The present invention relates to an acoustic transducer and a microphone.
Recent mobile phones and other devices may typically incorporate a micro electro-mechanical systems (MEMS) microphone.
A MEMS microphone includes an acoustic transducer fabricated using MEMS technology, and an application specific integrated circuit (ASIC) for amplifying an output of the acoustic transducer, which are together accommodated in a housing.
As shown in
In this acoustic transducer, the vibration electrode plate 33 transfers vibrations from its portion located on the substrate 32 toward its middle portion. The acoustic transducer shown in
The vibration electrode plate 33 may physically separate its portion located on the substrate 32 from its middle portion to avoid direct transfer of vibrations from the portion located on the substrate 32 to the middle portion. For example, an acoustic transducer may include a vibration electrode plate 33 having a plurality of slits 37 around its middle portion as shown schematically in
Patent Literature 1: U.S. Pat. No. 5,452,268
Patent Literature 2: Japanese Patent No. 5218432
An acoustic transducer may include a substrate 32, a stationary electrode plate 39, and a vibration electrode plate 33 arranged in the stated order. The vibration electrode plate 33 of this acoustic transducer may have a plurality of slits 37 around its middle portion to allow the middle portion to vibrate more easily.
For the acoustic transducer including the vibration electrode plate 33 with slits 37 around the middle portion, the noise floor is known to shift toward higher frequencies within the audible range (audible frequency band) shown in
Moreover, when the passage resistance of each slit 37 is too low, the sensitivity decreases in the low frequency region as shown in
The slits 37 in the acoustic transducer may thus need high passage resistance.
The slits 37 can have higher passage resistance when the slits 37 are narrower or when the vibration electrode plate 33 is thicker. However, large restrictions in the manufacturing processes limit the extent of narrowing of the slits 37 and thus limit the extent of increasing of the passage resistance of the slits 37. Additionally, a thicker vibration electrode plate 33 is stiffer (allowing less vibrations), and thus lowers the sensitivity of the acoustic transducer. The thickness of the vibration electrode plate 33 may not be increased to increase the passage resistance of the slits 37.
As shown in
During use, the acoustic transducer receives a voltage applied between the vibration electrode plate 33 and the stationary electrode plate 39. The electrostatic attraction generated between the vibration electrode plate 33 and the stationary electrode plate 39 can cause misalignment between the facing side surfaces of the slit 37 as shown schematically in
Further, stress acting across different positions of the vibration electrode plate 33 can cause parts of the vibration electrode plate 33 near the slit 37 to warp as shown schematically in
In the acoustic transducer including the vibration electrode plate 33 with the slit 37, the vibration electrode plate can deform and lower the passage resistance of the slit 37.
The present invention is directed to an acoustic transducer including a vibration electrode plate with a slit having higher passage resistance than in conventional structures and having a lower rate of decrease in the passage resistance than in conventional structures when, for example, the vibration electrode plate warps.
The present invention is also directed to a high-performance microphone incorporating an acoustic transducer including a vibration electrode plate with a slit.
To respond to the above issues, one aspect of the present invention provides an acoustic transducer including a stationary electrode plate, and a vibration electrode plate facing the stationary electrode plate with a space between the electrode plates. The vibration electrode plate includes a slit that allows sound to pass through. The vibration electrode plate includes a resistance increasing section that increases resistance to passage of sound through the slit. The resistance increasing section includes at least one pair of high-resistance surfaces that constitute side surfaces of the slit in a width direction and are thicker than a middle portion of the vibration electrode plate, and the high-resistance surfaces overlap as viewed in the width direction of the slit.
More specifically, one side surface (an inner side surface, which is hereinafter referred to as a first side surface) of the slit in the width direction in the acoustic transducer according to the aspect of the present invention includes at least one portion functioning as a high-resistance surface with a thickness (dimension of the vibration electrode plate in the thickness direction) greater than a middle portion of the vibration electrode plate. The other side surface of the slit in the width direction (hereinafter referred to as a second side surface) includes a portion functioning as a high-resistance surface at a position facing the high-resistance surface of the first side surface. The slit with these first and second side surfaces allows sound passing through the slit to contact a larger portion of the slit on average than a slit formed in a vibration electrode plate with a uniform thickness (a conventional slit including side surfaces having the same uniform thickness (height) as the vibration electrode plate). In other words, the slit including the first side surface and the second side surface has higher passage resistance (resistance to the passage of sound) than the conventional slit. The slit with this structure also has a lower rate of decrease in the passage resistance than in the conventional slit when, for example, the vibration electrode plate wraps (refer to
One or more aspects of the present invention provide the acoustic transducer according to the above aspect of the present invention in which the resistance increasing section includes surfaces at the slit each of which is shaped in a square wave (refer to
For a slit with a resistance increasing section including a plurality of pairs of high-resistance surfaces, the passage resistance will be larger as the dimension of the high-resistance surface in the longitudinal direction multiplied by the number of high-resistance surfaces is larger, if the slit is assumed to have the resistance increasing section with the same length. Forming the resistance increasing section having surfaces at the slit each shaped in a square wave (a square wave with a duty ratio of 50%) easily increases the number of high-resistance surfaces. To allow such easier increase in the number of high-resistance surfaces, the resistance increasing section may include surfaces at the slit each of which is shaped in a square wave.
The vibration electrode plate including the slit and the resistance increasing section with the surfaces at the slit each shaped in a square wave can be prepared with various methods. For example, the vibration electrode plate may be prepared by the procedure including forming a plate member including a slit structure with a longitudinal cross-section shaped in a square wave, and removing a middle portion of the slit structure in a transverse direction of the slit structure.
The resistance increasing section included in the acoustic transducer according to the aspect of the present invention protrudes from the vibration electrode plate. The resistance increasing section protruding toward the stationary electrode plate may easily stick to the stationary electrode plate, or may lower the sensitivity of the acoustic transducer. Another aspect of the present invention may be the acoustic transducer according to the above aspect of the present invention in which the resistance increasing section protrudes from the vibration electrode plate in a direction opposite to a direction toward the stationary electrode plate.
The acoustic transducer according to the aspect of the present invention typically includes the vibration electrode plate with a plurality of slits surrounding a middle portion of the vibration electrode plate. In this case, some or all of the slits may satisfy the above conditions (slits each with the resistance increasing section). The stationary electrode plate may not extend over areas outward from the slits of the vibration electrode plate. The acoustic transducer with this structure has good sensitivity. Another aspect of the present invention may be the acoustic transducer according to the above aspect of the present invention in which the vibration electrode plate includes a plurality of the slits surrounding the middle portion of the vibration electrode plate, and the stationary electrode plate is within an area defined by the plurality of slits as viewed in a direction of a normal to the vibration electrode plate, or the vibration electrode plate includes the slit shaped to surround the middle portion of the vibration electrode plate, and the stationary electrode plate is within an area defined by the slit as viewed in a direction of a normal to the vibration electrode plate.
Another aspect of the present invention provides the acoustic transducer according to the above aspect of the present invention in which a peripheral portion of the vibration electrode plate is fastened to the substrate with at least one support, or the peripheral portion of the vibration electrode plate is directly fastened to the substrate. When the acoustic transducer according to the above aspect of the present invention has the former structure, the at least one support may include a support that fastens a portion of the vibration electrode plate outward from the slit to the substrate to prevent the slit from widening when the portion of the vibration electrode plate outward from the slit deforms.
The acoustic transducer according to the aspect of the present invention typically includes the stationary electrode plate and the vibration electrode plate directly or indirectly fastened to the substrate having the cavity that opens at the first surface. However, the acoustic transducer can have higher sensitivity or a better signal-to-noise ratio when at least a portion of each slit does not face the substrate. Thus, another aspect of the present invention provides the acoustic transducer according to the aspect of the present invention in which the stationary electrode plate and the vibration electrode plate are directly or indirectly fastened to a substrate including a cavity that opens in a first surface thereof, and at least a portion of each slit is arranged more inward from the cavity than an opening rim of the cavity of the substrate at the first surface as viewed in a direction of a normal to the first surface. The acoustic transducer according to the aspect of the present invention may include the substrate, the vibration electrode plate, and the stationary electrode plate arranged in the stated order, or may include the substrate, the stationary electrode plate, and the vibration electrode plate arranged in the stated order.
Another aspect of the present invention provides the acoustic transducer according to the above aspect of the present invention in which a peripheral portion of the vibration electrode plate is fastened to the substrate with at least one support. The peripheral portion of the vibration electrode plate may be directly fastened to the substrate. When the acoustic transducer according to the above aspect of the present invention has the former structure, the at least one support may include a support that fastens a portion of the vibration electrode plate outward from the slit to the substrate to prevent the slit from widening when the portion of the vibration electrode plate outward from the slit deforms.
Another aspect of the present invention provides the acoustic transducer according to the above aspect of the present invention further including a back plate to which the stationary electrode plate is attached, in which a portion of the back plate facing each slit includes no acoustic hole. This structure prevents air through the slit from directly passing through the acoustic holes in the back plate. This further increases the passage resistance of the slit.
Another aspect of the present invention provides an acoustic transducer including a back plate, a stationary electrode plate attached to the back plate, and a vibration electrode plate facing the stationary electrode plate with a space between the electrode plates. The vibration electrode plate includes a slit that allows sound to pass through. A portion of the back plate facing the slit has no acoustic hole.
In the acoustic transducer according to the aspect of the present invention, air through the slit does not directly pass through the acoustic holes formed through the back plate (or both the back plate and the stationary electrode plate). The acoustic transducer according to the aspect of the present invention has a slit with higher passage resistance than in a conventional acoustic transducer in which acoustic holes are formed in an area of the back plate (or both the back plate and the stationary electrode plate) facing the slit, and with a lower rate of decrease in the passage resistance when, for example, the vibration electrode plate warps.
Another aspect of the present invention provides a microphone including the acoustic transducer according to one of the above aspects of the present invention, and an integrated circuit configured to amplify an output of the acoustic transducer.
The microphone according to the aspect of the present invention includes an acoustic transducer that has higher passage resistance than a conventional acoustic transducer, and has a lower rate of decrease in the passage resistance when, for example, the vibration electrode plate warps. The microphone according to the aspect of the present invention thus has higher performance than an acoustic transducer including a vibration electrode plate with a simple slit.
The acoustic transducer according to one or more embodiments of the present invention includes a vibration electrode plate with a slit having higher passage resistance than in conventional structures and having a lower rate of decrease in the passage resistance than in conventional structures when, for example, the vibration electrode plate warps. The microphone according to one or more embodiments of the present invention incorporates an acoustic transducer including such a vibration electrode plate with a slit.
FIGS. 11A(a) to 11A(f) are diagrams describing a procedure for preparing the vibration electrode plate.
FIGS. 11B(a) to 11B(e) are diagrams describing another procedure for preparing the vibration electrode plate.
Embodiments of the present invention will now be described with reference to the drawings. The invention should not be limited to the embodiments described below, but may be modified variously without departing from the scope and spirit of the invention. Although the embodiments are directed to acoustic transducers for microphones, the invention is also applicable to acoustic transducers for speakers.
The overall structure of an acoustic transducer 10 according to one embodiment of the invention will now be described with reference to
The acoustic transducer 10 according to the present embodiment is a capacitive transducer fabricated using MEMS technology. As shown in
The substrate 12 is a silicon substrate having a cavity 12a, which is formed through the substrate 12 and thus extends from the upper surface to the lower surface of the substrate 12. The cavity 12a in the substrate 12 shown in
The vibration electrode plate 13 included in the acoustic transducer 10 is a thin polysilicon layer. As shown in
The vibration electrode plate 13 has four slits 17 around its middle portion. Each slit 17 includes a straight portion that extends substantially parallel to the corresponding peripheral side of the vibration electrode plate 13, and includes end portions that extend in the direction where the corresponding legs 26 are arranged. As shown in
As shown in
The portions of the vibration electrode plate 13 outward from each slit 17 may not be fastened to the substrate 12. In this case, the portions of the vibration electrode plate 13 outward from each slit 17 may deform to increase the width of each slit 17. Thus, the vibration electrode plate 13 may be fastened to the substrate 12 using the structure shown in
The stationary electrode plate 19 included in the acoustic transducer 10 is a thin polysilicon layer. As shown in
The back plate 18 (refer to
As shown in
The portion of the back plate 18 that does not face the slits 17 and the stationary electrode plate 19 may have the acoustic holes 24 arranged in any pattern. The acoustic holes 24 may be arranged in a triangular lattice, a rectangular lattice, a concentric circle, or an irregular pattern.
The structure of the vibration electrode plate 13 included in the acoustic transducer 10 will now be described in more detail.
As described above, each slit 17 of the vibration electrode plate 13 has the resistance increasing section 20.
The resistance increasing section 20 increases the resistance to the passage of sound through the slit 17 (more specifically, the straight portion of the slit 17). The resistance increasing section 20 includes at least one pair of high-resistance surfaces that constitute the side surfaces of the slit 17 in the width direction and are thicker than the middle portion of the vibration electrode plate 13. The high-resistance surfaces overlap as viewed in the width direction of the slit 17.
The resistance increasing section 20 will now be described in more detail with reference to
As described above, the resistance increasing section 20 includes at least one pair of high-resistance surfaces that constitute the side surfaces of the slit 17 in the width direction and are thicker than the middle portion of the vibration electrode plate 13. The high-resistance surfaces overlap as viewed in the width direction of each slit 17.
Thus, the resistance increasing section 20 may include a pair of facing portions 20a with their surfaces at each slit 17 (the inner side surfaces of the slit 17) shaped in the manner shown in
The vibration electrode plate 13 including such resistance increasing sections 20 shaped in the manner described above can be prepared by various procedures.
A procedure for preparing the vibration electrode plate 13 in which each resistance increasing section 20 includes a pair of facing portions 20a with surfaces at the corresponding slit 17 shaped as shown in
To prepare the vibration electrode plate 13, a first sacrificial layer 51 is first formed on the substrate 12 as shown in FIGS. 11A(a) and 11A(b). The first sacrificial layer 51 is, for example, a polysilicon film or a SiO2 film. Subsequently, a plurality of recesses are formed in the surface of the first sacrificial layer 51 by forming a resist pattern and performing etching and other processes. Each recess extends along the central line of an area in which the straight portion of the slit 17 is to be formed. (FIG. 11A(c)).
Subsequently, a SiO2 film or the like is deposited onto the first sacrificial layer 51 with the recesses to form a second sacrificial layer 52 with the surface shaped in conformance with the surface of the first sacrificial layer 51 (FIG. 11A(d)). More specifically, the second sacrificial layer 52 with recesses slightly smaller than the recesses of the first sacrificial layer 51 is formed on the recesses of the first sacrificial layer 51. The recesses in the second sacrificial layer 52 are used to form the shaded portions in
Subsequently, a polysilicon film is formed on the second sacrificial layer 52 to form the member 13′ (FIG. 11A(e)). This is then followed by the processes including forming the slit 17 in the member 13′. This completes the vibration electrode plate 13 including the resistance increasing section 20 with a pair of facing portions 20a having their surfaces at the slit 17 shaped as shown in
As shown in FIGS. 11B(a) to 11B(c), the vibration electrode plate 13 with the above structure may also be prepared by forming a sacrificial layer 53 on the substrate 12 and then forming a plurality of recesses in the surface of the sacrificial layer 53. Although this procedure is simpler than the procedure described with reference to FIGS. 11A(a) to 11A(f), the etching time in this procedure determines the depth of each recess in the sacrificial layer 53. With this procedure, the depth of each recess in the sacrificial layer 53 can vary across different positions of a wafer. As a result, acoustic transducers 10 produced from the single wafer can vary in the specific shape of their resistance increasing sections 20. With the procedure described with reference to FIGS. 11A(a) to 11A(f), the thickness of the sacrificial layer 51 determines the depth of each recess of the sacrificial layer 52. With the procedure described with reference to FIGS. 11A(a) to 11A(f), acoustic transducers 10 produced from a single wafer can include resistance increasing sections 20 with the same shape.
The second sacrificial layer 52 or the sacrificial layer 53 may have each recess with corners where two lines (two line segments) meet (e.g., a rectangular recess). The resultant vibration electrode plate 13 also includes corners where two lines meet. Stress can concentrate on such corners. The acoustic transducer 10 can thus have low durability against drop impacts. If the corners each have a radius of curvature R, stress does not concentrate on the corners. In this case, the acoustic transducer 10 will have high durability against drop impacts.
The vibration electrode plate 13 (member 13′) designed and prepared may include the resistance increasing section 20 with at least corners excluding its corners near the slit 17 to have the radius of curvature R as shown in
When the recess formed in the second sacrificial layer 52 or in the sacrificial layer 53 is too narrow, misalignment during formation of the slit 17 can cause the vibration electrode plate 13 shown in
As described above, the vibration electrode plate 13 included in the acoustic transducer 10 according to the present embodiment includes the resistance increasing section 20 with at least one pair of high-resistance surfaces constituting the side surfaces of the slit 17 in the width direction and thicker than the middle portion of the vibration electrode plate 13. The high-resistance surfaces overlap as viewed in the width direction of the slit 17. Thus, the acoustic transducer 10 includes each slit 17 having higher passage resistance than in conventional structures and having a lower rate of decrease in the passage resistance than in conventional structures when, for example, the vibration electrode plate 13 warps.
The acoustic transducer 10 will now be compared with a conventional acoustic transducer (refer to
The passage resistance of the slit (slit 17 or 37) is higher as the area of the overlap between the pair of facing side surfaces of the slit is larger.
The resistance increasing section 20 of the slit 17 includes at least one pair of high-resistance surfaces that constitute the side surfaces of the slit 17 in the width direction and are thicker than the middle portion of the vibration electrode plate 13. The inner side surfaces 18a and 18b of the slit 17 are larger than the side surfaces 38a and 38b of the slit 37. In addition, the high-resistance surfaces of the resistance increasing section 20 overlap with each other as viewed in the width direction of the slit 17. Without misalignment between the side surfaces, as shown in
With misalignment corresponding to the height of the slit 37 between the inner side surfaces 38a and 38b of the slit 37 that may occur when, for example, the vibration electrode plate 33 warps, the inner side surfaces 38a and 38b have no overlap area as shown in
With misalignment corresponding to the same amount as described above between the inner side surfaces 18a and 18b of the slit 17, the inner side surfaces 18a and 18b overlap with each other in the hatched areas shown in
As described above, the acoustic transducer 10 according to the present embodiment includes the resistance increasing section 20 in each slit 17 having higher passage resistance than in conventional structures and having a lower rate of decrease in the passage resistance than in conventional structures when, for example, the vibration electrode plate 13 warps.
In the acoustic transducer 10, the back plate 18 has no acoustic hole 24 in its portion facing each slit 17. As shown schematically in
As described above, the acoustic transducer 10 has each slit 17 having higher passage resistance than in conventional structures and having a lower rate of decrease in the passage resistance than in conventional structures when, for example, the vibration electrode plate 13 warps. As shown in
The acoustic transducer 10 according to the above embodiment may be modified variously. As shown in
The acoustic transducer 10 may include a circular vibration electrode plate 13 having an arc-shaped slit 17 and a resistance increasing section 20. The acoustic transducer 10 may include a conductive layer on the substrate 12 to output a capacitance between the part of the vibration electrode plate 13 outward from the slit 17 and the substrate 12.
As shown in
To reduce sticking between the vibration electrode plate 13 and the stationary electrode plate 19, stoppers 30 may be arranged on the back plate 18 of the acoustic transducer 10 as shown schematically in
Although the acoustic transducer 10 described above includes the substrate 12, the vibration electrode plate 13, and the stationary electrode plate 19 arranged in the stated order, the acoustic transducer 10 may include the substrate 12, the stationary electrode plate 19, and the vibration electrode plate 13 arranged in the stated order. The stationary electrode plate 19 may be arranged on the substrate 12 and the vibration electrode plate 13 may be arranged on the stationary electrode plate 19 in, for example, the structure shown in
Although the structures shown in
Number | Date | Country | Kind |
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2014-195896 | Sep 2014 | JP | national |