Claims
- 1. A compound of the formula II, whereinR1 and R2 are independently selected from an unsubstituted or substituted aromatic group, wherein the substituted aromatic group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; a substituted or unsubstituted aralkyl group, wherein the substituted aralkyl group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; an unsubstituted or substituted alkyl group, wherein the substituted alkyl group may be substituted with one or more halogen, hydroxy, and lower alkoxy; and an unsubstituted or substituted cycloalkyl group, wherein the substituted cycloalkyl group may be substituted with one or more halogen, hydroxy, and lower alkoxy; each R3 and R4 is independently selected from halogen, hydroxy, amino, lower alkyl, lower alkoxy, lower alkenyl, and lower alkynyl, wherein the lower alkyl, lower alkoxy, lower alkenyl and lower alkynyl may be unsubstituted or may be substituted with one or more of halogen, hydroxy, and lower alkoxy; or is a group of the formula Z-(CH2)a—Yb—(CH2)c—Qd—(CH2)e—wherein Y and Q are independently selected from an aromatic group, O, S, —CR═CR—, each R is independently selected from H or lower alkyl, Z is selected from a, c and e are independently selected from values from 0 to 10; b and d are independently selected from 0 and 1, provided that when a=0 then b=0, and when c=0 then d=0; or R3 or R4 may occupy two adjacent positions to form a fused aromatic ring, n and m are independently selected from values between 0 and 4.
- 2. The compound of claim 1, wherein R3 and R4 are independently selected from fluorine or chlorine.
- 3. The compound of claim 1, wherein R3 and R4 are independently selected from hydroxy or methoxy.
- 4. A compound of the formula X wherein R3 is as described for the compound of formula I,R6 is selected from halogen, halogenated methyl, methoxy, and ethoxy; R7 is selected from H, halogen, halogenated methyl, methoxy, and ethoxy; R8 is selected from H, halogen, halogenated methyl, methoxy, and ethoxy, and R9 is selected from H, halogen, halogenated methyl, methoxy, and ethoxy.
- 5. The compound of claim 4, wherein R3 is selected from halogen and lower alkoxy.
- 6. The compound of the claim 5, wherein R7 is hydrogen.
- 7. The compound of claim 6, wherein R6 is fluorine or chlorine, and one of R8 and R9 is a halogen, and the other is hydrogen.
- 8. The compound of claim 7, wherein the halogen is fluorine or chlorine.
- 9. The compound of claim 4, wherein the chemical structure is
- 10. The compound of of claim 4, wherein the chemical structure is
- 11. The compound of of claim 4, wherein the chemical structure is
- 12. The compound of of claim 4, wherein the chemical structure is
- 13. The compound of of claim 4, wherein the chemical structure is
- 14. The compound of of claim 4, wherein the chemical structure is
- 15. The compound of of claim 4, wherein the chemical structure is
- 16. A process for the preparation of a compound of the formula I wherein a compound of the formula (IV) is reacted with a thiol of the formula R1SH, in the presence of a base,wherein R0 in combination with the oxygen atom to which it is attached, forms a leaving group, and wherein R1 is selected from an unsubstituted or substituted aromatic group, wherein the substituted aromatic group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; a substituted or unsubstituted aralkyl group, wherein the substituted aralkyl group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; an unsubstituted or substituted alkyl group, wherein the substituted alkyl group may be substituted with one or more halogen, hydroxy, and lower alkoxy; and an unsubstituted or substituted cycloalkyl group, wherein the substituted cycloalkyl group may be substituted with one or more halogen, hydroxy, and lower alkoxy; R3 is selected from halogen, hydroxy, amino, lower alkyl, lower alkoxy, lower alkenyl, and lower alkynyl, wherein the lower alkyl, lower alkoxy, lower alkenyl and lower alkynyl may be unsubstituted or may be substituted with one or more of halogen, hydroxy, and lower alkoxy; or R3 is a group of the formula Z—(CH2)a—Yb—(CH2)c—Qd—(CH2)e—wherein Y and Q are independently selected from an aromatic group, O, S, —CR═CR—, each R is independently selected from H or lower alkyl, Z is selected from a, c and e are independently selected from values from 0 to 10; b and d are independently selected from 0 and 1, provided that when a=0 then b=0, and when c=0 then d=0; or R3 may occupy two adjacent positions to form a fused aromatic ring, n is selected from values between 0 and 4; R5 is selected from hydrogen, lower alkyl, lower alkenyl, lower alkynyl, and lower aralkyl, each of which may be unsubstituted or substituted with one or more substituents selected from halogen, lower alkyl, and lower alkoxy, thio-lower alkyl C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; or R1 may be a group of the formula whereinR2 is selected from an unsubstituted or substituted aromatic group, wherein the substituted aromatic group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; a substituted or unsubstituted aralkyl group, wherein the substituted aralkyl group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide; an unsubstituted or substituted alkyl group, wherein the substituted alkyl group may be substituted with one or more halogen, hydroxy, and lower alkoxy; and an unsubstituted or substituted cycloalkyl group, wherein the substituted cycloalkyl group may be substituted with one or more halogen, hydroxy, and lower alkoxy; R4 is selected from halogen, hydroxy, amino, lower alkyl, lower alkoxy, lower alkenyl, and lower alkynyl, wherein the lower alkyl, lower alkoxy, lower alkenyl and lower alkynyl may be unsubstituted or may be substituted with one or more of halogen, hydroxy, and lower alkoxy; or R4 is a group of the formula Z—(CH2)a—Yb—(CH2)c—Qd—(CH2)e—wherein Y and Q are independently selected from an aromatic group, O, S, —CR═CR—, each R is independently selected from H or lower alkyl, Z is selected from a, c and e are independently selected from values from 0 to 10; b and d are independently selected from 0 and 1, provided that when a=0 then b=0, and when c=0 then d=0; or R4 may occupy two adjacent positions to form a fused aromatic ring, and, m is selected from values between 0 and 4.
- 17. The process of claim 16, wherein R0 is tosyl and the base is an amine base.
- 18. The process of claim 17, wherein R5 is hydrogen and R1 is an unsubstituted or substituted aromatic group, wherein the substituted aromatic group may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide.
- 19. The process of claim 18, wherein R1 is unsubstituted or substituted phenyl, wherein the substituted phenyl may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide.
- 20. The process of claim 19, wherein R1 is substituted phenyl wherein the substituted phenyl may be substituted with one or more of halogen, hydroxy, lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy, thio-lower alkyl, C1-C8 acyl, lower alkyl ester, amide, and lower alkyl amide.
- 21. The process of claim 20, wherein R1 is substituted phenyl wherein the substituted phenyl may be substituted with one or more of halogen, hydroxy, lower alkyl, and lower alkoxy.
- 22. The process of claim 21, wherein R1 is substituted phenyl wherein the substituted phenyl may be substituted with one or more of halogen and lower alkoxy.
- 23. A process for the preparation of a coumarin dimer of the formula II wherein a compound of the formula V is reacted with a thiol of the formula R1—SH or R2—SH, in the presence of a base, whereinR0, in combination with the oxygen atom to which it is attached, forms a leaving group, R1, R2, R3, R4, R5, n and m are as defined in claim 1, and R1 is the same as R2.
- 24. The process of claim 23, wherein R0 is tosyl and the base is an amine base.
- 25. A process for the preparation of a coumarin dimer of the formula II wherein a compound of the formula V is reacted with a thiol of the formula R1—SH in the presence of a base to give a compound of the formula VI and wherein the compound of the formula VI is further reacted with a thiol of the formula R2—SH in the presence of a base to give a compound of the formula II,whereinR0, in combination with the oxygen atom to which it is attached, forms a leaving group, R1, R2, R3, R4, R5, n and m are as defined in claim 1, and R1 is not the same as R2.
- 26. The process of claim 25, wherein R0 is tosyl and the base is an amine base.
Parent Case Info
This Application claims benefit of Provisional Application 60/380,487 May 14, 2002.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
5563280 |
Alvarado et al. |
Oct 1996 |
A |
5681968 |
Alvarado et al. |
Oct 1997 |
A |
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/380487 |
May 2002 |
US |