Information
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Trademark
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76236977
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Serial Number
76236977
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Registration Number
2558579
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International Classifications
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Filing Date
April 04, 2001
23 years ago
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Registration Date
April 09, 2002
22 years ago
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Transaction Date
February 24, 2009
15 years ago
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Status Date
January 17, 2009
15 years ago
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Published for Opposition Date
January 15, 2002
22 years ago
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Location Date
May 21, 2007
17 years ago
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Status Code
710
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Current Location
SCANNING ON DEMAND
Employee Name
FRYE, KIMBERLY
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Attorney Name
Robert W. Becker
Law Office Assigned Location Code
L40
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Owners
Mark Drawing Code
1000
Mark Identification
KRONOS
Case File Statements
- GS0071: Machines for the manufacture of semiconductor substrates, silicon disks, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation of ozonized water or ozone by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal display, solar cells, as machine parts
- GS0111: Drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
- GS0371: Installation and servicing of the following machines and units; machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
Case File Event Statements
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1/17/2009 - 15 years ago
11 - CANCELLED SEC. 8 (6-YR)
Type: C8..
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1/2/2008 - 17 years ago
10 - ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY
Type: ASCK
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5/21/2007 - 17 years ago
9 - CASE FILE IN TICRS
Type: CFIT
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4/9/2002 - 22 years ago
8 - REGISTERED-PRINCIPAL REGISTER
Type: R.PR
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1/15/2002 - 22 years ago
7 - PUBLISHED FOR OPPOSITION
Type: PUBO
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12/26/2001 - 23 years ago
6 - NOTICE OF PUBLICATION
Type: NPUB
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11/7/2001 - 23 years ago
5 - SEC. 44(D) CLAIM DELETED
Type: 44DD
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8/25/2001 - 23 years ago
4 - APPROVED FOR PUB - PRINCIPAL REGISTER
Type: CNSA
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7/11/2001 - 23 years ago
3 - EXAMINER'S AMENDMENT MAILED
Type: CNEA
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7/5/2001 - 23 years ago
2 - ASSIGNED TO EXAMINER
Type: DOCK
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5/7/2001 - 23 years ago
1 - CORRESPONDENCE RECEIVED IN LAW OFFICE
Type: CRFA