TREA

76075632 - BARRACUDA

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Information

  • Trademark
  • 76075632
  • Serial Number
    76075632
  • Registration Number
    2648048
  • Filing Date
    June 20, 2000
    24 years ago
  • Registration Date
    November 12, 2002
    22 years ago
  • Transaction Date
    July 28, 2009
    15 years ago
  • Status Date
    June 20, 2009
    15 years ago
  • Published for Opposition Date
    August 20, 2002
    22 years ago
  • Location Date
    January 08, 2008
    17 years ago
  • Status Code
    710
  • Current Location
    SCANNING ON DEMAND
    Employee Name
    HAN, DAWN L
  • Attorney Name
    Robert W. Becker
    Law Office Assigned Location Code
    M50
  • Owners
Information
Mark Drawing Code
1000
Mark Identification
BARRACUDA
Case File Statements
  • GS0071: Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces
  • GS0371: Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces
Case File Event Statements
  • 6/20/2009 - 15 years ago
    16 - CANCELLED SEC. 8 (6-YR) Type: C8..
  • 1/8/2008 - 17 years ago
    15 - CASE FILE IN TICRS Type: CFIT
  • 1/2/2008 - 17 years ago
    14 - ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY Type: ASCK
  • 11/17/2002 - 22 years ago
    13 - TEAS CHANGE OF CORRESPONDENCE RECEIVED Type: TCCA
  • 11/12/2002 - 22 years ago
    12 - REGISTERED-PRINCIPAL REGISTER Type: R.PR
  • 8/20/2002 - 22 years ago
    11 - PUBLISHED FOR OPPOSITION Type: PUBO
  • 7/31/2002 - 22 years ago
    10 - NOTICE OF PUBLICATION Type: NPUB
  • 8/29/2000 - 24 years ago
    9 - SEC. 44(D) CLAIM DELETED Type: 44DD
  • 3/18/2002 - 22 years ago
    8 - APPROVED FOR PUB - PRINCIPAL REGISTER Type: CNSA
  • 3/14/2002 - 22 years ago
    7 - EXAMINERS AMENDMENT MAILED Type: CNEA
  • 3/6/2002 - 22 years ago
    6 - EXAMINERS AMENDMENT MAILED Type: CNEA
  • 12/14/2001 - 23 years ago
    5 - CORRESPONDENCE RECEIVED IN LAW OFFICE Type: CRFA
  • 12/18/2001 - 23 years ago
    4 - CORRESPONDENCE RECEIVED IN LAW OFFICE Type: CRFA
  • 6/14/2001 - 23 years ago
    3 - NON-FINAL ACTION MAILED Type: CNRT
  • 6/12/2001 - 23 years ago
    2 - ASSIGNED TO EXAMINER Type: DOCK
  • 8/29/2000 - 24 years ago
    1 - APPLICANT AMENDMENT PRIOR TO EXAMINATION - ENTERED Type: AMPX