Claims
- 1. A process for substantially cleaning a surface that has been treated with a chemical paint remover, wherein said chemical paint remover comprises an organic, acidic or basic compound, and wherein said surface is contaminated with said compound, said process comprising the steps of:
- (A) applying a liquid-state composition to said surface, wherein said liquid-state composition comprises:
- (i) a polymeric component and
- (ii) an agent selected from the group consisting of an absorbant, an acid-neutralizing agent, and a base-neutralizing agent; and wherein said liquid-state composition has a cleaning capacity of about 0.10;
- (B) allowing said liquid-state composition to interact with said compound to form a product and to solidify into a solid-state matrix, thereby sequestering said product in said solid-state matrix; and
- (C) removing said solid-state matrix from said surface.
- 2. The process of claim 1, wherein said compound is an organic contaminant and said agent is an absorbant.
- 3. The process of claim 2, wherein said absorbant is selected form the group consisting of gypsum, calcium carbonate with oil absorption above 20 g/100 g pigment, silica, china clay, talc, asbestine, mica, bentonite, carbon black, activated carbon, vermiculite and perlite.
- 4. The process of claim 2, wherein said absorbant comprises from about 1% to about 40% of the liquid-state composition, based on the total weight of said liquid-state composition.
- 5. The process of claim 2, wherein said compound is selected from the group consisting of dichloromethane, chloroform, 1,1,2-trichloroethane, 1,2,3-trichloropropane, dichlorobenzenes, dimethylsulfoxide, dimethyl formamide, furfural, methanol, propanol, tetrahydrofuran, methyl ethyl ketone, acetone, anisole, butyl acetate, cyclohexanone, limonene, propylene glycol, butyl cellosolve, ethoxyethanol, ethyl acetate, ethylene glycol monomethyl ether, methypyrrolidone, benzyl alcohol, diacetone alcohol, dioxane, toluene, dimethyl phthalate, dimethyl acetamide, xylene, hydrocarbons, petroleum distallates, naphtha, naval stores, and dialkyl maleates.
- 6. The process of claim 1, wherein said compound is acidic and said agent is an acid-neutralizing agent.
- 7. The process of claim 6, wherein said acid-neutralizing agent is selected from the group consisting of alkali metal bicarbonates, alkali metal hydroxides, ammonium hydroxide, alkali metal phosphates, alkali metal silicates, dialkyl substituted ammonia derivatives, monoalkyl substituted ammonia derivatives, and trialkyl substituted amines.
- 8. The process of claim 7, wherein said acid-neutralizing agent is selected from the group consisting of sodium bicarbonate, cesium hydroxide, potassium hydroxide, sodium hydroxide, tetrapotassium pyrophosphate, trisodium phosphate, potassium metasilicate, sodium metasilicate, dimethylamine, diethylamine, diisopropylamine, diethanolamine, morpholine, piperazine, piperidine, methylamine, ethylamine, and ethanolamine, trimethylamine, triethylamine and triethanolamine.
- 9. The process of claim 6, wherein said acid-neutralizing agent comprises from about 0.1% to about 20& of the liquid-state composition, based on the total weight of said liquid-state composition.
- 10. The process of claim 6, wherein said compound is selected form the group consisting of acetic acid, chloroacetic acid, aromatic thiols, phenol, cresol, formic acid, oxalic acid, glycolic acid, phosphoric acid, toluenesulfonic acid, fluorosulfuric acid, hydrofluoric acid, hydrochloric acid, sulfuric acid and nitric acid.
- 11. The process of claim 1, wherein said compound is basic and said agent is a base-neutralizing agent.
- 12. The process of claim 11, wherein said base-neutralizing agent is selected from the group consisting of mineral acids and organic acids.
- 13. The process of claim 12, wherein said base-neutralizing agent is selected from the group consisting of hydrochloric acid, phosphoric acid, nitric acid, sulfuric acid, boric acid, carbonic acid, and chromic acid, acetic acid, adipic acid, benzoic acid, butyric acid, chloroacetic acid, citric acid, cresol, dichloroacetic acid, formic acid, fumaric acid, lactic acid, malonic acid, napthalenesulfonic acid, oleic acid, oxalic acid, phenolic acid, phthalic acid, quinolinic acid, and uric acid.
- 14. The process of claim 11, wherein said base-neutralizing agent comprises from about 0.5% to about 25% of the liquid-state composition, based on the total weight of said liquid-state composition.
- 15. The process of claim 11, wherein said compound is selected from the group consisting of sodium hydroxide, sodium metasilicate, potassium hydroxide, lithium hydroxide, calcium hydroxide, calcium oxide, trisodium phosphate, ammonium hydroxide, ethylenediamine, polyethylenepolyamines, triethanolamine, hydrazine, morpholine, pyridine, and quaternary ammonium compounds.
- 16. The process of claim 1, further comprising a step of using a chemical drying agent.
- 17. The process of claim 16, wherein said liquid-state composition comprises said drying agent.
- 18. The process of claim 16, wherein said drying agent is applied after said liquid-state composition has been applied.
- 19. The process of claim 1, wherein said polymeric component is selected from the group consisting of polacrylonitrile-containing copolymers, acrylonitrile/butadiene/styrene copolymers, butadiene copolymer rubbers, butadiene-styrene copolymers, chlorinated butadiene-styrene rubbers, chlorinated butyl rubbers, chlorinated isoprene rubbers, chlorinated polyethylenes, chlorosulfonated polyethylenes, chlorinated rubbers, chlorinated Neoprene rubber, chloroprene rubber, chloroprene copolymers with methacrylic acid, chloroprene copolymers with 2,3-dichloro-1,3-butadiene, cellulosics, cellulose ethers, natural rubbers, epoxidized natural rubbers, phosphazene rubbers, polyacrylate homopolymers, polyacrylate copolymers, polyacrylate vehicles, polyacrylate copolymers containing acrylic acids, polyacrylate copolymers containing methacrylic acids, polydimethylsiloxanes, polysulfide rubbers, poly(vinyl acetate) homopolymers, poly(vinyl acetate) copolymers, poly(vinyl alcohols), poly(vinyl butyral), poly(vinyl formal), poly(vinyl chloride) homopolymers, poly(vinyl chloride) copolymers, chlorinated poly(vinyl chlorides), poly(vinyl chloride-vinyl acetate) copolymers, urethane rubbers, polyether urethanes, polyester urethanes, polyurethane dispersions, epichlorohydrin rubbers, ethylene oxide/propylene oxide rubbers, isobutylene rubbers, and poly(perchloroethylenes).
- 20. The process of claim 1, wherein said surface is further contaminated with lead from paint.
- 21. The process of claim 20, wherein said paint comprises at least about 0.05% lead.
- 22. The process of claim 21, wherein said paint comprises at least about 0.5% lead.
- 23. The process of claim 20, wherein said lead is selected from the group consisting of lead driers, basic carbonate white lead, basic sulphate white lead, basic silicate white lead, leaded zinc oxide, red lead, lead chromate, lead oxide chromate, and lead molybdate.
- 24. The process of claim 1, wherein said solid-state matrix is removed from said surface by peeling said solid-state matrix away from said surface.
- 25. The process of claim 1, wherein said surface is selected from the group consisting of wood, cement, brick, cinder block, plasterboard, and wall board.
- 26. The process of claim 1, wherein said surface is selected from the group consisting of steel, aluminum and tile.
- 27. A process for substantially cleaning a surface that has been treated with a chemical paint remover, wherein said chemical paint remover comprises an organic, acidic or basic compound, and wherein said surface is contaminated with said compound, said process comprising the steps of:
- (A) applying a liquid-state composition to said surface, wherein said liquid-state composition comprises an agent selected from the group consisting of an absorbant, an acid-neutralizing agent, and a base-neutralizing agent;
- (B) applying a second liquid-state composition to said surface, wherein said second liquid-state composition comprises a polymeric component and has a cleaning capacity of about 0.10;
- (C) allowing said liquid-state compositions to interact with said compound to form a product and to solidify into a single solid-state matrix, thereby sequestering said product in said solid-state matrix; and
- (D) removing said solid-state matrix from said surface.
- 28. A process according to claim 27, wherein said second liquid-state composition enhances the removability of said solid-state matrix from said surface.
CROSS-REFERENCE TO RELATED APPLICATION
This application claims benefit under 35 U.S.C. .sctn. 120 and application is a continuation of Ser. No. 07/914,386, filed Jul. 17, 1992, now U.S. Pat. No. 5,421,897, which is a continuation of application Ser. No. 08/092,427, filed Jul. 19, 1993, now abandoned, the disclosures of which are expressly incorporated herein by reference.
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Continuations (2)
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Number |
Date |
Country |
Parent |
914386 |
Jul 1992 |
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Parent |
92427 |
Jul 1993 |
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