TREA

79103531 - WONIK IPS

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Information

  • Trademark
  • 79103531
  • Serial Number
    79103531
  • Registration Number
    4204134
  • Filing Date
    March 16, 2011
    14 years ago
  • Registration Date
    September 11, 2012
    12 years ago
  • Transaction Date
    December 18, 2023
    a year ago
  • Status Date
    March 11, 2023
    2 years ago
  • Published for Opposition Date
    June 26, 2012
    12 years ago
  • Location Date
    March 11, 2023
    2 years ago
  • Status Code
    706
  • Current Location
    GENERIC WEB UPDATE
    Employee Name
    MITTLER, ROBIN M
  • Attorney Docket Number
    JOO-113TM
    Law Office Assigned Location Code
    M80
  • Owners
Information
Mark Drawing Code
3000
Mark Identification
WONIK IPS
Case File Statements
  • DM0000: The mark consists of the stylized wording "WONIK" in blue, the stylized letters "IPS" in red, and a gray circular design inside the character "O".
  • B00001: In the statement, Page 1, line 8, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 8, through line 11, "ATOMIC LAYER DEPOSITION APPARATUS, ION BEAM DEPOSITION APPARATUS, ION BEAM ETCHING APPARATUS, ANNEALING APPARATUS, RAPID THERMAL PROCESSING APPARATUS, COUPLED SPUTTERING APPARATUS," should be deleted. In the statement, Page 1, line 11, through line 17, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 14, through line 15, "ION BEAM ETCHING APPARATUS," should be deleted. In the statement, Page 1, line 17, "ELECTRON BEAM ANNEALING APPARATUS," should be deleted.
  • GS0071: Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, ] low temperature annealing apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, coupled sputtering apparatus, ] multiple sputtering apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * laser sublimation deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * organic molecular chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam generation apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam sputter deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, ion beam etching apparatus, ] ion beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam crystallization apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, electron beam annealing apparatus, ] oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [ ; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electrocutions display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; micro electromechanical systems (ME MS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix light emitting diode (GAMBOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]
  • GS0371: Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor Keita apparatus, liquid Keita apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors [ ; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and GAMBOLED displays ]
  • CC0000: The color(s) blue, red and gray is/are claimed as a feature of the mark.
  • TR0010: The wording "WONIK" has no meaning in a foreign language.
Case File Event Statements
  • 12/18/2023 - a year ago
    69 - PARTIAL INVALIDATION PROCESSED BY THE IB Type: INNP
  • 11/16/2023 - a year ago
    68 - PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB Type: INPS
  • 11/16/2023 - a year ago
    67 - INVALIDATION PROCESSED Type: INPC
  • 11/11/2023 - a year ago
    66 - PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INPR
  • 3/11/2023 - 2 years ago
    65 - NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED Type: NA71
  • 3/11/2023 - 2 years ago
    64 - REGISTERED-SEC.71 ACCEPTED Type: 71AG
  • 3/11/2023 - 2 years ago
    63 - CASE ASSIGNED TO POST REGISTRATION PARALEGAL Type: APRE
  • 10/7/2022 - 2 years ago
    62 - CHANGE OF OWNER RECEIVED FROM IB Type: CHLD
  • 9/8/2022 - 2 years ago
    61 - TEAS SECTION 71 RECEIVED Type: ES71
  • 9/11/2021 - 3 years ago
    60 - COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED Type: REM4
  • 4/30/2021 - 3 years ago
    59 - INTERNATIONAL REGISTRATION RENEWED Type: RNWL
  • 12/17/2019 - 5 years ago
    58 - INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE Type: INNA
  • 11/27/2019 - 5 years ago
    57 - PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INPR
  • 5/3/2019 - 5 years ago
    56 - PARTIAL INVALIDATION PROCESSED BY THE IB Type: INNP
  • 3/27/2019 - 6 years ago
    55 - PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB Type: INPS
  • 3/27/2019 - 6 years ago
    54 - INVALIDATION PROCESSED Type: INPC
  • 2/22/2019 - 6 years ago
    53 - PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INPR
  • 6/22/2018 - 6 years ago
    52 - NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED Type: NA71
  • 6/22/2018 - 6 years ago
    51 - REGISTERED-SEC.71 ACCEPTED Type: 71AG
  • 5/11/2018 - 6 years ago
    50 - CASE ASSIGNED TO POST REGISTRATION PARALEGAL Type: APRE
  • 4/30/2018 - 6 years ago
    49 - TEAS SECTION 71 RECEIVED Type: ES71
  • 11/16/2017 - 7 years ago
    48 - LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED Type: LIMN
  • 10/23/2017 - 7 years ago
    47 - CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED Type: CORN
  • 10/23/2017 - 7 years ago
    46 - CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED Type: CORN
  • 10/16/2017 - 7 years ago
    45 - CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED Type: CORN
  • 10/13/2017 - 7 years ago
    44 - CORRECTION TRANSACTION RECEIVED FROM IB Type: CRCV
  • 10/13/2017 - 7 years ago
    43 - CORRECTION TRANSACTION RECEIVED FROM IB Type: CRCV
  • 10/13/2017 - 7 years ago
    42 - CORRECTION TRANSACTION RECEIVED FROM IB Type: CRCV
  • 10/13/2017 - 7 years ago
    41 - LIMITATION OF GOODS RECEIVED FROM IB Type: LIMG
  • 9/11/2017 - 7 years ago
    40 - COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED Type: REM3
  • 7/21/2016 - 8 years ago
    39 - CHANGE OF OWNER RECEIVED FROM IB Type: CHLD
  • 7/5/2016 - 8 years ago
    38 - INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE Type: INNA
  • 7/5/2016 - 8 years ago
    37 - PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED Type: INPR
  • 11/6/2015 - 9 years ago
    36 - LIMITATION FROM THE IB EXAMINED AND ENTERED Type: LIME
  • 11/5/2015 - 9 years ago
    35 - CORRECTION UNDER SECTION 7 ¿ PROCESSED Type: COC.
  • 11/5/2015 - 9 years ago
    34 - CASE ASSIGNED TO POST REGISTRATION PARALEGAL Type: APRE
  • 7/31/2015 - 9 years ago
    33 - LIMITATION OF GOODS RECEIVED FROM IB Type: LIMG
  • 1/7/2013 - 12 years ago
    32 - FINAL DECISION TRANSACTION PROCESSED BY IB Type: FINO
  • 12/17/2012 - 12 years ago
    31 - FINAL DISPOSITION NOTICE SENT TO IB Type: FICS
  • 12/17/2012 - 12 years ago
    30 - FINAL DISPOSITION PROCESSED Type: FIMP
  • 12/11/2012 - 12 years ago
    29 - FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB Type: FICR
  • 12/10/2012 - 12 years ago
    28 - NOTIFICATION PROCESSED BY IB Type: GPNX
  • 9/11/2012 - 12 years ago
    27 - REGISTERED-PRINCIPAL REGISTER Type: R.PR
  • 6/26/2012 - 12 years ago
    26 - OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED Type: NPUB
  • 6/26/2012 - 12 years ago
    25 - PUBLISHED FOR OPPOSITION Type: PUBO
  • 6/6/2012 - 12 years ago
    24 - NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB Type: OPNS
  • 6/6/2012 - 12 years ago
    23 - NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB Type: OP2R
  • 6/6/2012 - 12 years ago
    22 - NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED Type: NONP
  • 5/21/2012 - 12 years ago
    21 - LAW OFFICE PUBLICATION REVIEW COMPLETED Type: PREV
  • 5/14/2012 - 12 years ago
    20 - APPROVED FOR PUB - PRINCIPAL REGISTER Type: CNSA
  • 4/19/2012 - 12 years ago
    19 - TEAS/EMAIL CORRESPONDENCE ENTERED Type: TEME
  • 4/19/2012 - 12 years ago
    18 - CORRESPONDENCE RECEIVED IN LAW OFFICE Type: CRFA
  • 4/13/2012 - 12 years ago
    17 - ASSIGNED TO LIE Type: ALIE
  • 4/3/2012 - 13 years ago
    16 - TEAS RESPONSE TO OFFICE ACTION RECEIVED Type: TROA
  • 4/3/2012 - 13 years ago
    15 - TEAS CHANGE OF CORRESPONDENCE RECEIVED Type: TCCA
  • 12/30/2011 - 13 years ago
    14 - CHANGE OF NAME/ADDRESS REC'D FROM IB Type: ADCH
  • 12/19/2011 - 13 years ago
    13 - REFUSAL PROCESSED BY IB Type: RFNT
  • 11/15/2011 - 13 years ago
    12 - NON-FINAL ACTION MAILED - REFUSAL SENT TO IB Type: RFCS
  • 11/15/2011 - 13 years ago
    11 - REFUSAL PROCESSED BY MPU Type: RFRR
  • 11/15/2011 - 13 years ago
    10 - NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Type: RFCR
  • 11/14/2011 - 13 years ago
    9 - NON-FINAL ACTION WRITTEN Type: CNRT
  • 11/14/2011 - 13 years ago
    8 - FAX RECEIVED Type: FAXX
  • 11/8/2011 - 13 years ago
    7 - NON-FINAL ACTION (IB REFUSAL) WITHDRAWN FOR REVIEW Type: RFWR
  • 11/5/2011 - 13 years ago
    6 - NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Type: RFCR
  • 11/4/2011 - 13 years ago
    5 - NON-FINAL ACTION WRITTEN Type: CNRT
  • 11/1/2011 - 13 years ago
    4 - APPLICATION FILING RECEIPT MAILED Type: MAFR
  • 10/28/2011 - 13 years ago
    3 - ASSIGNED TO EXAMINER Type: DOCK
  • 10/28/2011 - 13 years ago
    2 - NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Type: NWOS
  • 10/27/2011 - 13 years ago
    1 - SN ASSIGNED FOR SECT 66A APPL FROM IB Type: REPR