Patent Application
20050221713
1. Field of the Invention
The present invention relates in general to a plasma display panel (PDP), and more particularly, to an alignment structure for assembling a plasma display panel.
2. Description of the Related Art
Recently, a variety of flat panel displays, such as liquid crystal display (LCD) and plasma display panel (PDP) have been intensively developed to replace cathode ray tube (CRT) displays. In PDP technology, ultraviolet light is emitted to excite RBG phosphors and produce visible light. The advantages of the PDP include a large display area, wide viewing angle, and intense brightness.
For luminance efficiency and quality assurance, it is necessary that the display electrodes on the front substrate be accurately aligned with the discharge cells defined by the rib structures on the rear substrate. In general, alignment marks with a circular or cross shape are additionally formed on the front and rear substrates, respectively. However, an alignment mark with a circular or cross shape on the rear substrate is formed when the address electrode is formed. The alignment mark must undergo several thermal processes for the fabrication of dielectric layer and rib structures. As a result, the alignment mark deforms or shifts from the original position, significantly increasing alignment errors.
Accordingly, an object of the present invention is to provide a novel alignment structure for a plasma display panel (PDP) to reduce alignment errors between the rear and front substrates of the PDP.
Another object of the present invention is to provide a novel alignment structure for a plasma display panel, which employs at least one rib structure or address electrode on the rear substrate and positioned outside of the display area as an alignment pattern, thereby reducing alignment errors between the rear and front substrates of the PDP.
The above and other objects and advantages, which will be apparent to one skilled in the art, are achieved in the present invention which is directed to, in a first aspect, an alignment structure for a plasma display panel. The alignment structure includes a first alignment pattern and a second alignment pattern. The first alignment pattern is disposed on a rear substrate and formed by a rib structure. The second alignment pattern is disposed on a front substrate disposed opposite, over the rear substrate, and corresponding to a space defined by the first alignment pattern. Moreover, the first and second alignment patterns are outside of a display area of the PDP.
In another aspect of the invention, an alignment structure for a plasma display panel is provided. The alignment structure includes a first alignment pattern and a rectangular and ringed second alignment pattern. The first alignment pattern is disposed on a rear substrate and formed by an address electrode having a rectangular block. The rectangular and ringed second alignment pattern is disposed on a front substrate disposed opposite, over the rear substrate, and corresponding to a space around the rectangular block. Moreover, the first and second alignment patterns are outside of a display area of the PDP.
In yet another aspect of the invention, an alignment structure for a plasma display panel is provided. The alignment structure includes a columnar first alignment pattern and a disklike second alignment pattern. The columnar first alignment pattern is disposed on a rear substrate and formed by a rib. The disklike second alignment pattern is disposed on a front substrate disposed opposite, over the rear substrate, and corresponding to the columnar first alignment pattern. Moreover, the first and second alignment patterns are outside of a display area of the PDP.
In yet another aspect of the invention, an alignment structure for a plasma display panel is provided. The alignment structure includes a first alignment pattern and a second alignment pattern. The first alignment pattern is disposed on a rear substrate and formed by a rib structure. The second alignment pattern is disposed on a front substrate disposed opposite, over the rear substrate, extending from the end of a bus electrode and corresponding to a space defined by the first alignment pattern. Moreover, the first and second alignment patterns are outside of a display area of the PDP.
The present invention will become more fully understood from the detailed description given hereinbelow and the accompanying drawings, given by way of illustration only and thus not intended to be limitative of the present invention.
a illustrates the rib structure with quadrangular shape of the invention.
b illustrates the rib structure with pentagonal shape of the invention.
c illustrates the rib structure with cross shape of the invention.
a is a plane view of even still another example of an alignment structure for a plasma display panel according to the invention.
b is a cross-section along the line 8b-8b shown in
a to 10c illustrate varied examples according to
In
Hexagonal rib structures 102 and 102a are respectively formed on the display area 10 and the non-display area 20 of the rear substrate 100, with each hexagonal rib structure adjacent to constitute a honeycombed rib structure, as shown in
A plurality of bus electrodes 202, such as Cr—Cu alloy, overlies the front substrate 200 and corresponds to the shape of the hexagonal rib structures 102 with a saw-toothed profile. Moreover, a plurality of T-shaped transparent electrodes 204 also overlies the front substrate 200 and corresponds to spaces defined by the hexagonal rib structures 102. Here, two T-shaped transparent electrodes 204 are symmetrically arranged in the space defined by the hexagonal rib structures 102 and electrically connected to the tip portion of the electrodes 202 with the saw-toothed profile. The transparent electrodes 204 may comprise indium tin oxide (ITO). Additionally, a black matrix 205 overlies the bus electrodes lines 202 and corresponds to the honeycombed structure formed on the rear substrate 100. A dielectric layer 206 and a protective layer (not shown), such as an MgO layer, successively overlie the front substrate 200 to cover the black matrix 205, the bus electrodes 202, and the transparent electrodes 204.
It is note that the rib structures 102 and 102a shown in
In order for the transparent electrodes 204 and bus electrodes 202 formed on the front substrate 200 to accurately correspond to the discharge cells and the hexagonal rib structures 102, respectively, an alignment structure is required. Accordingly, in the invention, an alignment structure is provided in the non-display area 20 between the rear and front substrates 100 and 200. FIGS. 2 to 10 illustrate several examples of the alignment structure formed on the non-display area 20 of the plasma display panel according to the invention.
The second alignment pattern 22a is disposed on the front substrate 200 disposed opposite, over the rear substrate 100. In the invention, the second alignment pattern 22a corresponds to a space defined by the first alignment pattern 102a. Moreover, the second alignment pattern 22a has a profile (or shape) similar to that of the rib structure 102a. That is, the second alignment pattern 22a has a hexagonal profile. Moreover, the second alignment pattern 22a is separated therefrom by predetermined distances x1, x2, y1, and y2. The second alignment pattern 22a with a hexagonal profile similar to the hexagonal rib structure 102a may be formed when the plurality of bus electrodes 202 is formed overlying the front substrate 200. Moreover, the second alignment pattern 22a may be formed when the plurality of transparent electrodes 204 or the black matrix 205 is formed overlying the front substrate 200.
When alignment is performed between the front and rear substrates 200 and 100, facing alignment can be used by the angles of the first alignment pattern 102a to the angles of the second alignment pattern 22a. Additionally, the predetermined distances x1, x2, y1, and y2 may be measured for perpendicular and horizontal alignment and for alignment interstitial control.
Additionally, the dielectric layer 206 overlying the front substrate 200 can be etched to form an opening 22b to serve as the second alignment pattern. The second alignment pattern 22b has a hexagonal profile similar to the hexagonal rib structure 102a and is separated from the hexagonal rib structure 102a by predetermined distances x1, x2, y1, and y2. Also, the method mentioned can be used to align the front and rear substrates 200 and 100.
In
The second alignment pattern 24a is disposed on the front substrate 200 disposed opposite, over the rear substrate 100. In the invention, the second alignment pattern 24a corresponds to a space defined by the first alignment pattern 102a. Moreover, the second alignment pattern 24a has a circular profile and is separated therefrom. The second alignment pattern 24a with a circular profile may be formed when the plurality of bus electrodes lines 202 is formed on the front substrate 200. Moreover, the second alignment pattern 24a may be formed when the plurality of transparent electrodes 204 or the black matrix 205 is formed on the front substrate 200.
When alignment is performed between the front and rear substrates 200 and 100, the distance from the center of the second alignment pattern 24a to the edges of the first alignment pattern (hexagonal rib structure) 102a can be measured for alignment interstitial control.
Additionally, the dielectric layer 206 overlying the front substrate 200 can be etched to form a circular opening 24b to serve as the second alignment pattern. The second alignment pattern 24b is separated from the first alignment pattern 102a and the method mentioned can be used to align the front and rear substrates 200 and 100.
Moreover, in the invention, a circular and ringed pattern 24c can be used as the second alignment pattern and may be formed when the plurality of bus electrodes 202 or the plurality of transparent electrodes 204 or the black matrix 205 is formed overlying the front substrate 200. Also, a circular and ringed opening 24d formed by etching the dielectric layer 206 overlying the front substrate 200 can be used as the second alignment pattern. Moreover, an additional columnar rib 102b can be optionally disposed on the rear substrate 100 corresponding to a space defined by the ringed second alignment pattern 24c or 24d. In general, the columnar rib 102b is an alignment mark for phosphor alignment, and is formed when the honeycombed rib structure is formed.
The concentric circle method can be used by the columnar rib 102b and the ringed second alignment pattern 24c or 24d for alignment of the front and rear substrates 200 and 100.
In
The yardstick second alignment pattern 26a is disposed on the front substrate 200 disposed opposite, over the rear substrate 100. In the invention, the yardstick second alignment pattern 26a corresponds to a space defined by the first alignment pattern 102a. Moreover, the yardstick second alignment pattern 26a may be formed when the plurality of bus electrodes lines 202 is formed overlying the front substrate 200. Moreover, the yardstick second alignment pattern 26a may be formed when the plurality of transparent electrodes 204 or the black matrix 205 is formed overlying the front substrate 200.
When alignment is performed between the front and rear substrates 200 and 100, the yardstick pattern 26a can be used to adjust the position of the front substrates 200 or the rear substrates 100.
Additionally, the dielectric layer 206 overlying the front substrate 200 can be etched to form a yardstick opening 22b to serve as the second alignment pattern. Also, the method mentioned can be used for aligning the front and rear substrates 200 and 100.
Additionally, in the invention, a third alignment pattern 101 may correspond to the space defined by the first alignment pattern 102a. For example, the third alignment pattern 101 may be formed by a dummy address electrode disposed between the rear substrate 100 and the first alignment pattern 102a. The dummy address electrode 101 can be formed when the plurality of address electrodes is formed on the display area 10 of the rear substrate 100. Here, the third alignment pattern 101 may be used rather than the first alignment pattern 102a when the yardstick pattern 26a is used to adjust the position of the front substrates 200 or the rear substrates 100.
In
The rectangular and ringed second alignment pattern 28a is disposed on a front substrate 200 disposed opposite, over the rear substrate 100. In the invention, the rectangular and ringed second alignment pattern 28a corresponds to a space around the rectangular block 101a and is separated therefrom by predetermined distances x3, x4, y3, and y4. Moreover, the second alignment pattern 28a may be formed when the plurality of bus electrodes lines 202 is formed overlying the front substrate 200. Moreover, the second alignment pattern 28a may be formed when the plurality of transparent electrodes 204 or the black matrix 205 is formed overlying the front substrate 200.
When alignment is performed between the front and rear substrates 200 and 100, the predetermined distances x3, x4, y3, and y4 may be measured for alignment of perpendicular and horizontal directions and for alignment interstitial control.
Additionally, the dielectric layer 206 overlying the front substrate 200 can be etched to form an opening 28b to serve as the second alignment pattern. The second alignment pattern 28b is rectangular and ringed and separated from the rectangular block 101a by predetermined distances x3, x4, y3, and y4. Also, the method mentioned can be used for aligning the front and rear substrates 200 and 100.
The second, fourth, and sixth alignment patterns 29a, 29a′, and 29″ are disposed on the front substrate 200 disposed opposite, over the rear substrate 100. In the invention, for example, the second, fourth, and sixth alignment patterns 29a, 29a′, and 29″ are three triangles respectively corresponding to each space defined by the first, third, and fifth alignment patterns 102a, 102a′, and 102a″. Moreover, each triangle 29a, 29a′, or 29″ is close to the corresponding hexagonal rib structures 102a, 102a′, or 102a″ to form slits between the first and second alignment patterns 102a and 29a, between the third and fourth alignment patterns 102a′ and 29a′, and between the fifth and sixth alignment patterns 102a″ and 29a″, respectively.
The second, fourth, and sixth alignment patterns 29a, 29a′, and 29″ may be formed when the plurality of bus electrodes lines 202 is formed overlying the front substrate 200. Moreover, the second, fourth, and sixth alignment patterns 29a, 29a′, and 29″ may be formed when the plurality of transparent electrodes 204 or the black matrix 205 is formed overlying the front substrate 200.
When alignment is performed between the front and rear substrates 200 and 100, these slits can be used for alignment interstitial control.
Additionally, the dielectric layer 206 overlying the front substrate 200 can be etched to form three triangular openings 31a, 31a′, and 31a″ respectively corresponding to each space defined by the three hexagonal rib structures 102a, 102a′, and 102a″ to serve as the second, fourth, six alignment patterns, respectively. As mentioned above, each triangular opening 31a, 31a′, or 31″ may be close to the corresponding hexagonal rib structures 102a, 102a′, or 102a″ to form slits. Also, the method mentioned can be used to align the front and rear substrates 200 and 100.
In
a is a plane view of even still another example of an alignment structure for a plasma display panel according to the invention and
The disklike second alignment pattern 32a is disposed on the front substrate 200 disposed opposite, over the rear substrate 100. In the invention, the disklike second alignment pattern 32a corresponds to the columnar first alignment pattern 102c. Moreover, the disklike second alignment pattern 32a may be formed when the plurality of bus electrodes lines 202 is formed overlying the front substrate 200. Moreover, the disklike second alignment pattern 32a may be formed when the plurality of transparent electrodes 204 or the black matrix 205 is formed overlying the front substrate 200.
The dielectric layer 206 overlies the front substrate 200 and the disklike second alignment pattern 32a.
When alignment is performed between the front and rear substrates 200 and 100, the concentric circle method can be used by the columnar rib 102c and the overlying disklike second alignment pattern 32a for alignment of the front and rear substrates 200 and 100.
Additionally, the dielectric layer 206 may have an opening 32b to expose the disklike second alignment pattern 32a. The underlying columnar rib 102c can be inserted into the opening 32b for aligning the front and rear substrates 200 and 100.
The second alignment pattern 34a is disposed on the front substrate 200 disposed opposite, over the rear substrate 100. For example, the second alignment pattern 34a may be a triangle extending from the end of a bus electrode 202a which extends from the bus electrode 202 on the display area 10. That is, the second alignment pattern 34a may comprise the same material as the bus electrode 202a. Moreover, the second alignment pattern 34a corresponds to a space defined by the first alignment pattern 102a, wherein the second alignment pattern 34a is close to the first alignment pattern 102a to form a slit S1 therebetween.
The third alignment pattern 34b is disposed on the front substrate 200. For example, the third alignment pattern 34b may be a triangle extending from the end of another bus electrode 202b symmetrical to the bus electrode 202a and corresponding to the space defined by the first alignment pattern 102a. In the invention, the third alignment pattern 34b may comprise the same material as the bus electrode 202b. Moreover, the third alignment pattern 34b is close to the first alignment pattern 102a to form a slit S2 therebetween.
When alignment is performed between the front and rear substrates 200 and 100, the slits S1 and S2 can be used for alignment interstitial control.
Additionally, the second alignment pattern may be a line 34c extending from the end of the bus electrode 202a, which comprises the same material as the bus electrode 202a. Moreover, the second alignment pattern 34c corresponds to the space defined by the first alignment pattern 102a, wherein the line 34c is close to the first alignment pattern 102a to form a slit S3 therebetween. Moreover, a line 34d extending from the bus electrode 202a, which comprises the same material as the bus electrode 202a, is used as the third alignment pattern. In the invention, the third alignment pattern 34d corresponds to a space outside of the first alignment pattern 102a and forms a slit S4 therebetween.
Also, when alignment is performed between the front and rear substrates 200 and 100, the slits S3 and S4 can be used for alignment interstitial control.
a to 10c illustrate varied examples according to
In
In
In
According to the invention, at least one rib structure or address electrode formed on the rear substrate and positioned outside of the display area is used as an alignment pattern, such that there is no need for additional alignment marks on the rear substrate. Moreover, the alignment mark formed by rib structure can prevent deformation from repeated thermal processes prior to formation of the discharge cells by rib structures. Accordingly, alignment errors between the rear and front substrates of the PDP are reduced.
While the invention has been described by way of example and in terms of the preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments. To the contrary, it is intended to cover various modifications and similar arrangements (as would be apparent to those skilled in the art). Therefore, the scope of the appended claims should be accorded the broadest interpretation to encompass all such modifications and similar arrangements.
| Number | Date | Country | Kind |
|---|---|---|---|
| 93108641 | Mar 2004 | TW | national |
