Wavelength of 200 nanometers or less

Industry

CPC
Y10S522/914

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series

Current Industry

Y10S522/914Wavelength of 200 nanometers or less

Industries

Patents Grantslast 30 patents

Information Patent Grant
Autoxidisable architectural coating compositions
- Patent number 7,767,727
- Issue date Aug 3, 2010
- Imperial Chemical Industries PLC
- Philip Louis Taylor
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Enabling chain scission of branched photoresist
- Patent number 7,166,413
- Issue date Jan 23, 2007
- Intel Corporation
- Heidi B. Cao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Enabling chain scission of branched photoresist
- Patent number 6,872,505
- Issue date Mar 29, 2005
- Intel Corporation
- Heidi B. Cao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing phenylmaleimide derivative, polymer, chemically...
- Patent number 6,746,722
- Issue date Jun 8, 2004
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of perfluorooligoether iodides
- Patent number 5,288,376
- Issue date Feb 22, 1994
- Shin-Etsu Chemical Co., Ltd.
- Masayuki Oyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive epoxy resins and use thereof
- Patent number 4,933,398
- Issue date Jun 12, 1990
- Ciba-Geigy Corporation
- Walter Fischer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for making a reverse image using a pigmented peel-apart pho...
- Patent number 4,923,780
- Issue date May 8, 1990
- E. I. Du Pont de Nemours and Company
- Harvey W. Taylor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the photochemical vapor deposition of siloxane polymers
- Patent number 4,781,942
- Issue date Nov 1, 1988
- Hughes Aircraft Company
- Richard N. Leyden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet light assisted fluorination of polymer surfaces
- Patent number 4,593,050
- Issue date Jun 3, 1986
- Massachusetts Institute of Technology
- Robert E. Cohen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
3912607
- Patent number 3,912,607
- Issue date Oct 14, 1975
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
Autoxidisable Architectural Coating Compositions
- Publication number 20080188584
- Publication date Aug 7, 2008
- Philip Louis Taylor
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Enabling chain scission of branched photoresist
- Publication number 20050106498
- Publication date May 19, 2005
- Heidi B. Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENABLING CHAIN SCISSION OF BRANCHED PHOTORESIST
- Publication number 20050058931
- Publication date Mar 17, 2005
- Heidi B. Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-containing phenylmaleimide derivative, polymer, chemically...
- Publication number 20030036618
- Publication date Feb 20, 2003
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Wavelength of 200 nanometers or less

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Autoxidisable architectural coating compositions

Enabling chain scission of branched photoresist

Enabling chain scission of branched photoresist

Fluorine-containing phenylmaleimide derivative, polymer, chemically...

Preparation of perfluorooligoether iodides

Photosensitive epoxy resins and use thereof

Process for making a reverse image using a pigmented peel-apart pho...

Process for the photochemical vapor deposition of siloxane polymers

Ultraviolet light assisted fluorination of polymer surfaces

3912607

Patents Applicationslast 30 patents

Autoxidisable Architectural Coating Compositions

Enabling chain scission of branched photoresist

ENABLING CHAIN SCISSION OF BRANCHED PHOTORESIST

Fluorine-containing phenylmaleimide derivative, polymer, chemically...