1. Technical Field
The present disclosure relates to optical coating devices, and more specifically, to an adjustable mask for use in an optical coating process.
2. Description of Related Art
At present, optical film can be coated on surfaces of optical components through physical vapor deposition (PVD). Optical coating devices often include a vacuum room, an evaporation source, a substrate carrier arranged above the evaporation source, and a mask between the evaporation source and the substrate carrier. The mask is used for adjusting the thickness of the film deposited on the surface of the substrates on the different locations of the substrate carrier. For example, if the film on the surface of substrates on the outer portions of the substrate carrier is thicker than preset thickness, an aluminum foil can be used to extend the mask corresponding to the outer portions to shield the evaporation source more, such that less evaporation material will reach the outer portions. Although conventional masks can satisfy basic requirements, a new adjustable mask is still required.
Many aspects of the embodiments can be better understood with reference to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present disclosure. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
Embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings.
Referring to
Referring to
In the embodiment, there are seven horizontal rods 20, seven pairs of shielding sheets 30, and seven adjustment members 40. However, the number of the above elements is not limited and may be varied according to need.
Referring to
Before coating, the substrates 400 are first arranged on the substrates carrier 300, and the substrates carrier 300 is then fixed to the drive device 700 at the ceiling of the vacuum coating room 100. The adjusted and covered mask 500 is then connected to the support 600 and arranged between the evaporation source 200 and the substrates carrier 300. During coating, the drive device 700 drives the substrates carrier 300 to rotate at a certain speed, the film material in the evaporation source 200 is heated to evaporate up to the substrates 400 in the substrates carrier 300 and deposit on surfaces of the substrates 400 and form a film. The thickness of the film is monitored until reaching a preset value. Then the coating process is stopped.
While various embodiments have been described and illustrated, the disclosure is not to be construed as being limited thereto. Various modifications can be made to the embodiments by those skilled in the art without departing from the true spirit and scope of the invention as defined by the appended claims.
Number | Date | Country | Kind |
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101106822 | Mar 2012 | TW | national |
Number | Name | Date | Kind |
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20090090301 | Tso et al. | Apr 2009 | A1 |
Number | Date | Country | |
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20130228121 A1 | Sep 2013 | US |