GS0071: Mechanical devices in the nature of manipulators, for handling or transport of semiconductor wafers
GS0091: Hardware and software used to operate systems and devices for thermal processing, namely, diffusion furnaces, continuous furnaces, burn in kilns, vacuum soldering furnaces, coating furnaces, annealing furnaces, enameling ovens, vacuum furnaces, plants for chemical vapor deposition
GS0111: Plants and equipment for thermal processing or manufacturing methods, namely, diffusion furnaces, continuous furnaces, burn in kilns, vacuum soldering furnaces, coating furnaces, annealing furnaces, enameling furnaces, vacuum furnaces, plants for chemical vapor deposition (CVD-plants); systems for processing of semiconductor wafers in vacuum, namely diffusion furnaces, plants for chemical vapor deposition; systems for handling and cleaning of gases and exhaust gases, namely, gas purification plants
Case File Event Statements
7/31/2010 - 14 years ago
16 - CANCELLED SEC. 8 (6-YR)Type:C8..
12/23/2003 - 21 years ago
15 - REGISTERED-PRINCIPAL REGISTERType:R.PR
9/30/2003 - 21 years ago
14 - PUBLISHED FOR OPPOSITIONType:PUBO
9/10/2003 - 21 years ago
13 - NOTICE OF PUBLICATIONType:NPUB
8/9/2003 - 21 years ago
12 - APPROVED FOR PUB - PRINCIPAL REGISTERType:CNSA
7/29/2003 - 21 years ago
11 - NON-FINAL ACTION MAILEDType:CNRT
7/22/2003 - 21 years ago
10 - PREVIOUS ALLOWANCE COUNT WITHDRAWNType:ZZZX
6/16/2003 - 21 years ago
9 - APPROVED FOR PUB - PRINCIPAL REGISTERType:CNSA
4/22/2003 - 21 years ago
8 - CORRESPONDENCE RECEIVED IN LAW OFFICEType:CRFA