful for manufacturing salacinol, method for manufacturi...
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Information Patent Grant
Onium salt, resist composition, and patterning process
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- Issue date Jul 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
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- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium compounds, their preparation and use
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- Issue date Apr 25, 2017
- BASF SE
- Kazuhiko Kunimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, photoresist composition, and method for produ...
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- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method for producing photoresist pattern
- Patent number 9,575,408
- Issue date Feb 21, 2017
- Sumitomo Chemical Company, Limited
- Mitsuyoshi Ochiai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,551,928
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,523,912
- Issue date Dec 20, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
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- Issue date Nov 22, 2016
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator, chemically amplified resist composition, and p...
- Patent number 9,366,958
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Rosin-derived cationic compounds and polymers
- Patent number 9,357,775
- Issue date Jun 7, 2016
- University of South Carolina
- Chuanbing Tang
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

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ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
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METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
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- FUJIFILM CORPORATION
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210364917
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- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210356862
- Publication date Nov 18, 2021
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200393756
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- FUJIFILM CORPORATION
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RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METH...
- Publication number 20190285983
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- JSR Corporation
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COMPOUND AND PHOTOELECTRIC DEVICE, IMAGE SENSOR AND ELECTRONIC DEVI...
- Publication number 20190131541
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- Samsung Electronics Co., Ltd.
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- H01 - BASIC ELECTRIC ELEMENTS
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20180364571
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COMPOUND USEFUL FOR MANUFACTURING SALACINOL, METHOD FOR MANUFACTURI...
- Publication number 20180327378
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PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME
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- Publication date Feb 1, 2018
- Samsung Electronics Co., Ltd.
- Suk-koo HONG
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COMPOUND USEFUL FOR MANUFACTURING SALACINOL, METHOD FOR MANUFACTURI...
- Publication number 20180009777
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- FUJIFILM CORPORATION
- Koki NAKAMURA
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Information Patent Application
COMPOUND USEFUL FOR MANUFACTURING SALACINOL, METHOD FOR MANUFACTURI...
- Publication number 20170001974
- Publication date Jan 5, 2017
- FUJIFILM CORPORATION
- Koki NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20160349612
- Publication date Dec 1, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
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ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20160320698
- Publication date Nov 3, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
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PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160124304
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- Rohm and Haas Electronic Materials, L.L.C.
- Mingqi Li
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COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPO...
- Publication number 20160116840
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- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
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PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
- Publication number 20150301449
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- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
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ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150277225
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- FUJIFILM CORPORATION
- MASAFUMI KOJIMA
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
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- Akiyoshi GOTO
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Rosin-Derived Cationic Compounds and Polymers
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- Publication date Mar 12, 2015
- Chuanbing Tang
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
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SULFONIUM COMPOUNDS, THEIR PREPARATION AND USE
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Photoacid Generators And Lithographic Resists Comprising The Same
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- University of North Carolina at Charlotte
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Rosin-Derived Cationic Compounds and Polymers
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- Chuanbing Tang
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High Stability Diionic Liquid Salts
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- Sigma-Aldrich Co. LLC
- DANIEL W. ARMSTRONG
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
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CYCLIC SULFONIUM SALT, PROCESS FOR PRODUCTION OF SAME, AND alpha-GL...
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- DIABETYM CO., LTD.
- Osamu Muraoka
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
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SULFONIUM SULFATES, THEIR PREPARATION AND USE
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COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
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- C07 - ORGANIC CHEMISTRY

substituted on the ring sulfur atom

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Radiation-sensitive resin composition, onium salt compound and meth...

Photoacid generator and photoresist composition including the same

Compound and photoelectric device, image sensor and electronic devi...

Salt and photoresist composition containing the same

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Sulfonium salt, resist composition, and patterning process

Sortilin binding compounds, formulations, and uses thereof

Compound useful for manufacturing salacinol, method for manufacturi...

Photoacid generators and lithographic resists comprising the same

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Salt and photoresist composition containing the same

Amino sulfonyl-based compounds, the preparation method therefor and...

Sortilin binding compounds, formulations, and uses thereof

Compound useful for manufacturing salacinol, method for manufacturi...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Compound, active light sensitive or radiation sensitive resin compo...

Compound useful for manufacturing salacinol, method for manufacturi...

Onium salt, resist composition, and patterning process

Sulfonium salt, chemically amplified resist composition, and patter...

Sulfonium compounds, their preparation and use

Salt, acid generator, photoresist composition, and method for produ...

Photoresist composition and method for producing photoresist pattern

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Acid generators and photoresists comprising same

Photoacid generator, chemically amplified resist composition, and p...

Rosin-derived cationic compounds and polymers

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METH...

COMPOUND AND PHOTOELECTRIC DEVICE, IMAGE SENSOR AND ELECTRONIC DEVI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

COMPOUND USEFUL FOR MANUFACTURING SALACINOL, METHOD FOR MANUFACTURI...

PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME

COMPOUND USEFUL FOR MANUFACTURING SALACINOL, METHOD FOR MANUFACTURI...

COMPOUND USEFUL FOR MANUFACTURING SALACINOL, METHOD FOR MANUFACTURI...

SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPO...

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

Rosin-Derived Cationic Compounds and Polymers

SULFONIUM COMPOUNDS, THEIR PREPARATION AND USE

Photoacid Generators And Lithographic Resists Comprising The Same

Rosin-Derived Cationic Compounds and Polymers

High Stability Diionic Liquid Salts

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

CYCLIC SULFONIUM SALT, PROCESS FOR PRODUCTION OF SAME, AND alpha-GL...

SULFONIUM SULFATES, THEIR PREPARATION AND USE

COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND