The present invention relates to microfluidic testing devices.
Microfluidic devices that are designed to hold nanoliter-sized droplets of liquids in separate nano-wells, have been proven to be of use in the execution of various biological and chemical tests and procedures. In a typical procedure, two or more fluids are introduced successively into the device via one or more inlets. The nano-wells are then examined, e.g., visually by: a microscope, an automated image analysis system, or other visualization tools, to determine results of any interactions between the successively introduced liquids, or effects on cells that are suspended in one of the introduced liquids.
There is provided, according to some embodiments of the present invention, a new apparatus microfluidic testing apparatus comprising a flat and thin substrate, the substrate comprising at least one microfluidic testing device, each device comprising:
According to some embodiments, each SNDA further comprises an individual metering chamber, coupled in fluid communication between the distribution manifold and its associated primary channel, configured to temporarily accommodate a predetermined amount of sample fluid.
According to some embodiments, each of the metering chambers comprises a flow stopper at its primary channel end-side, configured to allow the passage of the fluid sample into its associated primary channel, only above a predetermined pressure; such that when said predetermined pressure is provided via the distribution manifold, all primary channels are simultaneously loaded.
According to some embodiments, each of the metering chambers comprises a flow restriction at its primary channel end-side, configured to prevent liquid flow from its associated primary channel towards the metering chamber.
According to some embodiments, the flow restriction is characterized by a predetermined ratio between the area of the flow restriction SMetering_Restriction and the flow area SPrimary_Flow of the primary channel.
According to some embodiments, the metering chamber opening to the distribution manifold is restricted, characterized by a ratio between the area of the opening SMetering_Opening and the surface area SMetering_Faces of the metering chamber faces; configured to reduce an energy barrier for a droplet shearing, such that a sheared fluid is retained as a droplet within the metering chamber.
According to some embodiments, the nano-well's opening to the primary channel is restricted, characterized by a ratio between the area of the opening SWell_Opening and the surface area SWell_Faces of the nano-well's faces; configured to reduce an energy barrier for a droplet shearing, such that a sheared fluid is retained as a droplet within the nano-well.
According to some embodiments, both the distribution manifold and the individual inlet ports, are coupled proximal to a first end of the primary channels, such that fluid's flow within the primary channel is always in same direction.
According to some embodiments, the device further comprising at least one liquid reservoir, configured to collect a predetermined amount of liquid, wherein the collected liquid serves as a vapor source.
According to some embodiments, at least one SNDA component further comprises said liquid reservoir, coupled between:
According to some embodiments, the configuration of each of the metering chambers, to temporarily accommodate said predetermined amount of sample fluid, is selected to avoid an overflow of its associated SNDA liquid reservoir.
According to some embodiments, the SNDA's liquid reservoir comprises funnel configuration at inlet and/or outlet thereof, configured to enable laminar liquid flow therewithin.
According to some embodiments, each of the liquid reservoirs, is further configured to prevent or at least partially inhibit convection and advection from one primary channel to another.
According to some embodiments, at least one SNDA component further comprises said liquid reservoir configuration as a predetermined number of nano-wells, proximal to the first end and/or last end of its associated primary channel.
According to some embodiments, said predetermined nano-wells are significantly larger in surface and/or deeper than the rest of the nano-wells, configured to accommodate a significantly larger amount of liquid.
According to some embodiments, said liquid reservoir is coupled between the distribution manifold outlet port and the end of distribution manifold, the end which is proximal to said outlet port; said liquid reservoir is configured to collect liquid, flowing out of distribution manifold, up to a predetermined amount, before it enables its flow towards the outlet port.
According to some embodiments, the device further comprises at least one flow stopper, configured to allow passage of liquid therethrough, only above a predetermined pressure threshold.
According to some embodiments, at least one of the liquid reservoirs comprises said flow stopper, therefore liquid is enabled to leave said reservoir, only above a predetermined pressure threshold.
According to some embodiments, the liquid reservoir associated with the distribution manifold further comprises said flow stopper, coupled between: the distribution manifold and the liquid reservoir, therefore liquid is enabled to leave said distribution manifold, only above a predetermined pressure threshold, which is selected to enable the filling of all nano-wells, before flowing towards the liquid reservoir.
According to some embodiments, at least one of the SNDA components further comprises said flow stopper, coupled between: the primary channel at second end and the liquid reservoir, therefore liquid is enabled to leave said primary channel, only above a predetermined pressure threshold, which is selected to enable the filling of all nano-wells, before flowing towards the liquid reservoir.
According to some embodiments, the plurality of the SNDA components are aligned parallel to one another and are laterally displaced relative to one another, to form a rectangular configuration.
According to some embodiments, all of the SNDA components are substantially identical.
According to some embodiments, the substrate comprises:
According to some embodiments, at least some of the substrate's port side inlets and outlets are configured to be sealed with a cap and/or communicate with a valve.
According to some embodiments, at least one of the substrate's port side outlets, is configured to be coupled with a negative-pressure (NP) device, configured to:
According to some embodiments, the substrate's port side main inlet further comprising a fluid receiving cup and a sealing lid, configured to seal or expose the receiving cup; the receiving cup is configured to be in communication with the positive pressure port, via the pressure path; the receiving cup comprising:
According to some embodiments, the fluid chamber comprises a liquid reservoir, configured to avoid liquid communication with the flow stopper and therefore keep a predetermined amount of liquid that serves as a vapor source.
There is provided, according to some embodiments of the present invention, a new method of using the apparatus according to any one of the above-mentioned embodiments; the method comprising:
According to some embodiments, the step of examining further comprising heating the device to a predetermined temperature, configured for incubation of the liquid droplets, accommodated in the nano-wells.
According to some embodiments, the method further comprising a step of embossing the device's substrate together with the cover film, at predetermined fluidic path locations, wherein the embossing is configured to seal microchannels, thereby preventing evaporation of the accommodated sample droplets; the step of embossing takes place after the step of applying the third pressure for shearing the excessive fluid out of primary channels, while sheared droplets are maintained within the nano-wells, and before the step of heating the device; the embossing is configured to block fluidic pathways, such that said embossed fluidic pathways are permanently blocked.
According to some embodiments, the method further comprising steps that are prior to the liquid sample loading:
According to some embodiments, the method further comprising applying a negative pressure via the outlet port of the colleting manifold, configured to evacuate the collected treatment solutions.
According to some embodiments, the method further comprising treating the droplets of the treatment solution, while within the nano-wells.
According to some embodiments, the method further comprising a step of embossing the device's substrate together with the cover film, at predetermined locations configured to seal fluidic pathway between the each of the individual inlet ports and its associated primary channel; this step of embossing takes place after the step loading the individual treatment solutions, and before the step of loading the sample liquid, such that said embossed fluidic pathways are permanently blocked.
There is provided, according to some embodiments of the present invention, a new apparatus comprising a flat and thin substrate, the substrate comprising at least one microfluidic testing device, each device comprising:
According to some embodiments, both the distribution manifold and the individual inlet ports, are coupled proximal to a first end of the primary channels, such that fluid's flow within the primary channel is always in same direction.
According to some embodiments, the device further comprising at least one liquid reservoir (e.g., a sacrificial liquid reservoir), configured to collect a predetermined amount of liquid, wherein the collected liquid serves as a vapor source, used to at least partially mitigate evaporation of the droplets accommodated in the nano-wells.
According to some embodiments, at least one SNDA component further comprises the liquid reservoir, coupled between:
According to some embodiments, the SNDA's liquid reservoir comprises funnel configuration at inlet and/or outlet thereof, configured to enable laminar liquid flow therewithin.
According to some embodiments, each of the liquid reservoirs, is further configured to prevent or at least partially inhibit convection and advection from one primary channel to another.
According to some embodiments, at least one SNDA component further comprises the liquid reservoir configuration as a predetermined number of nano-wells, proximal to the first end of its associated primary channel.
According to some embodiments, the predetermined nano-wells are significantly larger and/or deeper than the rest of the nano-wells, configured to accommodate a significantly larger amount of liquid.
According to some embodiments, the liquid reservoir is coupled between the distribution manifold outlet port and the end of distribution manifold, the end which is proximal to the outlet port; the liquid reservoir is configured to collect liquid, flowing out of distribution manifold, up to a predetermined amount, before it enables its flow towards the outlet port.
According to some embodiments, the device further comprises at least one flow stopper, configured to allow passage of liquid therethrough, only above a predetermined pressure threshold.
According to some embodiments, at least one of the liquid reservoirs comprises the flow stopper, therefore liquid is enabled to leave the reservoir, only above a predetermined pressure threshold.
According to some embodiments, the liquid reservoir associated with the distribution manifold further comprises the flow stopper, coupled between: the distribution manifold and the liquid reservoir, therefore liquid is enabled to leave the distribution manifold, only above a predetermined pressure threshold, which is selected to enable the filling of all nano-wells, before flowing towards the liquid reservoir.
According to some embodiments, at least one of the SNDA components further comprises the flow stopper, coupled between: the primary channel at second end and the liquid reservoir, therefore liquid is enabled to leave the primary channel, only above a predetermined pressure threshold, which is selected to enable the filling of all nano-wells, before flowing towards the liquid reservoir.
According to some embodiments, the plurality of the SNDA components are aligned parallel to one another and are laterally displaced relative to one another, to form a rectangular configuration.
According to some embodiments, all of the SNDA components are substantially identical.
According to some embodiments, the substrate comprises:
According to some embodiments, at least some of the substrate's port side inlets and outlets are configured to be sealed with a cap and/or communicate with a valve.
According to some embodiments, at least one of the substrate's port side outlets, is configured to be coupled with a negative-pressure (NP) device, configured to:
According to some embodiments, the substrate's port side main inlet further comprising a fluid receiving cup and a sealing lid, configured to seal or expose the receiving cup; the receiving cup is configured to be in communication with the positive pressure port, via the pressure path; the receiving cup comprising:
According to some embodiments, the fluid chamber comprises a liquid reservoir, configured to avoid liquid communication with the flow stopper and therefore keep a predetermined amount of liquid that serves as a vapor source.
According to some embodiments, the device further comprising plurality of individual metering chambers, each coupled between the distribution manifold and a different primary channel of a different SNDA component configured to temporarily accommodate a predetermined amount of fluid.
According to some embodiments of the invention, a new method of using the apparatus according to any one of the above-mentioned embodiments; the method comprising:
According to some embodiments, the method further comprising heating the device to a predetermined temperature configured for incubation of the fluid droplets, accommodated in the nano-wells, and such that the liquid reservoirs allow their accommodated liquid to vapor, while maintaining the fluid droplets in the nano-wells.
According to some embodiments, the method further comprising steps which are prior to the sample loading:
According to some embodiments, the method further comprising applying a negative pressure via the substrate's port side outlet and colleting manifold, configured to drain the collected treatment solutions out of the liquid reservoirs.
According to some embodiments, the method further comprising treating the droplets of the treatment solution, while within the nano-wells.
The subject matter regarded as the invention is particularly pointed out and distinctly claimed in the concluding portion of the specification. The invention, however, both as to organization and method of operation, together with objects, features, and advantages thereof, may best be understood by reference to the following detailed description when read with the accompanying drawings in which:
It will be appreciated that for simplicity and clarity of illustration, elements shown in the figures have not necessarily been drawn to scale. For example, the dimensions of some of the elements may be exaggerated relative to other elements for clarity. Further, where considered appropriate, reference numerals may be repeated among the figures to indicate corresponding or analogous elements.
In the following detailed description, numerous specific details are set forth, in order to provide a thorough understanding of the invention. However, it will be understood by those of ordinary skill in the art that the invention may be practiced without these specific details. In other instances, well-known methods, procedures, components, modules, units and/or circuits have not been described in detail so as not to obscure the invention.
Although embodiments of the invention are not limited in this regard, discussions utilizing terms such as, for example, “processing,” “computing,” “calculating,” “determining,” “establishing”, “analyzing”, “checking”, or the like, may refer to operation(s) and/or process(es) of a computer, a computing platform, a computing system, or other electronic computing device, that manipulates and/or transforms data represented as physical (e.g., electronic) quantities within the computer's registers and/or memories into other data similarly represented as physical quantities within the computer's registers and/or memories or other information non-transitory storage medium (e.g., a memory) that may store instructions to perform operations and/or processes. Although embodiments of the invention are not limited in this regard, the terms “plurality” and “a plurality” as used herein may include, for example, “multiple” or “two or more”. The terms “plurality” or “a plurality” may be used throughout the specification to describe two or more components, devices, elements, units, parameters, or the like. Unless explicitly stated, the method embodiments described herein are not constrained to a particular order or sequence. Additionally, some of the described method embodiments or elements thereof can occur or be performed simultaneously, at the same point in time, or concurrently. As used herein, in one embodiment the term “about” refers to ±10%. In another embodiment, the term “about” refers to ±9%. In another embodiment, the term “about” refers to ±9%. In another embodiment, the term “about” refers to ±8%. In another embodiment, the term “about” refers to ±7%. In another embodiment, the term “about” refers to ±6%. In another embodiment, the term “about” refers to ±5%. In another embodiment, the term “about” refers to ±4%. In another embodiment, the term “about” refers to ±3%. In another embodiment, the term “about” refers to ±2%. In another embodiment, the term “about” refers to ±1%.
In accordance with some embodiments of the invention, and as demonstrated at least in
According to some embodiments, each of the SNDA's primary channels comprises a straight-line configuration. According to some embodiments, each of the SNDA's secondary channels comprises a straight-line configuration. According to some embodiments, each of the SNDA's primary and secondary channels comprises a straight-line configuration. According to some embodiments, the SNDA's straight-line primary- and secondary-channels are configured to be parallel one to another. According to some embodiments, all SNDAs are configured to be parallel one to another.
According to some embodiments, the volume of each of the nano-well (130,230,330) is selected between 0.015 and 0.002 μL.
According to some embodiments, the nano-well's (330) opening to the primary channel is restricted and can comprise a neck configuration, as demonstrated in
According to some embodiments, and as demonstrated in
According to some embodiments, the entire apparatus and its contained fluid are thermally controlled to a temperature of 36±1° C., for an optimal bacterial growth. It was evidenced that the liquid in the nano-wells, which are closer to a large gas volume (e.g., ports and manifolds), tend to evaporate, before the liquid in the rest of the SNDA component.
Accordingly, a configuration that can create at least one liquid buffer, between the SNDA nano-wells and the large air chambers of the apparatus, is required. It is therefore that, according to some embodiments, the device (200,300,600,800) further comprising at least one liquid reservoir, configured to collect a predetermined amount of liquid. According to some embodiments, the liquid reservoir is a sacrificial liquid reservoir, wherein the collected liquid serves as a vapor source, used to prevent the evaporation of the liquid accommodated within the nano-wells, at least during the apparatus's incubation and/or test period.
According to some embodiments and as demonstrated in
According to some embodiments, and as demonstrated in
According to some embodiments, and as demonstrated in
According to some embodiments, each of the liquid reservoirs (224,324), is further configured to prevent, or at least partially inhibit, convection and advection from one primary channel to another, and therefore prevent, or at least inhibit, contamination between adjacent primary channels.
According to some embodiments, and as demonstrated in
According to some embodiments, and as demonstrated in
The sample waste chamber (225,325) is configured to collect liquid, flowing out of distribution manifold, up to a predetermined amount, before it enables its flow towards the outlet port (221s,321s).
According to some embodiments, and as demonstrated in
According to some embodiments, at least one of the liquid reservoirs comprises the flow stopper (226,326), therefore liquid is enabled to leave the reservoir, only above a predetermined pressure threshold.
According to some embodiments, the liquid reservoir (or sample waste chamber) (225,325), which is associated with the distribution manifold, further comprises the flow stopper (226,326), coupled between: the distribution manifold and the liquid reservoir, therefore liquid is enabled to leave the distribution manifold, only above a predetermined pressure threshold, which is selected to enable the filling of all nano-wells (via the primary channels), before flowing towards the liquid reservoir (225,325).
According to some embodiments, at least one of the SNDA components further comprises the flow stopper (226,326), coupled between:
According to some embodiments, and as demonstrated in
According to some embodiments, the apparatus's substrate (101,201,301, 601,801) comprises:
According to some embodiments, and as demonstrated in
According to some embodiments, and as demonstrated in
According to some embodiments, and as demonstrated in
According to some embodiments, the liquid chamber (421) comprises a liquid reservoir (453) (e.g., a sacrificial liquid reservoir), configured to avoid liquid communication with the flow stopper (456) and therefore keep a predetermined amount of liquid that serves as a vapor source.
According to some embodiments, and as demonstrated in
According to some embodiments, outlet port (321e,921e), located at the 2nd end of the collecting manifold (322,939B), is kept open at any time, to allow fluid evacuation.
According to some embodiments, the method step of examining (550,750) further comprising heating the device (200,300) to a predetermined temperature; according to some embodiments, the heating temperature is selected from about 34° C. to about 37° C., configured for the incubation of the fluid droplets, accommodated in the nano-wells, and such that the liquid reservoirs allow their accommodated liquid to vapor, while maintaining the fluid droplets in the nano-wells.
According to some embodiments, the method further comprising steps, which are prior to the sample fluid loading (510):
According to some embodiments, the method further comprising applying a negative pressure via the substrate's outlet (421e) and colleting manifold (222,322), configured to evacuate the collected treatment solutions out of the liquid reservoirs (224,324).
According to some embodiments, the method further comprising treating 504 droplets of the treatment solution. For a non-limiting example, heating the device (200,300) to a predetermined temperature, configured to dry or lyophilize the droplets of the treatment solution in the nano-wells. According to some embodiments, and as known in the art lyophilization process comprises freezing temperatures and vacuum. According to some embodiments, and as known in the art lyophilization process comprises drying.
According to some embodiments, and as demonstrated in
According to some embodiments, the device (600,800) further comprises plurality of individual metering chambers (615). Each of the metering chambers is coupled between the common distribution manifold (612,812) and a different primary channel (310) of a different SNDA component (602), just before its individual inlet port (313). According to some embodiments, each of the metering chambers comprises a gradual or sharp change in cross section (623) at its primary channel end-side, accordingly the metering chambers (615) are configured to hold a predetermined amount of sample fluid (e.g., liquid), to be loaded into its associated the primary channel, when a predetermined pressure is applied from the distribution manifold; such that when said predetermined pressure is provided via the distribution manifold, all primary channels are simultaneously loaded. According to some embodiments, each of the metering chambers is configured to accommodate a predetermined amount of fluid (e.g., sample liquid), such that an overflow of its associated SNDA liquid reservoir (624) is prevented; for example, such an overflow may damage the shearing of the excessive fluid out of primary channels (310) and therefore contaminate the nano-wells (330) of that SNDA (302).
According to some embodiments, the metering chamber (615) opening to the distribution manifold is restricted and can comprise a neck configuration, as demonstrated in
According to some embodiments, the metering chamber's (615) opening to the primary channel (310) is restricted and comprises a flow restriction configuration (632), as demonstrated in
According to some embodiments, the device (600,800) further comprises a fluid reservoir (620) and a fluid path (621), between the common inlet port (611) and the distribution manifold (612,812); the fluid reservoir (620) is configured to:
According to some embodiments, the device (600,800) further comprises a pressure inlet (641) and a pressure path (640) in direct communication with the distribution manifold (612,812) (not via the common inlet port (611) and its liquid reservoir (620), configured to enable the application of a positive pressure to the distribution manifold. According to such embodiments, when a pressure is applied via the pressure inlet (641), the common inlet (611) should be closed. According to some embodiments, the connection between the pressure path (640) with the distribution manifold comprises a flow stopper (626), configured to prevent passage of sample fluid from the distribution manifold towards the pressure path (640), as demonstrated in
Non limiting examples for some measures include at least one of:
According to some embodiments, devices (600,800) can be operated by any one of the above-mentioned method steps. According to some embodiments during the steps of sample loading (510, 520, 530) the plurality of individual metering chambers (615) are functioning as an integral part of the distribution manifold.
According to some embodiments, and as demonstrated for apparatus 1800 as in
According to some embodiments, and as demonstrated in
According to some embodiments, the configuration of device (800) as in
According to some embodiments, and as demonstrated in
According to some embodiments, outlet port (321e,921e), located at the 2nd end of the collecting manifold (322,939B), is kept open at any time, to allow fluid evacuation.
According to some embodiments, the methods 500 and/or 700 further comprising an embossing step. According to some embodiments, the term “embossing” refers to a process for producing a raised or a sunken design, at one or more predetermined points. According to some embodiments, process is provided by a stamping and/or pressing (optionality heat-pressing) process. According to some embodiments, the location of the embossing process is selected at a fluidic pathway, such that said path is blocked, and accordingly the selection of the size of embossing point. For example, by heat-pressing the film (490) to the substrates fluidic side (471,871) at one or more predetermined points of fluidic pathways, and/or by pressing an inlet/outlet and/or port, such that their fluidic path is permanently blocked. According to some embodiments, the embossing step/s are configured to prevent the evaporation of the fluid accommodated in the nano-wells.
According to some embodiments, the methods 500 and/or 700 comprising an embossing step (509,709), before the step of loading the fluid sample (510,710), configured to seal any fluidic path of all individual inlets (313) towards their associated primary channel, at microfluidic side (471,871) and/or to seal any fluidic path at all individual testing ports (413), at port side (472,872), (not shown). According to some embodiments, the step of embossing the individual inlets (313) is provided at a neck location thereof for example their pathways to their associated primary channel, therefore minimizing the size of the embossing point, while sealing their fluidic path. According to some embodiments, the step of embossing the individual inlets (313) and/or their pathways to their primary channel and/or the individual testing ports (413), is provided at the apparatus provider site.
According to some embodiments, and as demonstrated in
According to some embodiments, and as demonstrated for the configuration of apparatus (1600) in
According to some embodiments, and as demonstrated in
According to some embodiments, each SNDA's primary channel (310) is in fluid communication configured to be loaded with a sample fluid via its associated metering chamber (915A), at first end thereof; wherein each SNDA's metering chamber (915A) is in fluidic communication with its nest's (990) associated distribution manifold (912A).
According to some embodiments, each SNDA's primary channel (310) and secondary channels (320) are configured to evacuate fluid (gas and/or liquid) from their second end into their associated waste trap (e.g., liquid reservoir) (924A); wherein each SNDA's waste trap (924A) is in fluidic communication with its nest's (990) associated vent manifold (939A), via a vent (938A) configured to enable passage of gas only, from the waste trap (924A) to the vent manifold (939A), such that any liquid waste remains in the waste trap (924A).
According to some embodiments, the distribution manifold (912A) of each nest (990) of SNDA's is in fluidic communication configured to be loaded with a sample fluid via its associated second level metering chamber (915B), at first end thereof; wherein each nest's (990) second level metering chamber (915B) is in fluidic communication with a common second level distribution manifold (912B); the common second level distribution manifold (912B) is in fluidic communication, at first end thereof, configured to be loaded with sample fluid via the single inlet port (911); the common second level distribution manifold (912B) is configured to evacuate sample fluid from its second end into a third level waste trap (e.g., liquid reservoir) (924C), which is in fluidic communication with waste port 921s.
According to some embodiments, the distribution manifold (912A) of each nest (990) of SNDA's is configured to evacuate fluid (gas and/or liquid) from its second end into its associated second level waste trap (e.g., liquid reservoir) (924B); wherein each nest's (990) waste trap (924B) is in fluidic communication with a second level vent manifold (939B), via a vent (938B) configured to enable passage of gas only, from the second level waste trap (924B) to the second level vent manifold (939B), such that any liquid waste remains in the second level waste trap (924B); the second level vent manifold (939B) is in fluidic communication configured to evacuate gas via a vent port (921e).
According to some embodiments, each of the waste traps (924A,924B,924C), comprises a volume that is much larger than the volume it is aimed to trap (liquid waste), configured to prevent any overflow thereof. According to some embodiments, the volume of each of the waste traps (924A,924B,924C) is about between 1.2 and 1.7 larger than the volume it is aimed to trap (liquid waste). According to some embodiments, the volume of each of the waste traps (924A,924B,924C) is about twice the volume it is aimed to trap (liquid waste).
According to some embodiments, the provided various metering chambers and their configurations enable the demonstrated device (900) configuration of plurality of SNDA nests (990) aimed for a massive and simultaneous sample distribution, from a single sample loading port (911).
Opening restrictions. Table 1 demonstrates examples for opening restrictions, configured to reduce an energy barrier for a droplet shearing, such that a sheared fluid (e.g., liquid) is retained as a droplet within the metering chamber (315,615) or within the nano-well (330), according to some of the above-mentioned embodiments.
Nano-wells per field of view (FOV). According to some embodiments, and as demonstrated for example in
Examples for treatment solution components. According to some embodiments, a list of treatment solutions is provided that can be used to functionalize the micro fluidic testing apparatus, according to any one of the above-mentioned embodiments. According to some embodiments, the list of treatment solutions and their use footnotes (a-n) can be found in Table 6A of CLSI M100 ED31:2021 which can be accessed for free at http://em100.edaptivedocs.net/dashboard.aspx; “Table 6A. Solvents and Diluents for Preparing Stock Solutions of Antimicrobial Agents”. According to some embodiments, this functionalization process is performed in a production facility and is not done by the end user. According to some embodiments, the treatment solutions are loaded onto the device for drying.
Examples for treatment solution concentrations. According to some embodiments, the concentration of each antibiotic can be a two-fold dilution anywhere between 0.125 mg/L and 512 mg/L (see” Table 8A “Preparing Dilutions of Antimicrobial Agents to Be Used in Broth Dilution Susceptibility Tests” can be found in Table 6A of CLSI M100 ED31:2021 which can be accessed for free at http://em100.edaptivedocs.net/dashboard.aspx).
Sample solution components and concentrations. According to some embodiments, the sample solution can be composed of bacterial cells suspended in cation-adjusted mueller hinton broth (CAMBH), as demonstrated in Table 2. According to some embodiments, the concentration of bacteria can be anywhere between 1×103 CFU/mL to 1×109 CFU/mL. According to some embodiments, the standard inoculum concentration of 5×105 CFU/mL is used. Product sheets for CAMBH (https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/product/documents/312/461/90922dat.pdf) state that it contains the following components which are diluted in water and adjusted to a final pH of 7.3+/−0.2 at 25≅:
While certain features of the invention have been illustrated and described herein, many modifications, substitutions, changes, and equivalents will now occur to those of ordinary skill in the art. It is, therefore, to be understood that the appended claims are intended to cover all such modifications and changes as fall within the true spirit of the invention.
Filing Document | Filing Date | Country | Kind |
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PCT/IL2021/050867 | 7/15/2021 | WO |
Number | Date | Country | |
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63052466 | Jul 2020 | US |