3390019

Information

• Patent Grant
• 3390019

• References
• Source

• Patent Number

  3,390,019

• Date Filed

  Not available

• Date Issued

  Tuesday, June 25, 1968
  56 years ago

• CPC

  • C30B31/185 - Pattern diffusion
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 065 - Glass manufacturing
  • 257 - Active solid-state devices