Claims
- 1. A process for cleaning the hair, which comprises contacting the hair and skin with an effective detersive concentration in aqueous the compound conforming to the following structure: R1 is selected from the group consisting of alkyl having from 6 to 20 carbon atoms and R4—O—(CH2)3—R4 is alkyl having from 6 to 20 carbon atoms; R2 is M is a cation selected from the group consisting of Na, K, Li and H; R3 is selected from the group consisting of H and
- 2. A process of claim 1 wherein said effective detersive concentration is between 1% and 25% by weight.
- 3. A process of claim 1 wherein said effective detersive concentration is between 5% and 20% by weight.
- 4. A process of claim 1 wherein R1 is of alkyl having from 6 to 20 carbon atoms.
- 5. A process of claim 1 wherein R1 is R4—O—(CH2)3—.
- 6. A process of claim 1 wherein M is H.
- 7. A process of claim 1 wherein M is Na.
- 8. A process of claim 1 wherein M is K.
- 9. A process of claim 1 wherein M is H.
- 10. A process of claim 1 wherein R3 is
- 11. A process of claim 1 wherein R1 is of alkyl having 6 carbon atoms.
- 12. A process of claim 1 wherein R1 is of alkyl having 12 carbon atoms.
- 13. A process of claim 1 wherein R1 is of alkyl having 14 carbon atoms.
- 14. A process of claim 1 wherein R1 is of alkyl having 16 carbon atoms.
- 15. A process of claim 1 wherein R1 is of alkyl having 18 carbon atoms.
- 16. A process of claim 1 wherein R1 is of alkyl having 20 carbon atoms.
- 17. A process of claim 1 wherein R4 is of alkyl having 6 carbon atoms.
- 18. A process of claim 1 wherein R4 is of alkyl having 12 carbon atoms.
- 19. A process of claim 1 wherein R4 is of alkyl having 14 carbon atoms.
RELATED APPLICATION
This application is a continuation-in-part of application Ser. No. 09/611,814 filed Jul. 7, 2000, now U.S. Pat. No. 6,365,774, which is in turn a continuation-in-part of application Ser. No. 09/611,429 filed Jul. 7, 2000, now U.S. Pat. No. 6,229,038, which is in turn a continuation-in-part of application Ser. No. 09/493,172 filed Jan. 28, 2000, now U.S. Pat. No. 6,346,648.
US Referenced Citations (18)
Foreign Referenced Citations (1)
Number |
Date |
Country |
49-30316 |
Mar 1974 |
JP |
Continuation in Parts (3)
|
Number |
Date |
Country |
Parent |
09/611814 |
Jul 2000 |
US |
Child |
10/114613 |
|
US |
Parent |
09/611429 |
Jul 2000 |
US |
Child |
09/611814 |
|
US |
Parent |
09/493172 |
Jan 2000 |
US |
Child |
09/611429 |
|
US |