This application claims, under 35 USC 119, priority of Japanese Application No. 2005-86029 filed Mar. 24, 2005.
The present invention relates to an airtight container, in which a thin plate such as a semiconductor wafer, a storage disk or a liquid crystal glass substrate is contained, to be then stored, transported or used in a fabrication process.
There has been generally known an airtight container, in which a thin plate such as a semiconductor wafer is contained, to be then stored or transported.
An airtight container in the related art is exemplified in
The related art is disclosed in, for example, U.S. Pat. No. 6,736,268.
The cavity 6 extending from above to below is formed at the center in the above-described door 4. The semiconductor wafer is located at the portion of the cavity 6. As a consequence, the inside latch mechanisms 5 are contained inside of the lid 1 in such a manner as to avoid the cavity 6. Therefore, a space for use in containing the inside latch mechanisms 5 becomes narrow, thereby raising a problem of a small freedom of a design.
The present invention has been accomplished to solve the above-described problems. Therefore, an object of the present invention is to provide an airtight container, in which a space is largely defined inside of the lid, thus enhancing the freedom of a design of members to be contained inside of the lid.
In order to achieve the above-described object, according to the present invention, an airtight container, including a container unit which contains therein a plurality of thin plates; a lid which closes the container unit; and a seal member which seals a clearance defined between the container unit and the lid; includes a support groove which is formed at an inside surface of the lid so as to support the thin plates one by one or every two or more.
The lid includes an upper plate for covering an upper side, a lower plate for covering a lower side and a machine interface formed at a clearance which is defined between the upper plate and the lower plate and is opened outward; wherein the support groove includes a relief groove which is intermittently formed at the lower plate and partly penetrates through the lower plate, and a thin plate supporter which is disposed in a manner corresponding to the relief groove in a thin plate supporting space air-tightly separated from the outside and opened toward the relief groove at a clearance defined between the upper plate and the lower plate so as to support one by one the thin plates fitted into the relief groove. The thin plate supporting space defined between the upper plate and the lower plate is air-tightly separated from the outside via a seal member disposed at a clearance between the upper plate and the lower plate.
Alternatively, the support groove having another configuration is formed at the inside surface of the lid in such a manner as to be opened toward the container unit, and is constituted of a slit, at and into which the thin plates are supported and fitted one by one or every two or more. A V-shaped groove for fitting and supporting the thin plate is formed at the bottom of the slit.
As described above, in the airtight container according to the present invention, the thin plates contained inside of the container unit are fitted into the support grooves formed at the inside surface of the lid, to be thus supported thereat. Thus, the space is largely defined inside of the lid, thereby enhancing the freedom of the design of the members to be contained inside of the lid.
A description will be given below of a preferred embodiment according to the present invention referring to the attached drawings. An airtight container according to the present invention is a container, in which a thin plate such as a semiconductor wafer, a storage disk or a liquid crystal glass substrate is contained, to be then stored, transported or used in a fabrication process. Here, the present invention is exemplified by an airtight container which contains therein semiconductor wafers.
As shown in
The container unit 12 is formed into a cubic shape as a whole. The container unit 12 is constituted of four side walls 12A, 12B, 12C and 12D and a bottom plate 12E serving as peripheral walls and has an opening 12F formed at an upper portion thereof in a vertically set state (i.e., in a state shown in
As shown in
Moreover, a second fitted portion 21 is formed in the vicinity of each of the first fitted portions 20. The second fitted portions 21 are fitted with a simplified attaching/detaching mechanism for the lid, having another structure.
As shown in FIGS. 5 to 8, the lid 14 includes a main body 30, a cover plate (not shown) and the simplified attaching/detaching mechanism 32.
The main body 30 is a lower plate for covering the lower side, and is formed into a shallow dish of a substantial rectangle. An inside plate 30A serving as a bottom plate of the main body 30 and a cover plate serving as an upper plate for covering the upper side of the main body 30 define therein a wide space for supporting the thin plate. Around a lower portion of the main body 30 is secured a gasket receiver 31. At the gasket receiver 31 is received the gasket, which is fitted to the seal groove 18C in a state in which the main body 30 is disposed in the lid receiver 18 of the container unit 12, thereby sealing the inside of the container unit 12.
At ends on both sides in a lateral direction in the main body 30 of the lid 14 (i.e., on both sides in upper left and lower right directions in
Inside of the inside plate 30A of the lid 14 (i.e., on the side of the container unit 12) are formed support grooves 41 for supporting the semiconductor wafers W one by one, as shown in
The airtight container 11 such configured as described above is used in the following manner.
The semiconductor wafers W are contained inside of the container unit 12, to be then covered with the lid 14. At this time, the lid 14 is fitted in the lid receiver 18 in the container unit 12, and then, is fixed to the container unit 12 by the simplified attaching/detaching mechanism 32. Here, the upper edge of each of the semiconductor wafers W contained inside of the container unit 12 is fitted to the corresponding support groove 41 on the side of the inside plate 30A of the lid 14. In addition, the upper edge of each of the semiconductor wafers W is fitted to the V-shaped groove 42 at the back of the support groove 41, to be thus fixed and supported in a precisely positioned state.
As described above, the airtight container 11 can produce the following effects:
(1) Since the support grooves 41 for supporting the semiconductor wafers W one by one are formed at the inside plate 30A in the lid 14, a wide space can be secured inside of the lid 14, and therefore, a mechanism such as the simplified attaching/detaching mechanism 32 can be disposed without any restriction from the viewpoint of the space. As a consequence, it is possible to enhance the freedom of the design of the simplified attaching/detaching mechanism 32, and further, to dispose other devices.
(2) Since the support grooves 41 are formed at the inside plate 30A in the lid 14 in such a manner as to be opened toward the container unit 12, the space defined inside of the lid 14 cannot be narrowed without any large intrusion into the lid 14, thereby securing the wide space. As a result, it is possible to enhance the freedom of the design, and further, to dispose other devices, as described above.
(3) Since the V-shaped groove 42 is formed at the bottom of the support groove 41, the edge of the semiconductor wafer W can be fitted into the V-shaped groove 42, to be thus stably supported therein.
[Modifications]
(1) Although the above-described preferred embodiment is configured such that one semiconductor wafer W is fitted into and supported by one support groove 41, it may be configured such that the plurality of semiconductor wafers W are fitted into and supported by one support groove 41. In this case, V-shaped grooves are formed in parallel to each other at the bottom of the support groove 41 in the same number as that of semiconductor wafers W to be fitted.
(2) Although each of the right and left edges of the support groove 41 is formed at a right angle in the above-described preferred embodiment, each of the right and left edges of the support groove 41 may be tapered (with a taper similar to a taper 54 shown in
(3) A plurality of partition plates 51 in
Incidentally, although the intermediate member 52 is inserted between the partition plates 51 under pressure in the above-described modification, an intermediate member 55 and a partition plate 56 may be arranged with a clearance therebetween, as shown in
Alternatively, as shown in
(4) Although the support groove is elongated at the inside plate in the lid in the above-described preferred embodiment, it may be configured as shown in FIGS. 13 to 15. Here, a support groove 61 includes a relief groove 62, which communicates intermittently with the inside plate 30A and partly with the inside of the container unit 12 and penetrates through the inside plate 30A, and a thin plate supporter 63, which is disposed in a manner corresponding to the relief groove 62 in a thin plate support space S opened toward the relief groove 62 in airtight separation from the outside in the clearance defined between a cover plate 65 and the inside plate 30A so as to support one by one the semiconductor wafers W fitted to the relief grooves 62.
The relief groove 62 has a hole formed at the inside plate 30A in the lid 14, to thus allow the plurality of semiconductor wafers W to be inserted thereinto one by one or every two or more. The lateral width of the relief groove 62 is set according to the number of semiconductor wafers W to be inserted. The number of relief grooves 62 is determined according to the number of semiconductor wafers W to be contained. The relief grooves 62 are formed in parallel to each other in the number such determined as described above. Incidentally, in the case where the plurality of semiconductor wafers W are contained in one relief groove 62, the relief grooves 62 are arranged in parallel to each other in the number accordingly.
The thin plate supporter 63 is a member for fitting and supporting the semiconductor wafer W inserted through the relief groove 62. The thin plate supporter 63 is secured to the cover plate 65 for covering the upper side of the lid 14. The thin plate supporter 63 mainly includes a base end supporter 66, an elastic support plate 67, an abutting piece 68, a connecting support plate 69 and a supporting rib 70. The semiconductor wafer W is fitted at the edges thereof to two abutting pieces 68, to be thus supported thereby. The two abutting pieces 68 are disposed in a manner corresponding to the relief groove 62, and therefore, support one by one the semiconductor wafers W fitted into the relief groove 62. The abutting piece 68 is elastically supported on both sides thereof by the elastic support plate 67 and the connecting support plate 69, thereby elastically supporting the semiconductor wafer W. In particular, the connecting support plate 69 is supported by the supporting rib 70 disposed at the cover plate 65, and therefore, stably supports the two abutting pieces 68. Consequently, the two abutting pieces 68 stably supported by the connecting support plate 69 supported by the supporting rib 70 elastically support the semiconductor wafer W. Incidentally, the thin plate supporter 63 may be divided into a plurality of parts. That is to say, the thin plate supporter 63 may be appropriately divided according to fixing modes.
In the case where the relief groove 62 is formed at the inside plate 30A in the lid 14, the container unit 12 need be sealed in order to be shut off from outside air. In view of this, a seal receiving wall 72 is provided at the inside plate 30A in such a manner as to surround the relief groove 62. In addition, a hook supporter 73 for supporting the base end supporter 66 of the thin plate supporter 63 is provided at the cover plate 65. The hook supporter 73 faces to the seal receiving wall 72. An annular seal 74 is interposed between the hook supporter 73 and the seal receiving wall 72, thereby air-tightly sealing the surroundings of the thin plate supporter 63. A space around the thin plate supporter 63 air-tightly sealed by the seal 74 serves as the thin plate support space, which is air-tightly separated from the outside and is opened toward the relief groove 62. Here, reference numeral 75 designates another seal for air-tightly sealing a gap defined between the container unit 12 and the lid 14. The two seals 74 and 75 air-tightly seal the inside of the container unit 12 from the outside.
Although in the above-described case, the thin plate support space defined around the thin plate supporter 63 is air-tightly separated from the outside via the seal 74, the seal 74 may be replaced with an elastic film 81, as shown in
Otherwise, the elastic film 81 may be attached in such a manner as to cover all of the partition plates, as shown in
The elastic film 81 is made of an expandable synthetic resin in such a manner as to be greatly flexed, as shown in
In this case, the elasticity of the elastic film 81 may be adjusted by changing the material or thickness of the elastic film 81, thereby varying force supporting the semiconductor wafer W. The force supporting the semiconductor wafer W can be readily changed according to various conditions such as the size or conveyance mode of the semiconductor wafer W by adjusting the elasticity of the elastic film 81. In other words, an optimum supporting force can be readily achieved by adjusting the force supporting the semiconductor wafer W.
This modification also can produce the same functions and effects as those produced in the above-described preferred embodiment.
Number | Date | Country | Kind |
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2005-086029 | Mar 2005 | JP | national |