CC0000: Color is not claimed as a feature of the mark.
D10000: "COMPANY TOOLS FOR NANOTECH"
GS0071: Components of equipment and micro-machining equipment for the manufacture of semi-conductors, data storage components, and items for scientific research use, namely, high brightness, sub-micron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, imaging, and ion beam milling, secondary ion mass spectrometry, focused electron beam columns for electron beam lithography, and electron beam microscopy and analysis, ion beam source emitters, electron beam source emitters; accessories of equipment and micro-machining equipment for the manufacture of semi-conductors, data storage components, and items for scientific research use, namely, sample preparation equipment that prepares biological samples for examination by microscopes
GS0091: Focused ion beam tools, namely, instruments for material deposition and removal and for imaging, analysis, and measurement of materials in the fields of microscopy and nanotechnology; Microscopes, scanning electron microscopes, scanning ion microscopes, atomic-force microscopes, and transmission electron microscopes; Microscopic system navigational software, namely, software that visually enhances the navigational, functional capability of spectroscopic, lithographic, and microscopic components; Application software and operation system software for operation of all the foregoing equipment, namely, software for use in microscopic imaging, milling and analysis; Computer software for manufacturing semi-conductors; Computer software for manufacturing data storage components; and computer software for manufacturing micro-machinery
GS0371: Repair and maintenance of components of equipment and micro-machining equipment and accessories for the manufacture of semi-conductors and data storage components, microscopes, scanning electron microscopes, scanning ion microscopes, focused ion beam tools, secondary ion mass spectrometry systems, atomic-force microscopes, and transmission electron microscopes; post-warranty repair and maintenance of components of equipment and micro-machining equipment and accessories for the manufacture of semi-conductors and data storage components, microscopes, scanning electron microscopes, scanning ion microscopes, focused ion beam tools, secondary ion mass spectrometry systems, atomic-force microscopes, and transmission electron microscopes
GS0411: Training in the operation of components of equipment and micro-machining equipment and accessories for the manufacture of semi-conductors and data storage components, microscopes, scanning electron microscopes, scanning ion microscopes, focused ion beam tools, secondary ion mass spectrometry systems, atomic-force microscopes, and transmission electron microscopes
GS0421: Scientific analysis and high resolution imaging, namely, scanning electron and focused ion beam microscopy, in the fields of semiconductor manufacture, data storage equipment manufacture, scientific research, biological sciences and manufacture of devices with sub-micron features; Computer software support services, namely, trouble shooting of computer software problems, providing back up for computer software programs; Computer software consultation services; design and updating of computer software; project management relating to computer software; Computer software installation and maintenance; Providing information and advice relating to computer software
Case File Event Statements
12/26/2014 - 10 years ago
37 - CANCELLED SEC. 8 (6-YR)Type:C8..
5/20/2008 - 16 years ago
36 - REGISTERED-PRINCIPAL REGISTERType:R.PR
3/4/2008 - 16 years ago
35 - PUBLISHED FOR OPPOSITIONType:PUBO
2/13/2008 - 16 years ago
34 - NOTICE OF PUBLICATIONType:NPUB
1/31/2008 - 17 years ago
33 - LAW OFFICE PUBLICATION REVIEW COMPLETEDType:PREV
1/11/2008 - 17 years ago
32 - APPROVED FOR PUB - PRINCIPAL REGISTERType:CNSA
1/11/2008 - 17 years ago
31 - EXAMINER'S AMENDMENT ENTEREDType:XAEC
1/11/2008 - 17 years ago
30 - NOTIFICATION OF EXAMINERS AMENDMENT E-MAILEDType:GNEN
1/11/2008 - 17 years ago
29 - EXAMINERS AMENDMENT E-MAILEDType:GNEA
1/11/2008 - 17 years ago
28 - EXAMINERS AMENDMENT -WRITTENType:CNEA
1/10/2008 - 17 years ago
27 - ASSIGNED TO EXAMINERType:DOCK
1/10/2008 - 17 years ago
26 - PREVIOUS ALLOWANCE COUNT WITHDRAWNType:ZZZX
1/10/2008 - 17 years ago
25 - ASSIGNED TO EXAMINERType:DOCK
1/7/2008 - 17 years ago
24 - ASSIGNED TO EXAMINERType:DOCK
8/6/2007 - 17 years ago
23 - WITHDRAWN FROM PUB - OG REVIEW QUERYType:PBCR
5/23/2007 - 17 years ago
22 - LAW OFFICE PUBLICATION REVIEW COMPLETEDType:PREV
5/20/2007 - 17 years ago
21 - APPROVED FOR PUB - PRINCIPAL REGISTERType:CNSA
5/20/2007 - 17 years ago
20 - EXAMINER'S AMENDMENT ENTEREDType:XAEC
5/20/2007 - 17 years ago
19 - EXAMINERS AMENDMENT E-MAILEDType:GNEA
5/20/2007 - 17 years ago
18 - EXAMINERS AMENDMENT -WRITTENType:CNEA
5/16/2007 - 17 years ago
17 - PREVIOUS ALLOWANCE COUNT WITHDRAWNType:ZZZX
3/26/2007 - 17 years ago
16 - WITHDRAWN FROM PUB - OG REVIEW QUERYType:PBCR
3/1/2007 - 17 years ago
15 - LAW OFFICE PUBLICATION REVIEW COMPLETEDType:PREV
2/17/2007 - 17 years ago
14 - APPROVED FOR PUB - PRINCIPAL REGISTERType:CNSA
2/16/2007 - 17 years ago
13 - EXAMINER'S AMENDMENT ENTEREDType:XAEC
2/16/2007 - 17 years ago
12 - ASSIGNED TO LIEType:ALIE
2/15/2007 - 17 years ago
11 - EXAMINERS AMENDMENT E-MAILEDType:GNEA
2/15/2007 - 17 years ago
10 - EXAMINERS AMENDMENT -WRITTENType:CNEA
8/15/2006 - 18 years ago
9 - FINAL REFUSAL E-MAILEDType:GNFR
8/15/2006 - 18 years ago
8 - FINAL REFUSAL WRITTENType:CNFR
7/27/2006 - 18 years ago
7 - AMENDMENT FROM APPLICANT ENTEREDType:ACEC
7/3/2006 - 18 years ago
6 - CORRESPONDENCE RECEIVED IN LAW OFFICEType:CRFA