Patent Application
20080220242
This application is related to commonly-assigned, co-pending applications entitled, “Method for Manufacturing Field Emission Electron Source”, filed on Oct. 5, 2007 (Atty. Docket No. US12421), and entitled, “Method for Manufacturing Transparent Conductive Film”, filed on XXXX (Atty. Docket No. US12422). Disclosures of the above-identified applications are incorporated herein by reference.
1. Field of the Invention
The present invention relates to anodic structures and methods for manufacturing same, and particularly, to an anodic structure with a carbon-nanotube-based film and a method for manufacturing the same.
2. Description of Related Art
Nowadays, anodic structures are used widely in electronic devices, such as cathode ray tube displays, field emission devices, transmission electron microscopes, etc. In the anodic structure, a transparent conductive film is formed on a transparent anodic substrate, and a phosphor layer is formed on the transparent conductive film. The anode and a cathode are oppositely configured (both in their position and in the charge placed thereon) to produce a spatial electrical field when a voltage is applied therebetween. Electrons are emitted from the cathode toward the phosphor layer. The phosphor layer is excited by the impinging electrons to emit light. Light can be transmitted out of these devices due to the transparency of the conductive film and the transparent anodic substrate.
The transparent conductive film used in the anodic structure is typically an indium-tin-oxide (ITO) film. The ITO film is formed on the substrate by a process of magnetron sputtering. However, the manufacturing steps in this process are complex, and the materials used in this process are expensive. Therefore, the manufacturing cost of such an anodic structure is high.
What is needed, therefore, is to a low-cost anodic structure and a method for manufacturing same.
In a present embodiment, a method for manufacturing an anodic structure includes the steps of: providing a carbon nanotube slurry and a glass structure; applying a carbon nanotube slurry layer onto the glass structure; drying the carbon nanotube slurry layer on the glass structure; applying a phosphor layer on the carbon nanotube slurry layer; and solidifying the carbon nanotube slurry layer and the phosphor layer on the glass structure at an approximate temperature of 300˜500° C. and under protection of an inert gas to form the anodic structure.
Advantages and novel features will become more apparent from the following detailed description of the present anodic structure and the method for manufacturing same, when taken in conjunction with the accompanying drawings.
Many aspects of the present anodic structure and the method for manufacturing such can be better understood with reference to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present anodic structure and the method for manufacturing the same. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
Corresponding reference characters indicate corresponding parts throughout the drawings. The exemplifications set out herein illustrate at least one preferred embodiment of the present anodic structure and the method for manufacturing the same, in one form, and such exemplifications are not to be construed as limiting the scope of the invention in any manner.
Reference will now be made to the drawings to describe at least one present embodiment of the anodic structure and the method for manufacturing such.
Referring to
providing a carbon nanotube slurry and a glass structure, shown as step S100;
applying a carbon nanotube slurry layer onto the glass structure, shown as step S200;
drying the carbon nanotube slurry layer on the glass structure, shown as step S300;
applying a phosphor layer on the carbon nanotube slurry layer, shown as step S400; and
solidifying the carbon nanotube slurry layer and the phosphor layer on the glass structure at an approximate temperature of 300˜500° C. and under protection of an inert gas (e.g., N, Ar, He), in order to form the anodic structure, shown as step S500.
In step S100, the carbon nanotube slurry typically includes an organic carrier and a plurality of carbon nanotubes suspended in the organic carrier. Referring to
In step S1001, the organic carrier advantageously includes at least one of terpineol, dibutyl phthalate, and ethyl cellulose, and most suitably, constitutes a mixture of such components. A method for preparing the organic carrier includes the steps of: dissolving ethyl cellulose and then dibutyl phthalate into terpilenol at a temperature of about 80˜110° C., quite suitably about 100° C., using a heated oil bath; and upon reaching and holding a temperature of about 80˜100° C., stirring the mixture of ethyl cellulose, dibutyl phthalate, and terpilenol for about 10˜25 hours, quite usefully about 24 hours.
The terpineol acts as a solvent, the dibutyl phthalate acts as a plasticizer, and the ethyl cellulose acts as a stabilizer. Opportunely, percentages of weights of ingredients of the organic carrier are about 90% of terpilenol, about 5% of ethyl cellulose, and about 5% of dibutyl phthalate.
In the step S1002, the carbon nanotubes are manufactured by a process selected from the group consisting of CVD (chemical vapor deposition), arc discharge, and laser evaporation. A length of the carbon nanotubes should, rather advantageously, be in the approximate range from 1˜500 microns (μm), (most advantageously about 10 microns) and a diameter of the carbon nanotubes should beneficially be in the approximate range from 1˜100 nanometers (nm). A ratio of carbon nanotubes to dichloroethane is, opportunely, about two grams of carbon nanotubes per about 500 milliliters (ml) of dichloroethane. The dispersing step rather suitably includes crusher-dispersing and then ultrasonic-dispersing. Crusher-dispersing should take from about 5˜30 minutes and should, quite usefully, take about 20 minutes. Meanwhile, the ultrasonic dispersing should take from about 10˜40 minutes, and rather suitably, should take about 30 minutes.
Furthermore, after the dispersing step, a mesh screen is used to filter the carbon nanotube suspension so that big carbon nanotube clusters can be removed and desirable carbon nanotube slurry can be obtained. The number of the sieve mesh of the screen should, rather usefully, be about 400.
In the step S1003, a weight ratio of carbon nanotubes to the organic carrier is 15 to 1; a duration of ultrasonic dispersion is 30 minutes.
In the step S1004, beneficially, a temperature for the heating step in the water bath is about 90° C. so as to obtain a carbon nanotube slurry with a desirable concentration.
Transparency and conductivity of the carbon-nanotube-based transparent conductive film are dependent on the concentration of the carbon nanotubes in the carbon nanotube slurry. If the concentration of the carbon nanotubes is relatively high, the transparency of the resultant carbon-nanotube-based transparent conductive film is relatively low, while the conductivity of such a carbon-nanotube-based transparent conductive film is relatively high. Conversely, if the concentration of the carbon nanotubes is relatively low, the transparency of the carbon-nanotube-based transparent conductive film is, instead, relatively high, while the conductivity thereof is relatively low. In this present embodiment, about 2 grams of carbon nanotubes are used per about 500 milliliters of dichloroethane, and accordingly a weight ratio of carbon nanotubes to the organic carrier is about 15 to 1.
In the step S200, if the glass structure is a glass plate, a method for applying a carbon nanotube slurry layer onto the glass plate usefully includes providing two stacked glass plates, the two stacked glass plates forming two respective outer surfaces. The two stacked glass plates are totally immersed in the carbon nanotube slurry. The two stacked glass plates are then withdrawn from the carbon nanotube slurry at a constant speed so as to form a respective carbon nanotube slurry layer on each of the two outer surfaces by absorption of the carbon nanotube slurry thereon. The speed at which the glass plates are withdrawn can be expected to inversely impact the resultant slurry layer thickness (i.e., slower withdrawal times should generally yield greater layer thicknesses). It is to be understood that other numbers of glass plates (i.e., not just two thereof) could be treated at a single time, using a similar procedure, and still be within the scope of the present embodiment. The application method particularly extends well to the coating of any of a number of pairs of glass plates.
If the glass structure is a glass tube including two ends, and the two ends are defined two respective openings, a method for applying a carbon nanotube slurry layer on the glass plate beneficially includes sealing one opening to temporarily form a sealing end and inverting the sealing end downwards. The glass tube is filled with the carbon nanotube slurry via another opening. The sealing end is then released (e.g., opened yet again) so that the carbon nanotube slurry is drawn out of the glass tube by gravity. As the carbon nanotube slurry is drawn out of the glass tube, a carbon nanotube slurry layer forms on an inner wall of the glass tube by adsorption of the carbon nanotube slurry.
Beneficially, the applying step is performed under conditions wherein the concentration of airborne particulates is less than 1000 mg/m3.
In the step S300, the carbon nanotube slurry layer is dried so that the carbon nanotube slurry layer is fixedly formed on the glass structure.
In the step S400, a method for applying the phosphor layer on the carbon nanobtubes slurry layer is opportunely selected from the group consisting of coating, depositing, and screen printing. The material of the phosphor layer may be, e.g., a monochromatic phosphor or a polychrome phosphor.
In the step S500, advantageously, the solidifying step is performed at a temperature of about 320° C. at a duration of about 20 minutes.
Referring to
Since carbon nanotubes are used in the method for manufacturing an anodic structure according to the present embodiment, manufacturing steps are simple, and the materials (e.g., carbon nanotubes, organic carrier) used in the present method are inexpensive. In this way, the requirement to yield an anodic structure at low cost are thus satisfied.
It is to be understood that the above-described embodiment is intended to illustrate rather than limit the invention. Variations may be made to the embodiment without departing from the spirit of the invention as claimed. The above-described embodiments are intended to illustrate the scope of the invention and not restrict the scope of the invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 200610156988.6 | Nov 2006 | CN | national |
