Claims
- 1. A compound of the formula: ##SPC31##
- wherein R.sub.3 is selected from the group consisting of hydrogen, fluoro, lower alkyl, hydroxy, benzoyloxy and lower alkanoyloxy; R.sub.6 is selected from the group consisting of hydrogen, lower alkyl, hydroxy, benzoyloxy, lower alkanoyloxy and halogen; EO is benzoyloxy, lower alkanoyloxy or free hydroxy; when R.sub.3 and R.sub.6 are hydroxy they may be taken together with an aldehyde or ketone to form an acetal or ketal of the formula: ##EQU3## wherein P is individually selected from the group consisting of hydrogen and lower alkyl; Q is individually selected from the group consisting of lower alkyl, phenyl, phenyl substituted with radicals selected from the group consisting of halogen, lower alkoxy, hydroxy and lower alkyl, phenyl-lower-alkyl or phenyl-lower-alkyl aromatically substituted with radicals selected from the group consisting of halogen, lower alkoxy, hydroxy and lower alkylcyano; and P and Q taken together are lower alkylene; R.sub.5 is selected from the group consisting of hydrogen and halogen; X is a substituent in the 6-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio and lower alkanoylthio or a substituent in the 7-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio, lower alkanoylthio and halogen.
- 2. A compound according to claim 1 wherein P and Q taken together are lower alkylene.
- 3. A compound of the formula: ##SPC32##
- wherein R.sub.3 is selected from the group consisting of hydrogen, fluoro, lower alkyl, hydroxy, benzoyloxy, and lower alkanoyl; R.sub.6 is selected from the group consisting of hydrogen, lower alkyl, hydroxy, lower alkoxy, benzyloxy, benzhydryloxy, trityloxy, allyloxy, tetrahydropyranyloxy and halogen; EO is selected from the group consisting of benzoyloxy, lower alkanoyl, and hydroxy; and X is a substituent in the 6-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio and lower alkanoylthio or a substituent in the 7-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio, lower alkanoylthio and halogen.
- 4. A compound of the formula: ##SPC33##
- wherein R.sub.3 is selected from the group consisting of hydrogen, fluoro, lower alkyl, hydroxy, benzoyloxy, and lower alkanoyl; EO is selected from the group consisting of benzoyloxy, lower alkanoyl, and hydroxy; and X is a substituent in the 6-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio and lower alkanoylthio or a substituent in the 7-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio, lower alkanoylthio, and halogen.
- 5. A compound of the formula: ##SPC34##
- wherein R.sub.3 is selected from the group consisting of hydrogen, fluoro, lower alkyl, hydroxy, benzoyloxy, and lower alkanoyl; EO is selected from the group consisting of benzoyloxy, lower alkanoyl and hydroxy; and X is a substituent in the 6-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio and lower alkanoylthio or a substituent in the 7-position selected from the group consisting of hydrogen, lower alkyl, lower alkylthio, lower alkanoylthio, and halogen.
RELATED APPLICATIONS
This application is a continuation of application Ser. No. 306,496, filed November 14, 1972, now U.S. Pat. No. 3,380,831, entitled "11-SUBSTITUTED-DESA-PREGNANES AND DERIVATIVES THEREOF", which is a continuation of application Ser. No. 736,569, filed June 13, 1968, now abandoned, entitled "11-SUBSTITUTED-DESA-PREGNANES AND DERIVATIVES THEREOF", which is a division of application Ser. No. 499,094, filed Oct. 20, 1965, now U.S. Pat. No. 3,574,761, entitled "INTERMEDIATES AND PROCESSES", which is a continuation-in-part of application Ser. No. 400,206, filed Sept. 29, 1964, now U.S. Pat. No. 3,412,107, entitled "INTERMEDIATES AND PROCESSES".
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3138591 |
Nomine et al. |
Jun 1964 |
|
3155660 |
Nomine et al. |
Nov 1964 |
|
3296283 |
Cross |
Jan 1967 |
|
Divisions (1)
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Number |
Date |
Country |
Parent |
499094 |
Oct 1965 |
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Continuations (2)
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Number |
Date |
Country |
Parent |
306496 |
Nov 1972 |
|
Parent |
736569 |
Jun 1968 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
400206 |
Sep 1964 |
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