Ablation system

Information

  • Patent Grant
  • 7367972
  • Patent Number
    7,367,972
  • Date Filed
    Tuesday, September 9, 2003
    21 years ago
  • Date Issued
    Tuesday, May 6, 2008
    16 years ago
Abstract
A system for creating lesions and assessing their completeness or transmurality. Assessment of transmurality of a lesion is accomplished by monitoring the impedance of the tissue to be ablated. Rather than attempting to detect a desired drop or a desired increase impedance, completeness of a lesion is detected in response to the measured impedance remaining at a stable level for a desired period of time, referred to as an impedance plateau. The mechanism for determining transmurality of lesions adjacent individual electrodes or pairs may be used to deactivate individual electrodes or electrode pairs, when the lesions in tissue adjacent these individual electrodes or electrode pairs are complete, to create an essentially uniform lesion along the line of electrodes or electrode pairs, regardless of differences in tissue thickness adjacent the individual electrodes or electrode pairs.
Description
BACKGROUND OF THE INVENTION

The present invention relates to tissue ablation devices generally and relates more particularly to devices adapted to ablate lines of tissue, for example for use in conjunction with an electrosurgical version of the Maze procedure.


The Maze procedure is a surgical intervention for patients with chronic atrial fibrillation (AF) that is resistant to other medical treatments. The operation employs incisions in the right and left atria which divide the atria into electrically isolated portions which in turn results in an orderly passage of the depolarization wave front from the sino-atrial node (SA Node) to the atrial-ventricular node (AV Node) while preventing reentrant wave front propagation. Although successful in treating AF, the surgical Maze procedure is quite complex and is currently performed by a limited number of highly skilled cardiac surgeons in conjunction with other open-heart procedures. As a result of the complexities of the surgical procedure, there has been an increased level of interest in procedures employing electrosurgical devices or other types of ablation devices, e.g. thermal ablation, micro-wave ablation, cryo-ablation or the like to ablate tissue along pathways approximating the incisions of the Maze procedure. Electrosurgical systems for performing such procedures are described in U.S. Pat. No. 5,916,213, issued to Hiassaguerre, et al. U.S. Pat. No. 5,957,961, issued to Maguire, et al. and U.S. Pat. No. 5,690,661, all incorporated herein by reference in their entireties. Cryo-ablation systems for performing such procedures are described in U.S. Pat. No. 5,733,280 issued to Avitall, also incorporated herein by reference in its entirety.


In conjunction with the use of electrosurgical ablation devices, various control mechanisms have been developed to control delivery of ablation energy to achieve the desired result of ablation, i.e. killing of cells at the ablation site while leaving the basic structure of the organ to be ablated intact. Such control systems include measurement of temperature and impedance at or adjacent to the ablation site, as are disclosed in U.S. Pat. No. 5,540,681, issued to Struhl, et al., incorporated herein by reference in its entirety.


Additionally, there has been substantial work done toward assuring that the ablation procedure is complete, i.e. that the ablation extends through the thickness of the tissue to be ablated, before terminating application of ablation energy. This desired result is some times referred to as a “transmural” ablation. For example, detection of a desired drop in electrical impedance at the electrode site as an indicator of transmurality is disclosed in U.S. Pat. No. 5,562,721 issued to Marchlinski et al, incorporated herein by reference in its entirety. Alternatively, detection of an impedance rise or an impedance rise following an impedance fall are disclosed in U.S. Pat. No. 5,558,671 issued to Yates and U.S. Pat. No. 5,540,684 issued to Hassler, respectively, also incorporated herein by reference in their entireties.


Three basic approaches have been employed to create elongated lesions using electrosurgical devices. The first approach is simply to create a series of short lesions using a contact electrode, moving it along the surface of the organ wall to be ablated to create a linear lesion. This can be accomplished either by making a series of lesions, moving the electrode between lesions or by dragging the electrode along the surface of the organ to be ablated and continuously applying ablation energy, as described in U.S. Pat. No. 5,897,533 issued to Mulier, et al., incorporated herein by reference in its entirety. The second basic approach to creation of elongated lesions is simply to employ an elongated electrode, and to place the elongated electrode along the desired line of lesion along the tissue. This approach is described in U.S. Pat. No. 5,916,213, cited above and. The third basic approach to creation of elongated lesions is to provide a series of electrodes and arrange the series of electrodes along the desired line of lesion. The electrodes may be activated individually or in sequence, as disclosed in U.S. Pat. No. 5,957,961, also cited above. In the case of multi-electrode devices, individual feedback regulation of ablated energy applied via the electrodes may also be employed. The present invention is believed useful in conjunction with all three approaches


SUMMARY OF THE INVENTION

The present invention is directed toward an improved system for creating lesions and assessing their completeness or transmurality. In particular, the preferred embodiments of the invention are directed toward an improved system for creating elongated lines of lesion and assessing their completeness or transmurality. In the preferred embodiment as disclosed, the apparatus for producing the lesions is an electrosurgical device, in particular a saline-irrigated bipolar electrosurgical forceps. However, the mechanism for assessing lesion transmurality provided by the present invention is believed useful in other contexts, including unipolar R-F ablation and R-F ablation using catheters or hand-held probes. The mechanism for assessing transmurality may also be of value in the context of other types of ablation systems, particularly those which ablation occurs in conjunction with an induced rise in tissue temperature such as those applying ablation energy in the form of microwave radiation, light (laser ablation) or heat (thermal ablation).


According to the present invention, assessment of transmurality of a lesion is accomplished by monitoring the impedance of the tissue to be ablated. The inventors have determined that, particularly in the case of a saline-irrigated electrosurgical ablation device, tissue impedance first falls and then reaches a stable plateau, during which portion the lesion is completed. Thereafter, the impedance rises. Rather than attempting to detect a desired drop or a desired increase impedance as described in the above cited Yates, Hassler and Marchlinski patents, the present invention detects completeness of a lesion in response to the measured impedance remaining at a stable level for a desired period of time, hereafter referred to as an impedance plateau. In the context of R-F ablation, measurement of impedance may be done using the ablation electrodes or may be done using dedicated electrodes adjacent to the ablation electrodes. In the context of the other types of ablation discussed above, impedance measurement would typically be accomplished by means of a dedicated set of impedance measurement electrodes.


In the context of R-F ablation, the invention is believed most valuable in the conjunction with an ablation device having multiple, individually activatable electrodes or electrode pairs to be arranged along a desired line of lesion. In this context, the mechanism for determining transmurality of lesions adjacent individual electrodes or pairs may be used to deactivate individual electrodes or electrode pairs, when the lesions in tissue adjacent these individual electrodes or electrode pairs are complete. This allows the creation of an essentially uniform lesion along the line of electrodes or electrode pairs, regardless of differences in tissue thickness adjacent the individual electrodes or electrode pairs. However, the invention is also believed useful in conjunction with assessment of transmurality of lesions produced by devices having only a single electrode or single electrode pair. Similar considerations apply to the use of the present invention in the contexts of other types of ablation as listed above.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a plan view of a type of electrosurgical hemostat that may be used in conjunction with the present invention.



FIGS. 2
a and 2b illustrate alternative electrode configurations for a hemostat generally according to FIG. 1.



FIG. 3 illustrates the fall and plateau of impedance measured across tissue ablated using a bi-polar, saline irrigated electro surgical hemostat.



FIG. 4 is a functional block diagram of an RF generator appropriate for use in practicing the present invention, particularly adapted for use in conjunction with an ablation system employing multiple, individually activatable electrodes or multiple electrode pairs.



FIG. 5
a is a functional flow chart illustrating a first mode of operation of the device illustrated in FIG. 4 in practicing the present invention.



FIG. 5
b illustrates an alternative mode of operation of a device as in FIG. 4 in practicing the present invention.



FIG. 6 illustrates an additional alternative mode of operation of a device as in FIG. 4 in practicing the present invention.



FIG. 7 illustrates a first mode of operation of a device as in FIG. 4 to activate and deactivate of individual electrodes or electrode pairs.



FIG. 8 illustrates a second mode of operation of a device as in FIG. 4 to activate and deactivate individual electrodes or electrode pairs.





DETAILED DESCRIPTION PREFERRED EMBODIMENTS


FIG. 1 is a plan view of a bipolar, saline irrigated electrosurgical hemostat of a type that may be employed in conjunction with the present invention. The hemostat is provided with elongated handles 11 and 12 and a lock mechanism 14, similar to a conventional surgical hemostat. The handles are connected to one another by pivot or hinge 16, and continue distally in the form of elongated jaws 18 and 19. Jaws 18 and 19 carry an elongated electrode or series of electrodes 24, 25, respectively, to which ablation energy, e.g. RF energy is applied by means of conductors 21 and 22. The electrodes are adapted to be irrigated by a saline solution or other conductive fluid along their length, provided via inlet tubes 20 and 23. In operation, tissue to be ablated is compressed between the jaws, and RF energy is applied between the electrode or electrode sets 24 and 25, as generally described in U.S. Pat. No. 6,096,037 issued to Mulier et al incorporated herein by reference in its entirety.



FIG. 2
a shows a first embodiment of an electrode arrangement for a hemostat generally as illustrated in FIG. 1. Illustrated components correspond to identically numbered components in FIG. 1. In this embodiment, electrodes 24 and 25 take the form of elongated coil electrodes 30 and 32, mounted around porous tubes 34 and 36, through which saline or other conductive fluid is delivered. The arrangement of the electrodes may also be reversed, for example placing coils 30 and 32 within elongated porous tubes 34 and 36, to accomplish a similar result. Alternatively, any other arrangement for providing an elongated electrode and delivery of saline solution along the length thereof may be substituted. The particular configuration of the electrode is not critical to the present invention. For example, irrigated electrodes corresponding to those described in U.S. Pat. No. 6,096,037 issued to Mulier, et al., U.S. Pat. No. 5,876,398 issued to Mulier, et al., U.S. Pat. No. 6,017,378 issued to Brucker, et al or U.S. Pat. No. 5,913,856 issued to Chia, et al., all incorporated herein by reference in their entireties may also be substituted. It should also be noted that while the electrode system as illustrated in FIG. 2a is a bipolar system, the invention may also be employed in conjunction with unipolar electrodes and/or in the form of a probe or a catheter. In some embodiments, irrigation of the electrodes may be omitted.



FIG. 2
b illustrates an alternative embodiment of an electrode system for a hemostat generally as illustrated in FIG. 1. In this case, rather than a single pair of electrodes, multiple electrode pairs are provided. The electrode pairs comprise coil electrodes 40 and 42, 44 and 46, 48 and 50, 52 and 54, and 56 and 58. However, other pairings of electrodes might also be substituted, for example, pairing electrodes 40 and 44, electrodes 48 and 52 or the like. In this embodiment, the electrode pairs are mounted around porous plastic tubes 60 and 62 through which saline or other electrically conductive fluid is delivered. As in the case with the embodiment of FIG. 2a, the arrangement of these electrodes may readily be reversed, placing the electrodes within the lumen of plastic tube 60 or 62 and any other arrangement providing multiple, irrigated electrodes may also be substituted. As in the case of the embodiment of FIG. 2a, unipolar electrodes might be substituted for the multiple bipolar pairs as illustrated and/or the invention may be practiced in conjunction with a multi-electrode probe or catheter. While the particular arrangement of electrodes is not believed critical to practicing the present invention, it is believed that the invention may be most beneficially practiced in conjunction with a set of linearly arranged bipolar electrode pairs as illustrated in FIG. 2b.


In use, the hemostat is arranged so that the tissue to be ablated is located between the jaws 18 and 19, and pressure is applied in order to compress the tissue slightly between the jaws to ensure good electrical contact. All electrode pairs may be activated individually and may be individually deactivated when the lesions between the individual electrode pairs are completely transmural. Alternatively, electrode pairs could be activated sequentially, with one pair deactivated upon a detection of a complete lesion between the electrode pair, followed by activation of the next sequential electrode pair. Corresponding use of the invention in conjunction with a series of unipolar electrodes, for example corresponding to electrodes along one of the two jaws in conjunction with a remote ground plate or a similar series of individually activatable electrodes on a catheter or probe in conjunction with a ground plate is also possible.



FIG. 3 is a graph illustrating measured impedance versus time across tissue located between the electrodes of an irrigated bipolar hemostat as illustrated in FIG. 1. FIG. 3 illustrates the drop in impedance followed by an impedance plateau, ultimately followed by an impedance rise. The impedance plateau is the primary indicator of transmurality employed by the present invention. Following the impedance plateau, as tissue is desiccated or as steam forms in the tissue, an impedance rise will generally occur. In some embodiments of the invention, the detection of this rise in impedance is employed as an alternative or mechanism for assessing transmurality and/or as a safety mechanism in order to assure shut off of the ablation electrodes before excessive physical damage to the tissue results.



FIG. 4 is a functional block diagram illustrating one embodiment of an R-F generator system for use in conjunction with the present invention. In this embodiment, separately controllable R-F outputs are provided for individual ablation electrodes or electrode pairs on an associated R-F ablation device, for example as in FIG. 2B. The R-F generator could of course also be used with ablation devices having only a single electrode or electrode pair as in FIG. 2A. With the exception of the electrogram amplitude measurement circuits discussed below, the generator corresponds generally to that described in conjunction with FIG. 14 of the '961 patent issued to Maguire, et al., cited above. The RF generator disclosed in the '961 patent provides feedback control of R-F power based upon either measured power (constant power) or temperature. The present invention is somewhat easier to implement in conjunction with the constant power mode, but may also be adapted to a temperature-regulated mode or to other feedback power regulation mechanism.


Display 804 and controls 802 are connected to a digital microprocessor 800, which permits interface between the user and the remainder of the electrical components of the system. Microprocessor 800 operates under control of stored programming defining its operation including programming controlling its operation according to the present invention, as discussed in more detail below. Microprocessor 800 provides control outputs to and receives input signals from the remaining circuitry via address/data bus 806. In particular, the microprocessor 800 provides for monitoring of power, current, voltage, impedance and temperature. As necessary, the microprocessor will provide this information to the display 804. Additionally, the microprocessor 800 permits the user to select the control mode (either temperature or power) and to input the power set point, temperature set point, and a timer set point to the system. The primary source of power for the radio-frequency generator may be a 12 V battery rated at 7.2 ampere-hours. Alternatively, the device may be AC powered. A back-up battery (not shown) such as a lithium cell may also be provided to provide sufficient power to the microprocessor 260 to maintain desired memory functions when the main power is shut off.


The power supply system as illustrated includes a desired number “M” of individually controllable R-F power supplies and receives temperature inputs from a desired number “N” of temperature sensing devices in the ablation device, illustrated schematically at 838 and receives temperature inputs from a desired number “M” of impedance monitoring circuits. Each R-F power supply includes a transformer (822, 824, 826), a power control circuit (810, 812, 814) and a power measurement circuit (816, 818, 820). A crystal-locked radio-frequency oscillator 264 generates the switching pulses, which drive both the power transformers (822, 824, 826) and the power controllers (810, 812, 814). Power controllers (810, 812, 814) may be analog controllers which operate by pulse-width modulation by comparing a power set point signal from microprocessor 800 with an actual power signal generated by a power measurement circuit (816, 818, 820), which may, for example, include a torroidal transformer coupled to the power output from the associated transformer (822, 824, 826). The power measurement circuits (816, 818, 820) multiply the output current and voltage and provide the resulting actual power signal to both the power controllers (810, 812, 814) and the microprocessor 800.


The R F power output of the transformers (822, 824, 826) is provided to inter face board 808, and thereby is provided to the ablation electrode or electrodes on the ablation device 838. Separate analog comparator circuits (not illustrated) may also be provided for monitoring the output of the power measurement circuits (816, 818, 820), in order to shut-off current to the output transformers (822, 824, 826) if the power exceeds a limit, typically 55 watts. Power transformers (822, 824, 826) may include center taps, which receive the outputs of the power controllers (810, 812, 814). Secondary windings of the transformers (822, 824, 826) may provide for continuous monitoring of the applied voltage in order to permit the power calculations by power measurement circuits (816, 818, 820).


The illustrated power R-F generator system employs software controlled temperature processing, accomplished by micro processor 800, which receives the “N” temperature input signals from temperature measurement circuits (828, 830, 832), each of which are coupled to a corresponding temperature sensor in ablation device 838 by means of an electrical connector, illustrated schematically at 836 and interface circuit 834. If programmed to operate in the temperature controlled mode, processor 800 receives the “N” temperature signals and, based upon the indicated temperatures, defines power set points for each of the power control circuits (810, 812, 814), which in the manner described above control the power levels applied to electrodes on the catheter through interface 834. Processor 800 may also selectively enable or disable any of the “M” provided R-F power sup plies, in response to external control signals from controls 802 or in response to detected anomalous temperature conditions.


In addition to the circuitry as described above and disclosed in and disclosed in the Maguire, et al. '961 patent, the apparatus of FIG. 4 includes multiple impedance monitoring circuits ZM1, ZM2 . . . ZMM (842, 844 and 846 respectively), which may operate as described in U.S. Pat. No. 5,733,281, issued to Nardella, or U.S. Pat. No. 5,863,990, issued to Li, also both incorporated herein by reference in their entireties to measure an impedance between electrodes on a RF ablation device. Impedance may be measured between the ablation electrodes or between electrodes located adjacent the ablation electrodes, as described in U.S. Pat. No. 5,558,671, incorporated by reference above. Individual impedance measurements made by measurement circuits 842, 844 and 846 are provided to the address/data bus 806 and thence to microprocessor 800 for analysis to determine whether the impedance over time, indicates that the lesion associated with the measured impedance is completely transmural. As discussed in more detail below, a determination of transmurality is made in response to a detection of a series of impedance measurements that are relatively constant, over a desired period of time or over a defined number of successive impedance measurements. In some embodiments, an abrupt rise in impedance may also be employed to terminate delivery of ablation energy.


As an alternative to dedicated impedance monitoring circuits, the microprocessor may employ voltage and current measurements of impedance measurement signals generated by the power transformers (822, 824, 826) to derive impedance and may use such derived impedance values in conjunction with the present invention. For example, measurement of impedance in this fashion is disclosed in U.S. Pat. No. 5,540,681, issued to Struhl, et al, cited above or U.S. Pat. No. 5,573,533, issued to Struhl, also incorporated herein by reference in its entirety.


In cases in which an alternative ablation energy generation apparatus is employed, particularly those in which a rise in tissue temperature is induced, e.g. laser, microwave or thermal ablation, the R-F generation circuitry of FIG. 4 would be replaced with a corresponding alternative ablation energy generation apparatus. The measurement of tissue impedance and its use according to the present invention, however, may still be useful in conjunction with these alternative ablation energy generation systems.



FIG. 5A is a functional flow chart illustrating the operation of a device as in FIG. 4, according to the present invention. The flow chart of FIG. 5A illustrates operation of the device of FIG. 4 to control provision of R-F energy to an individual electrode or electrode pair. In the event that multiple electrodes or electrode pairs are employed, the control methodology of FIG. 5A would be applied to each electrode or electrode pair individually, as discussed in more detail below in conjunction with FIGS. 7 and 8.


The flow chart of FIG. 5A illustrates a method of assessing transmurality and terminating delivery of ablation energy to an electrode or an electrode pair responsive to detection of a plateau in impedance in conjunction with a detected drop in impedance. Following the detection of a plateau in conjunction with the required impedance drop, the device waits a defined time period and then terminates the application of ablation energy to the associated electrode pair. Measurement of impedance in tissue associated with the electrode pair may be made using the ablation electrodes themselves or electrodes located in proximity to the ablation electrodes, for example as described in the Yates '671 patent, incorporated by reference above.


After initialization at 200, the microprocessor 800 (FIG. 4) initiates delivery of ablation energy at 201 and causes the impedance measurement circuitry associated with the electrode or electrode pair being evaluated or derives impedance based on applied voltage and current as discussed above to acquire a base line or initial impedance Zi, which may be, for example the maximum impedance during the first three seconds of ablation. At 202 and 204 counts “n” “m” are reset to zero. The microprocessor thereafter acquires a current impedance value Zn at 206. The value of “n” is incremented at 208 and compared with a predefined value “a” at 210 to determine whether a sufficient number of impedances have been measured in order to calculate the rate of change of impedance (dZ/dt). For example, dZ/dt may be calculated by taking the measured impedance Zn and comparing it to the preceding measured impedance Zn-1, in which case n would have to be greater or equal to 2 in order for dZ/dt to be calculated. Alternatively, dZ/dt may be calculated by taking the measured impedance Zn and comparing it to the previously measured impedance Zn-2, in which case n would have to be greater or equal to 3 in order for dZ/dt to be calculated. If “n” is less than “a” at 210, the microprocessor waits an impedance sampling interval Δt1, which may be, for example, 0.2 seconds, and then triggers an impedance measurement again at 206. This process continues until there are a sufficient number of collected impedance measurements to calculate dZ/dt at 212.


At 212, the microprocessor 800 employs the stored impedance measurements to calculate dZ/dt, which may, for example, be calculated as equal to (1/(2Δt1)) (Zn−Zn-2). The absolute value of dZ/dt, i.e., |dZ/dt|n is employed to assess whether or not an impedance plateau has been reached at 214. The microprocessor checks at 214 to determine whether |dZ/dt|n is less than a defined constant b, indicative of a minimal rate of change of impedance. In the case of an elongated, fluid irrigated ablation electrode similar to that illustrated in FIG. 2A, for example using an electrode of approximately 5 centimeters in length operated in a constant power mode with a power of less than 27 watts, an appropriate value of “b” might be 1.0. For other electrode configurations and other power levels, the value of “b” would have to be adjusted. Other power control modes, e.g. temperature controlled would similarly require adjustment of this parameter. The value of “b” and other parameters employed to determine transmurality using the present invention can be determined empirically in the laboratory by applying the specific electrode set and R-F generation system in question to test specimens, reading impedances at defined sample intervals and using the results to optimize the various parameters.


In the event that |dZ/dt|n is sufficiently small in value at 214, the count “m” is incremented at 216 and m is compared to a third constant “c” which sets forth the defined number of low value |dZ/dt|n measurements required to detect an impedance plateau. For example, in a system as described herein, “c” may be 6-12. Alternatively, rather than requiring an entire series of measured |dZ/dt|n values to be less than “b”, a requirement that a defined proportion of the |dZ/dt|n values must be less than “b” may be substituted, e.g. 8 of 12, or the like.


If the number of low values of |dZ/dt|n is less than “c” at 218, the microprocessor waits the impedance sampling interval Δt1 at 220 and continues to acquire successive impedance measurements until sufficient number of sequential low values of |dZ/dt|n have occurred at 218. At that point, the microprocessor then compares the current impedance value Zn with the initial impedance value Zi to determine whether a sufficient impedance drop has occurred. If not, the microprocessor waits for the next impedance sampling interval at 220 and continues to collect impedance measurements and make calculations of |dZ/dt|n until such time as an impedance plateau is recognized at 218 and a sufficient impedance drop is recognized at 220. When both of these criteria have been met at 220, the microprocessor than waits for an additional time interval Δt2 to assure completeness of the lesion at 222 and thereafter terminates the provision of ablation energy to the specific electrode pair being regulated at 224 and the ablation process with regard to that electrode or electrode pair is terminated at 226.



FIG. 5B illustrates an additional set of operations for implementing a transmurality measurement method generally as in FIG. 5A. The operations of FIG. 5B may either be a substituted for step 222 of FIG. 5A or alternatively may be performed before or after step 222. In the additional operations illustrated in FIG. 5B, the microprocessor increases the power to the electrodes under consideration slightly at 228 and sets a timer at 230. The microprocessor then causes the impedance measurement apparatus associated with the electrodes under consideration to measure current impedance at 234 and calculate |dZ/dt|n at 236, in the same fashion as discussed above. In the event that the value of |dZ/dt|n is greater then a defined constant “e” at 240, the microprocessor returns to 204 and resets the value of “m” to zero, essentially reinitializing the search for an impedance plateau. The value of “e” may be equal to “b” or may be different. If the value of |dZ/dt|n is sufficiently small at 240, the microprocessor checks at 242 to determine whether the timer has expired. If not, the microprocessor waits the impedance sampling interval Δt1 at 238 and continues to collect impedance values and calculate |dZ/dt|n values until expiration of the timer at 242, at which point it either terminates ablation at 224 or initiates the waiting period Δt1 at 222.



FIG. 6 illustrates a second basic approach to assessment of transmurality and control of delivery of ablation energy to an electrode pair. In the same fashion as for FIGS. 5a and 5b, the procedure defined by the flow chart of FIG. 6 it should be understood to be employed in conjunction with an impedance measurement circuit with a single electrode pair, which procedure would be repeated for other electrodes or electrode pairs, if present. After initiation at 300, the value of “n” is set to Zero at 302 and a timer is initiated at 304, used to determine that a sufficient amount of time has passed prior to termination of ablation. For example, in the context of a bipolar irrigated hemostat similar to FIGS. 1 and 2a as described above, having electrode lengths of 2 to 5 centimeters and receiving RF energy at a level of 27 watts or less, ten seconds may be an appropriate time interval for the timer initiated at 304.


The microprocessor than measures the current impedance Zn at 310 increments the value of “n” at 310 and checks at 314 to determine whether an adequate number of impedance measurements have been accumulated to make a calculation of dZ/dt at 314, in the same fashion as discussed above in conjunction with FIGS. 5a and 5b. If an inadequate number of samples have been collected, the microprocessor waits the impedance sampling interval Δt at 308 and continues to collect impedance measurements until an adequate number “a” of measurement have been collected. In the specific example presented, “a” may be set equal to 19 and Δt may be 0.2 seconds. After an adequate number of impedance measurements have been collected at 314, the microprocessor calculates the value of dZ/dtn and |dZ/dt|n at 316. In conjunction with the specific mechanism of plateau detection illustrated in FIG. 6, filtered or average impedance values Za may be employed to calculate dZ/dt and |dZ/dt|n.


For example, at 316, the microprocessor may calculate the value of dZ/dt according to the following method. The microprocessor may employ a 5 point moving average filter to produce an average impedance value Za, which is equal to (Zn+Zn-1+Zn-2+Zn-3+Zn-4)/5. The value of dZ/dtn and |dZ/dt|n may be calculated in the same fashion as in conjunction with the flow charts of FIGS. 5A and 5B discussed above, substituting the averaged impedance values Za for the individual impedance values Zn as employed in the previous flow charts. In this case, dZ/dtn would be (1/(2Δt)) (Zn−Zn-2) and |dZ/dt|n would be the absolute value of dZ/dt.


At 318, microprocessor 308 may attempt to determine whether an impedance plateau has been reached employing the following method. The microprocessor reviews the preceding 15 measurements of dZ/dtn, and |dZ/dt|n and applies three criteria to those values, all three of which must be met in order for an impedance plateau to be detected. For a fluid irrigated hemostat as described, the rules may be as follows: for n=1 to 15; |dZ/dt|n must be less than or equal to 1 for all 15; and for n=1 to 15 the value of dZ/dtn must be less than or equal to 0.75, for thirteen of the 15; and for n=1 to 15, |dZ/dt|n must be less than or equal to 0.5, for 10 of the 15. If all of these criteria are met at 318, the microprocessor checks at 319 to determine whether an adequate period of time has elapsed since ablation was initiated, if not, the microprocessor waits for the impedance sampling interval Δt at 312 and continues to measure impedances and calculate values of dZ/dt according to the above described method until both a plateau is present and the defined time period “b” has elapsed at 319. After the required time period at “b” at 319 has elapsed, delivery of ablation energy to the associated electrode or electrode pair is terminated at 322 and the ablation process ceases at 324 as to that electrode pair.


In this embodiment, in the event that an impedance plateau fails to manifest itself, the microprocessor may nonetheless safely terminate provision of ablation energy to the electrode pair under consideration in response to a detected rapid rise in impedance, which normally follows the impedance plateau. In the event that a plateau is not detected at 318, the microprocessor checks the preceding stored values of dZ/dtn to look for a rapid rise in impedance. For example, a rapid rise in impedance may be detected using the following rule: for n=1 to 10, dZ/dtn must be greater than or equal to 1.0 for all 10. If this rapid rise criteria is met at 320, the processor checks to see whether the required minimal time period has elapsed at 319, and if so, terminates ablation at 322 as discussed above. If the minimal time interval “b” has not elapsed, the microprocessor continues to acquire measurements of impedance and continues to calculate values of dZ/dt and |dZ/dt|n until either an impedance plateau is detected at 318 or a rapid rise in impedance is detected at 320 and the minimum time interval has expired at 319.



FIG. 7 is a function flow chart illustrating the over-all operation of the device in conjunction with a multi electrode or multi electrode pair ablation apparatus. In the flow chart of FIG. 7, all the electrodes are activated simultaneously and individual electrodes or electrode pairs are deactivated in response to impedance measurements associated with the electrode pair indicating that the lesion formed between that electrode pair is completely transmural. In this circumstance, the ablation system works as follows.


After initialization at 406, all electrodes 1-x are activated at 402, meaning that ablation energy is provided to all electrodes and electrode pairs. The microprocessor then checks the value of dZ/dt and/or |dZ/dt| at the first of the electrode pairs at 404, using any of the mechanisms discussed above in conjunction with FIGS. 5a, 5b and 6. At 408, the microprocessor checks using any of the mechanisms described above to determine whether an impedance plateau has been reached or, in the event that additional criteria for shut off of ablation energy are provided, to see whether any of these additional criteria are reached. If so, the electrode being examined is deactivated at 410 by ceasing the delivery of ablation energy to the electrode or electrode pair. If not, the microprocessor checks the value of dZ/dt and/or |dZ/dt| for the next electrode at 406. This process continues until all electrodes are deactivated at 412, after which the procedure is deemed complete at 414 and the ablation process is terminated at 416.



FIG. 8 illustrates a functional flow chart of overall operation of a device in which a multi-electrode or multi-electrode pair ablation apparatus is employed, as in FIG. 7. In this embodiment, however, electrodes or electrode pairs are activated initially and sequentially. After initialization at 500, the microprocessor activates delivery of ablation energy to the first electrode at 502, checks dZ/dt and/or |dZ/dt| at 504 and, in the same manner as described for FIG. 7 above, checks to determine whether the impedance plateau criteria and/or other criteria as described above have been met. If so, the electrode is deactivated at 510. If not, application of ablation energy continues until the plateau criterion or other criteria are met as described above. After deactivation of an electrode at 510, the microprocessor checks to determine whether all electrodes have been activated and deactivated at 512, if not, the microprocessor then activates the next electrode at 506 and initiates delivery of ablation energy to that electrode. This process continues until the last electrode has been deactivated at 512, following which the microprocessor determines that the ablation process is complete at 514 and the ablation process is stopped at 516.


The overall operational methodology of FIG. 7 is believed to be desirable in that it allows for a more rapid completion of an ablation procedure. However, the overall operational method is described in FIG. 8 has the advantage that it may allow the use of a somewhat simplified generator because that multiple, separate impedance measurement circuits, power control circuits, and the like need not be provided for each electrode or electrode pair. A simple switching mechanism may be used in conjunction with only a single RF generator and impedance measurement circuit to successively apply energy to each electrode and to monitor impedance according to the invention.

Claims
  • 1. An ablation system, comprising: generating means for generating ablation energy;an ablation device comprising first ablation means connectable to the generating means and locatable adjacent a first tissue site to be ablated, for applying the generated ablation energy to the first tissue site;a first impedance measuring electrode mounted to the ablation device so that the first impedance measuring electrode is adjacent the first tissue site when the first ablating means is adjacent the first tissue site;impedance measurement circuitry connectable to the first impedance measuring electrode to measure impedance at the first tissue site, using the first impedance measuring electrode; andcontrol circuitry operably coupled to the generating means to initiate and terminate the application of ablating energy to the first ablating means, wherein the control circuitry is coupled to the impedance measurement circuit and terminates application of ablation energy to the first ablating means responsive to occurrence of an impedance plateau measured by the impedance measuring circuitry using the first impedance measuring electrode, following initiation of application of ablating energy to the first ablating means, wherein the impedance plateau is defined as a maximum acceptable rate of change of impedance measurements over a defined period of time.
  • 2. A system as in claim 1 wherein the first ablating means is a first ablation electrode and wherein the generating means comprises an R-F generator.
  • 3. A system as in claim 2 wherein the first ablation electrode is an irrigated ablation electrode.
  • 4. A system as in claim 2 wherein the first ablation electrode is employed as the first impedance measuring electrode.
  • 5. A system as in any of claims 1-4, further comprising: second ablation means and connectable to the generating means and mounted to the ablation device so that the second ablation means is locatable adjacent a second tissue site to be ablated while the first ablation means is located adjacent the first tissue site, for applying the generated ablation energy to the second tissue site;a second impedance measuring electrode mounted to the ablation device so that the second impedance measuring electrode is adjacent the second tissue site when the second ablating means is adjacent the second tissue site; andwherein the impedance measurement circuitry is connectable to the first impedance measuring electrode to measure impedance at the second tissue site, using the second impedance measuring electrode; andcontrol circuitry operably coupled to the generating means to initiate and terminate the application of ablating energy to the second ablating means, wherein the control circuitry is coupled to the impedance measurement circuitry and terminates application of ablation energy to the second ablating means responsive to occurrence of the impedance plateau measured by the impedance measuring circuitry using the second impedance measuring electrode, following initiation of application of ablating energy to the second ablating means.
  • 6. A system as in claim 5 wherein the second ablating means is a second ablation electrode.
  • 7. A system as in claim 6 wherein the second ablation electrode is an irrigated ablation electrode.
  • 8. A system as in claim 6 wherein the second ablation electrode is employed as the second impedance measuring electrode.
  • 9. A system as in claim 5 wherein the first and second ablating means are simultaneously connectable to generating means wherein the control means is operable to simultaneously initiate application of ablating energy to the first and second ablating means.
  • 10. A system as in claim 5 wherein the first and second ablating means are successively connectable to generating means wherein the control means is operable to initiate application of ablating energy to the second ablating means following termination of application of ablating energy to the first ablating means.
  • 11. An ablation system according to claim 1 where the defined period of time is about 8 out of 12 impedance measurements.
  • 12. An ablation system according to claim 1 where the defined period of time is at least 6 out of 6 impedance measurements.
  • 13. An ablation system, comprising: a generator for generating ablation energy;an ablation device comprising an ablation element connectable to the generator and locatable adjacent a tissue site to be ablated, for applying the generated ablation energy to the tissue site;an impedance measurement electrode mounted to the ablation device so that the impedance measurement electrode is adjacent the tissue site when the ablation element is adjacent the tissue site;impedance measurement circuitry connectable to the impedance measurement electrode to measure impedance at the tissue site, using the impedance measurement electrode; andcontrol circuitry operably coupled to the generator to initiate and terminate the application of ablating energy to the ablation element, wherein the control circuitry is coupled to the impedance measurement circuit and terminates application of ablation energy to the ablation element responsive to occurrence of an impedance plateau measured by the impedance measurement circuitry using the impedance measurement electrode, following initiation of application of ablating energy to the ablation element, wherein the impedance plateau is defined as a maximum acceptable rate of change of impedance measurements over a defined period of time.
  • 14. A system as in claim 13 wherein the ablation element is an ablation electrode and wherein the generator is an R-F generator.
  • 15. A system as in claim 14 wherein the ablation electrode is an irrigated ablation electrode.
  • 16. A system as in claim 14 wherein the ablation electrode is employed as the impedance measurement electrode.
RELATED US APPLICATION DATA

This application is a divisional of U.S. Ser. No. 10/132,379 Apr. 24, 2002, now U.S. Pat. No. 6,648,883, and also claims priority to Provisional U.S. Patent Application Ser. No. 60/287,202, filed Apr. 26, 2001 by Francischelli et al., incorporated herein by reference in its entirety.

US Referenced Citations (397)
Number Name Date Kind
3736936 Basiulis et al. Jun 1973 A
3807403 Stumpf et al. Apr 1974 A
3823575 Parel Jul 1974 A
3823718 Tromovitch Jul 1974 A
3827436 Stumpf et al. Aug 1974 A
3830239 Stumpf Aug 1974 A
3859986 Okada et al. Jan 1975 A
3862627 Hans Sr. Jan 1975 A
3886945 Stumpf et al. Jun 1975 A
3907339 Stumpf et al. Sep 1975 A
3910277 Zimmer Oct 1975 A
3913581 Ritson et al. Oct 1975 A
3924628 Droegemueller et al. Dec 1975 A
4018227 Wallach Apr 1977 A
4022215 Benson May 1977 A
4061135 Widran et al. Dec 1977 A
4063560 Thomas et al. Dec 1977 A
4072152 Linehan Feb 1978 A
4082096 Benson Apr 1978 A
4207897 Lloyd et al. Jun 1980 A
4248224 Jones Feb 1981 A
4275734 Mitchiner Jun 1981 A
4278090 van Gerven Jul 1981 A
4377168 Rzasa et al. Mar 1983 A
4519389 Gudkin et al. May 1985 A
4598698 Siegmund Jul 1986 A
4601290 Effron et al. Jul 1986 A
4664110 Schanzlin May 1987 A
4736749 Lundback Apr 1988 A
4779611 Grooters et al. Oct 1988 A
4802475 Weshahy Feb 1989 A
4815470 Curtis et al. Mar 1989 A
4872346 Kelly-Fry et al. Oct 1989 A
4916922 Mullens Apr 1990 A
4917095 Fry et al. Apr 1990 A
4936281 Stasz Jun 1990 A
4946460 Merry et al. Aug 1990 A
5013312 Parins et al. May 1991 A
5029574 Shimamura et al. Jul 1991 A
5044165 Linner et al. Sep 1991 A
5078713 Varney Jan 1992 A
5080102 Dory Jan 1992 A
5080660 Buelina Jan 1992 A
5100388 Behl et al. Mar 1992 A
5108390 Potocky et al. Apr 1992 A
5147355 Friedman et al. Sep 1992 A
5178133 Pena Jan 1993 A
5207674 Hamilton May 1993 A
5217860 Fahy et al. Jun 1993 A
5222501 Ideker et al. Jun 1993 A
5224943 Goddard Jul 1993 A
5228923 Hed Jul 1993 A
5231995 Desai Aug 1993 A
5232516 Hed Aug 1993 A
5233515 Cosman Aug 1993 A
5254116 Baust et al. Oct 1993 A
5263493 Avitall Nov 1993 A
5269291 Carter Dec 1993 A
5275595 Dobak, III Jan 1994 A
5277201 Stern Jan 1994 A
5281213 Milder et al. Jan 1994 A
5281215 Milder Jan 1994 A
5295484 Marcus et al. Mar 1994 A
5300068 Rosar et al. Apr 1994 A
5309896 Moll et al. May 1994 A
5316000 Chapelon et al. May 1994 A
5317878 Bradshaw et al. Jun 1994 A
5318525 West et al. Jun 1994 A
5322520 Milder Jun 1994 A
5323781 Ideker et al. Jun 1994 A
5324255 Passafaro et al. Jun 1994 A
5324284 Imran Jun 1994 A
5324286 Fowler Jun 1994 A
5334181 Rubinsky et al. Aug 1994 A
5334193 Nardella Aug 1994 A
5342357 Nardella Aug 1994 A
5348554 Imran et al. Sep 1994 A
5353783 Nakao et al. Oct 1994 A
5354258 Dory Oct 1994 A
5361752 Moll et al. Nov 1994 A
5385148 Lesh et al. Jan 1995 A
5396887 Imran Mar 1995 A
5397304 Truckai Mar 1995 A
5400770 Nakao et al. Mar 1995 A
5400783 Pomeranz et al. Mar 1995 A
5403309 Coleman et al. Apr 1995 A
5403311 Abele et al. Apr 1995 A
5409483 Campbell et al. Apr 1995 A
5423807 Milder Jun 1995 A
5423811 Imran et al. Jun 1995 A
5427119 Swartz et al. Jun 1995 A
5431649 Mulier et al. Jul 1995 A
5433708 Nichols et al. Jul 1995 A
5435308 Gallup et al. Jul 1995 A
5437651 Todd et al. Aug 1995 A
5437664 Cohen et al. Aug 1995 A
5443463 Stern et al. Aug 1995 A
5443470 Stern et al. Aug 1995 A
5450843 Moll et al. Sep 1995 A
5452582 Longsworth Sep 1995 A
5452733 Sterman et al. Sep 1995 A
5456682 Edwards et al. Oct 1995 A
5462545 Wang et al. Oct 1995 A
5465717 Imran et al. Nov 1995 A
5469853 Law et al. Nov 1995 A
5472876 Fahy Dec 1995 A
5478309 Sweezer et al. Dec 1995 A
5478330 Imran et al. Dec 1995 A
5486193 Bourne et al. Jan 1996 A
5487385 Avitall Jan 1996 A
5487757 Truckai et al. Jan 1996 A
5496312 Klicek Mar 1996 A
5497774 Swartz et al. Mar 1996 A
5498248 Milder Mar 1996 A
5500012 Brucker et al. Mar 1996 A
5505730 Edwards Apr 1996 A
5516505 McDow May 1996 A
5520682 Baust et al. May 1996 A
5522870 Ben-Zion Jun 1996 A
5536267 Edwards et al. Jul 1996 A
5540681 Strul et al. Jul 1996 A
5540684 Hassler, Jr. Jul 1996 A
5542928 Evans et al. Aug 1996 A
5545195 Lennox et al. Aug 1996 A
5545200 West et al. Aug 1996 A
5549661 Kordis et al. Aug 1996 A
5555883 Avitall Sep 1996 A
5558671 Yates Sep 1996 A
5560362 Sliwa, Jr. et al. Oct 1996 A
5562720 Stern et al. Oct 1996 A
5562721 Marchlinski et al. Oct 1996 A
5569241 Edwards Oct 1996 A
5571088 Lennox et al. Nov 1996 A
5571215 Sterman et al. Nov 1996 A
5573532 Chang et al. Nov 1996 A
5575766 Swartz et al. Nov 1996 A
5575788 Baker et al. Nov 1996 A
5575810 Swanson et al. Nov 1996 A
5578007 Imran Nov 1996 A
5582609 Swanson et al. Dec 1996 A
5584872 LaFontaine et al. Dec 1996 A
5588432 Crowley Dec 1996 A
5590657 Cain et al. Jan 1997 A
5595183 Swanson et al. Jan 1997 A
5607462 Imran Mar 1997 A
5609151 Mulier et al. Mar 1997 A
5617854 Munsif Apr 1997 A
5630837 Crowley May 1997 A
5637090 McGee et al. Jun 1997 A
5643197 Brucker et al. Jul 1997 A
5653692 Masterson et al. Aug 1997 A
5656029 Imran et al. Aug 1997 A
5658278 Imran et al. Aug 1997 A
5671747 Connor Sep 1997 A
5673695 McGee et al. Oct 1997 A
5673704 Marchlinski et al. Oct 1997 A
5676662 Fleischhacker et al. Oct 1997 A
5676692 Sanghvi et al. Oct 1997 A
5676693 LaFontaine Oct 1997 A
5678550 Bassen et al. Oct 1997 A
5680860 Imran Oct 1997 A
5681278 Igo et al. Oct 1997 A
5681308 Edwards et al. Oct 1997 A
5687723 Avitall Nov 1997 A
5687737 Branham et al. Nov 1997 A
5688267 Panescu et al. Nov 1997 A
5690611 Swartz et al. Nov 1997 A
5697281 Eggers et al. Dec 1997 A
5697536 Eggers et al. Dec 1997 A
5697882 Eggers et al. Dec 1997 A
5697909 Eggers et al. Dec 1997 A
5697925 Taylor Dec 1997 A
5697927 Imran et al. Dec 1997 A
5697928 Walcott et al. Dec 1997 A
5713896 Nardella Feb 1998 A
5713942 Stern Feb 1998 A
5716389 Walinsky et al. Feb 1998 A
5718241 Ben-Haim et al. Feb 1998 A
5718701 Shai et al. Feb 1998 A
5720775 Lanard Feb 1998 A
5722402 Swanson et al. Mar 1998 A
5725524 Mulier et al. Mar 1998 A
5730074 Peter Mar 1998 A
5730127 Avitall Mar 1998 A
5730704 Avitall Mar 1998 A
5733280 Avitall Mar 1998 A
5733281 Nardella Mar 1998 A
5735280 Sherman et al. Apr 1998 A
5735290 Sterman et al. Apr 1998 A
5749869 Lindenmeier et al. May 1998 A
5755760 Maguire et al. May 1998 A
5769846 Edwards et al. Jun 1998 A
5782828 Chen et al. Jul 1998 A
5785706 Bednarek Jul 1998 A
5788636 Curley Aug 1998 A
5792140 Tu et al. Aug 1998 A
5797960 Stevens et al. Aug 1998 A
5800428 Nelson et al. Sep 1998 A
5800482 Pemeranz et al. Sep 1998 A
5807395 Mulier et al. Sep 1998 A
5810802 Panescu et al. Sep 1998 A
5827216 Igo et al. Oct 1998 A
5836947 Fleischman et al. Nov 1998 A
5840030 Ferek-Petric et al. Nov 1998 A
5844349 Oakley et al. Dec 1998 A
5846187 Wells et al. Dec 1998 A
5846191 Wells et al. Dec 1998 A
5849028 Chen Dec 1998 A
5868739 Lindenmeier et al. Feb 1999 A
5871523 Fleischman et al. Feb 1999 A
5871525 Edwards et al. Feb 1999 A
5873845 Cline et al. Feb 1999 A
5876398 Mulier et al. Mar 1999 A
5876399 Chia et al. Mar 1999 A
5879295 Li et al. Mar 1999 A
5879296 Ockuly et al. Mar 1999 A
5881732 Sung et al. Mar 1999 A
5882346 Pomeranz et al. Mar 1999 A
5885278 Fleischman Mar 1999 A
5888198 Eggers et al. Mar 1999 A
5891095 Eggers et al. Apr 1999 A
5893848 Negus et al. Apr 1999 A
5895417 Pomeranz et al. Apr 1999 A
5897533 Glickman Apr 1999 A
5897552 Edwards et al. Apr 1999 A
5897553 Mulier et al. Apr 1999 A
5897554 Chia et al. Apr 1999 A
5899898 Arless et al. May 1999 A
5899899 Arless et al. May 1999 A
5902289 Swartz et al. May 1999 A
5902328 LaFontaine et al. May 1999 A
5904711 Flom et al. May 1999 A
5906580 Kline-Schoder et al. May 1999 A
5906587 Zimmon May 1999 A
5906606 Chee et al. May 1999 A
5906613 Mulier et al. May 1999 A
5908029 Knudson et al. Jun 1999 A
5913854 Maguire et al. Jun 1999 A
5913856 Chia et al. Jun 1999 A
5916213 Haissaguerre et al. Jun 1999 A
5916214 Cosio et al. Jun 1999 A
5921924 Avitall Jul 1999 A
5921982 Lesh et al. Jul 1999 A
5927284 Borst et al. Jul 1999 A
5928191 Houser et al. Jul 1999 A
5931810 Grabek Aug 1999 A
5931835 Mackey Aug 1999 A
5931848 Saadat Aug 1999 A
5954661 Greenspon et al. Sep 1999 A
5957961 Maguire et al. Sep 1999 A
5971980 Sherman Oct 1999 A
5971983 Lesh Oct 1999 A
5976128 Schilling et al. Nov 1999 A
5993447 Blewett et al. Nov 1999 A
6007499 Martin et al. Dec 1999 A
6012457 Lesh Jan 2000 A
6016811 Knopp et al. Jan 2000 A
6042556 Beach et al. Mar 2000 A
6063081 Mulier May 2000 A
6071279 Whayne et al. Jun 2000 A
6080149 Huang et al. Jun 2000 A
6088894 Oakley Jul 2000 A
6096037 Mulier et al. Aug 2000 A
6112123 Kelleher et al. Aug 2000 A
6113592 Taylor Sep 2000 A
6117101 Diederich et al. Sep 2000 A
6120496 Whayne et al. Sep 2000 A
6142993 Whayne et al. Nov 2000 A
6142994 Swanson et al. Nov 2000 A
6152920 Thompson et al. Nov 2000 A
6161543 Cox et al. Dec 2000 A
6162216 Guziak et al. Dec 2000 A
6165174 Jacobs et al. Dec 2000 A
6179834 Buysse et al. Jan 2001 B1
6183468 Swanson et al. Feb 2001 B1
6217528 Koblish et al. Apr 2001 B1
6217576 Tu et al. Apr 2001 B1
6224592 Eggers et al. May 2001 B1
6231518 Grabek et al. May 2001 B1
6235024 Tu May 2001 B1
6237605 Vaska et al. May 2001 B1
6238347 Nix et al. May 2001 B1
6238393 Mulier May 2001 B1
6245061 Panescu et al. Jun 2001 B1
6245064 Lesh et al. Jun 2001 B1
6245065 Panescu et al. Jun 2001 B1
6251092 Qin et al. Jun 2001 B1
6251128 Knopp et al. Jun 2001 B1
6270471 Hechel et al. Aug 2001 B1
6293943 Panescu et al. Sep 2001 B1
6296619 Brisken et al. Oct 2001 B1
6302880 Schaer Oct 2001 B1
6311692 Vaska et al. Nov 2001 B1
6312383 Lizzi et al. Nov 2001 B1
6314962 Vaska et al. Nov 2001 B1
6314963 Vaska et al. Nov 2001 B1
6325797 Stewart et al. Dec 2001 B1
6328736 Mulier Dec 2001 B1
6332881 Carner et al. Dec 2001 B1
6358248 Mulier Mar 2002 B1
6361531 Hissong Mar 2002 B1
6364876 Erb et al. Apr 2002 B1
6368275 Sliwa et al. Apr 2002 B1
6371955 Fuimaono et al. Apr 2002 B1
6383151 Diederich et al. May 2002 B1
6385472 Hall et al. May 2002 B1
6398792 O'Connor Jun 2002 B1
6409722 Hoey et al. Jun 2002 B1
6413254 Hissong et al. Jul 2002 B1
6419648 Vitek et al. Jul 2002 B1
6425867 Vaezy et al. Jul 2002 B1
6430426 Avitall Aug 2002 B2
6440130 Mulier Aug 2002 B1
6443952 Mulier Sep 2002 B1
6447507 Bednarek et al. Sep 2002 B1
6461314 Pant et al. Oct 2002 B1
6461356 Patterson Oct 2002 B1
6464700 Koblish et al. Oct 2002 B1
6471697 Lesh Oct 2002 B1
6471698 Edwards et al. Oct 2002 B1
6474340 Vaska et al. Nov 2002 B1
6475216 Mulier Nov 2002 B2
6477396 Mest et al. Nov 2002 B1
6484727 Vaska et al. Nov 2002 B1
6488680 Francischelli Dec 2002 B1
6502575 Jacobs et al. Jan 2003 B1
6514250 Jahns Feb 2003 B1
6527767 Wang et al. Mar 2003 B2
6537248 Mulier Mar 2003 B2
6537272 Christopherson et al. Mar 2003 B2
6558382 Jahns May 2003 B2
6584360 Francischelli Jun 2003 B2
6585732 Mulier Jul 2003 B2
6605084 Acker et al. Aug 2003 B2
6610055 Swanson et al. Aug 2003 B1
6610060 Mulier Aug 2003 B2
6613048 Mulier Sep 2003 B2
6645199 Jenkins et al. Nov 2003 B1
6648883 Francischelli Nov 2003 B2
6656175 Francischelli Dec 2003 B2
6663627 Francischelli Dec 2003 B2
6692450 Coleman Feb 2004 B1
6699240 Francischelli Mar 2004 B2
6702811 Stewart et al. Mar 2004 B2
6706038 Francischelli Mar 2004 B2
6706039 Mulier Mar 2004 B2
6716211 Mulier Apr 2004 B2
6736810 Hoey May 2004 B2
6755827 Mulier Jun 2004 B2
6764487 Mulier Jul 2004 B2
6773433 Stewart et al. Aug 2004 B2
6776780 Mulier Aug 2004 B2
6807968 Francischelli Oct 2004 B2
6827715 Francischelli Dec 2004 B2
6849073 Hoey Feb 2005 B2
6858028 Mulier Feb 2005 B2
6887238 Jahns May 2005 B2
6899711 Stewart et al. May 2005 B2
6911019 Mulier Jun 2005 B2
6916318 Francischelli Jul 2005 B2
6936046 Hissong Aug 2005 B2
6949097 Stewart et al. Sep 2005 B2
6949098 Mulier Sep 2005 B2
6960205 Jahns Nov 2005 B2
6962589 Mulier Nov 2005 B2
20010039419 Francischelli et al. Nov 2001 A1
20030014047 Woloszko et al. Jan 2003 A1
20030045872 Jacobs Mar 2003 A1
20030144656 Ocel Jul 2003 A1
20030191462 Jacobs Oct 2003 A1
20030208193 Van Wyk Nov 2003 A1
20030216724 Jahns Nov 2003 A1
20040015106 Coleman Jan 2004 A1
20040015219 Francischelli Jan 2004 A1
20040044340 Francischelli Mar 2004 A1
20040049179 Francischelli Mar 2004 A1
20040078069 Francischelli Apr 2004 A1
20040082948 Stewart et al. Apr 2004 A1
20040087940 Jahns May 2004 A1
20040092926 Hoey May 2004 A1
20040138621 Jahns Jul 2004 A1
20040138656 Francischelli Jul 2004 A1
20040143260 Francischelli Jul 2004 A1
20040186465 Francischelli Sep 2004 A1
20040215183 Hoey Oct 2004 A1
20040220560 Briscoe Nov 2004 A1
20040236322 Mulier Nov 2004 A1
20040267326 Ocel Dec 2004 A1
20050010095 Stewart et al. Jan 2005 A1
20050033280 Francischelli Feb 2005 A1
20050090815 Francischelli Apr 2005 A1
20050143729 Francischelli Jun 2005 A1
20050165392 Francischelli Jul 2005 A1
20050209564 Bonner Sep 2005 A1
20050267454 Hissong Dec 2005 A1
20060009756 Francischelli Jan 2006 A1
20060009759 Christian Jan 2006 A1
Foreign Referenced Citations (2)
Number Date Country
WO 9424949 Nov 1994 WO
WO 0187172 Nov 2001 WO
Related Publications (1)
Number Date Country
20040049179 A1 Mar 2004 US
Provisional Applications (1)
Number Date Country
60287202 Apr 2001 US
Divisions (1)
Number Date Country
Parent 10132379 Apr 2002 US
Child 10657987 US