79044455 - NANOGROWTH

Information

  • Trademark
  • 79044455
  • Serial Number
    79044455
  • Registration Number
    3631493
  • Filing Date
    August 30, 2007
    17 years ago
  • Registration Date
    June 02, 2009
    15 years ago
  • Transaction Date
    March 17, 2018
    6 years ago
  • Status Date
    August 31, 2017
    7 years ago
  • Published for Opposition Date
    March 17, 2009
    15 years ago
  • Location Date
    June 02, 2009
    15 years ago
  • Status Code
    404
  • Current Location
    PUBLICATION AND ISSUE SECTION
    Employee Name
    DAHLING, KRISTIN M
  • Law Office Assigned Location Code
    M40
  • Owners
Mark Drawing Code
4000
Mark Identification
NANOGROWTH
Case File Statements
  • GS0071: Machine tools, namely, lathes, centrifuges, and grinders, all for use with plasma enhanced chemical vapor deposition (PECVD) machines, low pressure chemical vapor deposition (CVD) machines, chemical vapor deposition equipment and machines, rapid thermal process machines, rapid thermal anneal (RTA) machines, nano filtration equipment and machines, sputter equipment and machines, e-beam equipment and machines, evaporation machines, e-beam lithography machines, machines for the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon; machines for turning and grinding, namely, sputtering machines and centrifugal grinding machines; machines and machine tools for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires; nanomachines for process filtration in the pharmaceutical industry; plasma process apparatus, namely, plasma etching machines; turnkey equipment and installations, namely, starter alternators; electric motors, namely, electric motors for machines; oil filters; chucks for lathes and power drills; Machine tools, namely, filters, all for use with plasma enhanced chemical vapor deposition (PECVD) machines, low pressure chemical vapor deposition (CVD) machines, chemical vapor deposition machines, rapid thermal process machines, rapid thermal anneal (RTA) machines, nano filtration machines, sputter machines, e-beam machines, evaporation machines, e-beam lithography machines, machines for the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon
  • GS0091: Computer software for the control of machines used in the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon; computer software systems to enable research into the integration of carbon nanotubes (CNTs) technology into semiconductor devices, silicon nanowire growth for advanced silicon chip technologies, high performance solar cells, fuel cell technologies, and novel flat panel display coatings; computer software for the operation of machine tools, machines for turning and grinding, machines for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires, nanomachines, and plasma process apparatus; educational software featuring instruction in the operation of machine tools, machines for turning and grinding, machines for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires, nanomachines, and plasma process apparatus; computer hardware; software for ensuring processes are running according to specified parameters; software for calculating the required parameters to obtain the desired performance of machines; apparatus and devices for laboratory purposes and for use in the chemical industry and for establishing the properties of materials, namely, spectrometers, visible light spectrometers, infrared spectrometers, Raman spectrometers, x-ray inspection machines, ellipsometers; blank magnetic data carriers; pre-recorded magnetic data carriers featuring software for operation of machines that create structures in which at least one characteristic dimension is smaller than 1 micron; calculating machines, data processing equipment and computers; sputtering apparatus and instruments, namely, sputter devices used in further manufacture of goods by depositing material and substrates using a sputtering process
  • PM0000: NANO GROWTH
Case File Event Statements
  • 3/16/2018 - 6 years ago
    44 - NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG MAILED Type: DENC
  • 3/16/2018 - 6 years ago
    43 - DEATH OF INTERNATIONAL REGISTRATION Type: DETH
  • 3/31/2017 - 7 years ago
    42 - TOTAL INVALIDATION PROCESSED BY THE IB Type: INNT
  • 9/8/2016 - 8 years ago
    41 - TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB Type: INTS
  • 9/8/2016 - 8 years ago
    40 - INVALIDATION PROCESSED Type: INPC
  • 9/8/2016 - 8 years ago
    39 - TOTAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INTR
  • 1/8/2016 - 9 years ago
    38 - CANCELLED SECTION 71 Type: C71T
  • 1/12/2013 - 12 years ago
    37 - FINAL DECISION TRANSACTION PROCESSED BY IB Type: FINO
  • 9/9/2009 - 15 years ago
    36 - FINAL DISPOSITION NOTICE SENT TO IB Type: FICS
  • 9/9/2009 - 15 years ago
    35 - FINAL DISPOSITION PROCESSED Type: FIMP
  • 9/2/2009 - 15 years ago
    34 - FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB Type: FICR
  • 6/2/2009 - 15 years ago
    33 - REGISTERED-PRINCIPAL REGISTER Type: R.PR
  • 4/16/2009 - 15 years ago
    32 - NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB Type: OPNX
  • 4/2/2009 - 15 years ago
    31 - NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB Type: OPNS
  • 4/2/2009 - 15 years ago
    30 - NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB Type: OPNR
  • 3/17/2009 - 15 years ago
    29 - PUBLISHED FOR OPPOSITION Type: PUBO
  • 2/25/2009 - 16 years ago
    28 - NOTICE OF PUBLICATION Type: NPUB
  • 2/10/2009 - 16 years ago
    27 - LAW OFFICE PUBLICATION REVIEW COMPLETED Type: PREV
  • 2/10/2009 - 16 years ago
    26 - ASSIGNED TO LIE Type: ALIE
  • 1/30/2009 - 16 years ago
    25 - APPROVED FOR PUB - PRINCIPAL REGISTER Type: CNSA
  • 1/25/2009 - 16 years ago
    24 - EXAMINER'S AMENDMENT ENTERED Type: XAEC
  • 1/25/2009 - 16 years ago
    23 - NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED Type: GNEN
  • 1/25/2009 - 16 years ago
    22 - EXAMINERS AMENDMENT E-MAILED Type: GNEA
  • 1/25/2009 - 16 years ago
    21 - EXAMINERS AMENDMENT -WRITTEN Type: CNEA
  • 12/30/2008 - 16 years ago
    20 - EX PARTE APPEAL-INSTITUTED Type: EXPI
  • 12/30/2008 - 16 years ago
    19 - JURISDICTION RESTORED TO EXAMINING ATTORNEY Type: JURT
  • 12/30/2008 - 16 years ago
    18 - EXPARTE APPEAL RECEIVED AT TTAB Type: EXAF
  • 12/30/2008 - 16 years ago
    17 - TEAS REQUEST FOR RECONSIDERATION RECEIVED Type: ERFR
  • 12/30/2008 - 16 years ago
    16 - TEAS REQUEST FOR RECONSIDERATION RECEIVED Type: ERFR
  • 7/2/2008 - 16 years ago
    15 - NOTIFICATION OF FINAL REFUSAL EMAILED Type: GNFN
  • 7/2/2008 - 16 years ago
    14 - FINAL REFUSAL E-MAILED Type: GNFR
  • 7/2/2008 - 16 years ago
    13 - FINAL REFUSAL WRITTEN Type: CNFR
  • 6/10/2008 - 16 years ago
    12 - TEAS CHANGE OF CORRESPONDENCE RECEIVED Type: TCCA
  • 6/10/2008 - 16 years ago
    11 - TEAS/EMAIL CORRESPONDENCE ENTERED Type: TEME
  • 6/10/2008 - 16 years ago
    10 - CORRESPONDENCE RECEIVED IN LAW OFFICE Type: CRFA
  • 6/10/2008 - 16 years ago
    9 - TEAS RESPONSE TO OFFICE ACTION RECEIVED Type: TROA
  • 12/29/2007 - 17 years ago
    8 - REFUSAL PROCESSED BY IB Type: RFNT
  • 12/11/2007 - 17 years ago
    7 - NON-FINAL ACTION MAILED - REFUSAL SENT TO IB Type: RFCS
  • 12/11/2007 - 17 years ago
    6 - REFUSAL PROCESSED BY MPU Type: RFRR
  • 12/11/2007 - 17 years ago
    5 - NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Type: RFCR
  • 12/10/2007 - 17 years ago
    4 - NON-FINAL ACTION WRITTEN Type: CNRT
  • 12/7/2007 - 17 years ago
    3 - ASSIGNED TO EXAMINER Type: DOCK
  • 11/2/2007 - 17 years ago
    2 - NEW APPLICATION ENTERED IN TRAM Type: NWAP
  • 11/1/2007 - 17 years ago
    1 - SN ASSIGNED FOR SECT 66A APPL FROM IB Type: REPR