Claims
- 1. An anisotropic nanophase material comprising a nanophase structure of only one inorganic material, said nanophase structure containing a multiplicity of particulates, each of said particulates having a flat sheet structure,
- wherein said particulates have an average thickness of 1 to 10 nanometers and an average length of not less than 10 nanometers, the length being larger than the thickness,
- the particulates being anisotropically oriented in a given direction,
- said particulates are three-dimensionally dispersed within the nanophase structure,
- said nanophase structure is formed on a substrate, and
- wherein said particlates are inclined at an angle of not more than 6.degree. from the normal of the surface of the substrate.
- 2. The anisotropic nanophase material of claim 1, wherein said one inorganic material is one selected from the group consisting of inorganic oxides, fluorides, semiconductors and metals.
- 3. The anisotropic nanophase material of claim 1, wherein said one inorganic material is one selected from the group consisting of MgO, Al.sub.2 O.sub.3, SiO, SiO.sub.2, TiO.sub.2, V.sub.2 O.sub.5, CuO, ZnO, GeO.sub.2, ZnO.sub.2, Nb.sub.2 O.sub.5, MoO.sub.3, In.sub.2 O.sub.3, SnO.sub.2, HfO.sub.2, Ta.sub.2 O.sub.5, WO.sub.3, Bi.sub.2 O.sub.3, La.sub.2 O.sub.3, CeO.sub.2, CaF.sub.2, CeF.sub.2, MgF.sub.2, CdS, CdSe, CdTe, GaAs, Ge, ZnTe, ZnS, Fe, Co, Ni, Au, Ag, A1, Pt and Ca.
- 4. The anisotropic nanophase material of claim 1, wherein said nanophase structure is formed in a monolayer.
- 5. The anisotropic nanophase material of claim 1, wherein said particulates are not in contact with each other.
- 6. The anisotropic nanophase material of claim 1, wherein said particulates are in at least partial contact such that a given particulate at least partially contacts an adjacent particulate.
- 7. The anisotropic nanophase material of claim 1, wherein said particulates are formed by simultaneously depositing the same material obliquely on said substrate, said particulates are in contact, and wherein said nanophase structure contains voids between some of the particulates.
- 8. The anisotropic nanophase material of claim 1, wherein said particulates have a height of not more than 1500 nanometers.
- 9. An anisonropic nanophase material produced by a method comprising the steps of:
- maintaining the surface cf a substrate at a temperature (in K) less than 1/3 of the temperature (in K) of the melting point of an inorganic material to be deposited on the substrate; and
- simultaneously depositing the material from two different directions onto the surface of the substrate in a vacuum vessel, wherein the material is evaporated from a direction inclined at an angle of 30.degree.-89.degree. to the normal to the surface of the substrate and simultaneously the material is deposited from a direction differing from the former direction by at least 30.degree.,
- wherein said nanomhase material comprises flat sheet particulates, said particulates comprising said inorganic material,
- said particulates have an average thickness of 1 to 10 nanometers and an average length of not less than 10 nanometers the length being larger than the thickness, and
- wherein said particulates are inclined at an angle of not more than 6.degree. from the normal of the surface of the substrate.
- 10. The anisotropic nanophase material of claim 9, wherein said nanophase structure is formed in a monolayer.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2-80259 |
Mar 1990 |
JPX |
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Parent Case Info
This is a division, of application Ser. No. 07/675,878 filed on Mar. 27, 1991 now U.S. Pat. No. 5,401,587.
US Referenced Citations (4)
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4743507 |
Franses et al. |
May 1988 |
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4874664 |
Hamaguchi et al. |
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5073449 |
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Divisions (1)
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Number |
Date |
Country |
Parent |
675878 |
Mar 1991 |
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