78096901 - ACUITY

Information

• Trademark
• 78096901

• Source

• Serial Number

  78096901

• Registration Number

  2770323

• International Classifications

  • 7 - Machines and machine tools
  • 21 - Household or kitchen utensils and containers
  • 40 - Treatment of materials
  • 42 - Scientific and technological services and research and design relating thereto

• Filing Date

  December 06, 2001
  22 years ago

• Registration Date

  September 30, 2003
  21 years ago

• Transaction Date

  July 22, 2011
  13 years ago

• Status Date

  May 08, 2010
  14 years ago

• Published for Opposition Date

  October 01, 2002
  22 years ago

• Location Date

  October 06, 2003
  21 years ago

• First Use Anywhere Date

  December 03, 2002
  21 years ago

• First Use In Commerce Date

  July 22, 2002
  22 years ago

• Status Code

  710

• Current Location

  FILE REPOSITORY (FRANCONIA)

  Employee Name

  WILLIAMS, IRENE D

• Attorney Docket Number

  5430-00405

  Attorney Name

  Dwayne K. Goetzel

  Law Office Assigned Location Code

  M30

• Owners

  • Dupont Photomasks, Inc.

Case File Statements

• GS0071: Power equipment, namely, pattern generators, etch tools, inspection tools, metrology tools, repair tools, and photoresists, used for the manufacture of photomasks, the optical transfer of integrated circuit images onto semiconductor wafers, and for altering and blocking light as applied to photomasks
• GS0211: Clear substrates, namely, glass or quartz, imaged with device layers for exposing silicon substrates; quartz or glass substrates imaged with microscopic structures in the manufacture of integrated circuits, micro-electrical mechanical structures (MEMS), optical components and systems
• GS0401: Custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks
• GS0421: Photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass

Case File Event Statements

• 5/8/2010 - 14 years ago

  16 - CANCELLED SEC. 8 (6-YR) Type: C8..

• 9/30/2003 - 21 years ago

  15 - REGISTERED-PRINCIPAL REGISTER Type: R.PR

• 8/8/2003 - 21 years ago

  14 - ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED Type: CNPR

• 7/17/2003 - 21 years ago

  13 - CASE FILE IN TICRS Type: CFIT

• 7/9/2003 - 21 years ago

  12 - STATEMENT OF USE PROCESSING COMPLETE Type: SUPC

• 6/24/2003 - 21 years ago

  11 - USE AMENDMENT FILED Type: IUAF

• 6/24/2003 - 21 years ago

  10 - TEAS STATEMENT OF USE RECEIVED Type: EISU

• 2/7/2003 - 21 years ago

  9 - PAPER RECEIVED Type: MAIL

• 12/24/2002 - 21 years ago

  8 - NOA MAILED - SOU REQUIRED FROM APPLICANT Type: NOAM

• 10/1/2002 - 22 years ago

  7 - PUBLISHED FOR OPPOSITION Type: PUBO

• 9/11/2002 - 22 years ago

  6 - NOTICE OF PUBLICATION Type: NPUB

• 7/22/2002 - 22 years ago

  5 - APPROVED FOR PUB - PRINCIPAL REGISTER Type: CNSA

• 7/9/2002 - 22 years ago

  4 - EXAMINERS AMENDMENT E-MAILED Type: GNEA

• 6/3/2002 - 22 years ago

  3 - CORRESPONDENCE RECEIVED IN LAW OFFICE Type: CRFA

• 3/14/2002 - 22 years ago

  2 - NON-FINAL ACTION E-MAILED Type: GNRT

• 3/11/2002 - 22 years ago

  1 - ASSIGNED TO EXAMINER Type: DOCK