TREA

79102249 - WONIK IPS

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Information

  • Trademark
  • 79102249
  • Serial Number
    79102249
  • Registration Number
    4204098
  • Filing Date
    March 16, 2011
    13 years ago
  • Registration Date
    September 11, 2012
    12 years ago
  • Transaction Date
    October 04, 2021
    3 years ago
  • Status Date
    March 17, 2021
    3 years ago
  • Published for Opposition Date
    June 26, 2012
    12 years ago
  • Location Date
    August 18, 2019
    5 years ago
  • Status Code
    404
  • Current Location
    GENERIC WEB UPDATE
    Employee Name
    FINE, STEVEN R
  • Attorney Docket Number
    JOO-112TM
    Law Office Assigned Location Code
    M10
  • Owners
Information
Mark Drawing Code
3000
Mark Identification
WONIK IPS
Case File Statements
  • CC0000: The color(s) blue, red, gray and white is/are claimed as a feature of the mark.
  • DM0000: The mark consists of the wording "WONIK IPS" and a circular blue, gray and white design feature to the left of the wording. The wording "WONIK" is in blue, with a circular gray and white design within the letter "O", and the wording "IPS" is in red.
  • GS0071: Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electroluminescence display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; microelectromechanical systems (MEMS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix organic light emitting diode (AMOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]
  • GS0371: Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and AMOLED displays ]
  • TR0010: The wording "WONIK" has no meaning in a foreign language.
Case File Event Statements
  • 10/3/2021 - 3 years ago
    57 - NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED Type: DENC
  • 10/3/2021 - 3 years ago
    56 - DEATH OF INTERNATIONAL REGISTRATION Type: DETH
  • 7/3/2020 - 4 years ago
    55 - TOTAL INVALIDATION PROCESSED BY THE IB Type: INNT
  • 6/4/2020 - 4 years ago
    54 - TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB Type: INTS
  • 6/4/2020 - 4 years ago
    53 - INVALIDATION PROCESSED Type: INPC
  • 4/18/2020 - 4 years ago
    52 - TOTAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INTR
  • 8/20/2019 - 5 years ago
    51 - NOTICE OF CANCELLATION SEC. 71 E-MAILED Type: NC71
  • 8/18/2019 - 5 years ago
    50 - CANCELLED SECTION 71 Type: C71T
  • 4/16/2019 - 5 years ago
    49 - INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE Type: INNA
  • 3/31/2019 - 5 years ago
    48 - PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INPR
  • 2/11/2019 - 6 years ago
    47 - POST REGISTRATION ACTION MAILED - SEC.71 Type: PR71
  • 2/7/2019 - 6 years ago
    46 - CASE ASSIGNED TO POST REGISTRATION PARALEGAL Type: APRE
  • 1/31/2019 - 6 years ago
    45 - TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED Type: EROP
  • 1/31/2019 - 6 years ago
    44 - TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED Type: EROP
  • 7/31/2018 - 6 years ago
    43 - POST REGISTRATION ACTION MAILED - SEC.71 Type: PR71
  • 5/8/2018 - 6 years ago
    42 - CASE ASSIGNED TO POST REGISTRATION PARALEGAL Type: APRE
  • 4/27/2018 - 6 years ago
    41 - TEAS SECTION 71 RECEIVED Type: ES71
  • 10/16/2017 - 7 years ago
    40 - CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED Type: CORN
  • 10/13/2017 - 7 years ago
    39 - CORRECTION TRANSACTION RECEIVED FROM IB Type: CRCV
  • 9/11/2017 - 7 years ago
    38 - COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED Type: REM3
  • 7/21/2016 - 8 years ago
    37 - CHANGE OF OWNER RECEIVED FROM IB Type: CHLD
  • 8/17/2015 - 9 years ago
    36 - LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED Type: LIMN
  • 7/31/2015 - 9 years ago
    35 - LIMITATION OF GOODS RECEIVED FROM IB Type: LIMG
  • 5/6/2013 - 11 years ago
    34 - FINAL DECISION TRANSACTION PROCESSED BY IB Type: FINO
  • 4/16/2013 - 11 years ago
    33 - FINAL DISPOSITION NOTICE SENT TO IB Type: FICS
  • 4/16/2013 - 11 years ago
    32 - FINAL DISPOSITION PROCESSED Type: FIMP
  • 12/11/2012 - 12 years ago
    31 - FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB Type: FICR
  • 12/2/2012 - 12 years ago
    30 - NOTIFICATION PROCESSED BY IB Type: GPNX
  • 9/11/2012 - 12 years ago
    29 - REGISTERED-PRINCIPAL REGISTER Type: R.PR
  • 6/26/2012 - 12 years ago
    28 - OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED Type: NPUB
  • 6/26/2012 - 12 years ago
    27 - PUBLISHED FOR OPPOSITION Type: PUBO
  • 6/6/2012 - 12 years ago
    26 - NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB Type: OPNS
  • 6/6/2012 - 12 years ago
    25 - NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB Type: OP2R
  • 6/6/2012 - 12 years ago
    24 - NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED Type: NONP
  • 5/21/2012 - 12 years ago
    23 - LAW OFFICE PUBLICATION REVIEW COMPLETED Type: PREV
  • 5/11/2012 - 12 years ago
    22 - APPROVED FOR PUB - PRINCIPAL REGISTER Type: CNSA
  • 5/11/2012 - 12 years ago
    21 - EXAMINER'S AMENDMENT ENTERED Type: XAEC
  • 5/11/2012 - 12 years ago
    20 - NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED Type: GNEN
  • 5/11/2012 - 12 years ago
    19 - EXAMINERS AMENDMENT E-MAILED Type: GNEA
  • 5/11/2012 - 12 years ago
    18 - EXAMINERS AMENDMENT -WRITTEN Type: CNEA
  • 4/19/2012 - 12 years ago
    17 - TEAS/EMAIL CORRESPONDENCE ENTERED Type: TEME
  • 4/19/2012 - 12 years ago
    16 - CORRESPONDENCE RECEIVED IN LAW OFFICE Type: CRFA
  • 4/6/2012 - 12 years ago
    15 - TEAS CHANGE OF CORRESPONDENCE RECEIVED Type: TCCA
  • 4/6/2012 - 12 years ago
    14 - TEAS RESPONSE TO OFFICE ACTION RECEIVED Type: TROA
  • 12/30/2011 - 13 years ago
    13 - CHANGE OF NAME/ADDRESS REC'D FROM IB Type: ADCH
  • 10/30/2011 - 13 years ago
    12 - REFUSAL PROCESSED BY IB Type: RFNT
  • 10/19/2011 - 13 years ago
    11 - APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED Type: CHAN
  • 10/13/2011 - 13 years ago
    10 - ASSIGNED TO LIE Type: ALIE
  • 10/12/2011 - 13 years ago
    9 - FAX RECEIVED Type: FAXX
  • 10/11/2011 - 13 years ago
    8 - NON-FINAL ACTION MAILED - REFUSAL SENT TO IB Type: RFCS
  • 10/11/2011 - 13 years ago
    7 - REFUSAL PROCESSED BY MPU Type: RFRR
  • 10/10/2011 - 13 years ago
    6 - NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Type: RFCR
  • 10/9/2011 - 13 years ago
    5 - NON-FINAL ACTION WRITTEN Type: CNRT
  • 10/4/2011 - 13 years ago
    4 - APPLICATION FILING RECEIPT MAILED Type: MAFR
  • 9/30/2011 - 13 years ago
    3 - ASSIGNED TO EXAMINER Type: DOCK
  • 9/30/2011 - 13 years ago
    2 - NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM Type: NWOS
  • 9/29/2011 - 13 years ago
    1 - SN ASSIGNED FOR SECT 66A APPL FROM IB Type: REPR