GS0071: plasma etching and plasma deposition machines used in the fabrication of semiconductor devices and in the fabrication of related electronic components
PM0000: VERSA LOCK PHOTO MASK ETCHER 2
Case File Event Statements
4/3/2001 - 23 years ago
12 - ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSEType:ABN2
7/12/2000 - 24 years ago
11 - NON-FINAL ACTION MAILEDType:CNRT
6/21/2000 - 24 years ago
10 - ASSIGNED TO EXAMINERType:DOCK
6/15/2000 - 24 years ago
9 - STATEMENT OF USE PROCESSING COMPLETEType:SUPC
4/21/2000 - 24 years ago
8 - USE AMENDMENT FILEDType:IUAF
3/28/2000 - 24 years ago
7 - NOA MAILED - SOU REQUIRED FROM APPLICANTType:NOAM
1/4/2000 - 25 years ago
6 - PUBLISHED FOR OPPOSITIONType:PUBO
12/3/1999 - 25 years ago
5 - NOTICE OF PUBLICATIONType:NPUB
9/30/1999 - 25 years ago
4 - APPROVED FOR PUB - PRINCIPAL REGISTERType:CNSA