79383794 - NITTA DUPONT

Information

  • Trademark
  • 79383794
  • Serial Number
    79383794
  • Filing Date
    July 21, 2023
    a year ago
  • Transaction Date
    April 09, 2024
    8 months ago
  • Status Date
    March 19, 2024
    9 months ago
  • Location Date
    February 26, 2024
    10 months ago
  • Status Code
    641
  • Current Location
    TMEG LAW OFFICE 106 - EXAMINING ATTORNEY ASSIGNED
    Employee Name
    AYALA, LOURDES
  • Law Office Assigned Location Code
    L60
  • Owners
Mark Drawing Code
3000
Mark Identification
NITTA DUPONT
Case File Statements
  • GS0071: Work holding instruments for semiconductor wafer polishing machines and apparatus; templates for semiconductor wafer polishing machines and apparatus; blank templates for semiconductor wafer polishing machines and apparatus; mounting pads and sheets for semiconductor wafer polishing machines and apparatus; polishing pads for semiconductor wafer polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer polishing machines and apparatus; semiconductor wafer polishing machines and apparatus; parts and accessories of semiconductor wafer polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting pads and sheets for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting pads and sheets for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting pads and sheets for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting pads and sheets for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus; polishing pads for electric polishing machines; polishing cloths used as parts or accessories of electric polishing machines
  • GS0031: Abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations; pads impregnated with polishing preparations; impregnated cloths for polishing; grinding preparations; sharpening preparations; abrasives; scouring solutions; metal polishes; hydrophilic agents for industrial polishing; chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates
  • CC0000: The color(s) blue, red, black is/are claimed as a feature of the mark.
  • GS0011: Hydrophilic chemical agents for industrial purposes; detergents for industrial use; chemicals; chemically reactive solutions for use with abrasives for semiconductors; chemically reactive solutions for use with abrasives for electronic substrates; auxiliary fluids for use with abrasives
Case File Event Statements
  • 4/8/2024 - 8 months ago
    10 - REFUSAL PROCESSED BY IB Type: RFNT
  • 3/19/2024 - 9 months ago
    9 - NON-FINAL ACTION MAILED - REFUSAL SENT TO IB Type: RFCS
  • 3/19/2024 - 9 months ago
    8 - REFUSAL PROCESSED BY MPU Type: RFRR
  • 2/27/2024 - 10 months ago
    7 - NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Type: RFCR
  • 2/26/2024 - 10 months ago
    6 - NON-FINAL ACTION WRITTEN Type: CNRT
  • 2/14/2024 - 10 months ago
    5 - ASSIGNED TO EXAMINER Type: DOCK
  • 12/5/2023 - a year ago
    4 - APPLICATION FILING RECEIPT MAILED Type: MAFR
  • 12/1/2023 - a year ago
    3 - NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Type: NWOS
  • 11/27/2023 - a year ago
    2 - LIMITATION FROM ORIGINAL APPLICATION ENTERED Type: LIMI
  • 11/23/2023 - a year ago
    1 - SN ASSIGNED FOR SECT 66A APPL FROM IB Type: REPR