Information
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Trademark
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79424218
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International Classifications
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Filing Date
June 28, 2024
a year ago
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Transaction Date
July 05, 2025
3 months ago
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Status Date
May 30, 2025
4 months ago
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Location Date
May 30, 2025
4 months ago
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Status Code
638
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Current Location
TMEG LAW OFFICE 102
Employee Name
CLAYTON, CHERYL
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Law Office Assigned Location Code
L20
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Owners
Mark Drawing Code
3
Mark Identification
RAYNOS
Case File Statements
- GS0071: Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, glass substrates, and electronic circuit boards; polishing pads for polishing machines for use in the manufacture of semiconductor wafers, glass substrates, and electronic circuit boards; polishing pads being parts of machines for use in the manufacture of semiconductor wafers, glass substrates, and electronic circuit boards within the semiconductor industry; polishing pads being parts of machines for use in the manufacture of semiconductors within the semiconductor industry
- GS0031: Abrasive pads; abrasive cloth
Case File Event Statements
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5/28/2025 - 4 months ago
2 - LIMITATION FROM ORIGINAL APPLICATION ENTERED
Type: LIMI
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5/22/2025 - 4 months ago
1 - SN ASSIGNED FOR SECT 66A APPL FROM IB
Type: REPR
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5/29/2025 - 4 months ago
3 - NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Type: NWOS
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5/29/2025 - 4 months ago
4 - APPLICATION FILING RECEIPT MAILED
Type: MAFR
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5/30/2025 - 4 months ago
5 - ASSIGNED TO EXAMINER
Type: DOCK
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7/4/2025 - 3 months ago
6 - CORRECTION TRANSACTION RECEIVED FROM IB
Type: CRCV