with halogenated phenols

Patents Grantslast 30 patents

  • Information Patent Grant

    Compound, resin, resist composition or radiation-sensitive composit...

    • Patent number 11,572,430
    • Issue date Feb 7, 2023
    • Mitsubishi Gas Chemical Company, Inc.
    • Takumi Toida
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Resist composition, method for forming resist pattern, and polyphen...

    • Patent number 11,480,877
    • Issue date Oct 25, 2022
    • Mitsubishi Gas Chemical Company, Inc.
    • Takumi Toida
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Grant

    Compound, resist composition, and method for forming resist pattern...

    • Patent number 11,256,170
    • Issue date Feb 22, 2022
    • Mitsubishi Gas Chemical Company, Inc.
    • Takumi Toida
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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    Material for forming underlayer film for lithography, composition f...

    • Patent number 11,143,962
    • Issue date Oct 12, 2021
    • Mitsubishi Gas Chemical Company, Inc.
    • Takumi Toida
    • H01 - BASIC ELECTRIC ELEMENTS
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    Compound, resin, and purification method thereof, material for form...

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    • Issue date Aug 18, 2020
    • Mitsubishi Gas Chemical Company, Inc.
    • Takumi Toida
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Resist material, resist composition and method for forming resist p...

    • Patent number 10,437,148
    • Issue date Oct 8, 2019
    • Mitsubishi Gas Chemical Company, Inc.
    • Takumi Toida
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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    Material for forming film for lithography, composition for forming...

    • Patent number 10,310,377
    • Issue date Jun 4, 2019
    • Mitsubishi Gas Chemical Company, Inc.
    • Takashi Makinoshima
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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    Resist overlayer film forming composition for lithography and metho...

    • Patent number 9,746,768
    • Issue date Aug 29, 2017
    • Nissan Chemical Industries, Ltd.
    • Ryuji Ohnishi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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    Novolak resin containing hexafluoroisopropanol group, method for pr...

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    • Central Glass Company, Limited
    • Junya Nakatsuji
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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    Coating liquid for coating glass fiber and rubber-reinforcing glass...

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    • Central Glass Company, Limited
    • Katsuhiko Ogaki
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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    Coated sand composition and method for producing same

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    • Sumitomo Durez Company, Ltd.
    • Yukio Saeki
    • B22 - CASTING POWDER METALLURGY
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    Removal of sulfuric acid compounds

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    • Hoechst Aktiengesellschaft
    • Albert Jung
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    3672935

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    • Issue date Jun 27, 1972
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    3672886

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    3663256

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    3606988

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    3546147

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    3448078

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    3151096

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    • C07 - ORGANIC CHEMISTRY
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    2995536

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    2811566

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    • C07 - ORGANIC CHEMISTRY
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    2428358

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    2399735

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    1793311

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Patents Applicationslast 30 patents