Claims
- 1. A vaporizable compound corresponding to the formula (I)
- M(R).sub.2 (I)
- wherein
- M represents calcium, strontium or barium, and
- R represents 2,6-dimethyl-3,5-heptane dionate, 2,2,6-trimethyl-3,5-heptane dionate, or 2,2,6,6-tetramethyl-3,5-heptane dionate;
- said compound exhibiting a .sup.1 H-NMR spectrum free of a detectable water proton signal.
- 2. A compound according to claim 1, wherein R is 2,2,6,6-tetramethyl-3,5-heptane dionate.
- 3. A compound according to claim 1, wherein M is barium.
- 4. A composition of matter for use in a metal organic chemical vapor deposition process, said composition comprising in admixture at least one vaporizable compound corresponding to the formula (I) and at least one vaporizable organic compound of another metal.
- 5. A composition of matter according to claim 4, comprising at least one vaporizable compound corresponding to the formula (I) and at least one vaporizable organic compound of yttrium and copper.
- 6. A process for preparing a compound corresponding to the formula (I):
- M(R).sub.2 (I)
- wherein
- M represents the metal calcium, strontium or barium, and
- R represents 2,6-dimethyl-3,5-heptane dionate, 2,2,6-trimethyl-3,5-heptane dionate or 2,2,6,6-tetramethyl-3,5-heptane dionate,
- said process comprising the steps of:
- mixing a solution or suspension of a compound of the metal M in water or in a water-containing water-miscible solvent with a diketone selected from the group consisting of 2,6-dimethyl-3,5-heptane dione, 2,2,6-trimethyl-3,5-heptane dione and 2,2,6,6-tetramethyl-3,5-heptane dione to react said compound of the metal M with said diketone;
- separating the resulting compound of Formula (I) from the mixture; and
- vacuum drying said separated compound of Formula (I) at a temperature of at most 60.degree. C. until said compound of Formula (I) exhibits a .sup.1 H-NMR spectrum in which a water proton signal cannot be detected.
- 7. A process according to claim 6, wherein said compound of the metal M is a hydroxide or an oxide of said metal M.
- 8. A process according to claim 6, wherein said compound of the metal M and said diketone are used in a molar ratio of 1:2 to 1:2.05.
Priority Claims (1)
Number |
Date |
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Kind |
41 08 731.8 |
Mar 1991 |
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Parent Case Info
This application is a division of application Ser. No. 08/158,374, filed Nov. 29, 1994, now U.S. Pat. No. 5,451,434 which in turn is a continuation of application Ser. No. 07/847,266, filed Mar. 10, 1992, now abandoned.
US Referenced Citations (14)
Foreign Referenced Citations (4)
Number |
Date |
Country |
55459 |
Jul 1982 |
EPX |
297348 |
Jan 1989 |
DEX |
4122449 |
Jan 1992 |
DEX |
4124686 |
Jan 1992 |
DEX |
Non-Patent Literature Citations (6)
Entry |
Chemical Abstracts 116(6):50311m, 1992 (no month available). |
Chemical Abstracts 114(26):258508x, 1991 (no month available). |
Berg et al., "Fractional Sublimation of Various Metal Chelates of Dipivaloylmethane", Analytica Chimica Acta, vol. 60, pp. 117-125. |
Dickinson et al., "Chemical Vapor Deposition of YBa.sub.2 Cu.sub.3 O.sub.7-x Superconducting Films", J. Appl. Phys., vol. 66, No. 1, pp. 444-447 (1989). |
Hammond et al., "Chelates of .beta.-Diketones. V. Preparation and Properties of Chelates Containing Sterically Hindered Ligands", Inorganic Chemistry, vol. 2, No. 1, pp. 73-76. |
Murdock et al., "Acylation of Metal Chelates. Part I.", pp. 2153-2162 (1962). |
Divisions (1)
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Number |
Date |
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Parent |
158374 |
Jan 1993 |
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Continuations (1)
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Parent |
847266 |
Mar 1992 |
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