This application claims priority to Japanese Application No. 2023-088591, filed May 30, 2023, which are incorporated herein by reference, in their entirety, for any purpose.
The present disclosure relates to improvements in acoustic wave devices suitable for use as a frequency filter or the like in such as mobile communication device.
An acoustic wave (Surface Acoustic Wave/SAW) device including WLP (Wafer Level Package) structure has a structure disclosed in Patent Document 1 (JP2002-217673). In the Patent Document 1, a cover is provided on one surface of a device chip, and IDT electrodes formed on the one surface are positioned in an inner space formed by the cover.
Here, although heat is generated in the device chip by an input of a signal to the acoustic wave device, a piezoelectric body constituting the device chip has low thermal conductivity and poor heat dissipation. The thermal conductivity of lithium tantalate or lithium niobate used as a piezoelectric material is about 4 to 6 W/mK.
Some examples described herein may mainly solve the problem in the acoustic wave device that includes such as WLP structure to provide new structure capable of rationally improving heat dissipation of a device chip constituting the acoustic wave device.
In some examples, an acoustic wave device includes a device chip, a first metal pattern formed on one surface of the device chip and including a pattern to be a resonator, a second metal pattern formed on the one surface of the device chip so as to have a predetermined thickness larger than the first metal pattern at any position and including a pattern including a signal input/output terminal, a wiring connecting the signal input/output terminal and the resonator, a wiring connecting the plurality of resonators and a ground wiring, a first roof portion made of formed on the second metal pattern and cooperating with the one surface of the device chip and the second metal pattern to form a sealed space of the resonator, a metal layer within the roof formed on the first roof portion, a second roof portion made of resin formed on the first roof portion so as to position the metal layer within the roof between the first roof portion, two or more heat dissipation solder bumps formed by a heat dissipation passage hole passing through the second roof portion and including an inner end portion joined to the roof inner metal layer and an outer end portion protruding from the second roof portion.
Hereinafter, the exemplary embodiment will be described with reference to
The acoustic wave device 1 includes a device chip 2, a first metal pattern 3, a second metal pattern 4, a first roof portion 5, a metal layer within the roof 7, a second roof portion 6, an external connecting solder bump 8, and a heat dissipating solder bump 9.
The first metal pattern 3 is formed on one surface 2a of the device chip 2. The second metal pattern 4 having a thickness of not less than a thickness of the first metal pattern 3 is formed on the one surface 2a of the device chip 2.
An outer portion 4a (shown in
The second metal pattern 4 includes the outer portion 4a and the partitioning wall-shaped inner portion 4b.
A part of the inner portion 4b of the second metal pattern 4 is formed to be overlapped on a part of the first metal pattern 3, can be formed to be connected to the first metal pattern 3.
The first roof portion 5 is supported on the second metal pattern 4 with its inner surface 5a fixed to a second end 4d opposed to a first end 4c fixed to the one surface 2a of the device chip 2 in the second metal pattern 4.
On one surface 2a of the device chip 2, a sealed space 10 (cavity, hollow-structure portion) is formed by the main surface portion 2d, the outer portion 4a of the second metal pattern 4, and the first roof portion 5, and a resonator 11 that will be described later and is formed by the first metal pattern 3 is disposed in the sealed space 10.
Typically, the device chip 2 is configured to be a quadrangular plate shape (a rectangle as the example of the drawings) having a side of 0.5 mm to 1 mm and a thickness of 0.15 mm to 0.2 mm.
Typically, the first metal pattern 3 is configured to have a thickness of 0.1 m to 0.5 μm (a height of the first metal pattern 3 with respect to the one surface 2a of the device chip 2) in a direction perpendicular to the one surface 2a of the device chip 2.
Typically, the second metal pattern 4 is configured to have a thickness of 3 μm to 5 μm in a direction perpendicular to the one surface 2a of the device chip 2.
Typically, the first roof portion 5 is configured to have a thickness of 15 μm to 35 μm.
Further, the second roof portion 6, which will be described later, formed on the first roof portion 5 to sandwich the later-described metal layer within the roof 7, is configured to have a thickness of 15 μm to 35 μm.
The acoustic wave device 1 includes these components typically has a thickness of about 0.25 mm to 0.35 mm.
The acoustic wave device 1 has a square or rectangular contour when viewed from a direction perpendicular to the one surface 2a of the device chip 2.
That is, the acoustic wave device 1 is a flat hexahedral shape having two quadrangular shaped surfaces 1a and four side surfaces 1b extending between the two quadrangular shaped surfaces 1a.
In the drawings, the thicknesses of the constituent elements are exaggerated so that the configuration of the acoustic wave device 1 can be easily understood.
The device chip 2 has a function of propagating an elastic wave. Typically, lithium tantalate or lithium niobate is used as a piezoelectric body in the device chip 2, and the device chip 2 may be configured by laminating sapphire, silicon, alumina, spinel, quartz crystal, glass, or the like on the piezoelectric body.
The first metal pattern 3 is formed on the one surface 2a of the device chip 2 so as to have a predetermined thickness at any position and includes a pattern to be the resonator 11.
The first metal pattern 3 is typically configured of a conductive metal film formed by a photolithography technique.
As shown in
In the example of the drawings, the outer part 4a of the second metal pattern 4 includes an outer wall surface 4e that is slightly inside the outer edge 2c of the device chip 2 and substantially parallel to the outer edge 2c. The inner side of the outer wall surface 4e is the main surface portion 2d.
In the example of the drawings, a first portion 4f of the second metal pattern 4 functions as the signal input/output terminal 12 is formed by the second metal pattern 4 at each of the four corners of the device chip 2.
A second portion 4g of the second metal pattern 4 functions as the wiring 13a is formed between the first portion 4f and the resonator 11. A third portion 4h of the second metal pattern 4 functions as the wiring 13b is formed between adjacent resonators 11. The second metal pattern 4 is also typically formed of a conductive metal film formed by the photolithography technique.
In the example of the drawings, the ground wiring 13c connected to the ground 15 in the above-described circuit is arranged so as to surround the first metal pattern 3, the signal input/output terminal 12, the wiring 13a connecting the signal input/output terminal 12 and the resonator 11, and the wiring 13b connecting the plurality of resonators 11 to each other.
The ground wiring 13c is the wiring 13 connecting the resonator 11 and the ground 15 in the above-described circuit without interposing another resonator 11 therebetween. In the example of the drawings, as shown in
In addition, at least a part of the metal layer within the roof 7 that will be described later, may function as the inductor 14. In this case, one end of the inductor 14 is electrically connected to a wire connecting the resonator 11 and the inductor 14 through a wiring body 17 and a via 5c passing through the first roof portion 5. The other end of the inductor 14 is connected to a portion (not shown in the drawings) of an accompanying portion 7b of the metal layer within the roof 7 that is connected to the ground 15.
The first roof portion 5 is made of an insulating resin. The first roof portion 5 is formed on the second metal pattern 4, and cooperates to form the sealed space 10 of the resonator 11 with the one surface 2a of the device chip 2 and the second metal pattern 4.
The first roof portion 5 is preferably made of a non-photosensitive resin and has a higher thermal conductivity than that of the resin constituting the second roof portion 6. As such a resin, a resin in which fillers made of a material having a high thermal conductivity are contained in an amount of 70 weight % to 90 weight % with respect to a resin serving as a base material is used. Such fillers are typically configured as granules around 10 μm in diameter.
Specifically, as a resin constituting the first roof portion 5, an epoxy resin containing a filler or a phenolic resin containing a filler can be used. Typically, alumina, aluminum nitride, or powdered diamond may be used as the filler.
The first roof portion 5 has the inner surface 5a substantially parallel to the one surface 2a of the device tip 2 and an outer surface 5b opposite thereto. In the example of the drawings, the first roof portion 5 is shaped in the form of a plate having substantially the same shape and size as the device chip 2. A gap corresponding to the thickness of the second metal pattern 4 is formed between the inner surface 5a of the first roof portion 5 and the one surface 2a of the device chip 2, and the gap is hermetically sealed by the outer portion 4a of the second metal pattern 4 to form the sealed space 10.
The metal layer within the roof 7 is formed on the outer surface 5b of the first roof portion 5.
As shown in
In the example of the drawings, the main portion 7a and the accompanying portion 7b are separated from each other. In such a circuit shown in
The second roof portion 6 is formed on the first roof portion 5 so as to position a portion of the metal layer within the roof 7 between the first roof portion 5 and the second roof portion 6. The second roof portion 6 is made of an insulating resin.
The second roof portion 6 is preferably made of a photosensitive resin. The second roof portion 6 is formed so as to include an inner surface 6a fixed to the outer surface 5b of the first roof portion 5 and an outer surface 6b opposed thereto and to cover the entire outer surface 5b of the first roof portion 5 and the metal layer within the roof 7.
A roof 16 is formed from three parties: the first roof portion 5, the metal layer within the roof 7, and the second roof portion 6.
The thickness of the first roof portion 5 is preferably smaller than the thickness of the second roof portion 6. This can ensure the rigidity of the roof 16 by increasing the thickness of the roof 16 and improve heat dissipation efficiency by minimizing a distance between one surface of the device chip and the metal layer within the roof 7 through a first path L1 and a second path L2 that are described later.
In the first example shown in
In the first example, the via 5c is formed in the first roof part 5 so that the signal input/output terminal 12 is positioned at the bottom of the hole, and the wiring body 17 formed in the via 5c is connected to an accompanying portion 7b positioned on the via 5c.
In the first example, the external connecting solder bump 8 is formed by using a connecting passing hole 6c passing through the second roof portion 6, and includes an inner end 8a joined to the accompanying portion 7b as the part of the metal layer within the roof 7 and an outer end 8b protruding from the second roof portion 6.
The connecting passing hole 6c is formed in the second roof portion 6 just above the accompanying portion 7b of the metal layer within the roof 7, and the bottom of the connecting passing hole 6c corresponds to the accompanying portion 7b.
In the example of the drawings, the diameter of the connecting passing hole 6c is configured to gradually decrease toward the inner surface 6a of the second roof portion 6, and the hole wall is inclined.
The external connecting solder bumps 8 includes a shaft portion 8c positioned in the connecting passing hole 6c and having a shape that is complementary to the connecting passing hole 6c, and a head portion 8d positioned on the outer surface 6b of the second roof portion 6. Between the shaft portion 8c and head portion 8d, a circumferential jaw 8e fixed to the outer surface 6b of the second roof portion 6 is formed. The head portion 8d is a hemispherical shape and forms the outer end 8b.
In a second example shown in
In the second example, the circuit formed in the device chip 2 and the outside thereof can be connected by the external connecting solder bump 8 without the metal layer within the roof 7.
The heat dissipating solder bumps 9 is formed by using a heat dissipating passing hole 6d passing through the second roof portion 6, and includes an inner end 9a joined to the metal layer within the roof 7 an outer end 9b protruding from the second roof portion 6.
The heat dissipating passing hole 6d includes an opening on an outer surface 6b of the second roof part 6, and disposes the metal layer within the roof 7 at a bottom of the heat dissipating passing hole 6d.
In the example of the drawings, the diameter of the heat dissipating passing hole 6d is configured to gradually decrease toward the inner surface 6a of the second roof portion 6, and the hole wall is inclined.
The heat dissipating solder bumps 9 includes a shaft portion 9c positioned in the heat dissipating passing hole 6d and having a shape that is complementary to the heat dissipating passing hole 6d, and a head portion 9d positioned on the outer surface 6b of the second roof portion 6. Between the shaft portion 9c and head portion 9d, a circumferential jaw 9e fixed to the outer surface 6b of the second roof portion 6 is formed. The head portion 9d is a hemispherical shape and forms the outer end 9b.
The acoustic wave device includes the two or more heat dissipating solder bumps 9.
Further, as shown in
Firstly, the acoustic wave device 1 according to an example implementation according to the present disclosure contributes to a demand for a reducing-height device of this type by minimizing the thickness of the acoustic wave device 1 with forming the sealed space 10 of the resonator 11 by the second metal pattern 4 and the first roof portion 5.
Second, the heat generated in the device chip 2 can be efficiently dissipated to the outside through the linear first path L1 (shown in
Third, the heat transferred to the first roof portion 5 through the second metal pattern 4 can be efficiently dissipated to the outside through the second path L2 (shown in
Fourth, the heat generated in the device chip 2 can be efficiently dissipated to the outside through a third path L3 (shown in
Typically, as shown in
The acoustic wave device 1 according to the first example can be appropriately and rationally produced by a producing method including the following steps.
First, the first metal pattern 3 is formed on one surface of the wafer 20 to be the device chip 2 (first step/drawing is omitted).
Next, the second metal pattern 4 is formed on the one surface of the wafer 20 to be the device chip 2 (second step/drawing is omitted).
Next, the first roof portion 5 is formed on the one surface of the wafer 20 to be the device chip 2 (third step/drawing is omitted).
The first roof portion 5 may be formed by laminating a resin-made planar body (film) on the one surface of the wafer 20 and integrating them.
It is possible to reliably establish the first path L1 because pressurizing the first roof portion 5 after forming the first roof portion 5 in this way enable integrating the inner surface 5a and the second metal pattern 4 of the first roof portion 5 without a gap.
Next, a resist 21 for forming the via 5c is formed on the first roof portion 5 formed in the third step, and the via 5c is formed by removing a part of the first roof portion 5 by chemical treatment using the resist 21. (fourth step/
Next, after the resist 21 formed in the fourth step is removed, the wiring body 17 is formed by filling the via 5c with a metal (fifth step/
Then, the main portion 7a and the accompanying portion 7b as the metal layer within the roof 7 are formed on the first roof portion 5 (sixth step/
Then, the second roof portion 6 is then formed on the first roof portion 5. The second roof portion 6 can be formed by laminating a resin-made planar body (film) on the first roof portion 5 and integrating them. Alternatively, the second roof portion 6 may be formed by applying the resin onto the first roof portion 5.
After forming the resin layer to be the second roof portion 6 on the first roof portion 5 in this way, a resist (drawing is omitted) for forming the connecting passing hole 6c and the heat dissipating passing hole 6d is formed thereon, the connecting passing hole 6c and the heat dissipating passing hole 6d are formed by removing a portion of the resin layer to be the second roof portion 6 by this resist (seventh steps/
Next, the connecting passing hole 6c and the heat dissipating passing hole 6d are coated and filled with the cream-solder 22 typically by a printer (eighth step/
Reflow process after the eighth step forms the external connecting solder bumps 8 and the heat dissipating solder bump 9 having a height protruding from the outer surface of the second roof portion 6.
Thereafter, dicing is performed on the wafer 20 to generate the acoustic wave device 1 including the plurality of structures from the wafer 20 (
Further, the acoustic wave device 1 according to the second example can be appropriately and rationally produced by a producing method including the following steps.
First, the first metal pattern 3 is formed on one surface of the wafer 20 to be the device chip 2 (first step/illustration is omitted).
Next, the second metal pattern 4 is formed on the one surface of the wafer 20 to be the device chip 2 (second step/illustration is omitted).
Next, the first roof portion 5 is formed on the one surface of the wafer 20 to be the device chip 2 (third step/illustration is omitted). The first roof portion 5 may be formed by laminating a resin-made planar body (film) on one surface of the wafer 20 and integrating them.
It is possible to reliably establish the first path L1 because pressurizing the first roof portion 5 after forming the first roof portion 5 in this way enable integrating the inner surface 5a and the second metal pattern 4 of the first roof portion 5 without a gap.
Next, a resist 23 for forming the metal layer within the roof 7 is formed on the first roof portion 5 formed in the third step, and the metal layer within the roof 7 is formed by lift-off using the resist 23 (fourth step/
Then, the resist 23 formed in the fourth step is removed (fifth step/
The second roof portion 6 is then formed on the first roof portion 5.
The second roof portion 6 can be formed by laminating a resin-made planar body (film) on the first roof portion 5 and integrating them. Alternatively, the second roof portion 6 may be formed by applying the resin onto the first roof portion 5.
After forming the resin layer to be the second roof portion 6 on the first roof portion 5 in this way, a resist (drawing is omitted) for forming the connecting passing hole 18 and the heat dissipating passing hole 6d is formed thereon. With using the resist, the connecting passing hole 6c and the heat dissipating passing hole 6d are formed by removing a portion of the resin layer to be the first roof portion 5 and the second roof portion 6 by a chemical treatment at a forming region of the connecting passing hole 18, and by removing a portion of the resin layer to be the second roof portion 6 by a chemical treatment at a portion at a forming region of the heat dissipating passing hole 6d (seventh step/
Next, after the resist formed in the seventh step is removed, the connecting passing hole 18 and the heat dissipating passing hole 6d are coated and filled with the cream-solder 22 typically by a printer (eighth step/
Reflow process after the eighth step forms the external connecting solder bumps 8 and the heat dissipating solder bump 9 having a height protruding from the outer surface of the second roof portion 6.
Thereafter, dicing is performed on the wafer 20 to generate the acoustic wave device 1 including the plurality of structures from the wafer 20.
This enables fixing the second roof portion 6 to the first roof portion 5 by inserting the resin constituting the second roof portion 6 into the through-hole 7c at the forming region of the through-hole 7c.
This enables fixing the second roof portion 6 to the first roof portion 5 by inserting the resin constituting the second roof portion 6 into a mesh openings 7d at the mesh openings of the metal layer within the roof 7 having the form of mesh.
It should be noted that, of course, the present disclosure is not limited to the embodiments described above, but includes the embodiments that can achieve the purpose of the present disclosure.
Number | Date | Country | Kind |
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2023-088591 | May 2023 | JP | national |