The present invention relates to an active matrix substrate, and more particularly, to an active matrix substrate including a demultiplexer for time-divisionally applying each data signal output from a source drive circuit to two or more data signal lines. Further, the present invention relates to a display device including the active matrix substrate and a drive method therefor.
A display device such as an active matrix type liquid crystal display device uses an active matrix substrate in which a plurality of data signal lines (also referred to as “source lines”), a plurality of scan signal lines (also referred to as “gate lines”) intersecting the plurality of data signal lines, and a plurality of pixel formation portions arranged in a matrix along the plurality of data signal lines and the plurality of scan signal lines are formed. In some cases, the display device adopts a method (hereinafter, referred to as a “DEMUX method”) of grouping a plurality of data signal lines in an active matrix substrate into a plurality of sets, each set including two or more data signal lines and applying data signals time-divisionally to the two or more data signal lines of each set.
In the DEMUX method, a plurality of demultiplexers respectively corresponding to the plurality of sets described above are used, and a source drive circuit outputs, to each demultiplexer, a signal (hereinafter, referred to as a “multiplexed data signal”), which is obtained by time-divisionally multiplexing two or more data signals to be applied to two or more data signal lines of the corresponding set. Each demultiplexer includes two or more switching elements, which are respectively connected to two or more data signal lines of a corresponding set. Each multiplexed data signal from a source drive circuit is applied to any of the two or more data signal lines via a switching element switched on among two or more switching elements in the corresponding demultiplexer, and the switching elements in the ON state in each demultiplexer are sequentially switched. A data signal is applied to each data signal line via a switching element when the switching element connected to the data signal line in the corresponding demultiplexer is turned on, and thereafter, when the switching element changes to an OFF state, an analog voltage as the data signal is held in a wire capacitor. By doing so, one of the plurality of scan signal lines is selected in a state where the analog voltage as the data signal is applied to or held in each data signal line, and thereby, a voltage of the data signal line is written as pixel data to a pixel formation portion connected to the selected scan signal line.
In the active matrix type display device of a DEMUX method described above, the demultiplexer is often formed integrally (monolithically) with the pixel formation portion on the active matrix substrate to narrow a picture-frame of a display unit and reduce the number of output terminals and a circuit amount of the source drive circuit (hereinafter, a DEMUX method of using the active matrix substrate in which the demultiplexer and the pixel formation portion are integrally formed in this manner is referred to as a “monolithic DEMUX method”).
A thin film transistor (hereinafter, abbreviated as a “TFT”) is used as a switching element in each pixel formation portion formed on an active matrix substrate, and an oxide semiconductor may be used instead of amorphous silicon or low temperature polysilicon that is used in the related art as a material of a channel layer of this TFT. A TFT in which a channel layer is formed of an oxide semiconductor (hereinafter, referred to as an “oxide semiconductor TFT”) has an extremely small leakage current when turned off, and a display device with low power consumption can be realized by using the TFT. However, mobility of the oxide semiconductor is lower than mobility of low temperature polysilicon. Therefore, when an oxide semiconductor TFT is used for the display device of a monolithic DEMUX method, it is necessary to increase a size of a TFT that configure a demultiplexer, as compared with a case in which a TFT in which a channel layer is formed of low temperature polysilicon (hereinafter, referred to as a “LTPS-TFT”) is used. Increasing the size of the TFT in the demultiplexer causes an increase in a picture-frame size and power consumption of the display panel. Further, depending on specifications of the display panel, it is difficult to realize the demultiplexer by using the oxide semiconductor TFT.
In contrast to this, Pamphlet of International Publication No. 2018/190245 proposes a configuration of using a boost circuit for increasing a voltage to be applied to a gate terminal of a TFT configuring a demultiplexer for the DEMUX method. With this configuration, it is possible to suppress an increase in picture-frame size and power consumption even in a display device of a monolithic DEMUX method using an oxide semiconductor TFT.
However, recently, higher resolution of a display image and an increase in display size in a display device of a DEMUX method are in progress. Therefore, there is a case in which the configuration proposed by the pamphlet of International Publication No. 2018/190245 cannot cope with the higher resolution of the display image and the increase in display size.
Therefore, in a display device of a monolithic DEMUX method using a TFT in which a channel layer is formed of a material having a relatively low mobility, such as an oxide semiconductor, it is desirable to further reduce power consumption while suppressing an increase in picture-frame size.
(1) An active matrix substrate according to an embodiment of the present invention includes a plurality of data signal lines, a plurality of scan signal lines intersecting the plurality of data signal lines, a plurality of pixel formation portions arranged along the plurality of data signal lines and the plurality of scan signal lines, and a demultiplexing circuit that includes a plurality of demultiplexers respectively corresponding to a plurality of sets of data signal lines obtained by grouping the plurality of data signal lines, each set including two or more data signal lines and includes a plurality of input terminals respectively corresponding to the plurality of demultiplexers, in which each of the plurality of demultiplexers includes two or more connection control switching elements respectively corresponding to the two or more data signal lines in a corresponding set, first conduction terminals of the two or more connection control switching elements are all connected to corresponding input terminals, and second conduction terminals of the two or more connection control switching elements are respectively connected to the two or more data signal lines of the corresponding set in each of the plurality of demultiplexers, the demultiplexing circuit includes a plurality of boost circuits that generate connection control signals to be applied to control terminals of the connection control switching elements included in the plurality of demultiplexers, each of the plurality of boost circuits includes an internal node connected to a control terminal of a connection control switching element to which a connection control signal to be generated is applied, and a charging/discharging switching element for charging and discharging the internal node and is configured to boost a voltage applied to the internal node via the charging/discharging switching element and to apply, as the connection control signal, a boosted voltage of the internal node to the control terminal of the connection control switching element, and the demultiplexing circuit is configured such that, when a charging/discharging switching element in any of the plurality of boost circuits is in an ON state, a boosted voltage of an internal node in another boost circuit is applied to the control terminal of the charging/discharging switching element.
According to the configuration, if time-divisionally multiplexed signals (multiplexed data signals) are applied to the plurality of input terminals of the demultiplexing circuit on the active matrix substrate, the respective multiplexed data signals are applied to the plurality of data signal lines as a plurality of data signals demultiplexed by a demultiplexing circuit. At this time, connection control signals for turning on/off the two or more connection control switching elements in each demultiplexer are generated by a boost circuit, based on a control signal (hereinafter, referred to as a “demultiplexing control signal”) applied to operate the demultiplexing circuit. That is, in each boost circuit, a voltage applied to an internal node is boosted by precharging the internal node via the charging/discharging switching element based on a demultiplexing control signal, and the boosted voltage of the internal node is applied to a control terminal of a connection control switching element to be switched on as a connection control signal. Here, a boosted voltage of an internal node in another boost circuit is applied to the control terminal of the charging/discharging switching element for precharging the internal node. Therefore, for example, even when a thin film transistor (TFT) having a channel layer formed of an oxide semiconductor is used as a charging/discharging switching element, a precharge voltage is increased as compared to the related art, and thus, it is possible to increase a boosted voltage of the internal node, that is, a voltage of a connection control signal, and to decrease on-resistance of a charging/discharging switching element. Thereby, in a display device of a monolithic DEMUX method using a TFT having a channel layer formed of a material with relatively low mobility, such as an oxide semiconductor, it is possible to reduce power consumption while suppressing an increase in picture-frame size as compared to the related art.
(2) An active matrix substrate according to an embodiment of the present invention includes the configuration of (1) described above, and the demultiplexing circuit receives a demultiplexing control signal configured by a plurality of control signals for operating the plurality of boost circuits, and the plurality of boost circuits are grouped into two or more boost circuit groups, to which the same control signal of the plurality of control signals is applied, and the active matrix substrate further includes two or more signal lines for respectively transmitting the same control signal to the two or more boost circuit groups.
(3) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (1) described above, and an internal node of one boost circuit of the plurality of boost circuits is connected to control terminals of two or more connection control switching elements to which the same connection control signal is applied among connection control switching elements in the plurality of demultiplexers.
(4) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (3) described above, and the demultiplexing circuit receives a demultiplexing control signal configured by a plurality of control signals for operating the plurality of boost circuits, and the plurality of boost circuits are grouped into two or more boost circuit groups, to which the same control signal of the plurality of control signals is applied, and the active matrix substrate further includes two or more signal lines for respectively transmitting the same control signal to the two or more boost circuit groups.
(5) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (1) described above, and each of the plurality of boost circuits further includes an initialization switching element for initializing a voltage of the internal node at an end time of each frame period, immediately before start of each frame period, or at an halt time of a drive of the plurality of data signal lines and a drive of the plurality of scan signal lines.
(6) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (5) described above, and the demultiplexing circuit receives a demultiplexing control signal configured by a plurality of control signals for operating the plurality of boost circuits, and the plurality of boost circuits are grouped into two or more boost circuit groups, to which the same control signal of the plurality of control signals is applied, and the active matrix substrate further includes two or more signal lines for respectively transmitting the same control signal to the two or more boost circuit groups.
(7) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (5) described above, and an internal node of one boost circuit of the plurality of boost circuits is connected to control terminals of two or more connection control switching elements to which the same connection control signal is applied among connection control switching elements in the plurality of demultiplexers.
(8) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (7) described above, and the demultiplexing circuit receives a demultiplexing control signal configured by a plurality of control signals for operating the plurality of boost circuits, and the plurality of boost circuits are grouped into two or more boost circuit groups, to which the same control signal of the plurality of control signals is applied, and the active matrix substrate further includes two or more signal lines for respectively transmitting the same control signal to the two or more boost circuit groups.
(9) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of any one of (1) to (8) described above, and each of the plurality of boost circuits further includes a boost capacitor, a first input terminal connected to the internal node via the charging/discharging switching element, a second input terminal connected to a control terminal of the charging/discharging switching element, and a third input terminal connected to the internal node via the boost capacitor, and the second input terminal of each of the plurality of boost circuits is connected to an internal node of another boost circuit operated by a control signal different from a control signal for operating the boost circuit.
(10) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of (9) described above, and each of the plurality of boost circuits further includes a transistor of a diode-connected form, and the internal node in each of the plurality of boost circuits is connected to the first input terminal via the transistor of the diode-connected form.
(11) An active matrix substrate according to a certain embodiment of the present invention includes the configuration of any one of (1) to (10) described above, and each switching element and transistor included in the demultiplexing circuit is a thin film transistor having a channel layer formed of an oxide semiconductor.
(12) A display device according to an embodiment of the present invention the active matrix substrate according to any one of (1) to (11) described above, a source drive circuit that drives the plurality of data signal lines via the demultiplexing circuit, a scan signal line drive circuit that drives the plurality of scan signal lines, and a display control circuit that controls the scan signal line drive circuit, the source drive circuit, and the demultiplexing circuit such that a plurality of data signals representing an image to be displayed are applied to the plurality of data signal lines in response to scan of the plurality of scan signal lines.
(13) The display device according to a certain embodiment of the present invention includes the configuration of (12) described above, and the display control circuit controls the demultiplexing circuit such that a voltage of the internal node is boosted by any of the plurality of boost circuits at least once before a drive of the plurality of scan signal lines starts from a state where a drive of the plurality of data signal lines and a drive of the plurality of scan signal lines stop.
(14) The display device according to a certain embodiment of the present invention includes the configuration of (12) or (13) described above, and the display control circuit controls the demultiplexing circuit such that a voltage of the internal node is boosted by any of the plurality of boost circuits at least once before a drive of the plurality of scan signal lines restarts from a state where a drive of the plurality of data signal lines and a drive of the plurality of scan signal lines are halted.
(15) A drive method according to a certain embodiment of the present invention is a drive method of a display device including an active matrix substrate including a plurality of data signal lines, a plurality of scan signal lines intersecting the plurality of data signal lines, a plurality of pixel formation portions arranged along the plurality of data signal lines and the plurality of scan signal lines, and a demultiplexing circuit that includes a plurality of demultiplexers respectively corresponding to a plurality of sets of data signal lines obtained by grouping the plurality of data signal lines, each set including two or more data signal lines, and includes a plurality of input terminals respectively corresponding to the plurality of demultiplexers, in which each of the plurality of demultiplexers includes two or more connection control switching elements respectively corresponding to the two or more data signal lines in a corresponding set, first conduction terminals of the two or more connection control switching elements are all connected to corresponding input terminals, and second conduction terminals of the two or more connection control switching elements are respectively connected to the two or more data signal lines of the corresponding set in each of the plurality of demultiplexers, the demultiplexing circuit includes a plurality of boost circuits that generate connection control signals to be applied to control terminals of the connection control switching elements included in the plurality of demultiplexers, and each of the plurality of boost circuits includes an internal node connected to a control terminal of a connection control switching element to which a connection control signal to be generated is applied and a charging/discharging switching element for charging and discharging the internal node, the drive method includes a demultiplexing step of demultiplexing multiplexed data signals applied to input terminals corresponding to each of the plurality of demultiplexers to generate two or more data signals to be respectively applied to the two or more data signal lines of the corresponding set, in which the demultiplexing step includes a charging step of precharging the internal node in each of the plurality of boost circuits via the charging/discharging switching element in response to a demultiplexing control signal applied to the demultiplexing circuit, and a boost step of boosting a voltage of the internal node in response to the demultiplexing control signal after precharging is performed by the charging step in each of the plurality of boost circuits, and a boosted voltage of an internal node in another boost circuit is applied to the control terminal of the charging/discharging switching element included in each of the plurality of boost circuits in the charging step.
These and other objects, characteristics, aspects, and effects of the present invention will become more apparent from the following detailed description of the present invention with reference to the accompanying drawings.
Hereinafter, embodiments are described with reference to the accompanying drawings. In each transistor described below, a gate terminal corresponds to a control terminal, one of a drain terminal and a source terminal corresponds to a first conduction terminal, and the other corresponds to a second conduction terminal. Further, all transistors according to the present embodiments are N-channel type thin film transistors (TFTs) but are not limited thereto. Further, a term “connection” in the present specification means “electrical connection” unless otherwise specified, and it is assumed that the connection includes not only a case of meaning direct connection but also a case of meaning indirect connection via other elements, within the scope not departing from the gist of the present invention.
Each pixel formation portion 10 corresponds to any one of the source bus lines SL1 to SL2m, corresponds to any one of the gate bus lines GL1 to GLn, and is coupled to corresponding gate bus line GLi and source bus line SLj (1≤i≤n and 1≤j≤2m).
As illustrated in
A thin film transistor using amorphous silicon for a channel layer, a thin film transistor (LTPS-TFT) using low temperature polysilicon for a channel layer, or a thin film transistor (oxide TFT) using an oxide semiconductor for a channel layer can be adopted as the TFT 11 in the pixel formation portion 10. For example, a thin film transistor having an oxide semiconductor layer containing an In—Ga—Zn—O-based semiconductor (for example, an indium gallium zinc oxide) can be used as the oxide TFT. In the present embodiment, it is assumed that an oxide TFT is used as the TFT 11 in the pixel formation portion 10. It is assumed that the first and second gate drivers 51 and 52 and the demultiplexing circuit 40 are integrally formed with the pixel formation portion 10 on the active matrix substrate 100, and an oxide TFT is also used for the TFT in the demultiplexing circuit 40.
A display control circuit 20 receives an input signal Sin from the outside, and generates and outputs a data side control signal Scd, a first scan side control signal Scs1, a second scan side control signal Scs2, a demultiplexing control signal Ssw, and a common voltage Vcom (not illustrated), based on the input signal Sin. The data side control signal Scd is applied to the source driver 30 as a source drive circuit, the first scan side control signal Scs1 is applied to the first gate driver 51, the second scan side control signal Scs2 is applied to the second gate driver 52, and the demultiplexing control signal Ssw is applied to the demultiplexing circuit 40.
The first gate driver 51 generates scan signals G1, G3, . . . for sequentially selecting odd-numbered gate bus lines GL1, GL3, . . . , respectively, based on the first scan side control signal Scs1 to apply to the gate bus lines GL1, GL3, . . . , respectively. The second gate driver 52 generates scan signals G2, G4, . . . for sequentially selecting the even-numbered gate bus lines GL2, GL4, . . . , respectively, based on the second scan side control signal Scs2 to apply to the gate bus lines GL2, GL4, . . . , respectively. By driving the gate bus lines GL1 to GLn by using the first and second gate drivers 51 and 52, the n gate bus lines GL1 to GLn are sequentially selected for each horizontal period, and sequential selection of the gate bus lines GL1 to GLn is repeated with one frame period as a cycle. Here, the “horizontal period” refers to a period of a portion corresponding to one line of a display image in a video signal based on a horizontal scan and a vertical scan. A selection period of the gate bus lines GL1 to GLn may be configured to be sequentially selected by a plurality of horizontal periods (for example, two horizontal periods). Further, in the example illustrated in
The data side control signal Scd applied to the source driver 30 includes an image signal Sv representing an image to be displayed and a data side timing control signal Sct (for example, a start pulse signal, a clock signal, or the like). The source driver 30 generates and outputs data side output signals Do1 to Dom at a timing corresponding to the drive of the gate bus lines GL1 to GLn made by the scan signals G1 to Gn, based on the data side control signal Scd, thereby, driving the source bus lines SL1 to SL2m via the demultiplexing circuit 40 (details are described below). Generally, in a display device of a DEMUX method, the source bus lines in the active matrix substrate are grouped into a plurality of sets, each set including two or more source bus lines, and the source driver includes a plurality of output terminals corresponding to the plurality of sets as output terminals for driving the source bus lines. As illustrated in
The demultiplexing circuit 40 is integrally formed with the display unit 101 on the active matrix substrate 100, receives the multiplexed data signals Do1 to Dom from the source driver 30, and demultiplexes the multiplexed data signals Do1 to Dom to apply respectively to the source bus lines SL1 to SL2m as 2m data signals D1 to D2m. That is, the demultiplexing circuit 40 according to the present embodiment includes m demultiplexers 411 to 41m respectively corresponding to the m source bus line groups SLj and SLJ+2, and has m input terminals Td1 to Tdm respectively corresponding to the m demultiplexers 411 to 41m. The m input terminals Td1 to Tdm are respectively coupled to the m output terminals To1 to Tom of the source driver 30 via the data output lines VL1 to VLm, and the multiplexed data signals Do1 to Dom output from the source driver 30 are respectively applied to the input terminals Td1 to Tdm of the demultiplexing circuit 40. Each demultiplexer 41k couples data output line VLk coupled to the corresponding input terminal Tdk to either one of the two source bus lines SLj and SLJ+2 of the corresponding set, based on the demultiplexing control signal Ssw, and switches the source bus line coupled to the data output line VLkb between the two source bus lines SLj and SLJ+2 in each horizontal period. Thereby, the multiplexed data signal Dok applied to each input terminal Tdk of the demultiplexing circuit 40 is demultiplexed to be applied to the two source bus lines SLj and SLJ+2 in the corresponding set as the data signals Dj and DJ+2.
A liquid crystal display device including the active matrix substrate 100 according to the present embodiment adopts a method of driving the source bus lines SL1 to SLm such that polarities of the data signals Dj and Dj+1 applied to the adjacent source bus lines SLj and SLj+1 are different from each other. Here, a so-called column inversion drive method is adopted, but a drive method of the liquid crystal display device is not limited thereto. As illustrated in
As illustrated in
The demultiplexing circuit 40 demultiplexes the m multiplexed data signals Do1 to Dom output from the source driver 30, based on the demultiplexing control signal Ssw to respectively apply to the source bus lines SL1 to SL2m as the data signals D1 to D2m.
As described above, the data signals D1 to D2m are applied to the source bus lines SL1 to SL2m, and the scan signals G1 to Gn are applied to the gate bus lines GL1 to GLn. Further, a predetermined common voltage Vcom is supplied from the display control circuit 20 to the common electrode Ec. By driving the source bus lines SL1 to SL2m and the gate bus lines GL1 to GLn in the display unit 101 as described above, pixel data based on the image signal Sv is written in each pixel formation portion 10 and not illustrated on the back surface of the display unit 101. By irradiating light from the backlight, the image represented by the image signal Sv included in the input signal Sin from the outside is displayed on the display unit 101.
In the demultiplexing circuit 40 according to the present embodiment, the connection control signals SW1 to SW2m generated by the boost circuits 421 to 42(2m) based on the demultiplexing control signal Ssw control on/off of the connection control transistors M1 to M2m. Thereby, among the two connection control transistors Mj and Mj+2 in each demultiplexer 41k (k=1 to m), the connection control transistor (referred to as “A connection control transistor”) Mj denoted by a smaller number is turned on when the data signal Dj is applied to the source bus line SLj connected thereto in each horizontal period, and the connection control transistor (referred to as “B connection control transistor”) Mj+2 denoted by a larger number is turned on when the data signal Dj+2 is applied to the source bus line SLj+2 connected thereto in each horizontal period. Hereinafter, details of a configuration and an operation of the demultiplexing circuit 40 are described with reference to
The demultiplexing control signal Ssw applied to the demultiplexing circuit 40 is configured with two A control signals ASW1 and ASW3 and two B control signals BSW1 and BSW3 illustrated in
As illustrated in
As can be seen from
The demultiplexing circuit 40 including the boost circuits 421 to 42(2m) configured as described above operates as follows based on the demultiplexing control signal Ssw from the display control circuit 20, that is, the A control signals ASW1 and ASW3 and the B control signals BSW1 and BSW3 illustrated in
The A connection control transistor M1 to which the A connection control signal SW1 generated by the A boost circuit 421 is applied and the B connection control transistor M3 to which the B connection control signal SW3 generated by the B boost circuit 423 is applied configure the first demultiplexer 411, and signals obtained by time-divisionally multiplexing the data signals D1 and D3 to be applied to the two source bus lines SL1 and SL3, respectively, are applied to the input terminal of the demultiplexer 411 via the data output line VL1 as a multiplexed data signal Do1. Signals obtained by time-divisionally multiplexing the data signals D2 and D4 to be applied to the two source bus lines SL2 and SL4 are input to the input terminals of the second demultiplexer 412 via the data output line VL2 as the multiplexed data signal Dot. More specifically, a voltage of the data signal D1 is applied to the first demultiplexer 411 via the data output line VL1 in one of the first half and the second half of each horizontal period (also referred to as “1H period”), and a voltage of the data signal D3 is applied to the first multiplexer 411 via the data output line VL1 in the other period. Further, a voltage of the data signal D2 is applied to the second demultiplexer 412 via the data output line VL2 in one of the first half and the second half of each 1H period, and a voltage of the data signal D4 is applied to the second demultiplexer 412 via the data output line VL2 in the other period. The same applies to the other demultiplexers 413 to 41m.
As illustrated in
Thereafter, at a time t4, a voltage applied from the source driver 30 to the data output line VL1 changes from the voltage of the data signal D1 to be applied to the source bus line SL1 to the voltage of the data signal D3 to be applied to the source bus line SL3, and the voltage of the data signal D3 is applied to the source bus line SL3 via the connection control transistor M3 to which a voltage of the boost H level of the internal node N1B is applied.
At a time t5 when the 1H period ends and the next 1H period (hereinafter, referred to as a “second 1H period”) starts, a voltage applied from the source driver 30 to the data output line VL1 changes to the voltage of the data signal D3 of the next display line to be applied to the source bus line SL3. Further, at the time t5, one A control signal ASW1 of the demultiplexing control signal Ssw changes from an L level to an H level. Thereby, the internal node N1A of the A boost circuit 421 illustrated in
Thereafter, at the time t6, the other B control signal BSW3 of the demultiplexing control signal Ssw changes from an H level to an L level, and at a time t7, the one B control signal BSW1 also changes from an H level to an L level. According to this, the voltage of the internal node N1B of B boost circuit 423 is decreased to reach an L level at the time t7. Further, at the time t7, the other A control signal ASW3 of the demultiplexing control signal Ssw changes from an L level to an H level, the voltage of the internal node N1A of the A boost circuit 421 is boosted via the boost capacitor Cbst to become a voltage higher than a voltage of an H level, that is, a voltage of the boost H level. Due to this voltage, the transistor T2B of the B boost circuit 423 illustrated in
From the above description, in the period t5 to t6, the voltage of the data signal D3 of the next display line to be applied to the source bus line SL3 is applied to the source bus line SL3 via the connection control transistor M3 that is turned on by the boosted voltage of the internal node N1B (the voltage of the boost H level).
Thereafter, at a time t8, a voltage applied from the source driver 30 to the data output line VL1 changes from the voltage of the data signal D3 to be applied to the source bus line SL3 to the voltage of the data signal D1 to be applied to the source bus line SL1, and the voltage of the data signal D1 is applied to the source bus line SL1 via the connection control transistor M1 which is turned on by the boosted voltage of the internal node N1A (the voltage of the boost H level).
At a time t9 when the second 1H period ends and the next 1H period (hereinafter, also referred to as a “third 1H period”) starts, a voltage applied from the source driver 30 to the data output line VL1 changes to the voltage of the data signal D1 of the next display line to be applied to the source bus line SL1. Further, at the time t9, the above-described one B control signal BSW1 of the demultiplexing control signal Ssw changes from an L level to an H level. Thereby, the internal node N1B of the B boost circuit 423 illustrated in
Thereafter, at the time t10, the other A control signal ASW3 of the demultiplexing control signal Ssw changes from an H level to an L level, and at a time t11, the one A control signal ASW1 also changes from an H level to an L level. According to this, the voltage of the internal node N1A of the A boost circuit 421 decreases to reach an L level at the time t11. Further, at the time t11, the other B control signal BSW3 of the demultiplexing control signal Ssw changes from an L level to an H level, and thereby, the voltage of the internal node N1B of the B boost circuit 423 is boosted via the boost capacitor Cbst to become a voltage higher than a voltage of an H level, that is, the voltage of the boost H level. Due to this voltage, the transistor T2A of the A boost circuit 421 illustrated in
From the above description, in the period t9 to t10, the voltage of the data signal D1 of the next display line to be applied to the source bus line SL1 is applied to the source bus line SL1 via the connection control transistor M1 which is turned on by the boosted voltage of the internal node N1A.
Thereafter, at a time t12, a voltage applied from the source driver 30 to the data output line VL1 changes from the voltage of the data signal D1 to be applied to the source bus line SL1 to the voltage of the data signal D3 to be applied to the source bus line SL3, and the voltage of the data signal D3 is applied to the source bus line SL3 via the connection control transistor M3 which is turned on by the boosted voltage of the internal node N1B.
Hereinafter, in the same manner, the internal node N1A of the A boost circuit such as the boost circuit 421 illustrated in
By controlling the connection control transistors Mj and Mj+2 in each demultiplexer 41k (k=1 to m) as described above, m multiplexed data signals Do1 to Dom output from the source driver 30 are demultiplexed to be applied to the source bus lines SL1 to SL2m as the data signals D1 to D2m, respectively.
As will be understood from the above description, a precharge voltage of the internal node N1 in the boost circuit 42j is consequently determined by a voltage of the control signal ASW1 or BSW1 applied through the transistor T2 as a charging/discharging switching element, and thus, the transistor T1 of a diode-connected form is not always necessary. However, the transistor T1 of a diode-connected form is preferably provided to properly charge the internal node N1 at the restart time of driving the source bus line SLi after a pause period to be described below or at the start time of the source bus line SLj after power is supplied.
Next, a boost circuit used for a demultiplexing circuit in an active matrix substrate of a DEMUX method of the related art is described as a comparative example of the boost circuit 42j used for the demultiplexing circuit 40 according to the present embodiment. Here, a boost circuit used for a DEMUX circuit included in an active matrix substrate according to a twelfth embodiment described in International Publication No. 2018/190245 is used as a comparative example (see paragraphs [0145] to [0150] of the document, FIG. 18 and FIG. 19).
As illustrated in
Thereafter, at time t2, a voltage of the drive signal line DL3 (DL3A) changes from an L level to an H level, and thereby, the voltage of the internal node N1 of the boost circuit 20x is boosted via a boost capacitance element 26x to become a voltage higher than a voltage of an H level, that is, the voltage of the boost H level. However, as described above, the voltage (hereinafter, referred to as a “precharge voltage”) of the internal node N1 (N1A) obtained by the previous precharge operation (operation in the period t1 to t2) is not higher than the voltage Vh-Vth obtained by subtracting the threshold voltage Vth (>0) of the setting TFT 24x from the voltage Vh of an H level of the drive signal line DL1, and thus, accordingly, the voltage of the boost H level is also lower than a voltage of an H level of the internal node N1 of the boost circuit 42j according to the present embodiment.
In the above description, the signals of the drive signal lines DL1A, DL2A, and DL3A illustrated in
As described above, a voltage of a boost H level obtained at the internal node N1 is applied to the switching TFT 12x (corresponding to the connection control transistor Mj according to the present embodiment) in the demultiplexing circuit, and also in the demultiplexing circuit using the boost circuit 20x of the comparative example, the data signals D1 to D2m to be applied respectively to the source bus lines SL1 to SL2m are generated from the time divisionally multiplexed data signals (signals of the output signal lines VL1 to VL2m) output from the source driver by the demultiplexing operation which is functionally equivalent to the demultiplexing operation of the present embodiment.
As described above, in the present embodiment, a voltage of the internal node N1 of the boost circuit 42j is applied, as the connection control signal SWj, to a gate terminal of each connection control transistor Mj (j=1 to 2m) as a switching element in the demultiplexing circuit 40 as illustrated in
As can be seen from
Further, also in the B boost circuit 42(j+2) according to the present embodiment, the internal node N1B is precharged not only via the transistor T1B of a diode-connected form but also precharged via the transistor T2B having a gate terminal to which the voltage of the node N1A of the A boost circuit 42j is applied (see
As described above, in the present embodiment, the precharge voltage of the internal node N1 (N1A or N1B) of the boost circuit 42j (j=1 to 2m) can be higher than the precharge voltage of the internal node N1 (N1A or N1B) in the comparative example, and thus, even if a voltage boosted via the boost capacitance element 26x or the boost capacitor Cbst (the amount of increase by a boost operation) is the same, the boosted voltage (voltage of a boost H level) of the internal node N1 of the boost circuit 42j (j=1 to 2m) can be higher than the boosted voltage (voltage of a boost H level) of the internal node N1 in the comparative example described above.
As described above, according to the present embodiment, the connection control signal SWj (voltage of the internal node N1 of the boost circuit 42j) to be applied to the gate terminal of the connection control transistor Mj as a switching element configuring (each demultiplexer 41j of) the demultiplexing circuit 40 can be increased as compared to the related art. Therefore, it is possible to realize an active matrix substrate corresponding to a monolithic DEMUX method while suppressing a size of the TFT as a switching element configuring the demultiplexing circuit as compared to the related art. Thus, in a display device of a monolithic DEMUX method using a TFT in which a channel layer is formed of a material with a relatively low mobility such as an oxide semiconductor, it is possible to further suppress an increase in a picture-frame size and to reduce power consumption.
Next, a liquid crystal display device of a monolithic DEMUX method including an active matrix substrate according to a second embodiment is described.
As illustrated in
In the present embodiment, as illustrated in
Thus, according to the present embodiment, the demultiplexing circuit 40b operates in the same manner as the demultiplexing circuit 40 according to the first embodiment, and the same effect is obtained. In addition to this, according to the present embodiment, the number of signal lines for transmitting the demultiplexing control signal Ssw to the demultiplexers 411 to 41m increases, but a load per one signal line decreases (the number of boost circuits connected to one signal line is halved). Therefore, bluntness of waveforms of the control signals ASW1 to ASW4 and BSW1 to BSW4 configuring the demultiplexing control signal Ssw is reduced. As a result, generation of the data signals D1 to D2m by demultiplexing the multiplexed data signals Do1 to Dom as data side output signals from the source driver 30 and application to the source bus lines SL1 to SL2m are performed more accurately, and display quality on the display unit 101 is improved. Further, since the bluntness of the waveform is reduced, reaching a predetermined voltage at the time of precharging and boosting of the internal nodes N1A and N1B is made in a short time, and thus, high display quality can be obtained even in a panel with short one horizontal period, such as a high-resolution panel and a high-frequency drive panel.
In the configuration illustrated in
Next, a monolithic DEMUX liquid crystal display device including the active matrix substrate according to the third embodiment is described.
In the demultiplexing circuit 40 according to the first embodiment described above, as illustrated in
Although only 16 source bus lines SL1 to SL16 are illustrated in
The demultiplexing circuit 40c (
As illustrated in
Next, a liquid crystal display device of a monolithic DEMUX method including an active matrix substrate according to a fifth embodiment is described.
As illustrated in
As illustrated in
The clear signal CLR applied to each boost circuit 42j goes to a high level for a predetermined period at an end point in time of each frame period or immediately before a start point in time of each frame period, and the internal nodes N1 in each boost circuit 42j are initialized by the clear signal CLR of an H level. Thereby, the operation of the demultiplexing circuit 40e is stabilized.
The demultiplexing circuit 40e according to the present embodiment including the boost circuit 42j described above operates in the same manner as the demultiplexing circuit 40 according to the first embodiment except initialization of the internal node N1 made by the clear signal CLR. According to the present embodiment, it is possible to stabilize the operation of the demultiplexing circuit 40e while achieving the same effect as the first embodiment.
The demultiplexing circuit 40e (
In the present embodiment, the clear signal CLR applied to each boost circuit 42j goes to an H level for a predetermined period at an end point in time of each frame period or immediately before a start point in time of each frame period, and the internal nodes N1 in each boost circuit 42j are initialized by the clear signal CLR of an H level, in the same manner as the fourth embodiment.
According to the present embodiment described above, it is possible to stabilize the operation of the demultiplexing circuit 40f while achieving the same effect as the second embodiment.
In the present embodiment, the clear signal CLR applied to each boost circuit 42j also goes to an H level for a predetermined period at an end point in time of each frame period or immediately before a start point in time of each frame period, and the internal nodes N1 in each boost circuit 42j are initialized by the clear signal CLR of an H level, in the same manner as the fifth embodiment.
According to the present embodiment described above, it is possible to stabilize the operation of the demultiplexing circuit 40g while achieving the same effect as the third embodiment.
In the present embodiment, the clear signal CLR applied to each boost circuit 42j also goes to an H level for a predetermined period at an end point in time of each frame period or immediately before a start point in time of each frame period, and the internal nodes N1 in each boost circuit 42j are initialized by the clear signal CLR of an H level, in the same manner as the fifth embodiment.
According to the present embodiment described above, it is possible to stabilize the operation of the demultiplexing circuit 40h while achieving the same effect as the fourth embodiment.
Next, a liquid crystal display device of a monolithic DEMUX method (hereinafter, also referred to as a “display device according to the present embodiment” or a “display device according to a ninth embodiment”) including the active matrix substrate according to the ninth embodiment is described. In the display device according to the present embodiment, a so-called in-cell touch panel is configured by using the active matrix substrate according to the present embodiment. The display device according to the present embodiment has the same configuration as the display device according to the first embodiment except that an in-cell touch panel is configured by using an active matrix substrate and a control operation of a gate driver and a source driver that drive the in-cell touch panel. Therefore, hereinafter, in the configuration of the display device according to the present embodiment, portions which is the same as or corresponding to the configuration of the display device according to the first embodiment (
In
In the example illustrated in
However, at the time t1, a voltage of the internal node N1B of the B boost circuit 42(j+2) is at an L level, and thus, the transistor T2A in the A boost circuit 42j remains to be turned off. Therefore, as illustrated in
As illustrated in
In the present embodiment, as illustrated in
In the present embodiment, the display control circuit 20 is configured to control the demultiplexing circuit 40, the gate drivers 51 and 52, and the source driver 30 as described above, and thus, also in a display device having a pause period (the TP period Ttp) in which scan is halted like a display device including a touch panel, an effect is obtained in which the same operation as in the first embodiment is performed while ensuring a proper operation of the demultiplex circuit 40.
In the present embodiment, the in-cell touch panel is configured by using the active matrix substrate according to the first embodiment, but the in-cell touch panel may be configured by using the active matrix substrate according to another embodiment (any one of the second to eighth embodiments). Even in the configuration, the same effect as in other embodiments is obtained while ensuring a proper operation of a demultiplexing circuit. When the active matrix substrates according to the fifth to eighth embodiments are used, an internal node of a boost circuit may be initialized by the clear signal CLR at a start point in time of a pause period. Thereby, it is possible to pause an operation of a demultiplexing circuit more reliably during a pause period.
In the present embodiment, as illustrated in
Although the present invention is described in detail above, the above description is illustrative in all aspects and is not restrictive. It is understood that numerous other modifications and changes can be devised without departing from the scope of the present invention.
For example, in an active matrix substrate according to the respective embodiments described above, the demultiplexing circuit is realized by using only N-channel type TFTs but is not limited thereto. For example, a circuit such as the demultiplexing circuit in the active matrix substrate according to the respective embodiments described above may be realized by using only P-channel type TFTs. In this case, a configuration relating to a polarity of a voltage is different from the configurations of the respective embodiments described above, but since a specific configuration thereof is apparent to those skilled in the art, details thereof are omitted.
Further, in the respective embodiments described above, it is premised that the active matrix substrate according to the embodiment is used in a liquid crystal display device, and one set of source bus line groups corresponding to the respective demultiplexers 41k or the respective output terminals Tok of the source driver 30 is configured by two source bus lines SLj and SLj+2 selected every other source bus line in consideration of an inversion drive (a column inversion drive or the like) (see
The present invention can be applied to display devices other than liquid crystal display devices, for example, organic electroluminescence (EL) display devices, as long as the display devices are display devices of a monolithic DEMUX method using an active matrix substrate. When the present invention is applied to organic EL display devices, an inversion drive is not performed, and thus, a demultiplexing circuit may have a configuration in which source bus lines are grouped into a plurality of sets, each set including two or more source bus lines adjacent to each other (for example, three source bus lines corresponding to three primary colors of color display), and each set of the source bus lines corresponds to one demultiplexer 41k or one output terminal Tok of the source driver 30.
Number | Date | Country | |
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62879552 | Jul 2019 | US |