Tandems

Industry

CPC
H05H5/063

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Parent Industries

HELECTRICITY H05Electric techniques H05HPLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS H05H5/00Direct voltage accelerators Accelerators using single pulses

Current Industry

H05H5/063Tandems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems, devices, and methods for ion beam modulation
- Patent number 12,154,750
- Issue date Nov 26, 2024
- TAE TECHNOLOGIES, INC.
- Vladislav Vekselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, devices, and methods for high quality ion beam formation
- Patent number 12,070,625
- Issue date Aug 27, 2024
- TAE TECHNOLOGIES, INC.
- Alexander Dunaevsky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems, devices, and methods for deformation reduction and resista...
- Patent number 12,035,457
- Issue date Jul 9, 2024
- TAE TECHNOLOGIES, INC.
- Sergey Y. Taskaev
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems, devices, and methods for high quality ion beam formation
- Patent number 11,524,179
- Issue date Dec 13, 2022
- TAE TECHNOLOGIES, INC.
- Alexander Dunaevsky
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Functional membrane for ion beam transmission, beam line device and...
- Patent number 11,051,390
- Issue date Jun 29, 2021
- Japan Atomic Energy Agency
- Natsuko Fujita
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrode, accelerator column and ion implantation apparatus includ...
- Patent number 9,807,864
- Issue date Oct 31, 2017
- Varian Semiconductor Equipment Associates Inc.
- Christopher Lupoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cold stripper for high energy ion implanter with tandem accelerator
- Patent number 9,520,204
- Issue date Dec 13, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Bias electrodes for tandem accelerator
- Patent number 9,281,165
- Issue date Mar 8, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR HIGH QUALITY ION BEAM FORMATION
- Publication number 20230249002
- Publication date Aug 10, 2023
- TAE TECHNOLOGIES, INC.
- Alexander Dunaevsky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ION BEAM MODULATION
- Publication number 20220084774
- Publication date Mar 17, 2022
- TAE TECHNOLOGIES, INC.
- Vladislav Vekselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR HIGH QUALITY ION BEAM FORMATION
- Publication number 20210138273
- Publication date May 13, 2021
- TAE TECHNOLOGIES, INC.
- Alexander Dunaevsky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FUNCTIONAL MEMBRANE FOR ION BEAM TRANSMISSION, BEAM LINE DEVICE USI...
- Publication number 20200029417
- Publication date Jan 23, 2020
- JAPAN ATOMIC ENERGY AGENCY
- Natsuko Fujita
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
BIAS ELECTRODES FOR TANDEM ACCELERATOR
- Publication number 20160064186
- Publication date Mar 3, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLD STRIPPER FOR HIGH ENERGY ION IMPLANTER WITH TANDEM ACCELERATOR
- Publication number 20150187450
- Publication date Jul 2, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems, devices, and methods for ion beam modulation

Systems, devices, and methods for high quality ion beam formation

Systems, devices, and methods for deformation reduction and resista...

Systems, devices, and methods for high quality ion beam formation

Functional membrane for ion beam transmission, beam line device and...

Electrode, accelerator column and ion implantation apparatus includ...

Cold stripper for high energy ion implanter with tandem accelerator

Bias electrodes for tandem accelerator

Patents Applicationslast 30 patents

SYSTEMS, DEVICES, AND METHODS FOR HIGH QUALITY ION BEAM FORMATION

SYSTEMS, DEVICES, AND METHODS FOR ION BEAM MODULATION

SYSTEMS, DEVICES, AND METHODS FOR HIGH QUALITY ION BEAM FORMATION

FUNCTIONAL MEMBRANE FOR ION BEAM TRANSMISSION, BEAM LINE DEVICE USI...

BIAS ELECTRODES FOR TANDEM ACCELERATOR

COLD STRIPPER FOR HIGH ENERGY ION IMPLANTER WITH TANDEM ACCELERATOR