Information
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Trademark
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76218315
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International Classifications
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Filing Date
February 28, 2001
24 years ago
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Transaction Date
June 29, 2005
19 years ago
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Status Date
January 06, 2003
22 years ago
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Location Date
April 09, 2003
22 years ago
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Status Code
601
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Current Location
FILE REPOSITORY (FRANCONIA)
Employee Name
PAPPAS, MATTHEW JAMES
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Attorney Name
ROBERT W. BECKER
Law Office Assigned Location Code
L40
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Owners
Mark Drawing Code
1000
Mark Identification
TRITON
Case File Statements
- GS0071: Machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and solar cells; machines for drying, cleaning or etching silicon wafers for use in the in the manufacture of semiconductor chips; wet processing machines for use manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and machine parts, namely, drying units using nitrogen, alcohol vapors or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, and solar cells
- GS0111: Drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
- GS0371: Installation and servicing of the following machines and units, machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips, and/or solar cells, machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips wafers, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
Case File Event Statements
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1/6/2003 - 22 years ago
10 - ABANDONMENT - EXPRESS MAILED
Type: ABN1
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11/21/2002 - 22 years ago
9 - CORRESPONDENCE RECEIVED IN LAW OFFICE
Type: CRFA
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12/13/2002 - 22 years ago
8 - ASSIGNED TO EXAMINER
Type: DOCK
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7/8/2002 - 22 years ago
7 - TEAS CHANGE OF CORRESPONDENCE RECEIVED
Type: TCCA
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7/3/2002 - 22 years ago
6 - FINAL REFUSAL MAILED
Type: CNFR
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11/21/2001 - 23 years ago
5 - CORRESPONDENCE RECEIVED IN LAW OFFICE
Type: CRFA
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5/7/2001 - 23 years ago
4 - UNRESPONSIVE/DUPLICATE PAPER RECEIVED
Type: UNPR
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5/7/2001 - 23 years ago
3 - Sec. 1(B) CLAIM DELETED
Type: 1.BD
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5/22/2001 - 23 years ago
2 - NON-FINAL ACTION MAILED
Type: CNRT
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5/7/2001 - 23 years ago
1 - ASSIGNED TO EXAMINER
Type: DOCK