the product being a semiconductor or solid state device or parts thereof

Industry

CPC
Y02P70/605

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y02Climate change prevention Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products

Current Industry

Y02P70/605the product being a semiconductor or solid state device or parts thereof

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method for operation instability detection in a surface wave plasma...
- Patent number 10,651,017
- Issue date May 12, 2020
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump with abatement function
- Patent number 10,641,272
- Issue date May 5, 2020
- Ebara Corporation
- Koichi Iwasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum pump with abatement function
- Patent number 10,641,256
- Issue date May 5, 2020
- Ebara Corporation
- Hiroki Furuta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for realizing a system for recovering heat, in particular b...
- Patent number 10,510,941
- Issue date Dec 17, 2019
- STMicroelectronics S.r.l.
- Giovanni Abagnale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement and strip process chamber in a dual loadlock configuration
- Patent number 10,453,694
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Jared Ahmad Lee
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Device and method for exhaust gas treatment on CVD reactor
- Patent number 10,329,668
- Issue date Jun 25, 2019
- Aixtron SE
- Patrick Franken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for preparing recycled abrasive slurry
- Patent number 10,266,725
- Issue date Apr 23, 2019
- Konica Minolta, Inc.
- Chie Inui
- B24 - GRINDING POLISHING
Information Patent Grant
Method for preventing explosion of exhaust gas in decompression pro...
- Patent number 10,168,049
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Chamber cleaning and semiconductor etching gases
- Patent number 10,109,496
- Issue date Oct 23, 2018
- THE CHEMOURS COMPANY FC, LLC
- Sheng Peng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Trap mechanism, exhaust system, and film formation device
- Patent number 10,036,090
- Issue date Jul 31, 2018
- Tokyo Electron Limited
- Eiichi Komori
- B08 - CLEANING
Information Patent Grant
Trap assembly in film forming apparatus
- Patent number 9,896,761
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate detaching method
- Patent number 9,831,112
- Issue date Nov 28, 2017
- Tokyo Electron Limited
- Shingo Koiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust system
- Patent number 9,702,285
- Issue date Jul 11, 2017
- Tokyo Electron Limited
- Kiyoto Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Salicide process
- Patent number 8,815,738
- Issue date Aug 26, 2014
- United Microelectronics Corp.
- Chia-Chang Hsu
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Processes and systems for engineering a silicon-type surface for se...
- Patent number 8,747,960
- Issue date Jun 10, 2014
- Lam Research Corporation
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target object processing system and method of controlling the same
- Patent number 8,612,038
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Kenichi Kobayashi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,591,224
- Issue date Nov 26, 2013
- Tokyo Electron Limited
- Kim Dong-Hun
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Dry etching method of silicon compound film
- Patent number 8,394,686
- Issue date Mar 12, 2013
- Casio Computer Co., Ltd.
- Hisao Tosaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Metal recovery method, metal recovery apparatus, gas exhaust system...
- Patent number 8,349,283
- Issue date Jan 8, 2013
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber isolation valve RF grounding
- Patent number 8,327,878
- Issue date Dec 11, 2012
- Applied Materials, Inc.
- Ke Ling Lee
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
CVD apparatus and method of cleaning the CVD apparatus
- Patent number 8,277,560
- Issue date Oct 2, 2012
- National Institute of Advanced Industrial Science and Technology
- Katsuo Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wiring substrate, semiconductor device and manufacturing method the...
- Patent number 8,102,005
- Issue date Jan 24, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Hiroko Yamamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for generating gas plasma, gas composition for generating...
- Patent number 8,083,892
- Issue date Dec 27, 2011
- Samsung Electronics Co., Ltd.
- Young-Min Min
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Film formation apparatus and method for using the same
- Patent number 8,080,109
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust trap device
- Patent number 8,057,564
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Norihiko Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust assembly for a plasma processing system
- Patent number 8,012,305
- Issue date Sep 6, 2011
- Tokyo Electron Limited
- Hiroyuki Takahashi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Composition useful to chemical mechanical planarization of metal
- Patent number 7,931,714
- Issue date Apr 26, 2011
- Uwiz Technology Co., Ltd.
- Songyuan Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling semiconductor manufacturing appar...
- Patent number 7,885,728
- Issue date Feb 8, 2011
- Seiko Epson Corporation
- Tetsu Tomine
- G05 - CONTROLLING REGULATING
Information Patent Grant
Radical generating method, etching method and apparatus for use in...
- Patent number 7,875,199
- Issue date Jan 25, 2011
- Showa Denko K.K.
- Toshio Goto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Utility apparatus and utility method of substrate processing apparatus
- Patent number 7,758,341
- Issue date Jul 20, 2010
- SNF Solutions, Co., Ltd.
- Kim Dong-Hun
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
PROCESS FOR REALIZING A SYSTEM FOR RECOVERING HEAT, IN PARTICULAR B...
- Publication number 20200161528
- Publication date May 21, 2020
- STMicroelectronics S.r.l.
- Sebastiano Ravesi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION
- Publication number 20200027742
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber Cleaning and Semiconductor Etching Gases
- Publication number 20190027375
- Publication date Jan 24, 2019
- THE CHEMOURS COMPANY FC, LLC
- Sheng Peng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chamber Cleaning and Semiconductor Etching Gases
- Publication number 20180366339
- Publication date Dec 20, 2018
- THE CHEMOURS COMPANY FC, LLC
- Sheng Peng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU GENERATION OF THE MOLECULAR ETCHER CARBONYL FLUORIDE OR ANY...
- Publication number 20140060571
- Publication date Mar 6, 2014
- Matheson Tri-Gas, Inc.
- Glenn Mitchell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SALICIDE PROCESS
- Publication number 20140017888
- Publication date Jan 16, 2014
- United Microelectronics Corp.
- Chia-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION
- Publication number 20130337655
- Publication date Dec 19, 2013
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTANTIALLY NON-OXIDIZING PLASMA TREATMENT DEVICES AND PROCESSES
- Publication number 20130248113
- Publication date Sep 26, 2013
- LAM RESEARCH CORPORATION
- Phillip Geissbûhler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND POWER SOURCE MANAGEMENT METHOD
- Publication number 20130178971
- Publication date Jul 11, 2013
- Koji Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT SINK AND A METHOD FOR MAKING THE SAME
- Publication number 20130160982
- Publication date Jun 27, 2013
- Tsung-Hsien Huang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING WORKPIECE TEMPERATURE
- Publication number 20120317993
- Publication date Dec 20, 2012
- ADVANCED ION BEAM TECHNOLOGY, INC.
- RICHARD F. MCRAY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL RECOVERY METHOD, METAL RECOVERY APPARATUS, GAS EXHAUST SYSTEM...
- Publication number 20110206585
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR REALIZING A SYSTEM FOR RECOVERING HEAT, IN PARTICULAR B...
- Publication number 20110155201
- Publication date Jun 30, 2011
- STMicroelectronics S.r.l.
- Giovanni ABAGNALE
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Substantially Non-Oxidizing Plasma Treatment Devices and Processes
- Publication number 20110136346
- Publication date Jun 9, 2011
- Axcelis Technologies, Inc.
- Phillip Geissbühler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
EXHAUST SYSTEM STRUCTURE OF FILM FORMATION APPARATUS, FILM FORMATIO...
- Publication number 20110020544
- Publication date Jan 27, 2011
- TOKYO ELECTRON LIMITED
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating semicoductor wafers applicable to integrated...
- Publication number 20110011838
- Publication date Jan 20, 2011
- Shu-Ling Kuo
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET OBJECT PROCESSING SYSTEM AND METHOD OF CONTROLLING THE SAME
- Publication number 20100292809
- Publication date Nov 18, 2010
- TOKYO ELECTRON LIMITED
- Kenichi Kobayashi
- G05 - CONTROLLING REGULATING
Information Patent Application
BANDGAP ENGINEERED MOS-GATED POWER TRANSISTORS
- Publication number 20100244127
- Publication date Sep 30, 2010
- Ihsiu Ho
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20100183807
- Publication date Jul 22, 2010
- Dong-Hun Kim
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING SEMICONDUCTOR MANUFACTURING APPAR...
- Publication number 20100138076
- Publication date Jun 3, 2010
- SEIKO EPSON CORPORATION
- Tetsu TOMINE
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND APPARATUS FOR RECOVERING HEAT FROM PROCESSING SYSTEMS
- Publication number 20100096110
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Andreas Neuber
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PATTERN FORMING METHOD AND PATTERN FORM
- Publication number 20100086877
- Publication date Apr 8, 2010
- Toppan Printing Co., Ltd.
- Munehisa Soma
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
DRY ETCHING METHOD OF SILICON COMPOUND FILM
- Publication number 20100075491
- Publication date Mar 25, 2010
- CASIO COMPUTER CO., LTD.
- Hisao TOSAKA
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Apparatus for generating gas plasma, gas composition for generating...
- Publication number 20090229758
- Publication date Sep 17, 2009
- Young-Min Min
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
EXHAUST TRAP DEVICE
- Publication number 20090211213
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Norihiko Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TERNARY AZEOTROPIC-LIKE COMPOSITIONS WITH 1,1,1,2,3,3-HEXAFLUORO-3-...
- Publication number 20090186799
- Publication date Jul 23, 2009
- 3M Innovative Properties Company
- John G. OWENS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS AND MANUFACTURING METHOD
- Publication number 20090186569
- Publication date Jul 23, 2009
- SEIKO EPSON CORPORATION
- Masao Miura
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Wiring Substrate, Semiconductor Device and Manufacturing Method The...
- Publication number 20090179230
- Publication date Jul 16, 2009
- Semiconductor Energy Laboratory Co., Ltd
- Hiroko Yamamoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20090145555
- Publication date Jun 11, 2009
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20090114155
- Publication date May 7, 2009
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the product being a semiconductor or solid state device or parts thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for operation instability detection in a surface wave plasma...

Vacuum pump with abatement function

Vacuum pump with abatement function

Process for realizing a system for recovering heat, in particular b...

Abatement and strip process chamber in a dual loadlock configuration

Device and method for exhaust gas treatment on CVD reactor

Method for preparing recycled abrasive slurry

Method for preventing explosion of exhaust gas in decompression pro...

Chamber cleaning and semiconductor etching gases

Trap mechanism, exhaust system, and film formation device

Trap assembly in film forming apparatus

Substrate processing apparatus and substrate detaching method

Exhaust system

Salicide process

Processes and systems for engineering a silicon-type surface for se...

Target object processing system and method of controlling the same

Substrate processing apparatus and substrate processing method

Dry etching method of silicon compound film

Metal recovery method, metal recovery apparatus, gas exhaust system...

Chamber isolation valve RF grounding

CVD apparatus and method of cleaning the CVD apparatus

Wiring substrate, semiconductor device and manufacturing method the...

Apparatus for generating gas plasma, gas composition for generating...

Film formation apparatus and method for using the same

Exhaust trap device

Exhaust assembly for a plasma processing system

Composition useful to chemical mechanical planarization of metal

Method and system for controlling semiconductor manufacturing appar...

Radical generating method, etching method and apparatus for use in...

Utility apparatus and utility method of substrate processing apparatus

Patents Applicationslast 30 patents

PROCESS FOR REALIZING A SYSTEM FOR RECOVERING HEAT, IN PARTICULAR B...

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

Chamber Cleaning and Semiconductor Etching Gases

Chamber Cleaning and Semiconductor Etching Gases

IN-SITU GENERATION OF THE MOLECULAR ETCHER CARBONYL FLUORIDE OR ANY...

SALICIDE PROCESS

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

SUBSTANTIALLY NON-OXIDIZING PLASMA TREATMENT DEVICES AND PROCESSES

SUBSTRATE PROCESSING APPARATUS AND POWER SOURCE MANAGEMENT METHOD

HEAT SINK AND A METHOD FOR MAKING THE SAME

APPARATUS AND METHOD FOR CONTROLLING WORKPIECE TEMPERATURE

METAL RECOVERY METHOD, METAL RECOVERY APPARATUS, GAS EXHAUST SYSTEM...

PROCESS FOR REALIZING A SYSTEM FOR RECOVERING HEAT, IN PARTICULAR B...

Substantially Non-Oxidizing Plasma Treatment Devices and Processes

EXHAUST SYSTEM STRUCTURE OF FILM FORMATION APPARATUS, FILM FORMATIO...

Method for fabricating semicoductor wafers applicable to integrated...

TARGET OBJECT PROCESSING SYSTEM AND METHOD OF CONTROLLING THE SAME

BANDGAP ENGINEERED MOS-GATED POWER TRANSISTORS

Substrate processing apparatus and substrate processing method

METHOD AND SYSTEM FOR CONTROLLING SEMICONDUCTOR MANUFACTURING APPAR...

METHODS AND APPARATUS FOR RECOVERING HEAT FROM PROCESSING SYSTEMS

PATTERN FORMING METHOD AND PATTERN FORM

DRY ETCHING METHOD OF SILICON COMPOUND FILM

Apparatus for generating gas plasma, gas composition for generating...

EXHAUST TRAP DEVICE

TERNARY AZEOTROPIC-LIKE COMPOSITIONS WITH 1,1,1,2,3,3-HEXAFLUORO-3-...

SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS AND MANUFACTURING METHOD

Wiring Substrate, Semiconductor Device and Manufacturing Method The...

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...